Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPH0691308B2 - Partial plating method - Google Patents
[go: Go Back, main page]

JPH0691308B2 - Partial plating method - Google Patents

Partial plating method

Info

Publication number
JPH0691308B2
JPH0691308B2 JP17587285A JP17587285A JPH0691308B2 JP H0691308 B2 JPH0691308 B2 JP H0691308B2 JP 17587285 A JP17587285 A JP 17587285A JP 17587285 A JP17587285 A JP 17587285A JP H0691308 B2 JPH0691308 B2 JP H0691308B2
Authority
JP
Japan
Prior art keywords
plating
plated
shield plate
plating tank
gap
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP17587285A
Other languages
Japanese (ja)
Other versions
JPS6237987A (en
Inventor
正弘 古川
精一 芹澤
和博 縁本
明仁 川上
繁 藤田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Japan Pure Chemical Co Ltd
Original Assignee
Hitachi Ltd
Japan Pure Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Japan Pure Chemical Co Ltd filed Critical Hitachi Ltd
Priority to JP17587285A priority Critical patent/JPH0691308B2/en
Publication of JPS6237987A publication Critical patent/JPS6237987A/en
Publication of JPH0691308B2 publication Critical patent/JPH0691308B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は部分めっき方法に係り、特にめっき不用部分を
被覆することなく部分的にめっきを行なう方法に関す
る。
Description: FIELD OF THE INVENTION The present invention relates to a partial plating method, and more particularly to a method of performing partial plating without coating an unnecessary portion of plating.

〔発明の背景〕[Background of the Invention]

従来の部分めっき方法で、プリント配線板の接栓部(コ
ネクタタグ)に金めっきを行なうには、以下の(a),
(b)工程で行なっていた。
To perform gold plating on the plug portion (connector tag) of the printed wiring board by the conventional partial plating method, the following (a),
It was performed in the step (b).

(a)プリント配線板を対向する弾性ベルト間に圧接保
持して、ベルトが圧接することにより形成されるマスク
の境界線によってめっき液と接触する接栓部と、めっき
液と接触しない配線部とを分離し、 (b)境界線の下方からめっき液を接栓部に吹きつけ
る。(特開昭55−16499)しかし、上記の方法ではマス
クとするベルトとプリント配線板間にめっき液が毛細管
現象で浸み込み、めっき不要部分にも金めっき皮膜が形
成されてしまうという問題があった。
(A) A contact portion that holds a printed wiring board under pressure between opposing elastic belts, and a contact portion that comes into contact with a plating solution by a boundary line of a mask formed by the belt being brought into pressure contact; and a wiring portion that does not come into contact with the plating solution. And (b) the plating solution is sprayed onto the plug portion from below the boundary line. (Japanese Patent Laid-Open No. 55-16499) However, the above method has a problem that the plating solution penetrates between the belt as a mask and the printed wiring board by a capillary phenomenon, and a gold plating film is formed even on an unnecessary plating area. there were.

〔発明の目的〕[Object of the Invention]

本発明の目的は上記した従来技術の欠点をなくし、めっ
き不要部分を直接ベルト等で圧接してマスクを形成する
ことでなく、めっきすべき部分にのみ選択的にめっき皮
膜を形成することのできる改良された部分めっき方法を
提供することにある。
The object of the present invention is to eliminate the above-mentioned drawbacks of the prior art and to selectively form a plating film only on a portion to be plated, without forming a mask by directly pressing a portion not requiring plating with a belt or the like. An object is to provide an improved partial plating method.

〔発明の概要〕[Outline of Invention]

上記目的は、めっき槽の上部空間内に、垂直に保持した
被めっき物のめっきすべき部分とめっき不要の境界線
で、被めっき物に対して隙間を形成して直角に上部遮蔽
板を配設すると共に、この上部遮蔽板の先端部、内壁面
に被めっき物に交わる水平面からめっき槽内に所定角度
傾斜した滑らかな傾斜面を形成する工程と、この上部遮
蔽板の下方に、下部遮蔽板を上部遮蔽板に対して垂直
に、しかもその上端部との間に所定の間隔部が形成され
るように配設し、この間隔部からめっき液を前記めっき
槽内の上部空間に保持された被めっき物のめっきすべき
部分に噴射させる工程とを有して成る部分めっき方法に
より、達成される。
The purpose of the above is to arrange the upper shield plate at a right angle in the upper space of the plating tank by forming a gap with respect to the object to be plated and the boundary line between the object to be plated that is held vertically and the plating unnecessary. A step of forming a smooth inclined surface that is inclined at a predetermined angle in the plating tank from the horizontal plane that intersects the object to be plated on the tip portion and the inner wall surface of this upper shielding plate, and below the upper shielding plate, the lower shielding plate. The plate is arranged perpendicularly to the upper shield plate so that a predetermined gap is formed between the plate and the upper shield, and the plating solution is held in the upper space of the plating tank from this gap. And a step of spraying the portion to be plated of the object to be plated.

