JPH0823071B2 - Rough surface coating forming composition and rough surface coating forming method - Google Patents
Rough surface coating forming composition and rough surface coating forming methodInfo
- Publication number
- JPH0823071B2 JPH0823071B2 JP59168495A JP16849584A JPH0823071B2 JP H0823071 B2 JPH0823071 B2 JP H0823071B2 JP 59168495 A JP59168495 A JP 59168495A JP 16849584 A JP16849584 A JP 16849584A JP H0823071 B2 JPH0823071 B2 JP H0823071B2
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- JP
- Japan
- Prior art keywords
- rough surface
- surface coating
- composition
- forming
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Surface Treatment Of Optical Elements (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、被膜形成用組成物に係り、さらに詳しく
は、粗な表面を有する金属化合物被膜を形成するための
組成物および粗面被膜形成方法に関する。TECHNICAL FIELD The present invention relates to a film-forming composition, and more particularly, to a composition for forming a metal compound film having a rough surface and a rough surface film formation. Regarding the method.
金属,ガラス,セラミック,プラスチック等の基材表
面に形成される粗面被膜は、光を散乱するため、つや消
し効果、光反射防止効果を有するため、本発明は、多く
の表面処理分野で利用できる。The rough surface coating formed on the surface of a base material such as metal, glass, ceramics or plastic has a matte effect and a light reflection preventing effect because it scatters light, and therefore the present invention can be used in many surface treatment fields. .
従来、基材表面に光散乱性を付与する方法として、サ
ンドブラスト等による機械的な表面処理およびケミカル
エッチング等による化学的な表面処理により基材表面を
粗面化する方法、顔料を分散させた樹脂を基材表面に塗
布する方法などがあり、それぞれ完成された技術として
各分野の要望に合せて採用されている。基材表面に、透
光性の金属化合物によるつや消し膜または光反射防止膜
を形成する方法として、SiO2,MgF2等の金属化合物から
なる低屈折率の単層薄膜または、これらの低屈折率膜
と、TiO2,ZrO2,HfO2等の金属化合物からなる高屈折率膜
とを交互に積層した光干渉膜を、基材表面に真空蒸着
法、スパッタリング法、CVD法等により形成する方法が
あり、これらも完成された技術として採用されている。Conventionally, as a method for imparting light-scattering properties to a substrate surface, a method of roughening the substrate surface by a mechanical surface treatment such as sandblasting or a chemical surface treatment such as chemical etching, a resin in which a pigment is dispersed Is applied to the surface of the base material, and is adopted as a completed technology according to the demands of each field. As a method for forming a matte film or an antireflection film by a translucent metal compound on the surface of a substrate, a low-refractive-index single-layer thin film made of a metal compound such as SiO 2 or MgF 2 or a low-refractive index thereof A method for forming an optical interference film in which a film and a high refractive index film made of a metal compound such as TiO 2 , ZrO 2 , and HfO 2 are alternately laminated on the substrate surface by a vacuum deposition method, a sputtering method, a CVD method, or the like. , And these are also adopted as completed technologies.
基体表面を粗面化する方法においては、粗面側への入
射光を散乱させるつや消効果には優れるが、光の透過も
要求される照明器具・窓等に用いるガラス・プラスチッ
ク等の場合、粗面化により半透明になり光の透過率が低
下する。顔料含有樹脂被膜を形成する方法も同様であ
る。一方、透明な金属化合物の被膜を形成する方法にお
いては、平滑な表面しか得られないため、表面反射率を
低下させるためには限界があり、要求があれば前記粗面
化方法を併用して被膜表面の粗面化を行う必要がある。In the method of roughening the surface of the substrate, the matte effect of scattering the incident light to the rough surface side is excellent, but in the case of glass, plastic, etc. used for lighting fixtures, windows, etc. that also require transmission of light, The roughened surface makes it semi-transparent and reduces the light transmittance. The same applies to the method of forming the pigment-containing resin film. On the other hand, in the method of forming a transparent metal compound film, since only a smooth surface can be obtained, there is a limit in reducing the surface reflectance, and if necessary, the roughening method may be used in combination. It is necessary to roughen the coating surface.
本発明は、金属化合物被膜の形成方法の一つである塗
布焼成法により基材表面に粗面被膜を形成する方法およ
び該方法で使用する被膜形成用組成物を提供することを
その目的とする。An object of the present invention is to provide a method for forming a rough surface coating on a substrate surface by a coating and firing method which is one of the methods for forming a metal compound coating, and a coating forming composition used in the method. .
