JPH0668471B2 - Sample capsule for X-ray defractometer - Google Patents
Sample capsule for X-ray defractometerInfo
- Publication number
- JPH0668471B2 JPH0668471B2 JP60070191A JP7019185A JPH0668471B2 JP H0668471 B2 JPH0668471 B2 JP H0668471B2 JP 60070191 A JP60070191 A JP 60070191A JP 7019185 A JP7019185 A JP 7019185A JP H0668471 B2 JPH0668471 B2 JP H0668471B2
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- Prior art keywords
- sample
- thin film
- rays
- ray
- reflected
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
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- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Sampling And Sample Adjustment (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明はX線デフラクトメータ(以下デフラクトメータ
と言う)用試料カプセルに関する。更に詳しくはブラッ
グ・ブレンターノ(Bragg−Brentano)集中法を用いた
デフラクトメータにより粉末状・板状の多結晶,単結晶
あるいは非晶質の試料の結晶学的特性を測定する場合に
おいて、湿度の影響を受け易い試料,空気中の酸素・炭
酸ガスを嫌う試料及び揮発成分を含んだ試料(以下不安
定な試料と言う)を簡便に高精度で測定し得られるよう
にした試料カプセルに関する。TECHNICAL FIELD The present invention relates to a sample capsule for an X-ray defractometer (hereinafter referred to as a defractometer). More specifically, when measuring the crystallographic properties of powdery or plate-like polycrystals, single crystals or amorphous samples with a defractometer using the Bragg-Brentano concentration method, The present invention relates to a sample capsule capable of easily and highly accurately measuring a sample that is easily affected, a sample that dislikes oxygen and carbon dioxide in the air, and a sample that contains a volatile component (hereinafter referred to as an unstable sample).
従来技術 従来、デフラクトメータによる不安定な試料のX線回折
の測定・実験に対しては、次のような方法がとられてい
る。2. Description of the Related Art Conventionally, the following method has been used for the measurement and experiment of X-ray diffraction of an unstable sample with a diffractometer.
1) ガラスあるいはアルミニウム製の試料板の窪み等
に置き、そのまま測定する通常の方法で、可能な限り迅
速に測定する。1) Place the sample in a recess of a glass or aluminum sample plate and measure it as quickly as possible by the ordinary method.
2) 吸湿性試料を測定する場合、シリカゲル等の乾燥
剤をデフラクトメータの試料室に入れる。2) When measuring a hygroscopic sample, put a desiccant such as silica gel in the sample chamber of the defractometer.
3) セロハン粘着テープ,マイラー膜(E.I.du Pont
社製のポリエチレンテレフタレートの膜)等のX線に透
過能を有する薄膜を試料表面に密着させる。3) Cellophane adhesive tape, mylar film (EIdu Pont
A thin film such as a polyethylene terephthalate film manufactured by K.K.) having X-ray transmissivity is brought into close contact with the sample surface.
4) X線の透過を可能にするような窓を有する密閉容
器に試料板を収納する。4) Store the sample plate in a closed container having a window that allows the transmission of X-rays.
5) デフラクトメータ全体を不活性ガス雰囲気内に設
置する。5) Install the entire defractometer in an inert gas atmosphere.
等がある。Etc.
しかしながら、これらの方法はいずれも次のような問題
点がある。However, all of these methods have the following problems.
1)の方法は、測定時間に比較して試料が急速に変化す
る場合は適用できない。The method 1) cannot be applied when the sample changes rapidly compared to the measurement time.
2)の方法は、シリカゲル等を入れる試料室が完全に密
封されていないため、空気中の水蒸気の影響を完全に除
くことはできない。また、当該空気中の酸素・炭酸ガス
等の影響を受ける試料及び揮発成分を含んだ試料には適
用できない。In the method 2), the influence of water vapor in the air cannot be completely eliminated because the sample chamber containing silica gel or the like is not completely sealed. In addition, it cannot be applied to samples affected by oxygen and carbon dioxide in the air and samples containing volatile components.
3)の方法は、セロハン粘着テープやマイラー膜等の薄
膜材料の反射X線と(回折X線と同価、以下同様)と測
定しようとする試料の反射X線が同時に検出器に入射す
る。そのために試料からの反射X線をX線回折図形から
は識別できないことがある。In the method 3), the reflected X-rays of a thin film material such as a cellophane adhesive tape or a Mylar film and the like (equivalent to the diffracted X-rays, the same applies below) and the reflected X-rays of the sample to be measured are simultaneously incident on the detector. Therefore, the reflected X-ray from the sample may not be discriminated from the X-ray diffraction pattern.
