JP7196453B2 - table equipment - Google Patents

Description

The present invention relates to a table device.

2. Description of the Related Art A transport device, a machine tool, or a semiconductor manufacturing device uses a table device that slides and positions a table in a process chamber in a vacuum atmosphere or a special gas atmosphere (see, for example, Patent Document 1). In such a table device, a rolling guide device may be used to move the table on a plane.

JP-A-11-287880

The table device may be used in a vacuum atmosphere shielded by a partition wall, a process chamber in a special gas atmosphere, a clean environment, or the like. When the rolling guide device moves on the surface of the partition wall, wear may occur due to contact between the rolling guide device and the partition wall.

SUMMARY OF THE INVENTION An object of the present invention is to provide a table device capable of improving wear resistance.

In order to achieve the above object, a table device according to an aspect of the present invention has a first surface and a second surface opposite to the first surface, and a first space on the side of the first surface and a , a plate member that separates the second space from the second surface, a first substrate that faces the first surface of the plate member, and a surface of the first substrate that faces the first surface. a moving mechanism provided in the first space for moving the first substrate; a second substrate facing the first substrate via the plate member; A second attractive force provided on a surface of two substrates facing the second surface, facing the first attractive force generating section via the plate-like member, and generating an attractive force between the substrate and the first attractive force generating section. and a rolling guide device provided between the second substrate and the second surface for movably supporting the second substrate, wherein the rolling guide device is attached to the second substrate. It has a connected base, and a rolling element rotatably provided on the base, the surface of which is provided with a solid lubricating film.

Thereby, the first space in which the moving mechanism and the like are provided and the second space in which the second substrate and the like are provided are separated by the plate member. An attractive force acts on the second substrate in a direction toward the first substrate due to the attractive force between the first attractive force generating portion and the second attractive force generating portion. Accordingly, when the first substrate is moved by the operation of the moving mechanism, the second substrate provided in the second space moves following the first substrate. A solid lubricating film is provided on the rolling elements of the rolling guide device. Therefore, in the stage device, friction between the plate-like member and the rolling elements is reduced, and wear of the plate-like member and the rolling elements can be suppressed. Therefore, the stage device can improve wear resistance.

As a desirable aspect of the table device, the rolling element is in contact with the second surface of the plate-like member, and at least the second surface of the plate-like member is subjected to surface modification. According to this, the hardness of the plate member is improved. Therefore, the stage device can suppress wear caused by contact between the plate member and the rolling element, and can maintain cleanliness in the usage environment.

As a desirable aspect of the table device, the solid lubricating film is a fluorine oil baked film. According to this, the stage device can reduce the friction between the plate member and the rolling elements by applying the fluorinated oil baking film to the surfaces of the rolling elements.

As a desirable aspect of the table device, it has a parallelism adjusting structure capable of adjusting the inclination of the plate member with respect to a plane parallel to the surface of the first substrate. According to this, parallelism between the plate member and the first substrate can be improved by the parallelism adjusting structure. Therefore, even when the first substrate moves, the stage device can suppress a change in the distance between the first attractive force generating portion and the second attractive force generating portion. It is possible to suppress the change in the magnetic force that is applied. Therefore, the stage device can suppress the application of a large load locally to the plate-like member, thereby suppressing wear of the plate-like member and the rolling elements.

As a desirable aspect of the table device, the parallelism adjusting structure includes a plate-like member base facing the plate-like member, a support member provided on the plate-like member base and supporting the plate-like member, and the support member and a plate-like member fixing portion to which the plate-like member is fixed, and a spacer provided between the supporting member and the plate-like member fixing portion. According to this, by adjusting the number and thickness of the spacers, the parallelism adjusting structure can adjust the parallelism between the plate member and the first substrate.

A table device according to an aspect of the present invention has a first surface and a second surface opposite to the first surface, and includes a first space on the side of the first surface and a space on the side of the second surface. a first substrate facing the first surface of the plate-like member; and a first attractive force generating portion provided on a surface of the first substrate facing the first surface. a moving mechanism provided in the first space for moving the first substrate; a second substrate facing the first substrate via the plate-shaped member; and the second surface of the second substrate. a second attractive force generating portion provided on a surface facing the plate-like member, facing the first attractive force generating portion through the plate-shaped member, and generating an attractive force between the first attractive force generating portion and the second substrate; a rolling guide device provided between and the second surface to movably support the second substrate; an adjustment structure, wherein the parallelism adjustment structure includes a plate-like member base that faces the plate-like member; a support member that is provided on the plate-like member base and supports the plate-like member; A plate-like member fixing portion provided on the upper side of the member to which the plate-like member is fixed, and a spacer provided between the support member and the plate-like member fixing portion.

According to this, by adjusting the number and thickness of the spacers, the parallelism adjusting structure can adjust the parallelism between the plate member and the first substrate. Therefore, the stage device can suppress the application of a large load locally to the plate-like member, thereby suppressing wear of the plate-like member and the rolling elements.

ADVANTAGE OF THE INVENTION According to this invention, abrasion resistance can be improved.

1 is a perspective view of a table device according to a first embodiment; FIG. FIG. 2 is a cross-sectional view taken along line AA in FIG. FIG. 3 is a plan view of the first substrate. FIG. 4 is a perspective view of the second table. FIG. 5 is a plan view of the second substrate of the second table. FIG. 6 is a cross-sectional view of the rolling guide device of the second table. FIG. 7 is a side view showing an example of the second moving mechanism. FIG. 8 is a perspective view of a housing included in the table device according to the second embodiment. 9 is a cross-sectional view taken along line AA in FIG. 8. FIG. FIG. 10 is a plan view of the housing. FIG. 11 is a cross-sectional view of the table device according to the third embodiment.

