JPH0736320B2 - Scan conversion storage tube - Google Patents

Description

The present invention relates to a scan conversion storage tube suitable for use in a transit oscilloscope or the like.

<Prior Art> FIG. 3 is a block diagram showing an example of a conventional scan conversion storage tube.

As shown in FIG. 3, the scan conversion storage tube is an electron gun 11 and an acceleration tube.
12, an electron beam control unit 10 including a quadrupole lens 13, a vertical deflection plate 14, and a horizontal deflection plate 15, and a storage target 6, the operation of which is to erase, write, or read an image or other information by a charge pattern. It is possible.

The erasing operation is performed by scanning the entire area of the storage target 6 with an electron beam and uniformly charging the surface.

The writing operation is performed by drawing with a high-speed electron beam, and the drawing part has a positive potential more than other parts.

The reading operation is performed by scanning the storage target 6 with a low-speed electron beam, and a current flows through the electrodes in the writing section.

<Problems to be Solved by the Invention> However, in the scanning conversion storage tube shown in the above-mentioned prior art, the quadrupole lens 13 constituting the electron beam control unit 10 is used.
Also, since it is difficult to position and assemble the vertical deflection plate 14 and the horizontal deflection plate 15 when forming, there is a problem that the electron beam cannot be accurately scanned on the storage target 6.

The present invention has been made in view of the above-mentioned problems of the prior art, and by forming the quadrupole lens, the vertical deflection plate, and the horizontal deflection plate forming the electron beam control unit by fine processing of silicon, Easily position the dipole lens, vertical deflection plate, and horizontal deflection plate, improve the assembly precision of the quadrupole lens, and facilitate alignment of the optical axis. The purpose of the present invention is to provide a scan conversion storage tube that can be used.

<Means for Solving the Problems> The structure of the present invention for solving the above problems is formed by anisotropic etching of silicon, subjected to V-groove processing and square processing, and a pole is joined to the V-groove processed portion. A quadrupole lens and a vertical deflection plate formed by stacking two substrates, and a horizontal deflection plate formed by stacking two square-shaped substrates formed by anisotropic etching of silicon. It is characterized by joining and so that the beam axes coincide with each other.

<Operation> As described above, when the fine processing of silicon is used, the positioning and the assembling accuracy can be improved and the alignment of the optical axis is facilitated. Therefore, the electron beam is scanned with high accuracy on the storage target. You can do it.

<Example> Hereinafter, the present invention will be described with reference to the drawings.

FIG. 1 is a block diagram showing an embodiment of a scan conversion storage tube according to the present invention. In FIG. 1, the same elements as those in FIG. 3 are designated by the same reference numerals, and duplicate description will be omitted.

In FIG. 1, the quadrupole lens 13 'and the vertical deflection plate 14' are formed by anisotropic etching of silicon. The quadrupole lens 13 'is V-grooved and the vertical deflection plate 14' is rectangular. Eight poles 7 are applied to each V-groove processed part.
It is formed by stacking two substrates 20a and 20b bonded to each other. The substrates 20a and 20b are joined by sputtering Pyrex glass (# 7740) or the like on the joint surfaces and performing anodic joining. The horizontal deflection plate 15 'is formed by anisotropic etching of silicon and is formed by stacking two square-shaped substrates 30a and 30b, and the bonding is similarly performed by anodic bonding. Also, the substrate 20a (20b)
The substrate 30a (30b) and the substrate 30a (30b) are bonded together with an adhesive or the like so that the beam axes coincide with each other.

Here, details of the quadrupole lens 13 'are shown in FIGS.

As shown in FIG. 2 (a), four poles 7 are installed in the V-groove processed portion of the substrate 20a (20b) formed by anisotropic etching of silicon. 21 is p- on the substrate 20a (20b)
It is an electrode extracted by n-junction. Further, as shown in (b), the p-layer of the electrode 21 and the pole 7 are joined by an adhesive or the like by making an electrical connection with the Al layer 22 of about 1 μm sputtered on the joining surface. It

In such a structure, the operation is the same as the conventional one, and the electron beam emitted from the electron gun (not shown) and accelerated by the accelerating tube passes through the quadrupole lens 13 ', the vertical deflection plate 14', and the horizontal deflection plate 15 '. Controlled by
The top can be scanned accurately.

<Effects of the Invention> As described above in detail with reference to the embodiments, according to the present invention, the quadrupole lens, the vertical deflection plate, and the horizontal deflection plate forming the electron beam control unit are formed by fine processing of silicon. This makes it easy to position the quadrupole lens, vertical deflection plate, and horizontal deflection plate, improves the assembly precision of the quadrupole lens, and facilitates alignment of the optical axis. It is possible to scan over the storage target. Further, since the alignment of the optical axis is facilitated, an inexpensive scan conversion storage tube can be realized.

[Brief description of drawings]

FIG. 1 is a block diagram showing an embodiment of a scan conversion storage tube according to the present invention, FIG. 2 is a detailed view of a quadrupole lens used in the scan conversion storage tube of FIG. 1, and FIG. It is a block diagram which shows an example of a scan conversion storage tube. 6 ... Accumulation target, 7 ... Pole, 13 '... Quadrupole lens, 14' ... Vertical deflection plate, 15 '... Horizontal deflection plate, 20
a, 20b, 30a, 30b ... Silicon substrate, 21 ... Electrode, 22
…… Al layer.

Claims (1)

[Claims] 1. A quadrupole lens formed by stacking two substrates, which are formed by anisotropic etching of silicon, are subjected to V-groove processing and square processing, and have V-grooved portions bonded to poles, and a vertical pole. Scanning characterized in that a deflection plate and a horizontal deflection plate formed by stacking two square-shaped substrates formed by anisotropic etching of silicon are bonded so that their beam axes coincide with each other. Conversion storage tube.