本発明は、Si,Ti,Ta,Al,Zr,In,Hf,La,Nb,Pb,Sb,Sn,Y,
WまたはFeのアルコキシド類、アルコキシド重合体類、
キレート化体類およびアシル化体類よりなる群から選ば
れた有機金属化合物の1種または2種以上と溶剤とから
なる有機金属化合物溶液に、室温で液状の疎水性可塑剤
を添加含有させてなる粗面被膜形成用組成物および該組
成物を基材表面に塗布・乾燥し、形成される塗膜を熱分
解することを特徴とする粗面被膜形成方法である。The present invention is Si, Ti, Ta, Al, Zr, In, Hf, La, Nb, Pb, Sb, Sn, Y,
W or Fe alkoxides, alkoxide polymers,
A hydrophobic plasticizer, which is liquid at room temperature, is added to an organometallic compound solution consisting of a solvent and one or more organometallic compounds selected from the group consisting of chelating compounds and acylating compounds. And a composition for forming a rough surface coating, which is applied to the surface of a base material and dried to thermally decompose the formed coating film.
本発明において使用される有機金属化合物は有機溶剤
溶解性で、かつ金属原子に直接結合しているかまたは配
位している酸素を有する熱分解性のものである。有機Si
化合物により具体例を示すと、ジメチルジメトキシシラ
ン,ジエチルジエトキシシラン,ジメチルジイソプロポ
キシシラン,ジエチルジブトキシシラン,メチルトリメ
トキシシラン,エチルトリエトキシシラン,メチルトリ
エトキシシラン,メチルトリイソプポキシシラン,エチ
ルトリブトキシシラン,テトラメトキシシラン,テトラ
エトキシシラン,テトライソプロポキシシラン,テトラ
ブトキシシラン,ジメトキシジエトキシシラン,ジエト
キシジイソプロポキシシラン等の同種または異種の置換
基を有するシランアルコキシド類、同種または意趣のシ
ランアルコキシド類を有機用在中において、塩酸、硝
酸、リン酸、酢酸等の酸性触媒または水酸化ナトリウ,
水酸化カリウム等の塩基性触媒の存在下に加水分解し、
縮重合させた重合度2〜20のシランアルコキシド重合体
類、シランアルコキシド類またはその重合体類に酢酸,
プロピオン酸,酪酸等のカルボン酸類を反応させて得ら
れるアシル化体類、シランアルコキシド類またはその重
合体類に、アセシルアセトン,ベンゾイルアセトン等の
β−ジケトン類、アセト酢酸,プロピオニル酪酸等のケ
ト酸類、ケト酸の低級アルキルエステル類、グリコール
酸,乳酸等のオキシ酸類、オキシ酸の低級アルキルエス
テル類、ジオール類、アミノアルコール類などのキレー
ト化剤を反応させて得られるキレート化体類などを挙げ
ることができる。これらの化合物は1種の単独または2
種以上の混合物として使用できる。The organometallic compounds used in the present invention are those which are soluble in organic solvents and which are thermally decomposable with the oxygen directly bonded or coordinated to the metal atom. Organic Si
Specific examples of the compounds include dimethyldimethoxysilane, diethyldiethoxysilane, dimethyldiisopropoxysilane, diethyldibutoxysilane, methyltrimethoxysilane, ethyltriethoxysilane, methyltriethoxysilane, methyltriisopropoxysilane, ethyl. Silane alkoxides having the same or different substituents, such as tributoxysilane, tetramethoxysilane, tetraethoxysilane, tetraisopropoxysilane, tetrabutoxysilane, dimethoxydiethoxysilane, diethoxydiisopropoxysilane, the same or different. When silane alkoxides are used in organic storage, acidic catalysts such as hydrochloric acid, nitric acid, phosphoric acid, acetic acid, etc. or sodium hydroxide,
Hydrolyzes in the presence of a basic catalyst such as potassium hydroxide,
Polycondensation silane alkoxide polymers having a degree of polymerization of 2 to 20, silane alkoxides or their polymers, and acetic acid,
Acylated products obtained by reacting carboxylic acids such as propionic acid and butyric acid, silane alkoxides or polymers thereof, and β-diketones such as acetylacetone and benzoylacetone, ketoacetoacetate and propionyl butyric acid, etc. For example, chelating compounds obtained by reacting acids, lower alkyl esters of keto acids, oxy acids such as glycolic acid and lactic acid, lower alkyl esters of oxy acids, diols, amino alcohols, etc. Can be mentioned. These compounds may be used alone or in combination of 2
It can be used as a mixture of two or more species.
Si化合物以外の金属化合物として、前記Si化合物と同
様の置換基を有する化合物を使用することができる。As the metal compound other than the Si compound, a compound having the same substituent as the Si compound can be used.
