JPH0716096B2 - Method for manufacturing multilayer printed wiring board - Google Patents
Method for manufacturing multilayer printed wiring boardInfo
- Publication number
- JPH0716096B2 JPH0716096B2 JP27783788A JP27783788A JPH0716096B2 JP H0716096 B2 JPH0716096 B2 JP H0716096B2 JP 27783788 A JP27783788 A JP 27783788A JP 27783788 A JP27783788 A JP 27783788A JP H0716096 B2 JPH0716096 B2 JP H0716096B2
- Authority
- JP
- Japan
- Prior art keywords
- catalyst
- hole
- wiring board
- printed wiring
- multilayer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 238000000034 method Methods 0.000 title description 6
- 239000003054 catalyst Substances 0.000 claims description 38
- 239000000758 substrate Substances 0.000 claims description 29
- 239000004020 conductor Substances 0.000 claims description 18
- 238000007772 electroless plating Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 21
- 230000000694 effects Effects 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 238000005553 drilling Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/429—Plated through-holes specially for multilayer circuits, e.g. having connections to inner circuit layers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は多層印刷配線板の製造方法に関し、特に高密度
実装のために導体層が分割して設けられたスルホールを
一部に有する多層印刷配線板の製造方法に関する。Description: TECHNICAL FIELD The present invention relates to a method for manufacturing a multilayer printed wiring board, and in particular, multilayer printing partially having through holes formed by dividing conductor layers for high-density mounting. The present invention relates to a method for manufacturing a wiring board.
LSI,IC等の高集積化,電子機器の高性能化と経済性向上
のために多層印刷配線板(以下、多層板と記す)の高密
度化が進展している。The density of multilayer printed wiring boards (hereinafter referred to as “multilayer boards”) is increasing in order to achieve high integration of LSIs and ICs, high performance of electronic devices, and improvement of economic efficiency.
多層板の高密度化に対して、主に2つの対応が図られて
いる。第1に導体層数の増加、すなわち高多層化であ
り、第2の対応が基本格子間への多配線化である。しか
しながら、第1の対応では、層間の導体層を接続するバ
イアホールの増加になり、第2の対応の多配線化、しい
ては、配線の収容性を著しく制限する。そのため、特
に、このバイアホールを多層板に貫通孔として設けた場
合、バイアホールを小径化する事で対応しているが、板
厚/孔径比(アスペクト比)が増加し多層板の製造性を
著しく阻害している。Two main measures are taken to increase the density of multilayer boards. The first is the increase in the number of conductor layers, that is, the increase in the number of layers, and the second is the increase in the number of wirings between the basic lattices. However, in the first measure, the number of via holes connecting the conductor layers between the layers is increased, and the second measure increases the number of wirings, and the wiring accommodability is significantly limited. Therefore, in particular, when this via hole is provided as a through hole in the multilayer plate, it is dealt with by reducing the diameter of the via hole, but the plate thickness / hole diameter ratio (aspect ratio) is increased to improve the productivity of the multilayer plate. It is significantly hindered.
このため、上述した欠点を解消する手段として、第2図
(A)に示す様に、導体回路パターン1を形成した触媒
入り絶縁基板2の2枚1組をそれぞれ最外層に配置し、
その内側に多層板の貫通孔の直径より大なる同心円にく
り抜いた孔部14を設けた触媒なしの絶縁基板3と触媒入
りプリプレグ4とを介挿させて、第2図(B)に示す様
に、加熱,加圧して多層化基板6を形成する工程と、第
2図(C)に示すように、多層化基板6の所定の位置に
貫通孔7a,7bを穿設する工程と、第2図(D)に示す様
に、多層化基板6の貫通孔7a内壁の触媒入り絶縁基板2
端面に導体回路パターン1の端面と導通接続する導体層
10を無電解めっきにより形成する工程を経て、分割され
たバイアホール11と通常のスルホール12とを選択的に形
成する事により高密度化を達成した例がある(特願昭61
-029361)。Therefore, as a means for solving the above-mentioned drawbacks, as shown in FIG. 2 (A), two sets of the catalyst-containing insulating substrates 2 on which the conductor circuit patterns 1 are formed are arranged in the outermost layers, respectively.