Hereinafter, the present invention will be described in detail with reference to the drawings. It should be noted that the present invention is not limited by the following modes for carrying out the invention (hereinafter referred to as embodiments). In addition, components in the following embodiments include those that can be easily assumed by those skilled in the art, those that are substantially the same, and those that fall within a so-called equivalent range. Furthermore, the constituent elements disclosed in the following embodiments can be combined as appropriate.

(First embodiment)
1 is a perspective view of a table device according to a first embodiment; FIG. FIG. 2 is a cross-sectional view taken along line AA in FIG. FIG. 3 is a plan view of the first substrate. FIG. 4 is a perspective view of the second table. FIG. 5 is a plan view of the second substrate of the second table. FIG. 6 is a cross-sectional view of the rolling guide device of the second table. FIG. 7 is a side view showing an example of the second moving mechanism.

As shown in FIG. 1 , the table device 1 includes a housing 2 , a first table 3 , a second table 4 , a first moving mechanism 6 and a second moving mechanism 7 . The first table 3 , the first moving mechanism 6 and the second moving mechanism 7 are provided in the first space P inside the housing 2 . A second table 4 is provided in a second space R outside the housing 2 . The second space R is a space for maintaining a specific environment and performing positioning, processing, inspection, etc. of an operation target. The second space R may be any space that can maintain a specific environment suitable for work. The second space R can be applied to various environments such as vacuum, reduced pressure, gas replacement (reduced pressure or positive pressure), different temperature space, clean environment, and foreign matter environment. For example, the table device 1 is used for bio applications such as collection of samples such as cells and various tests. In this case, the second space R is a clean environment, and the second table 4 in the second space R is sterilized by high-temperature steam sterilization, dry heat sterilization, or the like.

The housing 2 includes a plate member 21 . The plate-like member 21 is a plate-like member extending in a direction perpendicular to the side surface of the housing 2 and provided integrally with the housing 2 . The first space P and the second space R are separated by a plate member 21 . In this embodiment, the plate member 21 is a non-magnetic material, and non-magnetic stainless steel or the like is used. Non-magnetic stainless steels include alloy austenitic stainless steels (such as SUS316, for example).

In this embodiment, one direction in the horizontal plane is the X direction, the direction intersecting the X direction in the horizontal plane is the Y direction, and the direction intersecting the X direction and the Y direction (that is, the vertical direction) is the Z direction. and The plate member 21 is parallel to a plane formed by the X direction and the Y direction.

As shown in FIG. 2, the plate member 21 has a first surface 21a and a second surface 21b opposite to the first surface 21a. The first space P is a space on the side of the first surface 21a. The second space R is a space on the second surface 21b side. The first space P and the second space R are separated by the plate member 21 . The plate-like member 21 is a continuous plate-like member that is not provided with a hole or the like that allows the first space P and the second space R to communicate with each other. The plate member 21 is continuous at least in a region overlapping the movable ranges of the first table 3 and the second table 4, and is not provided with holes or the like. As a result, it is possible to suppress the flow of gas containing foreign matter generated by the operations of the first moving mechanism 6 and the second moving mechanism 7 from the first space P into the second space R. Therefore, the table device 1 can maintain the environment of the second space R.

The first table 3 includes a first substrate 31 , a first attractive force generator 32 , a first repulsive force generator 33 , and a first rolling guide device 34 . The first substrate 31 is a plate-shaped member having a first principal surface 31a and a second principal surface 31b opposite to the first principal surface 31a. The first main surface 31a of the first substrate 31 faces the first surface 21a of the plate member 21 with a gap therebetween. The second main surface 31 b of the first substrate 31 is connected with the connecting portion 77 of the second moving mechanism 7 . The first substrate 31 moves in a plane parallel to the first surface 21 a of the plate member 21 by the operations of the first moving mechanism 6 and the second moving mechanism 7 .

The first attractive force generating portion 32 , the first repulsive force generating portion 33 and the first rolling guide device 34 are provided on the first main surface 31 a of the first substrate 31 . In other words, the first attractive force generating portion 32 , the first repulsive force generating portion 33 and the first rolling guide device 34 are provided between the first substrate 31 and the plate member 21 . In the present embodiment, the first attractive force generator 32 and the first repulsive force generator 33 are magnets, and heat-resistant neodymium magnets and cobalt magnets can be used, for example. The heat resistant temperature of the heat resistant neodymium magnet is about 150°C. The heat resistance temperature of cobalt magnets is about 200°C. The N pole of each of the first attractive force generating portion 32 and the first repulsive force generating portion 33 is in contact with the first main surface 31a. In addition, the first attractive force generating portion 32 and the first repulsive force generating portion 33 are opposed to the plate-like member 21 with their S poles separated from each other.

The first rolling guide device 34 includes a base 341 and rolling elements 342 . The base 341 is fixed to the first substrate 31 . The rolling element 342 is rotatably provided within the recess of the base 341 . The rolling element 342 is in contact with the first surface 21 a of the plate member 21 . The first rolling guide device 34 is, for example, a ball roller, and the first substrate 31 is freely movable along the first surface 21 a of the plate member 21 by the rotation of the rolling elements 342 . Since the first rolling guide device 34 is provided, it is possible to prevent the first attractive force generating portion 32 and the first repulsive force generating portion 33 from coming into contact with the plate member 21, and the first substrate 31 can move smoothly.

