JPH0650736B2 - Vertical plasma CVD device - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] In the present invention, a susceptor having a substrate vertically formed with a substrate formed on the surface between adjacent film forming chambers is delivered. The present invention relates to the configuration of a transfer mechanism in a vertical plasma CVD apparatus.

[Conventional technology]

FIG. 2 shows a first structural example of a conventional transfer mechanism of this type.
Below each of the film forming chambers 1 adjacent to each other, a substrate 2 on the surface of which a thin film is formed is vertically attached, and is horizontally and horizontally spaced at right angles to the moving direction (direction of the arrow) of the susceptor 3. By rotating the plurality of pinions 5 fixedly mounted on the plurality of shafts arranged in parallel in the same direction from the outside of the film forming chamber, the susceptor 3 having the rack 4 that meshes with the pinions 5 at the lower end edge is formed. Moving in the direction of the arrow, the susceptor 3 is delivered between both film forming chambers 1.

FIG. 3 shows a second configuration example of the conventional transport mechanism of this type.
In this example, above each of the film forming chambers 1 that are adjacent to each other, sprockets are respectively provided on a plurality of shafts that are arranged horizontally in a direction perpendicular to the moving direction of the susceptor 3 and at intervals in the horizontal direction in the same number in upper and lower two stages. 6 is fixed, the upper sprocket 6 is rotated by the common roller chain 7a, and the lower sprocket 6 is rotated through the roller chain 7b.
It is configured to rotate together with. Further, a roller 8 is fixedly mounted on each of the lower horizontal shafts, and by rotating one of the upper horizontal shafts, for example, the upper left shaft of each film forming chamber from the outside of the film forming chamber 1, the upper end edge is rotated. The susceptor 3 suspended by the roller 8 at the bent portion moves in the direction of the arrow, and the susceptor 3 is delivered between both film forming chambers.

[Problems to be Solved by the Invention]

The problems of the conventional transport mechanism configured as described above are as follows. That is, in the transport mechanism having the configuration shown in FIG. 2, among a plurality of pinions below each film forming chamber, when there are a plurality of pinions that need to be driven from the outside due to the width relationship in the moving direction of the susceptor, Since these pinions are normally driven mechanically in conjunction with each other by a common drive unit arranged outside each film forming chamber, it is extremely difficult to make adjustments for smooth engagement between the pinion and the rack. In addition, there is a drawback that the susceptor cannot be delivered when the transporting speed is different between the film forming chambers.

In addition, as shown in FIG. 3, in the structure in which the susceptor is hung on the rollers and conveyed, the conveying mechanism becomes complicated, and sliding easily occurs between the susceptor and the rollers, and fine particles that are inconvenient for film formation are likely to occur. There was a flaw.

It is an object of the present invention to prevent problems such as non-smooth transfer in one film forming chamber and inability to deliver between both film forming chambers, and
It is an object of the present invention to provide a configuration of a vertical plasma CVD apparatus including a susceptor capable of suppressing generation of fine powder due to delivery to a minimum.

[Means for Solving the Problems]

In order to solve the above problems, according to the present invention, the transfer of the susceptor in which the substrates, each of which is provided with a transport mechanism and on which a thin film is formed on the surface between the film deposition chambers, is vertically attached, is the transport mechanism. In the vertical plasma CVD apparatus performed by using the above-mentioned method, the susceptor has bent edges formed at both ends in the delivery direction so that the susceptor can support the susceptor in a suspended state from below. In addition, each of the film forming chambers is rotatably attached to a plurality of shafts arranged horizontally and at intervals in the horizontal direction at right angles to the delivery direction of the susceptor. A plurality of free rollers supported from the sprocket 6 and the sprocket 6 and the sprocket 6 which are arranged above the free roller row and horizontally spaced apart from each other. And a chain transport mechanism including a roller chain having a dock that is slid over and protrudes outward, wherein the susceptor is driven by transporting the chain transport mechanisms of the respective film forming chambers in the same direction. The dock of the chain transfer mechanism on the delivery side pushes the protrusion behind the bent edge of the susceptor, and the dock of the chain transfer mechanism on the side receiving the susceptor delays and hooks the protrusion in front of the bent edge of the susceptor for delivery. Assumed to be performed.

[Work]

With such a configuration of the vertical plasma CVD apparatus, the delivery of the susceptor is performed by the completion of the feeding operation from the film forming chamber in the former stage and the start of the drawing operation in the film forming chamber in the latter stage. The time difference between the time when the feeding is completed and the time when the drawing is started can be performed without requiring any strictness, and problems such as difficulty of adjustment and undeliverability unlike the case of the combination of the pinion and the rack do not occur. In addition, the slip that causes the generation of fine powder occurs between the protrusions at both ends of the bent edge of the susceptor and the dock of the roller chain, but the protrusion causes the slip between the dock for most of the movement process. It moves without being pressed by the dock, and the slip does not occur within a small dimensional range between the time when the feeding is completed and the time when the drawing is completed, and the pressing of the dock against the protrusion is performed by the roller rotatable around the shaft. Therefore, the generation of fine powder can be suppressed to an extremely small level.

