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JPH079774B2 - Gas dam cable manufacturing method - Google Patents
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JPH079774B2 - Gas dam cable manufacturing method - Google Patents

Gas dam cable manufacturing method

Info

Publication number
JPH079774B2
JPH079774B2 JP58121220A JP12122083A JPH079774B2 JP H079774 B2 JPH079774 B2 JP H079774B2 JP 58121220 A JP58121220 A JP 58121220A JP 12122083 A JP12122083 A JP 12122083A JP H079774 B2 JPH079774 B2 JP H079774B2
Authority
JP
Japan
Prior art keywords
gas
cable
plasma
sheath
plasma processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58121220A
Other languages
Japanese (ja)
Other versions
JPS6012609A (en
Inventor
昌明 清水
隆 島野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Priority to JP58121220A priority Critical patent/JPH079774B2/en
Publication of JPS6012609A publication Critical patent/JPS6012609A/en
Publication of JPH079774B2 publication Critical patent/JPH079774B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 〔技術分野〕 本発明は、電線、光フアイバの如き多数のプラスチツク
被覆心線より成るケーブルにガスダム部を形成するに際
し、ダム形成樹脂と前記プラスチツク被覆心線の接着強
度を向上させるためガスプラズマ処理にて前記プラスチ
ツク被覆表面を活性化するガスダムケーブルの製造方法
における、前記プラズマ処理の改良に関するものであ
る。
Description: TECHNICAL FIELD The present invention relates to the adhesive strength between a dam-forming resin and the plastic coated core wire when forming a gas dam portion in a cable composed of a large number of plastic coated core wires such as electric wires and optical fibers. The present invention relates to an improvement of the plasma treatment in a method of manufacturing a gas dam cable in which the plastic coating surface is activated by gas plasma treatment to improve the temperature.

〔従来技術〕[Prior art]

一般に、ケーブルガスダム部はケーブルのシースを剥取
つて多数のプラスチツク被覆心線を露出しこの心線露出
部とその両側のシース部分とに跨つてエポキシ、ウレタ
ンの如き充填材を充填して形成される。しかし、この場
合、充填材と心線被覆、シース等の材料であるポリエチ
レンとの間に接着性が無いため、該接着性を向上する目
的で前記充填材を充填する前に、心線露出部とその両側
のシース部分にプラズマ処理を施す方法(特願昭56−33
980号)が既に提案されている。
Generally, the cable gas dam is formed by stripping off the sheath of the cable to expose a large number of plastic coated core wires and filling a filler such as epoxy or urethane across the exposed core wire and the sheath parts on both sides of the exposed core wire. To be done. However, in this case, since there is no adhesiveness between the filler and polyethylene, which is a material for the core wire coating, the sheath, etc., before the filler is filled for the purpose of improving the adhesiveness, the core wire exposed portion And the method of applying plasma treatment to the sheath on both sides (Japanese Patent Application No. 56-33)
No. 980) has already been proposed.

この方法を第1図を参照して説明する。第1図は従来の
プラズマ処理装置を用いてケーブルの一部をプラズマ処
理している状態を示す断面図である。この従来装置を用
いてガスダム部を形成する場合は、ケーブル1のガスダ
ム部を形成すべき部分のシース2を剥取つて多数のプラ
スチツク被覆心線を露出する。この心線露出部3をプラ
ズマ処理容器4に挿入する。該プラズマ処理容器4は容
器本体6と、該容器本体6とシール用のOリング7を介
して両端に設けられ中央にケーブル貫通孔を有する蓋8,
8とを有している。このプラズマ処理容器4内のほぼ中
央に前記心線露出部3を位置決めした後、前記両端の蓋
8のケーブル貫通孔とケーブル1間の隙間をシーリング
テープ9にてシールする。しかる後吸入管10を通して真
空ポンプ11にてプラズマ容器4内を真空引きする。真空
引きを始めたら次にガスボンベ15より送出管16を通して
活性ガス及び不活性ガスをプラズマ処理容器4に送り込
み、該容器4内の真空度が安定してきたら高周波発生器
17によりプラズマ発生部18においてガスプラズマを発生
せしめる。該ガスプラズマは送出管16からプラズマ処理
容器4内へ導入され、心線露出部3及びその両端のシー
ス部分の表面を活性化する。
This method will be described with reference to FIG. FIG. 1 is a sectional view showing a state in which a part of a cable is plasma-processed by using a conventional plasma processing apparatus. When the gas dam portion is formed using this conventional apparatus, the sheath 2 of the portion of the cable 1 where the gas dam portion is to be formed is peeled off to expose a large number of plastic coated core wires. The core wire exposed portion 3 is inserted into the plasma processing container 4. The plasma processing container 4 has a container body 6 and a lid 8 provided at both ends via the container body 6 and an O-ring 7 for sealing and having a cable through hole in the center.
8 and. After the core wire exposed portion 3 is positioned substantially in the center of the plasma processing container 4, the gap between the cable through hole of the lid 8 at both ends and the cable 1 is sealed with a sealing tape 9. Then, the inside of the plasma container 4 is evacuated by the vacuum pump 11 through the suction pipe 10. When the evacuation is started, the active gas and the inert gas are then sent from the gas cylinder 15 through the delivery pipe 16 to the plasma processing container 4, and when the degree of vacuum inside the container 4 becomes stable, a high frequency generator
Gas plasma is generated in the plasma generator 18 by the gas generator 17. The gas plasma is introduced into the plasma processing container 4 through the delivery pipe 16 and activates the surfaces of the exposed portion 3 of the core wire and the sheath portions at both ends thereof.