As shown in FIG. 3, the first substrate 31 has a rectangular shape in plan view. 3 is a plan view of the first substrate 31 viewed from the first main surface 31a side. The first substrate 31 has a first side surface 31c, a second side surface 31d, a third side surface 31e and a fourth side surface 31f. The first side surface 31c, the second side surface 31d, the third side surface 31e, and the fourth side surface 31f are surfaces between the first main surface 31a and the second main surface 31b. The first side surface 31c faces the second side surface 31d. The third side surface 31e is between the first side surface 31c and the second side surface 31d and faces the fourth side surface 31f.

The first rolling guide devices 34 are provided at the four corners of the first main surface 31a of the first substrate 31, respectively. The first main surface 31a of the first substrate 31 is provided with four first attractive force generating portions 32-1, 32-2, 32-3, and 32-4. Here, a virtual line connecting the middle point of the third side surface 31e in the X direction and the middle point of the fourth side surface 31f in the X direction is defined as a virtual line B1. A virtual line B2 connects the middle point of the first side surface 31c in the Y direction and the middle point of the second side surface 31d in the Y direction. The first attractive force generating portions 32-1 and 32-2 are provided on the outer edge of the first main surface 31a at positions overlapping the imaginary line B1. The first attractive force generating portions 32-3 and 32-4 are provided on the outer edge of the first main surface 31a at positions overlapping the virtual line B2.

The first main surface 31a of the first substrate 31 is provided with four first repulsive force generating portions 33-1, 33-2, 33-3 and 33-4. The first repulsive force generating portions 33-1 and 33-2 are respectively provided at intermediate positions between the first rolling guide device 34 and the first attractive force generating portion 32-1 in the direction along the third side surface 31e. The first repulsive force generators 33-1 and 33-2 are arranged at line-symmetrical positions with the virtual line B1 as the axis of symmetry. The first repulsive force generators 33-3 and 33-4 are provided near the fourth side face 31f, like the first repulsive force generators 33-1 and 33-2. In the following description, the first attractive force generating units 32-1, 32-2, 32-3, and 32-4 are referred to as the first attractive force generating units 32 when there is no need to distinguish them. The first repulsive force generating portions 33-1, 33-2, 33-3, and 33-4 are also referred to as the first repulsive force generating portions 33 in the same manner.

As shown in FIG. 2 , the second table 4 includes a second substrate 41 , a second attractive force generator 42 , a second repulsive force generator 43 , and a second rolling guide device 44 . The second substrate 41 is a plate-like member having a third principal surface 41a and a fourth principal surface 41b opposite to the third principal surface 41a. The fourth main surface 41b of the second substrate 41 faces the second surface 21b of the plate-like member 21 while being separated therefrom. That is, the second substrate 41 faces the first substrate 31 with the plate member 21 interposed therebetween. As shown in FIG. 4, the third main surface 41a of the second substrate 41 is the surface on which the workpiece W, which is the object to be manipulated, is placed. Further, holding portions 412 for holding the work W are provided at the four corners of the third main surface 41a. Thereby, the workpiece W can be positioned on the second substrate 41 .

The fourth main surface 41b of the second substrate 41 is provided with mounting portions 411 and 443 that protrude from the fourth main surface 41b. The second attractive force generating portion 42 , the second repulsive force generating portion 43 and the second rolling guide device 44 are provided on the mounting portions 411 and 443 of the second substrate 41 . In other words, the second attractive force generator 42 , the second repulsive force generator 43 and the second rolling guide device 44 are provided between the second substrate 41 and the plate member 21 . In FIG. 2, the Z-direction position of the second substrate 41 and the Z-direction positions of the second attractive force generating portion 42 and the second repulsive force generating portion 43 can be adjusted according to the heights of the mounting portions 411 and 443 . In the present embodiment, the second attractive force generator 42 and the second repulsive force generator 43 are magnets, and heat-resistant neodymium magnets and cobalt magnets can be used, for example. The heat resistant temperature of the heat resistant neodymium magnet is about 150°C. The heat resistance temperature of cobalt magnets is about 200°C. The S pole of the second attractive force generating portion 42 is in contact with the fourth main surface 41b. In addition, the N pole of the second attractive force generating portion 42 faces the plate-like member 21 with a space therebetween. The N pole of the second repulsive force generating portion 43 is in contact with the fourth main surface 41b. The S pole of the second repulsive force generating portion 43 faces the plate-like member 21 with a space therebetween.

The second attractive force generator 42 faces the first attractive force generator 32 with the plate member 21 interposed therebetween. That is, the second attractive force generating portion 42 is arranged at a position overlapping the first attractive force generating portion 32 when viewed in the Z direction. The second attractive force generating portion 42 is arranged so that the poles different from those of the first attractive force generating portion 32 face each other. In the example shown in FIG. 2, the N pole of the second attractive force generating section 42 and the S pole of the first attractive force generating section 32 face each other. As a result, an attractive force F<b>1 is generated between the first attractive force generating portion 32 and the second attractive force generating portion 42 . An attractive force F<b>1 directed toward the first substrate 31 acts on the second substrate 41 . Thereby, the second substrate 41 can move along the second surface 21 b of the plate member 21 following the movement of the first substrate 31 .