有機溶剤として、前記有機金属化合物を溶解し得るも
のであれば特に制限はなく、メタノール,エタノール,
イソプロパノール,ブタノール等の低級アルコール類、
酢酸メチル,酢酸エチル等のエステル類、前記したβ−
ジケトン類、ケト酸類、ケトエステル類などの単独溶剤
または2種以上の混合溶剤が好ましく使用される。さら
に好ましくは、有機金属化合物の溶解性、該溶液の基材
への塗布性および熱分解性に優れる低級アルコール類を
主体とする溶剤を使用する。The organic solvent is not particularly limited as long as it can dissolve the organometallic compound, and methanol, ethanol,
Lower alcohols such as isopropanol and butanol,
Esters such as methyl acetate and ethyl acetate, the aforementioned β-
A single solvent such as diketones, keto acids, ketoesters or a mixed solvent of two or more kinds is preferably used. More preferably, a solvent containing a lower alcohol as a main component, which is excellent in the solubility of the organometallic compound, the coating property of the solution on the substrate, and the thermal decomposability, is used.
有機金属化合物溶液は、前記有機金属化合物の1種も
しくは置換基および/または金属種の異る2種以上を前
記有機溶剤に溶解したものであり、所望により、リン酸
等のリン化合物、ホウ酸等のホウ素化合物などのガラス
質形成剤などの添加剤を含有するものも含まれる。該溶
液中の有機金属化合物の濃度は、有機金属化合物および
溶剤の種類、該溶液の基材表面への塗布法等により異る
が、通常、当該有機金属化合物を熱分解して生成する金
属酸化物に換算して1〜20重量%である。有機金属化合
物溶液として、Si,Ti,Ta,Nb等の多くの金属種について
市販されている金属酸化物形成用組成物も使用すること
ができる。The organometallic compound solution is one obtained by dissolving one kind or a substituent of the organometallic compound and / or two or more kinds having different metal species in the organic solvent, and if desired, a phosphorus compound such as phosphoric acid or boric acid. And those containing additives such as glass forming agents such as boron compounds. The concentration of the organometallic compound in the solution varies depending on the types of the organometallic compound and the solvent, the coating method of the solution on the surface of the base material, and the like, but is usually a metal oxide produced by thermal decomposition of the organometallic compound. It is 1 to 20% by weight in terms of the product. As the organic metal compound solution, a metal oxide forming composition which is commercially available for many metal species such as Si, Ti, Ta and Nb can also be used.
一方、添加成分である疎水性可塑剤は、室温における
水に対する溶解度が10g/100gH2O以下の可塑剤類であ
る。たとえば、フタル酸メチル,フタル酸エチル,フタ
ル酸ブチル,フタル酸オクチル等のフタル酸エステル
類,アジピン酸ブチル,アジピン酸オクチル,セバシン
酸オクチル等の脂肪族の二塩基酸エステル類、アセチル
リシノール酸メチル,アセチルクエン酸トリー(2エチ
ルヘキシル)等のオキシ酸エステル類、ジエチレングリ
コールジベンゾアート等のグリコールエステル類、オレ
イン酸ブチル,オレイン酸テトラヒドロフルフリル等の
脂肪酸エステル類、リン酸トリブチル,リン酸トリフエ
ニル,リン酸トリ−2エチルヘキシル等のリン酸エステ
ル類、塩素化パラフィン類、ポリエステル類、ポリエー
テルポリオール類等が使用できる。On the other hand, the hydrophobic plasticizer as an additive component is a plasticizer having a solubility in water at room temperature of 10 g / 100 g H 2 O or less. For example, phthalic acid esters such as methyl phthalate, ethyl phthalate, butyl phthalate and octyl phthalate, aliphatic dibasic acid esters such as butyl adipate, octyl adipate and octyl sebacate, and methyl acetylricinoleate. , Oxyacid esters such as acetyl citrate tree (2 ethylhexyl), glycol esters such as diethylene glycol dibenzoate, fatty acid esters such as butyl oleate and tetrahydrofurfuryl oleate, tributyl phosphate, triphenyl phosphate, phosphate Phosphoric acid esters such as tri-2 ethylhexyl, chlorinated paraffins, polyesters, polyether polyols and the like can be used.
本発明の粗面被覆形成用組成物は、前記有機金属化合
物溶液に対し、前記疎水性可塑剤を100ppmないし10wt%
添加含有された溶液である。The composition for forming a rough surface coating of the present invention contains 100 ppm to 10 wt% of the hydrophobic plasticizer in the organometallic compound solution.
It is a solution containing addition.