As shown in FIG. 2 (B), an insulating substrate 3 without catalyst and a prepreg 4 with catalyst provided therein are provided with a hole 14 which is hollowed out in a concentric circle having a diameter larger than the diameter of the through hole of the multilayer plate. To heat and pressurize to form the multilayer substrate 6, and to form through holes 7a and 7b at predetermined positions of the multilayer substrate 6 as shown in FIG. 2 (C). As shown in FIG. 2D, the catalyst-containing insulating substrate 2 on the inner wall of the through hole 7a of the multilayer substrate 6
Conductor layer which is electrically connected to the end face of the conductor circuit pattern 1 on the end face
There is an example in which high density is achieved by selectively forming divided via holes 11 and normal through holes 12 through a step of forming 10 by electroless plating (Japanese Patent Application No. 61-61).
-029361).
しかしながら、上述した従来の製造方法では、通常のス
ルホール形成用の貫通孔の穿孔位置に貫通孔の直径より
大なる同心円にくり抜いた孔部を多層化基板の内側の触
媒なしの絶縁基板に設けるため、貫通孔と前記孔部間に
クリアランスを必要とし、平面方向の基本格子を小さく
できず、平面方向の高密度化の阻害要因になるという欠
点がある。However, in the above-mentioned conventional manufacturing method, in order to provide a hole formed in a concentric circle having a diameter larger than the diameter of the through hole at the drilling position of the through hole for forming a normal through hole on the insulating substrate without a catalyst inside the multilayer substrate. However, there is a drawback in that a clearance is required between the through hole and the hole portion, the basic lattice in the plane direction cannot be made small, and it becomes a factor that hinders high density in the plane direction.
又、先の孔部を触媒入りプリプレグに含浸された触媒入
レジンだけで充填する必要があるため、触媒なしの絶縁
基板の厚みが厚すぎるとボイドが発生するために、厚み
の制約が起こり、多層板の電気特性とりわけインピーダ
ンス特性に対する制約要因となる欠点がある。Further, since it is necessary to fill the above-mentioned holes only with the catalyst-containing resin impregnated in the catalyst-containing prepreg, if the thickness of the insulating substrate without a catalyst is too thick, voids will occur, which causes thickness restrictions, There is a drawback that it becomes a limiting factor for the electrical characteristics, especially the impedance characteristics, of the multilayer board.
さらに、孔部の穴数に応じて、触媒入りプリプレグ層の
樹脂量を調整する必要が生じ、又、孔部の平面方向での
集中度に依って多層板の平滑性や層間厚コントロールが
困難となるという欠点がある。Furthermore, it is necessary to adjust the amount of resin in the catalyst-containing prepreg layer according to the number of holes in the holes, and it is difficult to control the smoothness and interlayer thickness of the multilayer board depending on the degree of concentration of holes in the plane direction. There is a drawback that
本発明の目的は、高密度でインピーダンス特性に対する
制約がなく、平滑性や層間厚のコントロールが可能な多
層印刷配線板の製造方法を提供することにある。An object of the present invention is to provide a method for manufacturing a multilayer printed wiring board which has a high density and has no restriction on impedance characteristics and which can control smoothness and interlayer thickness.
本発明の多層印刷配線板の製造方法は、予め導体回路パ
ターンを表裏両面に設けた触媒入り絶縁基板の2枚1組
をそれぞれ最外層に配置し、その内側に触媒なしの絶縁
基板と触媒入りプリプレグとを介挿させて加熱,加圧し
て多層化基板を成型する工程と、前記多層化基板の所定
の位置に貫通孔を穿孔する工程と、前記貫通孔の一部を
マスクした後、マスクされていない前記貫通孔内壁に触
媒を吸着させる工程と、前記マスクを除去する工程と、
前記貫通孔内壁の前記触媒入り絶縁基板と前記触媒入り
プリプレグとで形成された触媒入り絶縁層及び触媒を吸
着させた部分を含めて無電解めっきで導体層を形成する
工程とを含んで構成される。The method for manufacturing a multilayer printed wiring board according to the present invention is such that two sets of catalyst-containing insulating substrates having conductor circuit patterns provided on both front and back surfaces in advance are arranged in the outermost layers, and an insulating substrate without a catalyst and a catalyst-containing substrate are provided inside thereof. A step of forming a multi-layered substrate by inserting a prepreg and heating and pressurizing, a step of forming a through hole at a predetermined position of the multi-layered substrate, and a mask after masking a part of the through hole. A step of adsorbing a catalyst on the inner wall of the through hole that is not formed; a step of removing the mask;
And a catalyst-containing insulating layer formed by the catalyst-containing insulating substrate and the catalyst-containing prepreg on the inner wall of the through hole, and a step of forming a conductor layer by electroless plating including a catalyst-adsorbed portion. It
次に、本発明の実施例について図面を参照して説明す
る。Next, embodiments of the present invention will be described with reference to the drawings.