The second repulsive force generator 43 faces the first repulsive force generator 33 with the plate member 21 interposed therebetween. That is, the second repulsive force generating portion 43 is arranged at a position overlapping the first repulsive force generating portion 33 when viewed in the Z direction. The second repulsive force generating portion 43 is arranged so that the same poles as those of the first repulsive force generating portion 33 face each other. In the example shown in FIG. 2, the S pole of the second repulsive force generating portion 43 and the S pole of the first repulsive force generating portion 33 face each other. Thereby, a repulsive force F2 is generated between the first repulsive force generating portion 33 and the second repulsive force generating portion 43 . A repulsive force F<b>2 in the direction from the first substrate 31 toward the second substrate 41 acts on the second substrate 41 .

In this embodiment, the total force of the attractive force F1 is greater than the total force of the repulsive force F2. The force acting between the first substrate 31 and the second substrate 41 can be adjusted by the attractive force F1 and the repulsive force F2. The attractive force F<b>1 and the repulsive force F<b>2 can be appropriately set according to the following performance (moving speed, acceleration, etc.) of the second substrate 41 . The attractive force F1 and the repulsive force F2 can be set by changing the number of the first attractive force generating portions 32, the first repulsive force generating portions 33, the second attractive force generating portions 42 and the second repulsive force generating portions 43, and the magnetic force of each magnet. Alternatively, the attractive force F1 and the repulsive force F2 can be set by changing the interval between the first attractive force generating portion 32 and the second attractive force generating portion 42 and the interval between the first repulsive force generating portion 33 and the second repulsive force generating portion 43 . The first attractive force generating portion 32 and the second attractive force generating portion 42 are magnets with opposite poles attracted to each other. The first repulsive force generator 33 and the second repulsive force generator 43 generate a repulsive force by appropriately arranging magnets with the same poles that are smaller in size than magnets that attract different poles. This makes it possible to finely adjust the attractive force in the Z direction and the followability in the XY directions.

The second rolling guide device 44 includes a base 441 and rolling elements 442 . The second rolling guide device 44 has the same configuration as the first rolling guide device 34, and is, for example, a ball roller. As shown in FIG. 6, the base 441 is fixed to the mounting portion 443 of the second substrate 41 . The rolling element 442 is rotatably provided within the recess of the base 441 . Accordingly, a plurality of balls (not shown) may be provided in the gap between the concave portion of the base 441 and the rolling element 442 to suppress friction caused by the rotation of the rolling element 442 . The rolling element 442 is in contact with the second surface 21 b of the plate member 21 . The second rolling guide device 44 supports the second substrate 41 so as to be freely movable along the first surface 21 a of the plate member 21 . Further, since the second rolling guide device 44 is provided, it is possible to prevent the second attractive force generating portion 42 and the second repulsive force generating portion 43 from coming into contact with the plate member 21 . Therefore, the second substrate 41 can smoothly move following the movement of the first substrate 31 .

As shown in FIG. 6, the surfaces of the rolling elements 442 are provided with a solid lubricating coating 444 . The solid lubricating film 444 is, for example, a baked fluorine oil film. The solid lubricating film 444 is not limited to this, and may be, for example, a vapor deposition film, a sputtered film, a viscous material coating film (grease), or a fluororesin coating film. This reduces the friction between the plate member 21 and the rolling elements 442 . Note that the solid lubricating film 444 may also be provided on the surface of the base 441 .

At least the second surface 21b of the plate member 21 is subjected to surface modification. As a result, a hardened layer is formed on the surface of the plate-like member 21, and the hardness of the plate-like member 21 is improved. Although the type of surface modification treatment for providing a hardened layer is not particularly limited, Pionite (registered trademark) treatment by Air Water Inc. is suitable. In this treatment, as a pretreatment for carburizing treatment, a fluorine-based gas such as nitrogen trifluoride (NF3) is used to perform fluorination treatment at about 200 to 400° C., and then carburizing treatment is performed using a carburizing gas. is. The hardened layer is not limited to this, and may be, for example, a hardened layer obtained by shot peening and polishing or a hardened layer obtained by nitriding. In the shot peening process, a hardened layer is formed by colliding many particles against the surface of the plate member 21 .

With these configurations, the table device 1 can reduce friction between the plate-like member 21 and the rolling elements 442 and suppress wear caused by contact between the plate-like member 21 and the rolling elements 442 . Therefore, the table device 1 can improve wear resistance. Therefore, the table device 1 can maintain cleanliness in the usage environment. The table device 1 of this embodiment was stored in an evaluation glove box, and a particle counter was installed inside the glove box to measure the cleanliness. The cleanliness before and after the test was measured when the second substrate 41 and the second rolling guide device 44 were driven under the following conditions. The second substrate 41 and the second rolling guide device 44 were subjected to a step-and-repeat test for 180 hours at a driving speed of 4.0 mm/sec. As a result, it was confirmed that the level of cleanliness inside the glove box after the test was maintained at the initial level of the test, and that the table device 1 was not worn.

As shown in FIG. 5, the second substrate 41 has a rectangular shape in plan view. 5 is a plan view of the second substrate 41 viewed from the fourth main surface 41b side. The second substrate 41 has a fifth side surface 41c, a sixth side surface 41d, a seventh side surface 41e and an eighth side surface 41f. The fifth side surface 41c, the sixth side surface 41d, the seventh side surface 41e, and the eighth side surface 41f are surfaces between the third main surface 41a and the fourth main surface 41b. The fifth side surface 41c faces the sixth side surface 41d. The seventh side surface 41e is between the fifth side surface 41c and the sixth side surface 41d and faces the eighth side surface 41f.

The arrangement of the second rolling guide device 44, the second attractive force generating portion 42 and the second repulsive force generating portion 43 is similar to the arrangement of the first rolling guide device 34, the first attractive force generating portion 32 and the first repulsive force generating portion 33 shown in FIG. is similar to That is, the second rolling guide devices 44 are provided at the four corners of the fourth main surface 41b of the second substrate 41, respectively. The four second rolling guide devices 44 are provided at positions overlapping the first rolling guide devices 34 .