本発明において、前記粗面被膜形成用組成物を基材表
面を塗布し、大気中において乾燥して塗膜を形成した
後、該塗膜中の有機物を熱分解することにより、該基板
上に粗面被膜が形成される。粗面被膜形成用組成物の基
材表面への塗布法には特に制限はなく、ディッピング
法,スプレー法,スピンナー法,刷毛塗り法,印刷法等
の塗布法を、被膜形成の対象とする基材の形状等を考慮
して適宜選択する。該組成物を塗布した基材の乾燥を、
大気中、必要があれば水蒸気の存在下に常温ないし150
℃の加温下に行うことにより、該基材表面に有機金属化
合物を主体とする塗膜が形成される。ついで該塗膜を加
熱し、該塗膜中の有機物を熱分解することにより、金属
酸化物を主体とする粗面被膜が基材表面に形成する。熱
分解温度を適宜選択することにより、一部有機物の残留
する金属化合物、一部水酸基の残留する金属酸化物、非
晶質の金属酸化物および結晶質の金属酸化物の硬化粗面
被膜を基材表面に形成することができる。有機金属化合
物、疎水性可塑剤および有機溶剤の種類により異なる
が、熱分解温度が80〜250℃で、一部有機物の残留する
金属化合物の硬化膜を、150〜300℃で水酸基の残留する
金属酸化物被膜を、250〜600℃で非晶質の金属酸化物被
膜を、また350℃以上で結晶質の金属酸化物被膜を形成
することができる。In the present invention, the surface of the substrate is coated with the composition for forming a rough surface coating, dried in the atmosphere to form a coating film, and then the organic matter in the coating film is thermally decomposed to form a film on the substrate. A rough film is formed. There is no particular limitation on the method for applying the rough surface film-forming composition to the surface of the base material, and a coating method such as a dipping method, a spray method, a spinner method, a brush coating method or a printing method The material is appropriately selected in consideration of the shape and the like. Drying the substrate coated with the composition,
In the air, if necessary, in the presence of water vapor at room temperature to 150
By performing the heating at a temperature of ℃, a coating film mainly composed of an organometallic compound is formed on the surface of the base material. Then, the coating film is heated to thermally decompose organic substances in the coating film, thereby forming a rough surface coating mainly composed of a metal oxide on the surface of the substrate. By appropriately selecting the thermal decomposition temperature, a cured rough surface coating of a metal compound in which some organic substances remain, a metal oxide in which some hydroxyl groups remain, an amorphous metal oxide and a crystalline metal oxide It can be formed on the material surface. Depending on the type of organometallic compound, hydrophobic plasticizer, and organic solvent, a cured film of a metal compound with a partial organic residue at a thermal decomposition temperature of 80 to 250 ° C and a metal with a hydroxyl group remaining at 150 to 300 ° C It is possible to form an oxide film, an amorphous metal oxide film at 250 to 600 ° C, and a crystalline metal oxide film at 350 ° C or higher.
本発明の方法で形成される粗面被膜を金属酸化物の例
で例示すると、SiO2,TiO2,Ta2O5,Al2O3,ZrO2,In2O3,HfO
2,La2O3,Nb2O3,PbO,Sb2O4,SnO2,Y2O3,WO3,Fe2O3等の単
独または2種以上の混合物もしくは2種以上を含有する
複合酸化物が挙げられる。The rough surface coating formed by the method of the present invention is exemplified by an example of a metal oxide, SiO 2 , TiO 2 , Ta 2 O 5 , Al 2 O 3 , ZrO 2 , In 2 O 3 and HfO.
Containing 2, La 2 O 3, Nb 2 O 3, PbO, Sb 2 O 4, SnO 2, Y 2 O 3, WO 3, Fe 2 O 3 mixture or two or more single or two or more of such A complex oxide may be used.
本発明において、添付第1図(a)〜(e)に示す如
く、表面に凹凸のある粗面被膜が基材表面に形成され
る。粗面被膜形成用組成物中の疎水性可塑剤の含有量が
約100ppmから粗面化の効果が出始め、5〜10wt%では半
透明の粗面被膜が形成される。In the present invention, as shown in FIGS. 1 (a) to 1 (e) attached, a rough surface coating having irregularities is formed on the surface of the substrate. The roughening effect begins to appear when the content of the hydrophobic plasticizer in the composition for forming a rough surface coating is about 100 ppm, and a translucent rough surface coating is formed when the content is 5 to 10 wt%.
また、本発明において、添付第2図中に示す如く、光
透過率を低下させることなく光反射率を低下させ得る粗
面被膜を形成することができる。Further, in the present invention, as shown in FIG. 2 attached, it is possible to form a rough surface coating capable of reducing the light reflectance without lowering the light transmittance.