ところが第1図のように吸入管10及びガスプラズマ送出
管16をプラズマ処理容器4のほぼ中央に開口させておく
従来の方法では心線露出部3の中央部の処理状態は良い
が両端のE部、F部はプラズマ密度が低いため処理が不
均一、不充分であつた。
However, in the conventional method in which the suction pipe 10 and the gas plasma delivery pipe 16 are opened in the approximate center of the plasma processing container 4 as shown in FIG. Since the plasma density was low in the parts F and F, the treatment was uneven and insufficient.

一般にガスダムケーブルではケーブルの上部側、すなわ
ち第1図のケーブル1におけるA部側にガスが封入され
る。それ故、第1図のE部にこそガスプラズマ密度を高
くし、均一なプラズマ処理を施す必要がある。ところが
前述の如く従来の方法では、心線露出部の端のE部に対
し充分なプラズマ処理が出来ず、その結果徒らに処理時
間のみ多くかけている。また、この問題を解決すべく、
プラズマ処理装置自体を大型化してプラズマ発生量を大
きくし、プラズマ処理容器内全体のプラズマ密度を高め
る方法もあるが、この場合には装置のコストが高くなる
という問題がある。
Generally, in a gas dam cable, gas is sealed in the upper side of the cable, that is, the A portion side in the cable 1 in FIG. Therefore, it is necessary to increase the gas plasma density and perform uniform plasma treatment at the portion E in FIG. However, as described above, the conventional method cannot sufficiently perform the plasma processing on the E portion at the end of the exposed portion of the core wire, and as a result, it takes a lot of processing time. Also, to solve this problem,
There is also a method of increasing the plasma generation amount by increasing the size of the plasma processing apparatus itself to increase the plasma density in the entire plasma processing container, but in this case, there is a problem that the cost of the apparatus increases.

〔発明の目的〕[Object of the Invention]

本発明の目的は、前記問題に鑑み、ガス気密が最も必要
とされている部分に対して、プラズマ密度を高くし、効
率的かつ均一なプラズマ処理を施すガスダムケーブルの
製造方法を提供することにある。
In view of the above problems, an object of the present invention is to provide a method for manufacturing a gas dam cable in which a plasma density is increased and an efficient and uniform plasma treatment is applied to a portion where gas tightness is most needed. It is in.

〔発明の構成〕[Structure of Invention]

前記目的を達成すべく、本発明はケーブルのシースを剥
取って多数のプラスチック被覆心線を露出し、この心線
露出部とその両側のシース部分とをガスプラズマ処理装
置内に入れてガルプラズマ処理を施した後、前記心線露
出部とその両側のシース部分とに跨って充填材を充填し
てガスダム部を形成するガスダムケーブルの製造方法に
おいて、前記心線露出部とその両側のシース部のうちガ
ス気密の信頼性を必要とするガス封入側の心線露出部と
該心線露出部に近接するシース部のプラズマ密度を他の
部分よりも高くすることを特徴とするものである。
In order to achieve the above object, the present invention peels off the sheath of the cable to expose a large number of plastic-coated core wires, and places the exposed core wires and the sheath portions on both sides thereof in a gas plasma processing apparatus. In the method for manufacturing a gas dam cable in which a gas dam portion is formed by filling a filler over the exposed core portion and the sheath portions on both sides thereof after the treatment, in the exposed core portion and the sheaths on both sides thereof. Among the above parts, the plasma density of the core wire exposed portion on the gas filled side requiring reliability of gas tightness and the sheath portion adjacent to the core wire exposed portion is made higher than that of other portions. .