Four second attractive force generators 42-1, 42-2, 42-3, and 42-4 are provided on the fourth main surface 41b of the second substrate 41. As shown in FIG. Here, a virtual line B3 connects the middle point of the seventh side surface 41e in the X direction and the middle point of the eighth side surface 41f in the X direction. A virtual line B4 connects the middle point of the fifth side surface 41c in the Y direction and the middle point of the sixth side surface 41d in the Y direction. The second attractive force generating portions 42-1 and 42-2 are provided on the outer edge of the fourth main surface 41b at positions overlapping the imaginary line B3. In addition, the second attractive force generating portions 42-3 and 42-4 are provided on the outer edge of the fourth main surface 41b at positions overlapping the imaginary line B4. The second attractive force generators 42-1, 42-2, 42-3 and 42-4 respectively overlap the first attractive force generators 32-1, 32-2, 32-3 and 32-4 shown in FIG. position.

Similarly, the fourth main surface 41b of the second substrate 41 is provided with four second repulsive force generating portions 43-1, 43-2, 43-3 and 43-4. The second repulsive force generators 43-1, 43-2, 43-3 and 43-4 respectively overlap the first repulsive force generators 33-1, 33-2, 33-3 and 33-4 shown in FIG. position.

In this embodiment, the first attractive force generator 32, the second attractive force generator 42, the first repulsive force generator 33, and the second repulsive force generator 43 are magnets. Therefore, it is not necessary to provide a driving circuit or wiring for driving the first attractive force generating portion 32, the second attractive force generating portion 42, the first repulsive force generating portion 33, and the second repulsive force generating portion 43. The configuration of the second substrate 41 can be simplified. In other words, there is no need to provide a moving mechanism, drive circuit, wiring, etc. for moving the second substrate 41 in the second space R. In addition, materials having excellent heat resistance are used for the second substrate 41, the second attractive force generating portion 42, the second repulsive force generating portion 43, and the second rolling guide device 44. FIG. Therefore, when the table device 1 is used in a clean environment such as for biotechnology, for example, the second substrate 41, the second attractive force generating section 42, the second repulsive force generating section 43, and the second rolling guide device 44 are arranged. The table 4 can be easily sterilized by high-temperature steam sterilization, dry heat sterilization, or the like.

At least the plate member 21 of the housing 2 is made of a material having excellent heat resistance. As a result, the plate member 21 can also be easily sterilized. The second table 4 and the housing 2 can be easily removed from the table device 1 . Therefore, sterilization can be performed by removing the second table 4 and the housing 2 from the table device 1 and placing them in a high temperature steam sterilization device or a dry heat sterilization device. In this case, a material having excellent heat resistance is used for the entire housing 2 including the plate member 21 . Further, since the first space P and the second space R are separated by the housing 2, it is possible to sterilize only the second space R by injecting gas, for example.

The first moving mechanism 6 and the second moving mechanism 7 shown in FIG. 1 are XY stages. The 1st moving mechanism 6 and the 2nd moving mechanism 7 have the same structure. In the following description, the second moving mechanism 7 will be taken as an example. The description of the second moving mechanism 7 can also be applied to the description of the first moving mechanism 6 . As shown in FIG. 7 , the second moving mechanism 7 is a ball screw mechanism including a motor 71 , a ball screw 73 , a nut 76 and a housing 74 . The second moving mechanism 7 is a drive transmission unit that converts the rotational driving force transmitted from the motor 71 into motion in the axial direction of the ball screw 73 and transmits the motion to the first substrate 31 .

The ball screw 73 and nut 76 are incorporated inside the housing 74 . Ball screw 73 passes through nut 76 . The ball screw 73 is rotatably supported by the housing 74 , and one end of the ball screw 73 is connected to the motor 71 via the shaft 72 . Thereby, the output of the motor 71 is transmitted to the ball screw 73, and the ball screw 73 is rotatable.

The nut 76 is provided movably along the guide rail 75 . Moreover, rotation of the nut 76 is restricted by being incorporated in the guide rail 75 . As a result, the nut 76 moves axially as the ball screw 73 rotates. The direction of movement of the nut 76 is switched according to the direction of rotation of the ball screw 73 .

The connecting portion 77 is a member that connects the nut 76 and the first substrate 31 and is movable in the axial direction along with the movement of the nut 76 . By appropriately changing the thickness and planar shape of the connecting portion 77, the first substrate 31 and the nut 76 can be satisfactorily connected even when the planar shape and height position of the first substrate 31 are changed.

With the above configuration, the second moving mechanism 7 moves the first substrate 31 along with the nut 76 in the axial direction when the rotational drive of the motor 71 is transmitted to the ball screw 73 . As shown in FIG. 1 , a second moving mechanism 7 is movably fixed to the first moving mechanism 6 . The operation of the first moving mechanism 6 allows the second moving mechanism 7 and the first table 3 to move in the X direction. The operation of the second moving mechanism 7 allows the first table 3 to move in the Y direction. In this manner, the first table 3 can move on a plane parallel to the plate member 21 .

The configurations of the first moving mechanism 6 and the second moving mechanism 7 are merely examples, and are not limited to the configurations shown in FIGS. The first moving mechanism 6 and the second moving mechanism 7 may be configured to move the first table 3 including the first substrate 31 . Various other moving mechanisms can be used as the first moving mechanism 6 and the second moving mechanism 7, and for example, a moving mechanism using a linear motor can be used.