すなわち本発明において、粗面被膜形成用組成物中の
塑水性可塑剤の添加含有量を調節することにより、形成
される被膜の粗面度、光反射率および透過率を任意に調
節することができる。That is, in the present invention, by adjusting the addition content of the plastic water-based plasticizer in the composition for forming a rough surface coating, it is possible to arbitrarily adjust the roughness, light reflectance and transmittance of the coating formed. it can.
本発明において粗面被膜は、基材表面に塗布した粗面
被膜形成用組成物を乾燥して塗膜を形成するに際し、大
気中のまたは必要により供給される水蒸気を塗膜が吸収
し、塗膜中に存在する疎水性可塑剤を核としてミセル構
造を形成するものと推定され、熱分解によりミセル化さ
れた部分とミセル化されていない部分との間に段差を生
じ、粗面被膜が形成されるものと推定される。In the present invention, the rough surface coating, when the composition for forming a rough surface coating applied to the surface of the substrate is dried to form a coating film, the coating film absorbs water vapor in the air or supplied as necessary, It is presumed that the hydrophobic plasticizer present in the film forms the core of the micelle structure, and a step is created between the micelle part and the non-micelle part due to thermal decomposition, and a rough surface film is formed. Presumed to be done.
本発明を実施例により、さらに詳細に説明する。 The present invention will be described in more detail by way of examples.
ただし、本発明の範囲は、下記実施例により何等限定
されるものではない。However, the scope of the present invention is not limited to the following examples.
実施例1および比較例1 粗面被膜形成用組成物の調製: テトラエトキシシラン;186g,エターノル;634g,酢酸;2
06gおよび濃塩酸;0.3gを混合し、加熱して還流下に45時
間保持して反応させ、SiO2に換算した濃度が5.0wt%の
シランアルコキシド重合体のアシル化体溶液を得た。Example 1 and Comparative Example 1 Preparation of composition for forming rough surface coating: tetraethoxysilane; 186 g, ethanol; 634 g, acetic acid; 2
06 g and concentrated hydrochloric acid; 0.3 g were mixed, heated and held under reflux for 45 hours to cause a reaction, to obtain an acylated solution of a silane alkoxide polymer having a concentration converted to SiO 2 of 5.0 wt%.
得られたシランアルコキシド重合体溶液に、疎水性可
塑剤としてフタル酸オクチル(DOP)、分子量約300のポ
リプロピレングリコール(PPG−300)または分子量約1,
000のポリプロピレングリコール(PPG−1,000)を添加
混合し、粗面被膜形成用組成物を調製した。The obtained silane alkoxide polymer solution was added with octyl phthalate (DOP) as a hydrophobic plasticizer, polypropylene glycol (PPG-300) having a molecular weight of about 300 or about 1,
000 polypropylene glycols (PPG-1,000) were added and mixed to prepare a rough surface film-forming composition.
調製した粗面被膜形成用組成物の使用を第1表中に示
す。The use of the prepared rough surface film-forming composition is shown in Table 1.
粗面被膜の形成: 前記調製した粗面被膜形成用組成物にソーダガラス板
を浸漬し、引上げ速度を一定にして引上げ、大気中にお
いて乾燥した後、500℃の温度に30分間保持して焼成
し、ソーダガラス板の両面にSiO2粗面被膜を形成した。Formation of rough surface coating: A soda glass plate is dipped in the prepared composition for forming a rough surface coating, pulled at a constant pulling rate, dried in air, and then held at a temperature of 500 ° C for 30 minutes to be baked. Then, a SiO 2 rough surface coating was formed on both surfaces of the soda glass plate.
比較として疎水性可塑剤無添加の前記合成したシラン
アルコキシド重合体溶液を用いてソーダガラス板の両面
にSiO2被膜を形成した。For comparison, a SiO 2 coating was formed on both sides of a soda glass plate using the above-prepared silane alkoxide polymer solution without addition of a hydrophobic plasticizer.
被膜形成条件を第1表中に示す。 The film forming conditions are shown in Table 1.
粗面度測定: 前記形成されたSiO2粗面被膜の粗面度を薄膜段差測定
装置(小坂研究所製)を用いて測定した。試料番号1−
1,1−2,1−3,1−6および1−7の粗面度測定曲線を添
付第1図(a)〜(e)に示す。Roughness measurement: The roughness of the formed SiO 2 rough surface coating was measured using a thin film step measuring device (manufactured by Kosaka Laboratory). Sample number 1-
The roughness measurement curves of 1,1-2, 1-3, 1-6 and 1-7 are shown in FIGS. 1 (a) to 1 (e).