上記の所定角度とは、後述する第1図のθを指し、実用
上は10°〜65°であり、好ましくは30°〜45°である。
また、めっき液が噴出する部分は、被めっき物の移動に
支障ない位置にあれば良く、通常は被めっき物から1mm
〜4mm離すが、1m〜2mm離れていると更に良い。
The above-mentioned predetermined angle refers to θ in FIG. 1 which will be described later, and is practically 10 ° to 65 °, preferably 30 ° to 45 °.
In addition, the portion where the plating solution is ejected may be located at a position that does not hinder the movement of the object to be plated, usually 1 mm from the object to be plated.
~ 4mm apart, but 1m ~ 2mm apart is even better.

めっき液の噴射速度は、めっき液がめっきをすべき部分
とめっき不用部分の境界線付近に均一に噴射される速度
が良く、通常はめっき槽1m当り21.0l/mm〜212l/mm、好
ましくは35.7l/mm〜71.4l/mmである。
The spraying speed of the plating solution is preferably such that the plating solution is uniformly sprayed near the boundary between the part to be plated and the part not to be plated, and is usually 21.0 l / mm to 212 l / mm per 1 m of the plating tank, preferably It is 35.7 l / mm to 71.4 l / mm.

また、上部遮蔽板と下部遮蔽板の上端部との間に設けら
れた間隔部から、めっき液を被めっき物のめっきすべき
部分に噴射させるに際しては、後述する第1図で説明す
るように、この間隔部の間隔をWとし、めっき槽の上部
空間内に保持された被めっき物のめっきする端子の長さ
(接栓部の長さ)をLとしたとき、両者の関係W/Lは0.3
/10〜10/10(すなわち、0.03〜1)である。この値が0.
3より小さくなると接栓部の一部に局部的にめっきが形
成され、1より大きくなると部分めっき効果が低減す
る。
Further, when jetting the plating solution to the portion to be plated of the object to be plated from the gap portion provided between the upper shield plate and the upper end portion of the lower shield plate, as described later with reference to FIG. , Where W is the distance between these spaces and L is the length of the terminal (the length of the plugging part) for plating the object to be plated that is held in the upper space of the plating tank. Is 0.3
/ 10 to 10/10 (that is, 0.03 to 1). This value is 0.
When it is smaller than 3, plating is locally formed on a part of the plug portion, and when it is larger than 1, the partial plating effect is reduced.

また、被めっき物に対して上部遮蔽板を直角に配設する
とき、両者間に隙間を設けているが、これには次に示す
ような二つの作用がある。
Further, when the upper shielding plate is arranged at a right angle to the object to be plated, a gap is provided between the two, which has the following two effects.

その一つは、先に「発明の背景」の項で従来例として挙
げた周知の連続めっき処理方法と同様に、構成は異なる
が被めっき物がめっき槽内を上部遮蔽板に非接触の状態
で移動し、搬送され易くする作用である。
One of them is similar to the well-known continuous plating method described as a conventional example in the section of "Background of the Invention", but the configuration is different, but the object to be plated is in a non-contact state in the plating tank with the upper shielding plate. The function is to move and move easily.