〔Example〕

FIG. 1 shows an embodiment of the present invention. In the figure, the same members as those in FIGS. 2 and 3 are designated by the same reference numerals, and the description thereof will be omitted. At the upper edge of the susceptor 13 that is delivered between the left and right film forming chambers 1, the bent edge 1 is provided with protrusions 11a and 11b at both ends of the susceptor 13 in the delivery direction.
1 is formed, on the other hand, a plurality of shafts 18 are arranged in the film forming chamber 1 in the direction perpendicular to the delivery direction of the susceptor 13 and at intervals in the horizontal direction. A roller 19 for supporting the bent edge 11 of the above from below was rotatably attached. Also,
Two rollers are horizontally spaced above the row of 19 rollers.
Each sprocket 16 is arranged, and this sprocket 16
A roller chain 17 provided with a dock 20 is hung around to form a chain transfer mechanism for each film forming chamber 1. Now, when the chain transfer mechanism is driven in the same direction by a driving device provided outside each film forming chamber 1, the dock 20 of the film forming chamber 1 at the previous stage is moved to the protrusion 11b at the rear end of the bent edge 11 of the susceptor 13. Push the back side of the susceptor 13 and feed the susceptor 13 to the position shown in the figure. Dock 2 in the film deposition chamber 1 in the latter stage
0 wraps around behind the projection 11a at the front end, and after the feeding by the dock 20 at the front stage is completed, the dock 20 at the rear stage reaches the back surface of the protrusion 11a after a while, and from this position The movement of the susceptor 13 by the dock 20 is started. Therefore, even if a slight deviation occurs in the moving speed of both chain transfer mechanisms, the susceptor 13
Delivery is never impossible. Further, as shown in the figure, the dock 20 is a roller 2 which is rotatable around an axis.
0a, and the protrusions 11a, 1
Since the back side of 1b is pushed, between the dock 20 and the projections 11a, 11b within the dimensional range on the back surface of the projections 11a, 11b when the dock 20 transitions from the straight track to the circular track at the time of completion of feeding and retraction. The generation of fine powder due to the generated slip is extremely small, and does not substantially affect the film quality of the thin film formed on the substrate 2.

〔The invention's effect〕

As described above, according to the present invention, the transfer mechanism is used to deliver the susceptor to which the substrate, on which the thin film is formed, is vertically attached between the film forming chambers adjacent to each other and which is provided with the transfer mechanism. In the vertical plasma CVD apparatus to be performed, the susceptor is formed with a bent side edge at the upper end edge to support the susceptor from a lower side in a suspended state, at each of both ends in the delivery direction having a projection extending upward. Each of the film forming chambers is rotatably attached to a plurality of shafts that are arranged horizontally at right angles to the direction of delivery of the susceptor and at intervals in the horizontal direction, and supports the bent edge of the upper end of the susceptor from below. A plurality of free rollers, a sprocket arranged above the free roller row and spaced apart in the horizontal direction, and circulated over the sprocket. A chain transfer mechanism including a roller chain having a dock projecting in one direction, and a chain transfer mechanism of each of the film forming chambers is driven in the same direction to drive the susceptor. The dock of the chain transport mechanism pushes the protrusion behind the bent edge of the susceptor, and the dock of the chain transport mechanism on the side receiving the susceptor delays and hooks the protrusion in front of the bent edge of the susceptor for delivery. Therefore, after the feeding from the film forming chamber in the former stage is completed, the drawing in in the film forming chamber in the latter stage is started, and as in the conventional case, mechanical interference between both transfer mechanisms via the susceptor is eliminated,
The vibration and shock of the susceptor, which occurs when the pinion and rack are combined, is eliminated, and smooth and reliable delivery is possible without the risk of dropping or damaging the board. So also
Since the transport speed of the susceptor in each film forming chamber can be changed, the speed can be set according to the use of the film forming chamber. Further, the configuration of the transfer system including the susceptor is simple and the cost reduction effect is brought about. further,
The generation of fine powder due to slippage should occur only in a small size range when the dock moves from a linear orbit to a circular orbit while the back surfaces of the protrusions at both ends of the bent edge of the susceptor are pressed by a rotatable roller. From being extremely small,
It enables film formation with good film quality without being affected by the transport system.

[Brief description of drawings]

FIG. 1 is a sectional view showing an embodiment of the configuration of a vertical plasma CVD apparatus according to the present invention, and FIGS. 2 and 3 are sectional views showing different examples of the configuration of a conventional vertical plasma CVD apparatus. . 1 ... Deposition chamber, 2 ... Substrate, 3, 13 ... Susceptor, 1
1 ... Bending edge, 11a, 11b ... Protrusion, 16 ... Sprocket, 17 ... Roller chain, 18 ... Shaft, 1
9: Roller (free roller), 20: Dock.

Claims (1)

[Claims] 1. A vertical plasma CVD apparatus in which a susceptor having a substrate on which a thin film is formed is vertically mounted between adjacent film forming chambers, each of which has a transport mechanism, is used to transfer the susceptor. In the above, the susceptor forms a bent edge at the upper end edge for supporting the susceptor in a suspended state from below, and at each end in the delivery direction, the bent edge is provided with a projecting portion that extends upward, and A plurality of free rollers that are rotatably attached to a plurality of shafts that are arranged horizontally and at intervals in the horizontal direction at right angles to the delivery direction of the susceptor, and that support the bent edge of the upper end of the susceptor from below. Sprockets arranged above the free roller row and at a distance in the horizontal direction, and a sprocket that circulates around the sprockets and projects outward. And a chain transport mechanism including a roller chain having a lock, and the dock of the chain transport mechanism on the side of passing the susceptor is driven by transporting and driving the chain transport mechanisms of the respective film forming chambers in the same direction. Vertical plasma CVD, characterized in that the protrusion of the chain transfer mechanism on the side receiving the susceptor is pushed by pushing the protrusion behind the curved edge of the apparatus.