光学特性測定: 前記SiO2粗面被膜を形成したソーダガラス板の可視光
の透過率:T(%)および反射率:R(%)を測定した。Optical property measurement: The visible light transmittance: T (%) and reflectance: R (%) of the soda glass plate on which the SiO 2 rough surface coating was formed were measured.
試料番号1−3,1−4,1−5および1−7ならびに比較
としたソーダガラス板の光学特性曲線を添付第2図に示
す。The optical characteristic curves of the sample numbers 1-3, 1-4, 1-5 and 1-7 and the soda glass plate for comparison are shown in FIG.
実施例2 エタノール;650g,酢酸ブチル;250g,およびアセチルア
セトン;150gからなる混合溶液に、下記組成式 で表されるチタンアルコキシド重合体を溶解しTiO2換算
濃5.0wt%の溶液を得た。得られた溶液に、PPG−1000;5
00ppmまたはDOP;500ppmを添加混合し、粗面被膜形成組
成物を調製した。 Example 2 In a mixed solution of ethanol; 650 g, butyl acetate; 250 g, and acetylacetone; 150 g, the following composition formula was added. The titanium alkoxide polymer represented by the following formula was dissolved to obtain a solution of concentrated 5.0 wt% in terms of TiO 2 . The resulting solution, PPG-1000; 5
00 ppm or DOP; 500 ppm was added and mixed to prepare a rough surface film forming composition.
調製した粗面被膜形成用組成物にソーダガラス板を浸
漬し、引上げ速度20cm/minの一定速度で引上げ、大気中
において乾燥した後、500℃の温度に30分間保持して焼
成し、ソーダガラス板の両面にTiO2粗面被膜を形成し
た。Dip a soda glass plate in the prepared composition for forming a rough surface coating, pulling it at a constant pulling speed of 20 cm / min, and after drying in the air, hold it at a temperature of 500 ° C. for 30 minutes and burn it, soda glass A TiO 2 rough surface coating was formed on both sides of the plate.
得られた粗面被膜の粗面度を実施例1と同一の装置を
用いて測定した結果、添付第1図(b)に示す曲線と近
似する曲線が得られた。The roughness of the obtained rough surface coating was measured using the same apparatus as in Example 1, and as a result, a curve similar to the curve shown in FIG. 1 (b) was obtained.
実施例3 メチルエトキシシラン;200g,テトラエトキシシラン;2
50g,エタノール;880gおよび20%塩酸;1.5gを混合し、70
℃に加温して、水;150gを滴下し、さらに70℃の温度に
5時間保持して反応を完結させ、SiO2換算濃度10wt%の
シランアルコシド重合体溶液を得た。Example 3 Methylethoxysilane; 200 g, tetraethoxysilane; 2
Mix 50g, ethanol; 880g and 20% hydrochloric acid; 1.5g, 70
The mixture was heated to 0 ° C., 150 g of water was added dropwise, and the temperature was maintained at 70 ° C. for 5 hours to complete the reaction to obtain a silane alcoside polymer solution having a SiO 2 conversion concentration of 10 wt%.
得られたシランアルコキシド重合体溶液にPPG−1,000
を5wt%添加し、粗面被膜形成用組成物を調製した。PPG-1,000 was added to the obtained silane alkoxide polymer solution.
Was added in an amount of 5 wt% to prepare a composition for forming a rough surface film.
調製した粗面被膜形成用組成物のスピンナーを用いて
ステンレス鋼板(SUS304)上に1μmの膜厚となるよう
塗布した後、大気中において乾燥し、ついで、350℃に3
0分間保持焼成し、SUS板上にSiO2粗面被膜を形成した。A spinner of the prepared composition for forming a rough surface coating was applied to a stainless steel plate (SUS304) so as to have a film thickness of 1 μm, then dried in the air, and then heated to 350 ° C. for 3 days.
It was held and baked for 0 minutes to form a SiO 2 rough surface coating on the SUS plate.
形成されたSiO2粗面被膜は、セロテープ剥離試験にお
いて剥離の認められない密着性の良好なつや消し膜であ
った。The formed SiO 2 rough surface coating was a matte film with good adhesion and no peeling observed in the cellotape peeling test.
実施例4 実施例3で得たシランアルコキシド重合体溶液に、DO
P;500ppmを添加し粗面被膜形成組成物を調製した。Example 4 The silane alkoxide polymer solution obtained in Example 3 was treated with DO.
P; 500 ppm was added to prepare a rough film-forming composition.