As described above, the table device 1 includes the plate member 21, the first substrate 31, the first attractive force generating section 32, the moving mechanisms (the first moving mechanism 6 and the second moving mechanism 7), and the second It has a substrate 41, a second attractive force generator 42, and a rolling guide device (second rolling guide device 44). The plate-like member 21 has a first surface 21a and a second surface 21b opposite to the first surface 21a. separates R. The first substrate 31 faces the first surface 21 a of the plate member 21 . The first attractive force generator 32 is provided on the surface of the first substrate 31 that faces the first surface 21a. The moving mechanism is provided in the first space P and moves the first substrate 31 . The second substrate 41 faces the first substrate 31 with the plate member 21 interposed therebetween. The second attractive force generator 42 is provided on the surface of the second substrate 41 facing the second surface 21b, and faces the first attractive force generator 32 via the plate member 21. generate an attractive force between The second rolling guide device 44 is provided between the second substrate 41 and the second surface 21b, and supports the second substrate 41 movably. The second rolling guide device 44 has a base 441 connected to the second substrate 41, and rolling elements 442 rotatably provided on the base 441 and provided with a solid lubricating film 444 on their surfaces.

With such a configuration, the plate member 21 separates the first space P in which the moving mechanism and the like are provided and the second space R in which the second substrate 41 and the like are provided. An attractive force acts on the second substrate 41 in a direction toward the first substrate 31 due to the attractive force between the first attractive force generating portion 32 and the second attractive force generating portion 42 . Accordingly, when the first substrate 31 is moved by the operation of the moving mechanism, the second substrate 41 provided in the second space R moves following the first substrate 31 . A solid lubricating film 444 is provided on the rolling elements 442 of the second rolling guide device 44 . Therefore, in the table device 1, the friction between the plate member 21 and the rolling elements 442 is reduced, and wear of the plate member 21 and the rolling elements 442 can be suppressed. Therefore, the table device 1 can improve wear resistance. In addition, the table device 1 suppresses the inflow of gas from the first space P in which a moving mechanism and the like are provided to the second space R in which the operation target is positioned and inspected, and the second space R is used to move the second substrate. 41 moves are possible. In other words, it is possible to prevent foreign matter generated by the operations of the first moving mechanism 6 and the second moving mechanism 7 in the first space P from flowing into the second space R. Therefore, the environment of the second space R can be maintained.

Further, in the table device 1, the rolling elements 442 are in contact with the second surface 21b of the plate-like member 21, and at least the second surface 21b of the plate-like member 21 is subjected to surface modification. Thereby, the hardness of the plate member 21 is improved. Therefore, the table device 1 can suppress wear caused by contact between the plate member 21 and the rolling elements 442, and can maintain cleanliness in the usage environment.

Further, in the table device 1, the solid lubricating film 444 is a fluorine oil baking film. According to this, by coating the surfaces of the rolling elements 442 with the fluorine oil baking film, the table device 1 can reduce the friction between the plate member 21 and the rolling elements 442 .

In addition, the table device 1 includes a plate member 21 that separates the first space P and the second space R, a substrate (second substrate 41) facing the plate member 21, and a substrate (second substrate 41). a rolling guide device (second rolling guide device 44) movably supported along the surface of the shaped member 21; The second rolling guide device 44 has a base 441 connected to the second substrate 41, and rolling elements 442 rotatably provided on the base 441 and provided with a solid lubricating film 444 on their surfaces.

Moreover, in the table device 1, the plate member 21 is a non-magnetic material. According to this, the attractive force can be applied to the first substrate 31 and the second substrate 41 through the plate member 21 by the magnetic force generated between the first attractive force generating portion 32 and the second attractive force generating portion 42 . can. Further, by using a material having excellent heat resistance for the plate member 21, the plate member 21 can be easily sterilized by high-temperature steam sterilization, dry heat sterilization, or the like.

Further, in the table device 1, the configuration of the second rolling guide device 44 is simple, and the configuration of the second substrate 41 can also be simplified. Also, the second rolling guide device 44 can be easily sterilized by high-temperature steam sterilization, dry heat sterilization, or the like.

The number and arrangement of the first rolling guide devices 34, the first attractive force generating portions 32, and the first repulsive force generating portions 33 are not limited to the example shown in FIG. Two, three, or five or more first attractive force generators 32 may be provided. Two, three, or five or more first repulsive force generating portions 33 may be provided. The number of the first attractive force generating portions 32 may differ from the number of the first repulsive force generating portions 33 . Moreover, the structure which does not provide the 1st repulsive force generation part 33 may be sufficient. Any one of the first rolling guide device 34, the first attractive force generator 32, and the first repulsive force generator 33 may be provided at the position of the intersection C1 between the virtual lines B1 and B2. The number and arrangement of the second rolling guide device 44, the second attractive force generating portion 42 and the second repulsive force generating portion 43 are also the same as those of the first rolling guide device 34, the first attractive force generating portion 32 and the first repulsive force generating portion 33. In addition, it can be changed as appropriate according to the follow-up performance of the second substrate 41 . For example, any one of the second rolling guide device 44, the second attractive force generating portion 42, and the second repulsive force generating portion 43 may be provided at the intersection point C2 shown in FIG. Note that the first rolling guide device 34 and the second rolling guide device 44 are not limited to the configurations shown in FIGS. 2, 6, etc., and may have, for example, multiple rolling bearings. Note that the first rolling guide device 34 may not be provided. If the attractive force between the first table 3 and the second table 4 and the rigidity of the plate member 21 are appropriately set, the first rolling guide device 34 is not necessarily required.