4)の方法は、既製のデフラクトメータのゴニオメータ
の試料室は十分な大きさがないため、そこに収容する容
器の製作が困難な場合が多く、ゴニオメータ自体を改造
する必要がある。In the method of 4), since the sample chamber of the goniometer of the ready-made defractometer is not sufficiently large, it is often difficult to manufacture the container to be stored therein, and the goniometer itself needs to be modified.
5)の方法は、操作が面倒であり、且つ装置全体が不活
性ガス雰囲気内に置かれているため、費用が高くなる欠
点がある。The method 5) has the drawback that the operation is troublesome and the cost is high because the entire apparatus is placed in an inert gas atmosphere.
発明の目的 本発明は前記従来法における問題点を解消するためにな
されたもので、その目的は、既製のデフラクトメータの
改造を必要とせず、不安定な試料からの反射X線を正確
簡便にとらえることができる試料カプセルを提供せんと
するものである。OBJECT OF THE INVENTION The present invention has been made in order to solve the problems in the above-mentioned conventional method, and the object thereof is to accurately and simply reflect X-rays from an unstable sample without the need to modify a ready-made diffractometer. It is intended to provide a sample capsule that can be captured in
発明の構成 本発明者らは前記目的を達成せんと鋭意研究の結果、前
記3)の方法における薄膜で試料表面を密接して覆う代
りに、薄膜の位置を試料表面から一定距離以上に離して
設けると、前記3)の方法における欠点を解消し得られ
ることの知見を得た。この知見に基づいて本発明を完成
した。As a result of earnest research to achieve the above-mentioned object, the inventors of the present invention, instead of closely covering the sample surface with the thin film in the method of 3), set the position of the thin film at a certain distance or more from the sample surface. It has been found that the above-mentioned method can eliminate the drawbacks of the method 3). The present invention has been completed based on this finding.
本発明の要旨は、ブラッグ・ブレンターノ集中法を用い
たX線デフラクトメータによる試料の結晶学的特性付け
の測定をする場合において、水蒸気,酸素,炭酸ガス,
揮発成分あるいは置換ガスの通過能が小さく、かつX線
の透過能を有する材料からなる薄膜を用い、入射X線及
び反射X線のカットを生じない薄膜寸法で、薄膜による
反射X線が検出器で検出されないように、試料表面から
薄膜を、下記式で求められる一定距離t以上離して、試
料を覆うように構成したことを特徴とするX線デフラク
トメータ用試料カプセルにある。The gist of the present invention is to measure water vapor, oxygen, carbon dioxide gas, when measuring crystallographic characterization of a sample by an X-ray defractometer using the Bragg-Brentano concentration method.
A thin film made of a material that has a low ability to pass volatile components or a replacement gas and has an ability to pass X-rays is used, and the size of the thin film does not cause the cut of incident X-rays and reflected X-rays. A sample capsule for an X-ray defractometer is characterized in that a thin film is separated from a sample surface by a predetermined distance t or more calculated by the following equation so as not to be detected by the above, and covers the sample.
(ただし、tは試料表面と薄膜との距離、Rはゴニオメ
ータ半径、θBはブラッグ角、φは発散スリットの開き
角の1/2、Sは散乱防止用スリットの開き角の1/2
を表わす。) 前記の薄膜をゴニオメータの回転中心を通る試料表面位
置(以下試料表面・試料表面位置と略記する)に置いた
場合と、試料表面から上方に離して置いた場合の反射X
線の相違を第1図・第2図及び第3図で説明する。第1
図はデフラクトメータの光学系の説明図、第2図はデフ
ラクトメータで測定した薄膜のX線回折図形、第3図は
反射X線とスリットの関係図である。 (Where, t is the distance between the sample surface and the thin film, R is the goniometer radius, θ B is the Bragg angle, φ is 1/2 the opening angle of the divergence slit, and S is 1/2 the opening angle of the scattering prevention slit.
Represents ) Reflection X when the thin film is placed at a sample surface position (hereinafter abbreviated as sample surface / sample surface position) passing through the center of rotation of the goniometer and when the thin film is placed above and apart from the sample surface.
The difference between the lines will be described with reference to FIGS. 1, 2 and 3. First
The figure is an illustration of the optical system of the defractometer, FIG. 2 is the X-ray diffraction pattern of the thin film measured by the defractometer, and FIG. 3 is the relationship diagram between the reflected X-rays and the slit.