調製した組成物に、ポリカーボネート板を浸漬し、引
上げ速度30cm/minの一定速度引上げ、風乾した。つい
で、100℃に2時間保持して熱処理し、両面にシランア
ルコキド重合体の硬化被膜を形成した。A polycarbonate plate was dipped in the prepared composition, pulled up at a constant rate of a pulling rate of 30 cm / min, and air-dried. Then, it was kept at 100 ° C. for 2 hours and heat-treated to form a cured film of the silane alkoxide polymer on both surfaces.
得られた硬化被膜は、鉛筆硬度が3Hの密着性の良好な
つや消し膜であった。The obtained cured film was a matte film having a pencil hardness of 3H and good adhesion.
本発明において、前記実施例に示す如く、本発明の粗
面被膜形成用組成物を用い、塗布、乾燥および熱硬化処
理という簡単な操作で、各種の基材表面に添付第1図に
示す如き金属化合物の粗面被膜を形成することができ
る。また、粗面被膜形成用組成物に添加含有させる疎水
性可塑剤の種類および添加量を選択することにより形成
される粗面被膜の粗面度を任意に調節することができ、
結果として、粗面被膜を形成した基板の光学特性すなわ
ち光反射率および光透過率を調節することができる。In the present invention, as shown in the above-mentioned Examples, the composition for forming a rough surface film of the present invention is used to perform various operations such as coating, drying and heat curing treatment on various substrate surfaces, as shown in FIG. A rough surface coating of a metal compound can be formed. Further, the roughness of the rough surface coating formed by selecting the type and addition amount of the hydrophobic plasticizer to be added to the composition for forming a rough surface coating can be arbitrarily adjusted,
As a result, it is possible to adjust the optical properties, that is, the light reflectance and the light transmittance, of the substrate on which the rough surface coating is formed.
本発明において、従来から使用されている反射防止膜
およびつや消膜を基材表面を形成することができるばか
りでなく、第2図中に示す如く反射率を低下させ、か
つ、透過率を向上させる粗面被膜を形成することができ
る。この粗面被膜は、太陽熱吸収膜として極めて有用で
ある。In the present invention, not only the antireflection film and the matte film which have been conventionally used can be formed on the surface of the base material, but also the reflectance is lowered and the transmittance is improved as shown in FIG. A rough surface coating can be formed. This rough surface coating is extremely useful as a solar heat absorbing film.
本発明は、基板上に有機金属化合物の粗面被膜を形成
するに適した粗面被膜形成用組成物および粗面被膜形成
方法を提供するものであり、産業上の意義は極めて大き
い。The present invention provides a composition for forming a rough surface coating and a method for forming a rough surface coating, which are suitable for forming a rough surface coating of an organometallic compound on a substrate, and are of great industrial significance.
第1図は、実施例1で得られた粗面被膜の粗面度を表す
曲線 (a)実施例番号1−1で得られた粗面被膜の粗面度曲
線 (b)実施例番号1−2で得られた粗面被膜の粗面度曲
線 (c)実施例番号1−3で得られた粗面被膜の粗面度曲
線 (d)実施例番号1−6で得られた粗面被膜の粗面度曲
線 (e)実施例番号1−7で得られた粗面被膜の粗面度曲
線 第2図は、実施例1で得られた粗面被膜を形成したガラ
ス板の光学特性曲線 (T−a)(R−a)実施例番号1−3のガラス板の光
透過率および光反射率 (T−b)(R−b)実施例番号1−4のガラス板の光
透過率および光反射率 (T−c)(R−c)実施例番号1−5のガラス板の光
透過率および光反射率 (T−d)(R−d)実施例番号1−7のガラス板の光
透過率および光反射率 (T−e)(R−e)比較のための無被覆ガラス板の光
透過率および光反射率1 is a curve showing the roughness of the rough surface coating obtained in Example 1 (a) The roughness surface curve of the rough surface coating obtained in Example No. 1-1 (b) Example No. 1 Roughness curve of the rough surface coating obtained in No.-2 (c) Roughness curve of the rough surface coating obtained in Example No. 1-3 (d) Roughness surface obtained in Example No. 1-6 Roughness Curve of Coating (e) Roughness Curve of Roughness Coating Obtained in Example No. 1-7 FIG. 2 is an optical characteristic of the glass plate formed with the roughening coating obtained in Example 1. Curve (T-a) (R-a) Light transmittance and light reflectance of glass plate of Example No. 1-3 (T-b) (R-b) Light transmission of glass plate of Example No. 1-4 And Light Reflectance (T-c) (R-c) Light Transmittance and Light Reflectance (T-d) (R-d) of Example No. 1-5 Glass Plate of Example No. 1-7 Light transmittance and light reflection of plate (T-e) (R-e) Light transmittance and light reflectance of uncoated glass plate for comparison
Claims (6)
WまたはFeのアルコキシド類、アルコキシド重合体類、
キレート化体類およびアシル化体類よりなる群から選ば
れた有機金属化合物の1種または2種以上と溶剤とから
なる有機金属化合物溶液に、室温で液状の疎水性可塑剤
を添加含有させてなる粗面被膜形成用組成物。1. Si, Ti, Ta, Al, Zr, In, Hf, La, Nb, Pb, Sb, Sn, Y,
W or Fe alkoxides, alkoxide polymers,
A hydrophobic plasticizer, which is liquid at room temperature, is added to an organometallic compound solution consisting of a solvent and one or more organometallic compounds selected from the group consisting of chelating compounds and acylating compounds. For forming a rough surface film.
