deposition reactionとは 意味・読み方・使い方

To provide a film deposition apparatus, and a film deposition method having the high rate of film deposition on a surface of an object for film deposition by the reaction of sputter particles or evaporation particles.例文帳に追加

スパッタ粒子または蒸発粒子を反応させることによる成膜対象物表面の成膜の成膜速度が速い成膜装置および成膜方法の提供。 - 特許庁

This device for producing polycrystalline silicon includes: a reaction tube in which a silicon deposition reaction occurs; a fluid gas-feeding part which feeds a fluid gas to silicon particles in the reaction tube; and a means which keeps the reaction temperature constant when the silicon deposition reaction occurs in the reaction tube.例文帳に追加

内部でシリコン析出反応が起きる反応管と、前記反応管内のシリコン粒子に流動ガスを供給する流動ガス供給部と、前記反応管の内部でシリコン析出反応時に反応温度を一定に維持させるための手段と、を含む。 - 特許庁

To suppress the generation of film deposition defects caused by residue upon film deposition while efficiently cleaning a deposited film stuck to a reaction chamber upon the film deposition.例文帳に追加

成膜時に反応室に付着した堆積膜を効率良く洗浄しつつ、成膜時の残渣に起因する成膜欠陥の発生を抑制する。 - 特許庁

To stop film deposition reaction in an extreme short period of time and suppress overshoot.例文帳に追加

成膜反応を極めて短時間で停止させ、オーバーシュートを抑制する。 - 特許庁

On the wall surface of the reaction chamber, to which an effect of plasma is very small, the deposition of the reaction product is controlled, by changing the deposition seed to a volatile substance(SiF4 etc).例文帳に追加

プラズマの影響が極めて小さい反応室壁面等ではデポ種を揮発性物質（ＳｉＦ4 等）に代えて、反応生成物の付着を抑制する。 - 特許庁

The temperature T_L of the reaction liquid L of the chemical bath deposition process is equal to or higher than 70°C.例文帳に追加

化学浴析出法の反応液Ｌの温度Ｔ_Ｌは７０℃以上である。 - 特許庁

To provide a method where the deposition of sludge is prevented, and reaction is efficiently performed.例文帳に追加

汚泥の堆積を防止して反応を効率よく行わせる方法を提供する。 - 特許庁

To manufacture a synthetic gas while reaction at high temperature and carbon deposition are kept under control.例文帳に追加

高温での反応および炭素析出を抑制しつつ、合成ガスを製造する。 - 特許庁