As shown in FIGS. 3 and 5, each of the first substrate 31 and the second substrate 41 has a rectangular shape, but is not limited to this. The first substrate 31 and the second substrate 41 may be square, polygonal, circular, or other shapes. Also, the first substrate 31 and the second substrate 41 may have different shapes and sizes.

Although the first attractive force generating portion 32, the first repulsive force generating portion 33, the second attractive force generating portion 42, and the second repulsive force generating portion 43 are magnets, they are not limited to this. For example, at least one of the first attractive force generating portion 32 and the first repulsive force generating portion 33 may be configured to include a coil and a yoke. In this case, an attractive force can be generated between the first attractive force generator 32 and the second attractive force generator 42 by changing the current flowing through the coil. Similarly, a repulsive force can be generated between the first repulsive force generating portion 33 and the second repulsive force generating portion 43 .

(Second embodiment)
FIG. 8 is a perspective view of a housing included in the table device according to the second embodiment. 9 is a cross-sectional view taken along line AA in FIG. 8. FIG. FIG. 10 is a plan view of the housing. 8 and 10, illustration of the second table 4 is omitted. In the following description, the same reference numerals are assigned to the same components as those described in the above-described embodiment, and overlapping descriptions are omitted.

As shown in FIG. 8, the table device 1A of this embodiment has a parallelism adjusting structure 5 that can adjust the parallelism of the plate member 21. As shown in FIG. Here, the parallelism of the plate-like member 21 indicates the inclination of the plate-like member 21 with respect to a plane parallel to the surface of the first substrate 31 . Specifically, the parallelism adjusting structure 5 has a plate member base 22 , a support member 23 , a plate member fixing portion 25 and a spacer 26 .

As shown in FIG. 9, the space surrounded by the plate member base 22, the support member 23, the plate member fixing portion 25, and the support member 23 is provided with the first table 3 and the moving mechanism (first moving mechanism). A mechanism 6 and a second moving mechanism 7) are provided. That is, the parallelism adjusting structure 5 may be part of the housing 2A.

The plate member base 22 faces the plate member 21A. The support member 23 is provided on the plate-like member base 22 and supports the plate-like member 21A via the plate-like member fixing portion 25 . In this embodiment, two support members 23 are provided. Both of the two support members 23 are flat plate-shaped, and are provided facing each other in the X direction. As shown in FIG. 10, the two support members 23 extend in the Y direction along the sides of the plate member 21A.

As shown in FIG. 9 , the plate member fixing portion 25 is provided above the support member 23 and fixed to the support member 23 by a fixing member 27 . A plate-like member 21A is fixed to the plate-like member fixing portion 25 by a fixing member 28. As shown in FIG. The fixing member 27 and the fixing member 28 are screws, for example, the plate member fixing portion 25 is screwed to the support member 23, and the plate member 21A is screwed to the plate member fixing portion 25. As shown in FIG. 10, the plate-like member fixing portion 25 is a frame-like member provided with an opening 25a, and a plate-like member 21A is provided to cover the opening 25a. The plate-like member 21A is fixed to the plate-like member fixing portion 25 by a plurality of fixing members 28 provided along the four sides of the plate-like member 21A. The plate-like member fixing portion 25 is thicker than the plate-like member 21A and has rigidity. With such a fixing structure, it is possible to suppress the occurrence of warping of the plate member 21A.

A spacer 26 is provided between the support member 23 and the plate member fixing portion 25 . The spacer 26 is provided on the upper surface of the support member 23 so as to extend in the Y direction. According to this, the parallelism adjusting structure 5 can adjust the parallelism between the plate member 21A and the first substrate 31 by adjusting the number and thickness of the spacers 26 .

Therefore, the table device 1 can suppress a change in the distance between the first attractive force generating section 32 and the second attractive force generating section 42 even when the first substrate 31 moves. As a result, change in the magnetic force acting on the second substrate 41 can be suppressed. Therefore, the table device 1 can suppress the application of a large load locally to the plate-like member 21A, thereby suppressing wear of the plate-like member 21A and the rolling elements 442 (see FIG. 6).

(Third Embodiment)
FIG. 11 is a cross-sectional view of the table device according to the third embodiment. As shown in FIG. 11, the table device 1B of this modification includes a housing 2B, a first table 3, a second table 4, moving mechanisms (a first moving mechanism 6 and a second moving mechanism 7 (see FIG. 1 See)). The space outside the housing 2B is the first space P, and the space inside the housing 2B is the second space R. The second space R is adaptable to various environments such as vacuum, reduced pressure, and clean environment. A bottom plate of the housing 2B is the plate member 21B.

The first table 3 is arranged on the first surface 21Ba side of the plate member 21B, that is, in the first space P. As shown in FIG. The second table 4 is arranged on the second surface 21Bb side of the plate member 21B, that is, in the second space R. That is, a first table 3 including a first substrate 31 and a first attractive force generating unit 32 and a moving mechanism (a first moving mechanism 6 and a second moving mechanism 7 (not shown in FIG. 6) are provided outside the housing 2B. )) and are provided. A second table 4 including a second substrate 41, a second attractive force generator 42, and a second rolling guide device 44 is provided inside the housing 2B. The configurations of the first table 3 and the second table 4 are the same as those shown in FIGS. 2 to 6, and detailed description thereof will be omitted.