第1図において説明すると、 A:試料表面の位置にブラッグ角θBで回折を起こすよう
な薄膜を置いた時のθBの回折、 B:と同じ薄膜を試料表面からtだけ上方に離した時の
回折、 SはX線源の焦点,Dは検出器,Cはゴニオメータ円,Oはゴ
ニオメータの回転中心,Rはゴニオメータ半径,D・Sは発
散スリット,R・Sは受光スリット,S・Sは散乱防止用ス
リット(以下散乱スリットと言う),θBはブラッグ
角,αは試料表面からtだけ上方に離して置いた薄膜か
らの反射X線の中心線とR・S−S・Sの中心線とのな
す角,4は試料表面,tは試料表面と薄膜の距離を示す。Referring to FIG. 1, A: Diffraction of θ B when a thin film that causes diffraction at the Bragg angle θ B is placed on the sample surface, the same thin film as B: is separated from the sample surface by t Diffraction at time, S is focus of X-ray source, D is detector, C is goniometer circle, O is goniometer rotation center, R is goniometer radius, D ・ S is divergence slit, R ・ S is light receiving slit, S ・S is a scattering prevention slit (hereinafter referred to as a scattering slit), θ B is a Bragg angle, α is a center line of a reflected X-ray from a thin film placed above the sample surface by t, and R · S−S · S. Is the angle between the sample and the center line, 4 is the sample surface, and t is the distance between the sample surface and the thin film.
試料表面位置に薄膜を置いた場合、第1図で示される
ように、X線に対し反射能を有する薄膜にブラッグ角θ
Bで入射X線が反射されると、入射X線と2θBの角度
方向にX線が反射され、受光スリット(R・S)・散乱
スリット(S・S)を経て検出器に入射する。When a thin film is placed on the surface of the sample, as shown in FIG. 1, the thin film having a reflectivity for X-rays has a Bragg angle θ.
When the incident X-rays are reflected by the B, X-rays are reflected in the angular direction of the incident X-ray and 2 [Theta] B, incident on the detector via the receiving slit (R · S) · Scattering slit (S · S).
この場合におけるX線回折図形を示すと、第2図aの通
りである。薄膜としてマイラー膜を使用し、X線源とし
てCuKα線を用いた。(以下の測定でもX線源は全てCuK
α線を用いた。)この図からマイラー膜は2θ(実際の
デフラクトメータの読み取り角)=26゜付近に強い回折
ピークを持つている。従つて試料表面に薄いマイラーを
密着させた場合、試料によるこの角度付近の小さな反射
X線はマイラー膜の反射X線に隠されてしまう。The X-ray diffraction pattern in this case is as shown in FIG. 2a. A Mylar film was used as the thin film, and CuKα rays were used as the X-ray source. (Even in the following measurements, all X-ray sources are CuK
α rays were used. ) From this figure, the Mylar film has a strong diffraction peak near 2θ (actual defractometer reading angle) = 26 °. Therefore, when a thin mylar is brought into close contact with the sample surface, small reflected X-rays near this angle due to the sample are hidden by the reflected X-rays of the mylar film.
なおこの測定に使用したデフラクトメータは、ゴニオメ
ータ半径:173mm,X線源:Cu封入管球,検出器:NaI(Tl)
−シンチレーションカウンタである。測定条件として
は、発散・散乱スリットの開き角:共に1/2,受光スリ
ット(KB線カット用Niフィルター付き)の開き幅:0.3m
m、X線管電圧:30kV,X線管電流:10mA,ゴニオメータの速
度:2゜/分,時定数:1秒,記録速度:2cm/分である。The diffractometer used for this measurement was a goniometer radius: 173 mm, X-ray source: Cu-filled tube, detector: NaI (Tl)
A scintillation counter. As a measuring condition, the opening angle of divergence and scattering slit: both 1/2, receiving slit (K B line cutting Ni with filter) of opening width: 0.3 m
m, X-ray tube voltage: 30 kV, X-ray tube current: 10 mA, goniometer speed: 2 ° / min, time constant: 1 second, recording speed: 2 cm / min.
一方第1図Bに示されるように、薄膜を試料表面の位置
よりtだけ上方に離すと、この位置の薄膜による反射X
線が受光スリット(R・S)を通過するための光学系の
条件は、X線源,検出部がある角度αだけ高角度側に回
転し、tだけ離れた位置にある薄膜の中心に入射するX
線の照射角がθBに等しくなつた場合である。(なお、
実際のデフラクメータは、入射X線の方向が固定されて
おり、試料面と検出部がそれぞれ1対2の割合で回転す
る構造のものが多いが、ここでは試料面を固定し、X線
源と検出部を1対1対の関係で逆方向に回転させる試料
水平デフラクトメータをモデルにした。この両者は原理
的に全く等価である。)αはθBとt及びゴニオメータ
半径Rを用いて次式より求められる。On the other hand, as shown in FIG. 1B, when the thin film is separated from the position on the sample surface by t, the reflection X by the thin film at this position is reflected.