第1図は本発明の一実施例の製造方法を説明する工程順
に示した縦断面図である。FIG. 1 is a vertical sectional view showing the manufacturing method of an embodiment of the present invention in the order of steps.
まず、第1図(A)に示す様に、予め導体回路パターン
1a,1bを表裏両面に設けた触媒入り絶縁基板2の2枚1
組をそれぞれ最外層に配置し、その内側に触媒なしの絶
縁基板3と触媒入りプリプレグ4とを介挿させてセット
する。First, as shown in FIG. 1 (A), a conductor circuit pattern is previously prepared.
Two pieces of insulating substrate 2 with catalyst 1a and 1b on both sides
Each set is arranged in the outermost layer, and the insulating substrate 3 without a catalyst and the prepreg 4 with a catalyst are set inside the set.
次に、第1図(B)に示すように、加熱,加圧して触媒
入り絶縁層5及び触媒なしの絶縁基板3とを含む多層化
基板6を得る。Next, as shown in FIG. 1 (B), heating and pressurization are performed to obtain a multi-layer substrate 6 including the catalyst-containing insulating layer 5 and the catalyst-free insulating substrate 3.
次に、第1図(C)に示す様に、所定の位置にN/Cドリ
リング装置により貫通孔7a,7bを穿孔する。Next, as shown in FIG. 1 (C), through holes 7a and 7b are drilled at predetermined positions by an N / C drilling device.
次に、第1図(D)に示すように、分割されたバイアホ
ールを形成する貫通孔7aをホト印刷法により、例えば、
デュポン社製ドライフィルムリストン1220 を用いて、
マスク8を形成した後、塩化パラジウムをベースにした
触媒液に浸漬して、マスク8が施されていない貫通孔7b
の内壁全体に触媒9を吸着させる。Next, as shown in FIG.
The through holes 7a forming the rule by a photo printing method, for example,
DuPont Dry Film Liston 1220 Using,
After forming the mask 8, based on palladium chloride
Through hole 7b without mask 8 by immersing in catalyst liquid
The catalyst 9 is adsorbed on the entire inner wall of the.
次に、マスク8を有機溶剤で除去した後(図示略)第1
図(E)に示すように、無電解銅めっきを施すと、多層
化基板6の露出した導体回路パターン1a及び貫通孔7a,7
bの内壁に導体層10が形成される。この場合、貫通孔7a
に於いては、触媒入り絶縁層5にのみ導体層10が形成さ
れ、触媒なしの絶縁基板3には形成されないため、貫通
孔7a内壁で導体層10の分離が起こり、且つ、導体回路パ
ターン1aと1bが接続され、一方、貫通孔7bに於いては、
先に吸着させた触媒9により、内壁全体に導体層10が形
成されることにより、分割されたバイアホール11と通常
のスルホール12と含む多層印刷配線板13を得る。Next, after removing the mask 8 with an organic solvent (not shown), the first
As shown in FIG. 6E, when electroless copper plating is performed, the exposed conductor circuit pattern 1a and the through holes 7a, 7 of the multilayer substrate 6 are exposed.
The conductor layer 10 is formed on the inner wall of b. In this case, the through hole 7a
In this case, since the conductor layer 10 is formed only on the catalyst-containing insulating layer 5 and not on the insulating substrate 3 without a catalyst, the conductor layer 10 is separated at the inner wall of the through hole 7a, and the conductor circuit pattern 1a is formed. And 1b are connected, while in the through hole 7b,
The conductive layer 10 is formed on the entire inner wall by the catalyst 9 adsorbed in advance, so that the multilayer printed wiring board 13 including the divided via hole 11 and the normal through hole 12 is obtained.