Also in the present embodiment, the attractive force F1 acts on the second substrate 41 in the direction toward the first substrate 31 due to the attractive force between the first attractive force generating portion 32 and the second attractive force generating portion 42 . Accordingly, when the first substrate 31 is moved by the operation of the moving mechanism, the second substrate 41 provided in the second space R moves following the first substrate 31 . As a result, the table apparatus 1B suppresses the inflow of gas from the first space P in which the moving mechanism and the like are provided to the second space R in which the operation target is positioned and inspected, Substrate 41 can be moved. Further, the second rolling guide device 44 is provided with a solid lubricating film 444 (see FIG. 6) on the surfaces of the rolling elements 442 . Therefore, in the table device 1B, friction between the plate member 21B and the rolling elements 442 is reduced, and wear of the plate member 21B and the rolling elements 442 can be suppressed. Therefore, the table device 1B can improve wear resistance.

1, 1A, 1B Table device 2, 2A, 2B Housing 21, 21A, 21B Plate-shaped member 21a, 21Ba First surface 21b, 21Bb Second surface 22 Plate-shaped member base 23 Supporting member 25 Plate-shaped member fixing part 25a Opening 26 spacer 3 first table 31 first substrate 31a first main surface 31b second main surface 32 first attractive force generating part 33 first repulsive force generating part 34 first rolling guide device 4 second table 41 second substrate 41a third main surface Surface 41b Fourth Main Surface 411, 443 Mounting Part 412 Holding Part 42 Second Attractive Force Generating Part 43 Second Repulsive Force Generating Part 44 Second Rolling Guide Device 441 Base 442 Rolling Element 444 Solid Lubricating Film 5 Parallelism Adjusting Structure 6 First First Moving Mechanism 7 Second Moving Mechanism 77 Connecting Portion P First Space R Second Space

Claims (6)

a plate-shaped member having a first surface and a second surface opposite to the first surface and separating a first space on the side of the first surface from a second space on the side of the second surface;
a first substrate facing the first surface of the plate member;
a first attractive force generator provided on a surface of the first substrate facing the first surface;
a moving mechanism provided in the first space for moving the first substrate;
a second substrate facing the first substrate via the plate member;
The second substrate is provided on a surface facing the second surface of the second substrate, faces the first attraction force generation section via the plate member, and generates an attraction force between itself and the first attraction force generation section. 2 an attraction force generator;
a first repulsive force generator provided on a surface of the first substrate facing the first surface;
A second substrate provided on a surface of the second substrate facing the second surface, facing the first repulsive force generating section via the plate member, and generating a repulsive force between itself and the first repulsive force generating section. 2 a repulsive force generating portion;
a rolling guide device provided between the second substrate and the second surface and movably supporting the second substrate;
The rolling guide device has a base connected to the second substrate, and rolling elements rotatably provided on the base and having a surface provided with a solid lubricating film,
The first attractive force generating portion, the second attractive force generating portion, the first repulsive force generating portion, and the second repulsive force generating portion are magnets,
In the direction along the side surface of the first substrate, one of the first attractive force generating parts is arranged between the two rolling guide devices, and the first repulsive force generating part is arranged between the two rolling guide devices. Arranged between the rolling guide device on one side and the first attractive force generating section and between the rolling guide device on the other side and the first attractive force generating section, respectively
table device. the rolling element is in contact with the second surface of the plate-like member,
At least the second surface of the plate-like member is surface-modified,
The table device according to claim 1. The solid lubricating film is a fluorine oil baked film,
The table device according to claim 1 or 2. Having a parallelism adjustment structure capable of adjusting the inclination of the plate member with respect to a plane parallel to the surface of the first substrate,
The table device according to any one of claims 1 to 3. The parallelism adjusting structure is
a plate-like member base facing the plate-like member;
a support member provided on the plate-like member base for supporting the plate-like member;
a plate-shaped member fixing portion provided on the upper side of the support member to which the plate-shaped member is fixed;
a spacer provided between the support member and the plate member fixing portion ;
The plate-shaped member fixing portion is a frame-shaped member provided with an opening,
The plate-like member is provided to cover the opening of the plate-like member fixing portion,
The first substrate and the moving mechanism are provided in a space surrounded by the plate member base, the support member, the plate member fixing portion, the support member, and the spacer.
5. The table device according to claim 4. a plate-shaped member having a first surface and a second surface opposite to the first surface and separating a first space on the side of the first surface from a second space on the side of the second surface;
a first substrate facing the first surface of the plate member;
a first attractive force generator provided on a surface of the first substrate facing the first surface;
a moving mechanism provided in the first space for moving the first substrate;
a second substrate facing the first substrate via the plate member;
The second substrate is provided on a surface facing the second surface of the second substrate, faces the first attraction force generation section via the plate member, and generates an attraction force between itself and the first attraction force generation section. 2 an attraction force generator;
a rolling guide device provided between the second substrate and the second surface for movably supporting the second substrate;
a parallelism adjusting structure capable of adjusting the inclination of the plate member with respect to a plane parallel to the surface of the first substrate;
The parallelism adjusting structure is
a plate-like member base facing the plate-like member;
a support member provided on the plate-like member base for supporting the plate-like member;
a plate-shaped member fixing portion provided on the upper side of the support member to which the plate-shaped member is fixed;
a spacer provided between the support member and the plate member fixing portion ;
The plate-shaped member fixing portion is a frame-shaped member provided with an opening,
The plate-like member is provided to cover the opening of the plate-like member fixing portion,
The first substrate and the moving mechanism are provided in a space surrounded by the plate member base, the support member, the plate member fixing portion, the support member, and the spacer.
table device.

Images