The condition of the optical system for the rays to pass through the light-receiving slit (R / S) is that the X-ray source and the detector are rotated by a certain angle α toward the high angle side and are incident on the center of the thin film at a position separated by t. Do X
This is the case when the irradiation angle of the line is equal to θ B. (Note that
Most of the actual defractometers have a fixed incident X-ray direction, and the structure is such that the sample surface and the detection unit rotate at a ratio of 1: 2, but here, the sample surface is fixed and the X-ray source and The model was a sample horizontal diffractometer in which the detectors were rotated in opposite directions in a one-to-one relationship. Both are completely equivalent in principle. ) Α is obtained from the following equation using θ B and t and the goniometer radius R.
このことは、試料表面から離れた位置にある薄膜からの
反射X線は見掛け上高角側にずれ、θB+α(2θBを
測定値とする場合は2θB+2α)の位置に観測される
ことを意味する。 This means that the reflected X-rays from the thin film located away from the surface of the sample apparently shift to the high angle side and are observed at the position of θ B + α (2θ B + 2α when 2θ B is the measured value). Means
しかし、実際にはこの反射X線は、散乱スリットにより
その一部または全部が遮へいされてしまう。However, in reality, the reflected X-rays are partially or wholly shielded by the scattering slit.
次にその点について説明する。Next, that point will be described.
第3図に示すようにデフラクトメータにおいては、試料
表面の中心からの反射X線が受光スリット(R・S)・
散乱スリット(S・S)の中心を通過するような位置
(A′)に両スリットが設置される。一方試料表面から
離れた薄膜からの反射X線の中心は、これと式1のαの
角を持つて受光スリット(R・S)を通過するため
(B′)、その1部または全部が散乱スリット(S・
S)により遮へいされる。Cは散乱スリット(S・S)
で遮へいされる薄膜からの反射X線を示す。As shown in FIG. 3, in the diffractometer, the reflected X-ray from the center of the sample surface is received by the light receiving slit (R / S).
Both slits are installed at a position (A ′) that passes through the center of the scattering slits (S · S). On the other hand, the center of the reflected X-ray from the thin film away from the sample surface passes through the light-receiving slit (R / S) with an angle of α with Equation 1 (B '), so part or all of it scatters. Slit (S /
It is shielded by S). C is a scattering slit (SS)
2 shows X-rays reflected from a thin film shielded by.
本発明においては、薄膜の位置を試料表面から離し、そ
の薄膜からの反射X線が検出器Dに入射しないようにす
るものである。そのためには、試料表面から離れた位置
の薄膜からの反射X線を散乱スリット(S・S)により
完全に遮へいしなければならない。これを完全に遮へい
できるかどうかは、試料表面と薄膜間の距離tに依存
し、完全に遮へいするためのtの最小値は、発散スリッ
ト(D・S)と散乱スリット(S・S)の開き角が決ま
れば、次のようにして近似的に求めることができる。In the present invention, the position of the thin film is separated from the sample surface so that the reflected X-rays from the thin film do not enter the detector D. For that purpose, it is necessary to completely shield the reflected X-rays from the thin film located away from the sample surface by the scattering slit (S · S). Whether or not this can be completely shielded depends on the distance t between the sample surface and the thin film, and the minimum value of t for completely shielding is that of the divergence slit (DS) and the scattering slit (SS). Once the opening angle is determined, it can be approximately calculated as follows.
一般に受光スリット(R・S)を通過する反射X線は、
発散スリット(D・S)の開き角とほぼ等しい開き角を
持つと考えられる。発散スリットの開き角を2φとし、
散乱スリットの開き角を2Sとすると、試料表面から離れ
た薄膜からの反射X線を完全に遮へするためのαの最小
値は、 α=φ+S ……式2 となる。Generally, the reflected X-ray that passes through the light receiving slit (R / S) is
It is considered that it has an opening angle almost equal to the opening angle of the divergence slit (DS). The opening angle of the divergence slit is 2φ,
If the opening angle of the scattering slit is 2S, the minimum value of α for completely blocking the reflected X-rays from the thin film away from the sample surface is α = φ + S.
式1式2よりtの最小値は (ただし、φ,S:ラジアン) である。From Equation 1 Equation 2, the minimum value of t is (However, φ, S: radian).
すなわち、式3で求められるt以上に試料表面から薄膜
を離して設置すれば、薄膜からの反射X線は検出されな
い。That is, if the thin film is set apart from the sample surface by t or more obtained by the equation 3, the reflected X-ray from the thin film cannot be detected.
薄膜材料としてマイラー膜を使用し、X線源としてCuK
α線を用いるθB≒13゜であるので、ゴニオメータ半径
を173mm、発散スリット及び散乱スリットの開き角を共
に1/2゜とすると、式3によりtの値は1.55mmとな
る。Mylar film is used as a thin film material and CuK is used as an X-ray source.
Since θ B ≅13 ° using α rays, when the goniometer radius is 173 mm and the opening angles of the divergence slit and the scattering slit are both 1/2 °, the value of t is 1.55 mm according to equation 3.
第2図bに、散乱スリットを使用せずにマイラー膜を1.