〔発明の実施例〕Example of Invention

本発明の実施例を図を参照して詳細に説明する。 Embodiments of the present invention will be described in detail with reference to the drawings.

第2図は本発明に係る一実施例の断面図、第3図は別の
実施例の断面図である。第2図が示すように本発明にお
いてはケーブル1のガスダム部を形成すべき部分のシー
ス2を剥取つて多数のプラスチツク被覆心線を露出させ
た心線露出部3をプラズマ処理容器4のほぼ中央に位置
決めする。いまケーブル1のガス封入側を第2図のA側
とすると、最もガス気密の信頼性が必要なのはE部であ
る。そこでこの心線露出部3のA側端と、それに近接す
るシース部とからなるE部にプラズマ送出管16の開口部
がくるようにし、かつ真空引き用の吸入管10の開口部を
やはり前記E部側に寄せる。この場合吸入管10の開口部
は送出管16の開口部と対向させるか、あるいは少し内
側、すなわち対向する位置より心線露出部3の中央部側
に少し寄せる。尚、対向する位置より外側に寄せると心
線露出部3のプラズマ密度がシース2へのプラズマ密度
より低くなるためあまり好ましくない。さらに別の実施
例として第3図に示すように従来の装置にさらに1式の
高周波発生器17′及びプラズマ送出管16′を用意し、前
述の第2図の場合と同じようにケーブル1のE部に送出
管16′の開口部がくるようにする。該送出管16′の開口
部と真空引き用ポンプ11の吸入管10の開口部との位置関
係は前述の第2図の場合と同じである。
FIG. 2 is a sectional view of one embodiment according to the present invention, and FIG. 3 is a sectional view of another embodiment. As shown in FIG. 2, in the present invention, the core wire exposed portion 3 in which a large number of plastic-coated core wires are exposed by peeling off the sheath 2 at the portion where the gas dam portion of the cable 1 is formed is almost the same as the plasma processing container 4. Position in the center. Now, assuming that the gas-filled side of the cable 1 is the A side in FIG. 2, the most gas-tightness reliability is required at the E section. Therefore, the opening portion of the plasma delivery tube 16 is made to come to the E portion composed of the A side end of the core wire exposed portion 3 and the sheath portion adjacent thereto, and the opening portion of the suction pipe 10 for vacuuming is also the above-mentioned. Move to the E section side. In this case, the opening of the suction pipe 10 is made to face the opening of the delivery pipe 16, or slightly inward, that is, a little closer to the central portion side of the core wire exposed portion 3 than the facing position. It should be noted that it is not preferable to move it outside the facing position because the plasma density of the exposed core portion 3 becomes lower than the plasma density of the sheath 2. As yet another embodiment, as shown in FIG. 3, a set of a high frequency generator 17 'and a plasma delivery tube 16' is further prepared in the conventional device, and the cable 1 is connected in the same manner as in the case of FIG. The opening of the delivery pipe 16 'is located at the E portion. The positional relationship between the opening of the delivery pipe 16 'and the opening of the suction pipe 10 of the vacuum pump 11 is the same as that shown in FIG.

当然のことながら第3図の実施例の方が第2図の実施例
よりプラズマ容器内のプラズマ密度は高く、プラズマ処
理も安定して出来るが設備的に高価になる。他方第2図
の実施例の場合は設備的に安価であるという利点があ
る。それ故第2図に示す装置と第3図に示す装置の使い
分けはケーブルの太さ、あるいはガスダムケーブルの要
求品質等によつて行う。
As a matter of course, the embodiment shown in FIG. 3 has a higher plasma density in the plasma container than the embodiment shown in FIG. 2, and the plasma processing can be performed stably, but the equipment is expensive. On the other hand, the embodiment shown in FIG. 2 has the advantage of being inexpensive in terms of equipment. Therefore, the device shown in FIG. 2 and the device shown in FIG. 3 are used properly depending on the thickness of the cable or the required quality of the gas dam cable.

前記の如くガスダム部で最も気密性を要求される部分に
プラズマ送出管の開口部を、また該送出管にほぼ対向す
る位置に吸入管開口部を設けることにより前記最も気密
性を要求される部分のプラズマ密度は高くなり、もつて
該部分を均一にしかも短時間で効率よく活性化すること
が出来る。その結果前記プラズマ処理後エポキシ、ウレ
タン等の樹脂を前記プラズマ処理部に充填せしめた時、
前記最も気密性を必要とされる部分はこの充填樹脂と均
一にかつ強く接着するため、気密性は向上し、かつ安定
する。
As described above, by providing the opening portion of the plasma delivery pipe at the portion where the gas tightness is required most and the suction pipe opening portion at a position substantially opposite to the delivery pipe, the portion where the air tightness is required most. Therefore, the plasma density becomes high, so that the portion can be uniformly and efficiently activated in a short time. As a result, after the plasma treatment, when the resin such as epoxy and urethane is filled in the plasma treatment part,
Since the most airtight portion is uniformly and strongly adhered to the filling resin, the airtightness is improved and stabilized.