肪族の三塩基酸エステル類、オキシ酸エステル類、グリ
コールエステル類、脂肪酸エステル類、リン酸エステル
類、塩素化パラフイン類、ポリエステル類およびポリエ
ーテルポリオール類よりなる群から選ばれた1種または
2種以上である特許請求の範囲第(1)項記載の組成
物。2. The hydrophobic plasticizer is a phthalic acid ester, an aliphatic tribasic acid ester, an oxyacid ester, a glycol ester, a fatty acid ester, a phosphoric acid ester, a chlorinated paraffin, or a polyester. The composition according to claim (1), which is one kind or two or more kinds selected from the group consisting of and polyether polyols.
液に対して100ppmないし10wt%である特許請求の範囲第
(1)項記載の組成物。3. The composition according to claim 1, wherein the added amount of the hydrophobic plasticizer is 100 ppm to 10 wt% with respect to the organometallic compound solution.
WまたはFeのアルコキシド類、アルコキシド重合体類、
キレート化体類およびアシル化体類よりなる群から選ば
れた有機金属化合物の1種または2種以上と溶剤とから
なる有機金属化合物溶液に、室温で液状の疎水性可塑剤
を添加含有させてなる粗面被膜形成用組成物を、基材表
面に塗布・乾燥し、形成された塗膜を熱分解することを
特徴とする粗面被膜形成方法。4. Si, Ti, Ta, Al, Zr, In, Hf, La, Nb, Pb, Sb, Sn, Y,
W or Fe alkoxides, alkoxide polymers,
A hydrophobic plasticizer, which is liquid at room temperature, is added to an organometallic compound solution consisting of a solvent and one or more organometallic compounds selected from the group consisting of chelating compounds and acylating compounds. A method for forming a rough surface coating, which comprises applying the composition for forming a rough surface coating to a substrate surface and drying the composition, and thermally decomposing the formed coating film.
または水蒸気の存在下に、常温ないし150℃の温度で行
う特許請求の範囲第(4)項記載の方法。5. The method according to claim 4, wherein the composition coated on the surface of the substrate is dried in the atmosphere or in the presence of water vapor at a temperature from room temperature to 150 ° C.
上の温度で行う特許請求の範囲第(4)項記載の方法。6. The method according to claim 4, wherein the thermal decomposition of the coating film formed on the surface of the base material is carried out at a temperature of 80 ° C. or higher.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59168495A JPH0823071B2 (en) | 1984-08-10 | 1984-08-10 | Rough surface coating forming composition and rough surface coating forming method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59168495A JPH0823071B2 (en) | 1984-08-10 | 1984-08-10 | Rough surface coating forming composition and rough surface coating forming method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6148571A JPS6148571A (en) | 1986-03-10 |
| JPH0823071B2 true JPH0823071B2 (en) | 1996-03-06 |
Family
ID=15869142
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59168495A Expired - Lifetime JPH0823071B2 (en) | 1984-08-10 | 1984-08-10 | Rough surface coating forming composition and rough surface coating forming method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0823071B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01132770A (en) * | 1987-08-20 | 1989-05-25 | Central Glass Co Ltd | Composition for titanium-containing oxide film and formation of said film |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5538428A (en) * | 1978-09-09 | 1980-03-17 | Toshiba Electric Appliance Co Ltd | Horizontal pot-type incinerator |
| US4269903A (en) * | 1979-09-06 | 1981-05-26 | General Motors Corporation | Abradable ceramic seal and method of making same |
| JPS5721490A (en) * | 1980-07-14 | 1982-02-04 | Hitachi Ltd | Dehydration and storage of coal-water pulp |
-
1984
- 1984-08-10 JP JP59168495A patent/JPH0823071B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6148571A (en) | 1986-03-10 |
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