6mmだけ試料表面から離して測定した場合のX線回折図
形を示す。このピークの位置は、マイラー膜を試料表面
の位置に置いて測定した第2図aと比較して2θ=1.0
゜だけ高角側にずれている。Fig. 2b shows the Mylar membrane without 1.
The X-ray diffraction pattern when measured at a distance of 6 mm from the sample surface is shown. The position of this peak is 2θ = 1.0 as compared with FIG. 2a measured by placing the Mylar film at the position of the sample surface.
Deviated to the high angle side by ゜.
同じ条件で発散スリットと等しい開き角の散乱スリット
を挿入すると、第2図cに示すようにマイラー膜の反射
X線は完全に消失してしまう。When a scattering slit having an opening angle equal to that of the divergence slit is inserted under the same condition, the reflected X-ray of the Mylar film disappears completely as shown in FIG. 2c.
本発明の試料カプセルの一実施態様を第4図に示す。図
中、1は試料充填板,2は窓枠,3は薄膜を表わす。試料充
填板1は通常の測定法における試料板と基本的には同じ
構造で、測定するための十分な面精度と試料を充填する
ための窪みを持つたものである。その材質は無機化合物
・有機化合物もしくは金属からなり、板状に成形可能な
ものである。試料充填板の大きさは使用するゴニオメー
タの試料室に挿入可能であり、次に述べる窓枠2が取り
付けられることが必要である。One embodiment of the sample capsule of the present invention is shown in FIG. In the figure, 1 is a sample filling plate, 2 is a window frame, and 3 is a thin film. The sample filling plate 1 has basically the same structure as a sample plate in a normal measurement method, and has sufficient surface accuracy for measurement and a dent for filling a sample. The material is made of an inorganic compound, an organic compound, or a metal, and can be molded into a plate shape. The size of the sample filling plate can be inserted into the sample chamber of the goniometer to be used, and the window frame 2 described below needs to be attached.
窓枠2は試料表面の位置から式3で求められるt以上に
薄膜3を嵩上げして取り付けるためのものである。薄膜
3と窓枠2は一体としてもよく、一体化していない場合
は両者を十分に接着するのが望ましい。薄膜3を平坦に
保持する必要はないが、薄膜と試料表面の空間は前記範
囲以上でできる限り小さくすることが望ましい。試料表
面への照射角θが小さい時、窓枠2で入射X線及び反射
X線のカットを生じる場合がある。これを避ける為に、
窓枠2の窓はゴニオメータの回転軸と直交する窓の一辺
の長さを、試料表面のその一辺の長さよりも大きくする
ことが望ましい。The window frame 2 is used to attach the thin film 3 by raising the thickness of the thin film 3 from the position on the surface of the sample to t or more obtained by the formula 3. The thin film 3 and the window frame 2 may be integrated, and if they are not integrated, it is desirable to sufficiently bond them. It is not necessary to keep the thin film 3 flat, but it is desirable to make the space between the thin film and the sample surface as small as possible within the above range. When the irradiation angle θ on the sample surface is small, the incident X-rays and the reflected X-rays may be cut by the window frame 2. To avoid this,
It is desirable that the length of one side of the window of the window frame 2 that is orthogonal to the rotation axis of the goniometer be larger than the length of that side of the sample surface.
第5図は必要とする窓の大きさを示す説明図である。入
射X線及び反射X線をカットしないために、ゴニオメー
タの回転軸と直交する窓の一辺の長さLの最小値は、最
小の照射角をθm,薄膜の嵩上げ高さをt,ゴニオメータ半
径をR,発散スリットの開き角を2φとした時、 L=2t・cot(θm+φ)+R・sinφ {cosec(θm+φ)+cosec(θm−φ)} ……式4 である。FIG. 5 is an explanatory diagram showing the required window size. In order not to cut incident X-rays and reflected X-rays, the minimum value of the length L of one side of the window orthogonal to the rotation axis of the goniometer is: the minimum irradiation angle is θm, the raised height of the thin film is t, and the goniometer radius is R, when the opening angle of the divergence slit is 2φ, L = 2t · cot (θm + φ) + R · sinφ {cosec (θm + φ) + cosec (θm−φ)} ... Equation 4
窓がこれより小さいと、照射角θm付近では、入射X線
及び反射X線の一部あるいは全部が窓枠に遮へいされ、
反射X線の観測強度を低下させる。この窓の一辺と直角
な他の一辺の寸法は、試料表面の同方向の長さと等しい
かあるいは大きいことが窪ましいが、それより僅かに小
さくても反射X線の観測強度はそれ程大きな影響を受け
ない。If the window is smaller than this, some or all of the incident X-rays and the reflected X-rays are shielded by the window frame near the irradiation angle θm.