他の一つは、本発明がマスクを使用しない部分めっき方
法を可能とする重要な作用であり、それは上記間隔部か
らめっき液をめっきすべき部分に噴射するとき、この上
部遮蔽板と被めっき物との隙間から外気を取り込み、周
知のベルヌーイの定理に基づいて上記境界線近傍に負圧
が生じることであり、その結果、めっき液が上部遮蔽板
と被めっき物との隙間から上部に漏れることはなく、境
界線より下方の、めっきを必要とする部分にのみ確実に
めっき液を供給することができる。めっきする端子の長
さが16mmのときは0.5mm〜16mm、好ましくは1mm〜13mmで
ある。
The other one is an important function of the present invention, which enables a maskless partial plating method. It is preferable that when the plating solution is sprayed from the above-mentioned interval to the portion to be plated, the upper shield plate and the plating target are plated. It is that the outside air is taken in from the gap between the object and the negative pressure is generated near the boundary line based on the well-known Bernoulli's theorem, and as a result, the plating solution leaks to the upper part from the gap between the upper shielding plate and the object to be plated. Therefore, the plating solution can be reliably supplied only to the portion below the boundary line that requires plating. When the length of the plated terminal is 16 mm, it is 0.5 mm to 16 mm, preferably 1 mm to 13 mm.

〔発明の実施例〕Example of Invention

以下、本発明を実施例によって詳細に説明する。 Hereinafter, the present invention will be described in detail with reference to examples.

実施例1 第1図にめっき槽の断面を示すように、プリント回路板
1をめっき槽の上部遮蔽板2−1,2−2の間に垂直に保
持すると共に、その接栓部とそれに接続されたリードの
極一部をめっき槽内の上部空間に位置させる。上部遮蔽
板2−1,2−2の先端C,Dは、プリント回路板より2mmの
隙間を形成してそれぞれ離れている。めっき液槽5−1,
5−2中のめっき液は、上部遮蔽板2−1,2−2と下部遮
蔽板4−1,4−2との間に形成された間隔部の間隔Wか
ら流出し、先端部C、Dの傾斜面(θ=30°)からめっ
き槽1m当り70l/mmの割合でプリント回路板1の長さ50cm
の境界線に噴射させためっき液は、めっき液排出部6か
らめっき槽5−1,5−2に循環された。なお、上記めっ
き槽1m当たりとは、めっき槽の単位長さを表し、図示さ
れた間隔Wの奥行きの長さに相当する。また、上記プリ
ント回路板1の長さとは、図示された回路板1の奥行
き、すなわち、プリント回路板1の幅に相当する。そし
て、プリント回路板1を陰極とし、陽極3とプリント回
路板1との間に電源回路図は省略しているが直流電圧
(DC4〜20V,DA=5〜20A/dm2)を印加し、めっき液に日
本高純度化学製オーロブライトHS−5(金濃度:5〜10g/
l、比重:10〜16ボーメ度、PH:4.0±0.2、添加剤:オー
ロブライトHS−5)を用いてプリント回路板1の接栓部
銅パターン上に金めっきを行なった。
Example 1 As shown in the cross section of the plating tank in FIG. 1, the printed circuit board 1 is vertically held between the upper shielding plates 2-1 and 2-2 of the plating tank, and its plug portion and its connection are connected. A very small part of the prepared lead is located in the upper space in the plating tank. The tips C and D of the upper shield plates 2-1 and 2-2 are separated from the printed circuit board by forming a gap of 2 mm. Plating bath 5-1
The plating solution in 5-2 flows out from the gap W between the gaps formed between the upper shield plates 2-1 and 2-2 and the lower shield plates 4-1 and 4-2, and the tip portion C, The length of the printed circuit board 1 is 50 cm at a rate of 70 l / mm per 1 m of plating tank from the inclined surface of D (θ = 30 °)
The plating solution sprayed on the boundary line of No. 2 was circulated from the plating solution discharge unit 6 to the plating tanks 5-1 and 5-2. The term "per meter of plating bath" means the unit length of the plating bath, and corresponds to the length of the depth of the interval W shown in the figure. The length of the printed circuit board 1 corresponds to the depth of the illustrated circuit board 1, that is, the width of the printed circuit board 1. Then, the printed circuit board 1 is used as a cathode, and a DC voltage (DC4 to 20V, DA = 5 to 20A / dm 2 ) is applied between the anode 3 and the printed circuit board 1, although a power circuit diagram is omitted. Aurobrite HS-5 (gold concentration: 5-10 g /
1, specific gravity: 10 to 16 Baume degree, PH: 4.0 ± 0.2, additive: aurobrite HS-5), and gold plating was performed on the copper pattern at the plug portion of the printed circuit board 1.