以上説明したように本発明は、分割されたバイアホール
を選択的に多層印刷配線板に形成する場合に、従来技術
の様な基本格子配置,層間厚,特性インピーダンス設定
等の種々設計的制約要素がなく、配線収容性が大幅に向
上した高密度な多層印刷配線板が得られる効果がある。As described above, according to the present invention, when selectively forming divided via holes in a multilayer printed wiring board, various design constraint elements such as the basic lattice arrangement, the interlayer thickness, and the characteristic impedance setting as in the prior art are used. There is no effect, and there is an effect that a high-density multilayer printed wiring board having a significantly improved wiring accommodation property can be obtained.
第1図(A)〜(E)は本発明の一実施例の製造方法を
説明する工程順に示した縦断面図、第2図(A)〜
(D)は従来の製造方法の一例を説明する工程順に示し
た縦断面図である。 1a,1b……導体回路パターン、2……触媒入り絶縁基
板、3……触媒なしの絶縁基板、4……触媒入りプリプ
レグ、5……触媒入り絶縁層、6……多層化基板、7a,7
b……貫通孔、8……マスク、9……触媒、10……導体
層、11……分割されたバイアホール、12……通常のスル
ホール、13……多層印刷配線板、14……孔部。1 (A) to 1 (E) are longitudinal sectional views showing the manufacturing method of one embodiment of the present invention in the order of steps, and FIGS. 2 (A) to 2 (E).
(D) is a longitudinal cross-sectional view showing an example of a conventional manufacturing method in the order of steps. 1a, 1b ... Conductor circuit pattern, 2 ... Insulating substrate with catalyst, 3 ... Insulating substrate without catalyst, 4 ... Prepreg with catalyst, 5 ... Insulating layer with catalyst, 6 ... Multilayer substrate, 7a, 7
b ... through hole, 8 ... mask, 9 ... catalyst, 10 ... conductor layer, 11 ... divided via hole, 12 ... normal through hole, 13 ... multilayer printed wiring board, 14 ... hole Department.
Claims (1)
触媒入り絶縁基板の2枚1組をそれぞれ最外層に配置
し、その内側に触媒なしの絶縁基板と触媒入りプリプレ
グとを介挿させて加熱,加圧して多層化基板を成型する
工程と、前記多層化基板の所定の位置に貫通孔を穿孔す
る工程と、前記貫通孔の一部をマスクした後、マスクさ
れていない前記貫通孔内壁に触媒を吸着させる工程と、
前記マスクを除去する工程と、前記貫通孔内壁の前記触
媒入り絶縁基板と前記触媒入りプリプレグとで形成され
た触媒入り絶縁層及び触媒を吸着させた部分を含めて無
電解めっきで導体層を形成する工程とを含む事を特徴と
する多層印刷配線板の製造方法。1. A set of two insulating substrates containing a catalyst having conductor circuit patterns provided on both front and back sides in advance is arranged in the outermost layer, and an insulating substrate without a catalyst and a prepreg containing a catalyst are inserted inside the outermost layers. A step of forming a multilayer substrate by heating and pressurizing, a step of forming a through hole at a predetermined position of the multilayer substrate, and a part of the through hole being masked, and then the inner wall of the through hole that is not masked A step of adsorbing a catalyst on
Forming a conductor layer by electroless plating including the step of removing the mask, the insulating layer containing the catalyst formed by the insulating substrate containing the catalyst and the prepreg containing the catalyst on the inner wall of the through hole, and the portion where the catalyst is adsorbed A method of manufacturing a multilayer printed wiring board, comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27783788A JPH0716096B2 (en) | 1988-11-01 | 1988-11-01 | Method for manufacturing multilayer printed wiring board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27783788A JPH0716096B2 (en) | 1988-11-01 | 1988-11-01 | Method for manufacturing multilayer printed wiring board |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02122696A JPH02122696A (en) | 1990-05-10 |
| JPH0716096B2 true JPH0716096B2 (en) | 1995-02-22 |
Family
ID=17588958
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27783788A Expired - Lifetime JPH0716096B2 (en) | 1988-11-01 | 1988-11-01 | Method for manufacturing multilayer printed wiring board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0716096B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2513526B2 (en) * | 1990-08-08 | 1996-07-03 | 日立エーアイシー株式会社 | Method for manufacturing multilayer wiring board |
-
1988
- 1988-11-01 JP JP27783788A patent/JPH0716096B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02122696A (en) | 1990-05-10 |
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