The observation intensity of reflected X-rays is reduced. It is desirable that the dimension of one side of this window, which is perpendicular to one side, is equal to or larger than the length of the sample surface in the same direction, but even if it is slightly smaller than that, the observation intensity of reflected X-rays has a great influence. Do not receive
また、試料カプセルの各部分は矩形でなくてもよい。Further, each part of the sample capsule does not have to be rectangular.
薄膜材料は水蒸気,酸素,炭酸ガス,揮発成分あるいは
置換ガスの通過能が小さく、かつX線の透過能を有する
ものであれば、有機化合物・無機化合物もしくは金属で
あつてもよい。薄膜材料として非常に高角度に回折ピー
クを持つようなものを使用すると、式3でθBが大きく
なることから、必要な薄膜の嵩上げ高さtが大きくな
る。このことは式4から分かるように、低角度まで測定
するために必要な窓の大きさが大きくなることを意味す
る。従つて試料カプセルの大きさを小さくするために
は、より低角度に回折ピークを有するような薄膜材料を
使用することが望ましい。The thin film material may be an organic compound / inorganic compound or a metal, as long as it has a low ability to pass water vapor, oxygen, carbon dioxide, a volatile component or a replacement gas and has an ability to transmit X-rays. When a material having a diffraction peak at an extremely high angle is used as the thin film material, θ B in Expression 3 becomes large, so that the required height t of the thin film is increased. This means that, as can be seen from Equation 4, the size of the window required to measure a low angle becomes large. Therefore, in order to reduce the size of the sample capsule, it is desirable to use a thin film material having a diffraction peak at a lower angle.
本試料カプセルの使用法は、試料充填板1に試料4を充
填し、その上から薄膜4を取り付けた窓枠2を試料充填
板1上に設置する。この際窓枠2と試料充填板1の間か
ら置換ガス、揮発成分、水蒸気、酸素あるいは炭酸ガス
が流出もしくは流入しないように、接着剤,グリース等
で両者を接着する。これらの操作は試料が著しく不安定
で空気中で扱うことが不可能な場合は、真空または不活
性ガス雰囲気にしたグローブボックス等の中で行うこと
が必要である。The sample capsule is used by filling the sample filling plate 1 with the sample 4 and installing the window frame 2 on which the thin film 4 is attached on the sample filling plate 1. At this time, the replacement gas, the volatile component, the water vapor, the oxygen, and the carbon dioxide gas are bonded to each other with an adhesive, grease or the like so as not to flow out or flow in between the window frame 2 and the sample filling plate 1. If the sample is extremely unstable and cannot be handled in the air, it is necessary to perform these operations in a glove box or the like in a vacuum or an inert gas atmosphere.
実施例1. 第6図に示すように、試料充填板1として厚さ1.8mmの
ガラス板の片面に深さ0.6mm,大きさ20×17mmの窪みを有
するもの、窓枠2として1.6mm厚の55×32mmアクリル樹
脂板からなり、45×17mmの窓を設けたもの、薄膜3とし
て30μm厚のマイラー膜をそれぞれれ使用した。薄膜3
はエポキシ樹脂系接着剤により窓枠2に接着した。試料
としてα−アルミナ粉末を使用した。α−アルミナは空
気中で安定であるため、通常の測定用ガラス試料板によ
る測定が可能であるが、本発明による測定と通常の測定
によるものを比較検討するために、マイラー膜の回折ピ
ークの近傍に回折ピークを持つα−アルミナを選んだ。
その測定結果は第7図に示す通りであつた。Example 1. As shown in FIG. 6, a glass plate having a thickness of 1.8 mm as a sample filling plate 1 having a recess of 0.6 mm in depth and a size of 20 × 17 mm on one side, and a window frame 2 having a thickness of 1.6 mm. A 55 × 32 mm acrylic resin plate with a window of 45 × 17 mm, and the thin film 3 was a Mylar film having a thickness of 30 μm. Thin film 3
Was adhered to the window frame 2 with an epoxy resin adhesive. Α-alumina powder was used as a sample. Since α-alumina is stable in air, it can be measured by a normal measurement glass sample plate, but in order to compare and examine the measurement according to the present invention and the normal measurement, the diffraction peak of the Mylar film Α-alumina having a diffraction peak in the vicinity was selected.
The measurement result was as shown in FIG.
aはα−アルミナを通常の測定用のガラス試料板のみを
用いて測定したもの、 bはα−アルミナの表面の上にマイラー膜を密着させて
測定したもの、 cは本発明の試料カプセルを用いて測定したもの、 dはJCPDS(Joint Committee on Powder Diffraction S
tandards)発行のパウダー・デフラクション・ファイル
のデータ・カード(以下JCPDSのデータ・カードと言
う)の10−173より求めたα−アルミナの回折線の2θ
表示の回折角度と相対強度を参考のために示した。a is a measurement of α-alumina using only a normal glass sample plate for measurement, b is a measurement of a Mylar film adhered on the surface of α-alumina, and c is the sample capsule of the present invention. Measured using, d is JCPDS (Joint Committee on Powder Diffraction S
tandards) data file of powder defraction file (hereinafter referred to as JCPDS data card) 10-173 α-alumina diffraction line 2θ
The indicated diffraction angles and relative intensities are shown for reference.