接栓部への部分金めっき結果を、第2図に示した。図示
のように、めっき槽の上部空間には、プリント回路基板
1の一端部の接栓部とそれに接続されたリードの一部を
境界線として配置した。
The result of partial gold plating on the plugging portion is shown in FIG. As shown in the figure, in the upper space of the plating bath, a plug portion at one end of the printed circuit board 1 and some of the leads connected to the plug portion are arranged as boundaries.

第2図の(a)は、境界線以下に位置するめっき槽内に
保持されたプリント回路基板1の一端部である接栓部
(端子)とそれに接続されたリードの一部領域を示した
平面図であり、幅の広い部分が接栓部の形状を示してい
る。
FIG. 2 (a) shows a plug portion (terminal) that is one end portion of the printed circuit board 1 held in the plating tank located below the boundary line and a partial region of the lead connected to the plug portion. It is a plan view, and the wide portion shows the shape of the plug portion.

第2図の(b)は、めっき液の噴射角θが30°で、上、
下の遮蔽板の間隔Wを1.0mmに調節した時の、めっき厚
さ分布を示している。ただし、この例では接栓部(端
子)の長さをLとしたとき、L=10mmであるので、上、
下の遮蔽板の間隔W÷端子長さL、つまりW/Lの関係
は、1.0mm/10mm=0.1となる。図示のように、接線部の
上部領域である接点との接触部近傍に厚く、その下端部
では極端に薄い金めっき状態であった。このような状態
は(上,下の遮蔽板間隔÷端子長さ=W/L)が0.1〜0.2
の間でみられた。また、上記W/Lの関係を0.5,1.0にした
時の結果を第2図(c),第2図(d)に示した。第2
図(c)は、上,下の遮蔽板間隔÷端子長さ=W/Lを0.5
にしたもので、接触部近傍が厚くなりその他の部分は約
1/2位の厚みになる。
In FIG. 2B, the spray angle θ of the plating solution is 30 °, and
The distribution of plating thickness is shown when the distance W between the lower shielding plates is adjusted to 1.0 mm. However, in this example, when the length of the plug portion (terminal) is L, L = 10 mm, so
The relationship of the interval W of the lower shield plate / terminal length L, that is, W / L is 1.0 mm / 10 mm = 0.1. As shown in the figure, the gold plating state was thick near the contact portion with the contact, which is the upper region of the tangent portion, and extremely thin at the lower end portion. In such a condition, (upper and lower shield plate spacing ÷ terminal length = W / L) is 0.1 to 0.2
It was seen between. The results when the above W / L relationship is set to 0.5 and 1.0 are shown in FIGS. 2 (c) and 2 (d). Second
Figure (c) shows the upper and lower shield plate spacing ÷ terminal length = 0.5 W / L.
The thickness around the contact part becomes thicker and the other parts are
It is about 1/2 the thickness.

また、第2図(c)に示すように、上,下の遮蔽板間隔
Wと端子長さLの比W/Lを1.0にすると、接栓部の全面に
均一な金めっき厚さが得られた。
Further, as shown in FIG. 2 (c), if the ratio W / L of the upper and lower shield plate spacing W and the terminal length L is set to 1.0, a uniform gold plating thickness can be obtained on the entire surface of the plug portion. Was given.

部分めっきの形状について補足すると、金などの貴金属
めっきは高価なことから、第2図の(c)や(d)のよ
うに端子の全面にめっきしないで、用途によっては第2
図の(b)のように、外部端子との接続に必要な端子の
接触部に極在させて部分めっきするだけでも十分に目的
は果たせる。また、端子全面に均一なめっきをしたいと
きは、第2図の(c)や(d)のようなめっき条件を選
択すれば良い。
Supplementing the shape of partial plating, plating of noble metal such as gold is expensive. Therefore, as shown in (c) and (d) of FIG.
As shown in (b) of the figure, the purpose can be sufficiently fulfilled only by locally arranging the contact portion of the terminal necessary for connection with the external terminal and performing partial plating. Further, when uniform plating is desired on the entire surface of the terminal, the plating conditions as shown in (c) and (d) of FIG. 2 may be selected.