〔発明の効果〕〔The invention's effect〕

前記の如く、本発明によれば、ガスダムケーブルのガス
ダム部において最も気密性を必要とする部分、すなわ
ち、ガス封入側の心線露出部と該心線露出部に近接する
シース部を効率的、かつ均一にプラズマにて活性化出来
る。その結果、信頼性の高いガスダムケーブルを得るこ
とが出来る。加えて、本発明によれば、プラズマ処理装
置全体を大型化する必要もないので、装置のコスト高を
招く心配もない。
As described above, according to the present invention, in the gas dam portion of the gas dam cable, the portion that requires the most airtightness, that is, the core wire exposed portion on the gas-filled side and the sheath portion that is close to the core wire exposed portion are efficiently provided. And, it can be uniformly activated by plasma. As a result, a highly reliable gas dam cable can be obtained. In addition, according to the present invention, since it is not necessary to increase the size of the plasma processing apparatus as a whole, there is no fear of increasing the cost of the apparatus.

【図面の簡単な説明】[Brief description of drawings]

第1図は従来のプラズマ処理装置にてケーブルにプラズ
マ処理を施している縦断面図、第2図は本発明に係る一
実施例の縦断面図、第3図は本発明の別の実施例を示す
縦断面図である。 1……ケーブル、3……心線露出部、4……プラズマ処
理容器、10……吸入管、11……真空ポンプ、15……ガス
ボンベ、16……送出管、17……高周波発生器、18……プ
ラズマ発生器。
FIG. 1 is a vertical cross-sectional view in which a cable is plasma-processed by a conventional plasma processing apparatus, FIG. 2 is a vertical cross-sectional view of an embodiment according to the present invention, and FIG. 3 is another embodiment of the present invention. FIG. 1 ... Cable, 3 ... Core exposed part, 4 ... Plasma processing container, 10 ... Suction pipe, 11 ... Vacuum pump, 15 ... Gas cylinder, 16 ... Delivery pipe, 17 ... High frequency generator, 18 ... Plasma generator.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】ケーブルのシースを剥取って多数のプラス
チック被覆心線を露出し、この心線露出部とその両側の
シース部分とをガスプラズマ処理装置内に入れてガスプ
ラズマ処理を施した後、前記心線露出部とその両側のシ
ース部分とに跨って充填材を充填してガスダム部を形成
するガスダムケーブルの製造方法において、前記心線露
出部とその両側のシース部のうちガス気密の信頼性を必
要とするガス封入側の心線露出部と該心線露出部に近接
するシース部のプラズマ密度を他の部分よりも高くする
ことを特徴とするガスダムケーブルの製造方法。
1. A cable sheath is peeled off to expose a large number of plastic-coated core wires, and the exposed core wires and the sheath portions on both sides thereof are placed in a gas plasma processing apparatus and subjected to gas plasma processing. In a method of manufacturing a gas dam cable in which a gas dam portion is formed by filling a filler over the exposed core portion and the sheath portions on both sides thereof, a gas-tight seal is provided between the exposed core portion and the sheath portions on both sides thereof. A method for manufacturing a gas dam cable, characterized in that the plasma density of the exposed core portion on the gas-filled side and the sheath portion adjacent to the exposed core portion is higher than that of other portions.
JP58121220A 1983-07-04 1983-07-04 Gas dam cable manufacturing method Expired - Lifetime JPH079774B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58121220A JPH079774B2 (en) 1983-07-04 1983-07-04 Gas dam cable manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58121220A JPH079774B2 (en) 1983-07-04 1983-07-04 Gas dam cable manufacturing method

Publications (2)

Publication Number Publication Date
JPS6012609A JPS6012609A (en) 1985-01-23
JPH079774B2 true JPH079774B2 (en) 1995-02-01

Family

ID=14805859

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58121220A Expired - Lifetime JPH079774B2 (en) 1983-07-04 1983-07-04 Gas dam cable manufacturing method

Country Status (1)

Country Link
JP (1) JPH079774B2 (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6036684B2 (en) * 1981-03-11 1985-08-22 古河電気工業株式会社 Manufacturing method of cable gas dam part

Also Published As

Publication number Publication date
JPS6012609A (en) 1985-01-23

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