この結果が示すように、本発明の方法によるものはaと
比較して見劣りがなく、またdとも実験誤差範囲内であ
り、よく一致している。As this result shows, the method according to the present invention is not inferior to that of a, and both d are within the experimental error range and are in good agreement.
使用したデフラクトメータはゴニオメータ半径173mmの
フィリップス社製、X線源は銅の対陰極を有する封入管
球を用い、検出器はNaI(Tl)−シンチレーションカウ
ンターでX線を検出した。The defractometer used was a Philips goniometer with a radius of 173 mm, manufactured by Philips, an X-ray source was a sealed bulb having a copper anticathode, and the detector was a NaI (Tl) -scintillation counter to detect X-rays.
測定条件としては、発散スリット・散乱スリット:共に
開き角1/2゜,Kβ線カット用Niフィルターを有する受
光スリット:開き幅0.3mm、X線管電圧:30kV,X線管電
流:10mA,ゴニオメータの速度:2゜/分,時定数:1秒,記
録紙速度:2cm/分であり、試料のα−アルミナは関東化
学社製試薬1級を1100℃で4時間加熱したものを用い
た。The measurement conditions are: divergence slit / scattering slit: opening angle 1/2 °, receiving slit with Kβ-ray cutting Ni filter: opening width 0.3 mm, X-ray tube voltage: 30 kV, X-ray tube current: 10 mA, goniometer Speed: 2 ° / min, time constant: 1 second, recording paper speed: 2 cm / min. The sample α-alumina used was Kanto Chemical Co., Ltd. reagent grade 1 heated at 1100 ° C. for 4 hours.
実施例2 五酸化リンの粉末を測定した。五酸化リンは吸湿性が強
く、大気中での通常の測定は不可能な試料である。Example 2 A powder of phosphorus pentoxide was measured. Phosphorus pentoxide has a high hygroscopic property, and it is a sample that cannot be normally measured in the atmosphere.
五酸化リンは和光純薬工業社製の試薬一級をそのまま使
用し、これを空気中で素早くガラス製の試料充填板に詰
め、マイラー膜を取り付けた窓枠をエポキシ樹脂系接着
剤で試料充填板上に接着した。For phosphorus pentoxide, the first-grade reagent made by Wako Pure Chemical Industries, Ltd. is used as it is, and this is quickly packed in a glass sample filling plate in the air, and the window frame with the mylar membrane attached is a sample filling plate with an epoxy resin adhesive. Glued on.
なお、デフラクトメータ,スリット類及び試料カプセル
は実施例1と同様な装置類を使用した。測定条件として
は、X線管電圧:40kV,X線管電流:20mA,ゴニオメータの
速度:1゜/分,時定数:2秒,記録紙速度:1cm/分であつ
た。The same equipment as in Example 1 was used for the deflactometer, slits, and sample capsule. The measurement conditions were as follows: X-ray tube voltage: 40 kV, X-ray tube current: 20 mA, goniometer speed: 1 ° / min, time constant: 2 seconds, recording paper speed: 1 cm / min.
デフラクトメータが設置されている部屋は湿度調整のな
い部屋であつた。The room where the defractometer was installed was a room without humidity adjustment.
その測定結果は第8図aの通りであつた。第8図bはJC
PDSのデータ・カード23−1303及び23−1303Aより求めた
五酸化リンの回折線の回折角(2θ)と相対強度を示
す。この結果が示すように両者はよく一致している。The measurement result was as shown in FIG. Figure 8b is JC
The diffraction angle (2θ) and the relative intensity of the diffraction line of phosphorus pentoxide obtained from PDS data cards 23-1303 and 23-1303A are shown. As the result shows, the two agree well.
発明の効果 本発明の試料カプセルを使用すると、不安定な試料でも
正確なX線回折図形が容易に得られ、またこの試料カプ
セルは製作が容易で安価であり、しかも既製のデフラク
トメータにも簡単に取り付けて通常の測定法で測定し得
られる優れた効果を有する。EFFECTS OF THE INVENTION By using the sample capsule of the present invention, an accurate X-ray diffraction pattern can be easily obtained even for an unstable sample, and the sample capsule is easy and inexpensive to manufacture, and can be used as a ready-made diffractometer. It has an excellent effect that it can be easily attached and measured by a usual measuring method.