実施例2 上部遮蔽板の先端とプリント回路板の間隔を1mmとし、
噴射速度をめっき槽1m当り50l/mmとし、上部遮蔽板と下
部遮蔽板の間隔Wを1mmに固定し、噴射角θを10°〜65
°に変えた以外は実施例1と同様にプリント回路板の接
栓部にめっきを行なった。
Example 2 The distance between the tip of the upper shielding plate and the printed circuit board was 1 mm,
The jet speed is 50l / mm per 1m of plating tank, the distance W between the upper and lower shields is fixed at 1mm, and the spray angle θ is 10 ° ~ 65
The contact portion of the printed circuit board was plated in the same manner as in Example 1 except that the temperature was changed to °.

第3図は、実施例1の第2図と同様に接栓部へ部分金め
っきを形成した結果を示したものである。
FIG. 3 shows the result of forming the partial gold plating on the plug portion in the same manner as in FIG. 2 of Example 1.

第3図の(a)は、噴射角(θ)が30°の場合である。
部分的、すなわち接点との接触部近傍にのみ金めっきが
されていた。このような状態は、噴射角30°〜45°の間
でみられた。めっき液の噴射速度、めっき液の噴出する
上部遮蔽板の先端(第1図中のC,D)とプリント回路板
との距離が前述した範囲で同様に起こることも確認され
た。
FIG. 3 (a) shows the case where the injection angle (θ) is 30 °.
Gold was partially plated, that is, only in the vicinity of the contact portion with the contact. Such a condition was observed between the injection angles of 30 ° and 45 °. It was also confirmed that the spraying speed of the plating solution and the distance between the tip of the upper shielding plate (C and D in FIG. 1) from which the plating solution is sprayed and the printed circuit board similarly occur within the range described above.

第3図(b),(c)は噴射角(θ)が60°,80°の場
合である。第3図(b)のように接点との接触部近傍の
金めっき皮膜厚さが厚くなり、その他の部分は金めっき
皮膜厚さがうすくなるのは、噴射角10°〜30°未満、45
°より大〜65°以下の場合であった。このような状態
は、めっき液の噴出速度、めっき液の噴出する部分(第
1図中のC,D)とプリント回路板との距離が前述した範
囲で同様に起こることも確認された。第4図はその一例
であり、めっき液の噴出する上部遮蔽板の先端とプリン
ト回路板との距離が4mmである以外は第3図(b)と同
じ条件で部分金めっきを行なった場合であり、第3図
(b)と同様の結果を得ている。
FIGS. 3B and 3C show the case where the injection angle (θ) is 60 ° and 80 °. As shown in FIG. 3 (b), the thickness of the gold plating film in the vicinity of the contact portion with the contact becomes thicker, and the thickness of the gold plating film in other portions becomes thinner.
Greater than ° to less than 65 °. It was also confirmed that such a state occurs similarly in the range where the jetting speed of the plating solution, the distance between the jetting parts of the plating solution (C and D in FIG. 1) and the printed circuit board are within the above-mentioned range. Fig. 4 is an example of that, and shows the case where partial gold plating is performed under the same conditions as in Fig. 3 (b) except that the distance between the tip of the upper shielding plate from which the plating solution is ejected and the printed circuit board is 4 mm. Yes, the same result as in FIG. 3 (b) is obtained.

〔発明の効果〕〔The invention's effect〕

以上述べたように本発明によって部分めっきをすれば、 (a)必要とする部分の近傍にのみ厚くつくので経済的
である。
As described above, partial plating according to the present invention is (a) economical because it is thick only in the vicinity of the required portion.

(b)めっき不要部分を弾性体で圧接する必要もないの
で、めっき設備が簡単になる。
(B) Since it is not necessary to press the non-plating portion with the elastic body, the plating facility is simplified.

(c)テープでマスクしてめっき不用部分をかくす必要
がないので、めっき工程が簡略になる。また、テープを
はがした後に残る粘着剤を取り除く工程も不要となる。
(C) The plating process is simplified because it is not necessary to mask with a tape to hide the unnecessary portions of the plating. Further, the step of removing the adhesive remaining after peeling the tape is also unnecessary.