第1図はデフラクトメータの光学系の説明図、第2図は
マイラー膜のX線回折図形、第3図は反射X線とスリッ
トの関係図、第4図は本発明の試料カプセルの概要図、
第5図は窓の大きさを求める幾何学図、第6図は本発明
の試料カプセルの分解図、第7図はα−アルミナ粉末の
X線回折図形、第8図は五酸化リン粉末のX線回折図形
を示す。 S:X線源の焦点、D:検出器、 C:ゴニオメータ円、 O:ゴニオメータの回転中心、 R:ゴニオメータ半径、D・S:発散スリット、 R・S:受光スリット、S・S:散乱スリット、 θB:ブラッグ角、 t:試料表面と薄膜の距離、 2φ:発散スリットの開き角、 2S:散乱スリットの開き角、 1:試料充填板、2:窓枠、 3:薄膜、4:試料。FIG. 1 is an explanatory view of an optical system of a diffractometer, FIG. 2 is an X-ray diffraction pattern of a Mylar film, FIG. 3 is a relationship diagram of a reflected X-ray and a slit, and FIG. 4 is an outline of a sample capsule of the present invention. Figure,
FIG. 5 is a geometrical diagram for determining the size of the window, FIG. 6 is an exploded view of the sample capsule of the present invention, FIG. 7 is an X-ray diffraction pattern of α-alumina powder, and FIG. 8 is a phosphorus pentoxide powder. An X-ray diffraction pattern is shown. S: Focus of X-ray source, D: Detector, C: Goniometer circle, O: Goniometer rotation center, R: Goniometer radius, D / S: Divergence slit, R / S: Receiving slit, S / S: Scattering slit , Θ B : Bragg angle, t: Distance between sample surface and thin film, 2φ: Divergence slit opening angle, 2S: Scattering slit opening angle, 1: Sample filling plate, 2: Window frame, 3: Thin film, 4: Sample .
Claims (1)
線デフラクトメータによる試料の結晶学的特性付けの測
定をする場合において、水蒸気,酸素,炭酸ガス,揮発
成分あるいは置換ガスの通過能が小さく、かつX線の透
過能を有する材料からなる薄膜を用い、入射X線及び反
射X線のカットを生じない薄膜寸法で、薄膜による反射
X線が検出器で検出されないように、試料表面から薄膜
を、下記式で求められる一定距離t以上離して、試料を
覆うように構成したことを特徴とするX線デフラクトメ
ータ用試料カプセル。 (ただし、tは試料表面と薄膜との距離、Rはゴニオメ
ータ半径、θBはブラッグ角、φは発散スリットの開き
角の1/2、Sは散乱防止用スリットの開き角の1/2
を表わす。)1. X using the Bragg-Brentano concentration method
When measuring crystallographic characterization of a sample with a line diffractometer, use a thin film made of a material that has a low ability to pass water vapor, oxygen, carbon dioxide, a volatile component or a replacement gas and has X-ray permeability. In order to prevent reflected X-rays due to the thin film from being detected by the detector, the thin film should be separated from the sample surface by a certain distance t or more calculated by the following equation, so that the incident X-rays and the reflected X-rays are not cut. A sample capsule for an X-ray defractometer, which is configured to cover a sample. (However, t is the distance between the sample surface and the thin film, R is the goniometer radius, θ B is the Bragg angle, φ is the opening angle of the divergence slit, and S is the opening angle of the scattering prevention slit.
Represents )
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60070191A JPH0668471B2 (en) | 1985-04-02 | 1985-04-02 | Sample capsule for X-ray defractometer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60070191A JPH0668471B2 (en) | 1985-04-02 | 1985-04-02 | Sample capsule for X-ray defractometer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61246656A JPS61246656A (en) | 1986-11-01 |
| JPH0668471B2 true JPH0668471B2 (en) | 1994-08-31 |
Family
ID=13424384
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60070191A Expired - Lifetime JPH0668471B2 (en) | 1985-04-02 | 1985-04-02 | Sample capsule for X-ray defractometer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0668471B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7129076B1 (en) * | 2022-06-10 | 2022-09-01 | 株式会社稜彩 | draining bag for sink |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5448587B2 (en) * | 2009-06-10 | 2014-03-19 | 本田技研工業株式会社 | Sample holder for X-ray diffraction measurement and X-ray diffraction measurement method |
| JP6314778B2 (en) * | 2014-10-01 | 2018-04-25 | 住友金属鉱山株式会社 | Crystallite diameter calculation method |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS512633U (en) * | 1974-06-21 | 1976-01-09 |
-
1985
- 1985-04-02 JP JP60070191A patent/JPH0668471B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7129076B1 (en) * | 2022-06-10 | 2022-09-01 | 株式会社稜彩 | draining bag for sink |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61246656A (en) | 1986-11-01 |
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