また、本発明は、コネクタ、その他部分めっきをする場
合にも適用できる。
Further, the present invention can be applied to the case of performing connector and other partial plating.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明で用いるめっき槽の断面図、第2図、第
3図、第4図は本発明の方法で部分めっきした場合のめ
っき皮膜の出来工合を示す図である。 1……プリント回路板、 2−1,2−2……上部遮蔽板、 3……陽極、 4−1,4−2……下部遮蔽板、 5−1,5−2……めっき液槽、 6……めっき液排出部。
FIG. 1 is a cross-sectional view of a plating tank used in the present invention, and FIGS. 2, 3, and 4 are diagrams showing the finish of a plated film when partial plating is performed by the method of the present invention. 1 ... Printed circuit board, 2-1, 2-2 ... Upper shield plate, 3 ... Anode, 4-1, 4-2 ... Lower shield plate, 5-1, 5-2 ... Plating bath , 6 ... Plating solution discharge part.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 縁本 和博 東京都豊島区南池袋2丁目26番7号 日本 高純度化学株式会社内 (72)発明者 川上 明仁 神奈川県横浜市戸塚区戸塚町216番地 株 式会社日立製作所戸塚工場内 (72)発明者 藤田 繁 神奈川県横浜市戸塚区戸塚町216番地 株 式会社日立製作所戸塚工場内 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Kazuhiro Enmoto 2-26-7 Minamiikebukuro, Toshima-ku, Tokyo Japan High-Purity Chemical Co., Ltd. (72) Akihito Kawakami 216 Totsuka-cho, Totsuka-ku, Yokohama-shi, Kanagawa Address Stock Company Hitachi Co., Ltd. Totsuka Factory (72) Inventor Shigeru Fujita Address 216 Totsuka-cho, Totsuka-ku, Yokohama-shi, Kanagawa Stock Company Hitachi Ltd. Totsuka Factory

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】めっき槽の上部空間内に、垂直に保持した
被めっき物のめっきすべき部分とめっき不要の境界線
で、被めっき物に対して隙間を形成して直角に上部遮蔽
板を配設すると共に、この上部遮蔽板の先端部の内壁面
に、被めっき物に直角に交わる水平面からめっき槽内に
所定角度傾斜した滑らかな傾斜面を形成する工程と、こ
の上部遮蔽板の下方に、下部遮蔽板を上部遮蔽板に対し
て垂直に、しかも上部遮蔽板と下部遮蔽板の上端部との
間に所定間隔部が形成されるように配設し、この間隔部
からめっき液を、前記めっき槽内の上部空間に保持され
た被めっき物のめっきすべき部分に噴射させる工程とを
有して成りる部分めっき方法。
1. An upper shielding plate is formed at a right angle in the upper space of a plating tank by forming a gap with respect to an object to be plated at a boundary line of the object to be plated held vertically and a plating-free boundary. A step of forming a smooth inclined surface that is inclined at a predetermined angle in the plating tank from the horizontal plane that intersects the object to be plated at the inner wall surface of the tip of the upper shielding plate, and below the upper shielding plate. In addition, the lower shield plate is arranged vertically to the upper shield plate so that a predetermined gap portion is formed between the upper shield plate and the upper end portion of the lower shield plate, and the plating solution is supplied from this gap portion. And a step of spraying onto a portion to be plated of an object to be plated held in the upper space in the plating tank.
【請求項2】めっき槽の上部空間内に、垂直に保持した
被めっき物のめっきすべき部分とめっき不要の境界線
で、被めっき物に対して隙間を形成して直角に上部遮蔽
板を配設すると共に、この上部遮蔽板の先端部の内壁面
に、被めっき物に直角に交わる水平面からめっき槽内に
所定角度傾斜した滑らかな傾斜面を形成する工程と、こ
の上部遮蔽板の下方に、下部遮蔽板を上部遮蔽板に対し
て垂直に、しかも上部遮蔽板と下部遮蔽板の上端部との
間に所定間隔部が形成されるように配設すると共に、こ
の間隔部の間隔をWとし、めっき槽の上部空間内に保持
された被めっき物のめっきする端子の長さをLとしたと
き、両者の関係をW/L=0.03〜1として、この間隔部か
らめっき液を、前記めっき槽内の上部空間に保持された
被めっき物のめっきすべき部分に噴射させる工程とを有
して成る部分めっき方法。
2. An upper shield plate is formed at a right angle in the upper space of the plating tank by forming a gap with respect to the object to be plated at a portion to be plated that is held vertically and a boundary line that does not require plating. A step of forming a smooth inclined surface that is inclined at a predetermined angle in the plating tank from the horizontal plane that intersects the object to be plated at the inner wall surface of the tip of the upper shielding plate, and below the upper shielding plate. In addition, the lower shield plate is arranged vertically to the upper shield plate, and a predetermined gap is formed between the upper shield plate and the upper end portion of the lower shield plate. When W is W and the length of the terminal for plating the object to be plated held in the upper space of the plating tank is L, the relationship between the two is W / L = 0.03 to 1, and the plating solution is supplied from this space. The plating of the object to be plated held in the upper space of the plating tank. The method of partial plating, which comprises:
【請求項3】めっき槽の上部空間内に、垂直に保持した
被めっき物のめっきすべき部分とめっき不要の境界線
で、被めっき物に対して隙間を形成して直角に上部遮蔽
板を配設すると共に、この上部遮蔽板の先端部の内壁面
に、被めっき物に直角に交わる水平面からめっき槽内に
10°〜65°の角度で傾斜した滑らかな傾斜面を形成する
工程と、この上部遮蔽板の下方に、下部遮蔽板を上部遮
蔽板に対して垂直に、しかも上部遮蔽板と下部遮蔽板の
上端部との間に所定間隔部が形成されるように配設し、
この間隔部からめっき液を、前記めっき槽内の上部空間
に保持された被めっき物のめっきすべき部分に噴射させ
る工程とを有して成部分めっき方法。
3. An upper shielding plate is formed at a right angle in the upper space of the plating tank by forming a gap with respect to the object to be plated at a portion to be plated that is held vertically and a boundary line that does not require plating. In addition to being installed, the inner wall surface of the tip of this upper shielding plate is placed in the plating tank from a horizontal plane that intersects the object to be plated at a right angle.
The process of forming a smooth inclined surface inclined at an angle of 10 ° to 65 °, and the lower shield plate below the upper shield plate, perpendicular to the upper shield plate, and the upper shield plate and the lower shield plate. Arranged so that a predetermined gap is formed between the upper end,
And a step of spraying a plating solution from the gap portion onto a portion to be plated of the object to be plated held in the upper space of the plating tank.
JP17587285A 1985-08-12 1985-08-12 Partial plating method Expired - Fee Related JPH0691308B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17587285A JPH0691308B2 (en) 1985-08-12 1985-08-12 Partial plating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17587285A JPH0691308B2 (en) 1985-08-12 1985-08-12 Partial plating method

Publications (2)

Publication Number Publication Date
JPS6237987A JPS6237987A (en) 1987-02-18
JPH0691308B2 true JPH0691308B2 (en) 1994-11-14

Family

ID=16003680

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17587285A Expired - Fee Related JPH0691308B2 (en) 1985-08-12 1985-08-12 Partial plating method

Country Status (1)

Country Link
JP (1) JPH0691308B2 (en)

Also Published As

Publication number Publication date
JPS6237987A (en) 1987-02-18

Similar Documents

Publication Publication Date Title
JPH0691308B2 (en) Partial plating method
US5480519A (en) Electrochemical etch system and method
TW343426B (en) Process for producing a circuit board at least having a metal layer, circuit board thereof and its use
JPH0762270B2 (en) Partial plating method
JPS58217693A (en) Material treated on its minute part with silver plating and plating method
JP2611431B2 (en) Uniform partial electroplating method
EP0114216B1 (en) Method for selective electroplating
JPH04268091A (en) Method and device for plating insulating strip
JP2617637B2 (en) Partial plating apparatus and lead frame for semiconductor device
KR20060114982A (en) Partial Plating Apparatus and Method
JP2576142B2 (en) Spray etching method
JPS5931882A (en) Method and device for surface treatment in bath
KR100254276B1 (en) Connector of plating apparatus of manufacturing semiconductor
EP0159471A1 (en) Method and device for electrolytically applying a metal coating selectively on metal objects
JP2669085B2 (en) Continuous strip plating system for metal strips
JPH052603Y2 (en)
JPS6369996A (en) Method for plating electrical contact part of female terminal
JP3031478B2 (en) Wafer plating method and apparatus
JPS57210985A (en) Partial plating device
JPH0754199A (en) Cathode plate for plating
JP4252286B2 (en) Conductor circuit forming method in printed wiring board and printed wiring board
JPS6053759B2 (en) Partial plating method and device
JPS6280293A (en) Nozzle header to be used for plating cell for high current density electrolysis
JPH02159393A (en) High speed partial plating equipment
GB1058444A (en) Method of plating metal surfaces with gold

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees