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JPS6054339B2 - Method for producing aromatic copolyamide film - Google Patents
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JPS6054339B2 - Method for producing aromatic copolyamide film - Google Patents

Method for producing aromatic copolyamide film

Info

Publication number
JPS6054339B2
JPS6054339B2 JP4709475A JP4709475A JPS6054339B2 JP S6054339 B2 JPS6054339 B2 JP S6054339B2 JP 4709475 A JP4709475 A JP 4709475A JP 4709475 A JP4709475 A JP 4709475A JP S6054339 B2 JPS6054339 B2 JP S6054339B2
Authority
JP
Japan
Prior art keywords
film
solvent
dope
thin film
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4709475A
Other languages
Japanese (ja)
Other versions
JPS51122159A (en
Inventor
明 三好
昭夫 佐々木
静夫 猪飼
民弘 中山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Unitika Ltd
Original Assignee
Unitika Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unitika Ltd filed Critical Unitika Ltd
Priority to JP4709475A priority Critical patent/JPS6054339B2/en
Publication of JPS51122159A publication Critical patent/JPS51122159A/en
Publication of JPS6054339B2 publication Critical patent/JPS6054339B2/en
Expired legal-status Critical Current

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  • Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
  • Polyamides (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Insulating Materials (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)

Description

【発明の詳細な説明】 本発明は、性能のすぐれたとくに電気絶縁性がすぐれた
芳香族コポリアミドフイルムの製造法に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing an aromatic copolyamide film having excellent performance, particularly excellent electrical insulation properties.

芳香族ポリアミドから得られる紙は、その分子構造の剛
直さや分子間力等により期待されるように、すぐれた耐
熱性、機械的性能ならびに電気特性を有し、しはしば大
型電動機等の回転子、固定子の絶縁材ならびに高圧線被
覆材等に使用されるが、もしより密度の高いフィルムの
形にすれば一層高性能の電気絶縁材が得られることが期
待される。
Paper obtained from aromatic polyamide has excellent heat resistance, mechanical performance, and electrical properties, as expected due to the rigidity of its molecular structure and intermolecular forces, and is often used in the rotation of large electric motors. It is used as an insulating material for children and stators, as well as a high-voltage wire covering material, but if it is made into a film with higher density, it is expected that an even higher performance electrical insulating material can be obtained.

ところで芳香族ホモポリアミドフィルムの製造法として
、ポリマーの溶解性ならびにドープの安定性を増すため
に塩化カルシウム、塩化リチウム等の塩を添加したアミ
ド系溶媒ドープからの乾式もしくは湿式法が公知である
By the way, as a method for producing an aromatic homopolyamide film, a dry or wet method is known in which an amide solvent dope is added with a salt such as calcium chloride or lithium chloride in order to increase the solubility of the polymer and the stability of the dope.

前者の方法はドープを膜状にし加熱雰囲気または加熱板
に接触させて溶媒を蒸発除去させる方法であり、後者は
ドープを膜状にし凝固浴中に浸漬して、溶媒を抽出除;
去させる方法である。しかしながらこれらの方法は、得
られるフィルムの電気絶縁性能上、経済上ならびに技術
上の欠点を有している。
In the former method, the dope is formed into a film and brought into contact with a heated atmosphere or a heating plate to evaporate and remove the solvent; in the latter, the dope is formed into a film and immersed in a coagulation bath to extract and remove the solvent;
This is a way to make them leave. However, these methods have drawbacks in terms of the electrical insulation performance of the resulting film, as well as economic and technical disadvantages.

すなわち、前者においてはドープ中に含有する塩化カル
シウム等の塩が加熱のみ2では除去できずに水の水洗工
程において除去されるので、脱塩の際にフィルム中に形
成される空洞のため電気絶縁性が劣つたものとなる。さ
らには、塩化カルシウム等の塩とアミド系溶媒とは錯体
を形成することが知られており、したがつて溶5媒の蒸
発能率が悪くフィルム成形には長時間を要し、また完全
に溶媒を除去することも困難である。さらに工業生産を
考えた場合、水洗排液からも溶剤を回収することが不可
欠となる。一方、後者の場合は凝固剤の選択に問題があ
り3すぐれた電気的性能ならびに機械的性能を有するフ
ィルムを得るには凝固剤の凝固能、凝固時間、凝固温度
等に特別の配慮が必要である。
That is, in the former case, salts such as calcium chloride contained in the dope cannot be removed by heating alone (2), but are removed in the washing process with water, so electrical insulation is caused by the cavities formed in the film during desalination. It becomes inferior in quality. Furthermore, it is known that salts such as calcium chloride and amide solvents form complexes, which results in poor evaporation efficiency of the solvent and requires a long time to form a film. It is also difficult to remove. Furthermore, when considering industrial production, it is essential to recover the solvent from the washing wastewater. On the other hand, in the latter case, there is a problem in the selection of the coagulant.3 To obtain a film with excellent electrical and mechanical performance, special consideration must be given to the coagulant's coagulation ability, coagulation time, coagulation temperature, etc. be.

さらには溶剤回収においては、塩化カルシウム等の塩と
アミド系溶媒との錯体形成の問題があり特別な配慮4が
必要となる。本発明者らは、芳香族ポリアミドフィルム
の製造方法におけるかかる欠点を改良すべく鋭意研究の
結果、本発明に到達したものである。
Furthermore, in solvent recovery, there is a problem of complex formation between salts such as calcium chloride and amide solvents, which requires special consideration. The present inventors have arrived at the present invention as a result of intensive research aimed at improving these drawbacks in the method for producing aromatic polyamide films.

すなわち、本発明は全アミド構成単位の90〜20モル
%がポリーm−フエニレンイソフタラミドからなり残り
の10〜80モル%が実質的に等モルの下記のジカルボ
ン酸およびジアミン単位で構成される固有粘度0.8以
上(96%硫酸溶媒中で濃度0.5y/100m1、2
5(Cで測定)のポリアミドとアミド系溶媒とからなり
、かつ無機塩含有量(対ポリマー)が0.鍾量%以下で
あるドープから薄膜を形成し、該薄膜を加熱して該薄膜
中の残存溶媒量(対薄膜、以下同じ)を2鍾量%以下と
なし、ついで150℃以上の温度で熱処理するか、ある
いは水洗を行つたのち15(代)以上の温度で熱処理す
ることを特徴とする芳香族コポリアミドフイルムの製造
法である。
That is, in the present invention, 90 to 20 mol% of all amide structural units are composed of poly m-phenylene isophthalamide, and the remaining 10 to 80 mol% is composed of substantially equimolar dicarboxylic acid and diamine units shown below. Intrinsic viscosity of 0.8 or more (concentration 0.5y/100ml in 96% sulfuric acid solvent)
5 (measured by C) and an amide solvent, and the inorganic salt content (relative to the polymer) is 0.5 (measured by C). A thin film is formed from a dope having a dope of less than 2% by weight, the thin film is heated to reduce the amount of residual solvent in the thin film (relative to the thin film, the same applies hereinafter) to 2% by weight or less, and then heat treatment is performed at a temperature of 150°C or higher. This is a method for producing an aromatic copolyamide film, which is characterized by carrying out a heat treatment at a temperature of 15 (degrees) or more after washing with water or washing with water.

(ジカルボン酸単位) ただし、〔X:ハロゲン,メチル基 n:0,1または2〕 ただし、〔Y:ーCH2−,−C(CH3)2−,
−CO−,−SO2−, 一S
O一 m:0または1〕 (ジアミン単位) ただし、〔Z:ハロゲン,メチル基 1:0,1または2〕 ただし、〔W:ーCF[2,−C(CH3)2−,
一CO−,−SO,−, −S
O− 本発明に使用するポリマーの好適例としては、ポリーm
−フエニレンイソフタラミド単位が90〜20モル%か
らなり、残りの10〜80モル%がポリーp−フエニレ
ンイソフタラミド、ポリーm−フエニレンテレフタラミ
ド単位よりなるポリマーなどをあげることができる。
(Dicarboxylic acid unit) However, [X: halogen, methyl group n: 0, 1 or 2] However, [Y: -CH2-, -C(CH3)2-,
-CO-, -SO2-, -S
O1 m: 0 or 1] (Diamine unit) However, [Z: halogen, methyl group 1: 0, 1 or 2] However, [W: -CF[2, -C(CH3)2-,
-CO-,-SO,-,-S
O- As a preferred example of the polymer used in the present invention, polym
- Polymers consisting of 90 to 20 mol% of phenylene isophthalamide units, and the remaining 10 to 80 mol% of poly p-phenylene isophthalamide and poly m-phenylene terephthalamide units, etc. can.

本発明に使用するポリマーは、公知の方法のいずれによ
つても得られる。
The polymer used in the present invention can be obtained by any known method.

たとえば、各々該当するジアミンとジカルボン酸二塩化
塩を低温溶液重合、あるいは界面重合する方法等があげ
られる。重合溶媒としては、ジメチルアセトアミド、N
−メチルピロリドン、テトラメチル尿素、ヘキサメチル
ホスホルアミド等のアミド系溶媒、塩化メチレン、クロ
ロホルムなどのハロゲン化炭化水素等の単独または混合
溶剤が適用できる。この時、重合溶媒に塩化リチウムあ
るいは塩化カルシウム等の無機塩を加えてもよい。また
、本発明に使用する芳香族コポリアミドはランダムまた
は規則性またはプロツクコポリアミドのいずれであつて
もよい。
For example, a method may be mentioned in which the corresponding diamine and dicarboxylic acid dichloride are subjected to low-temperature solution polymerization or interfacial polymerization. As a polymerization solvent, dimethylacetamide, N
- Single or mixed solvents such as amide solvents such as methylpyrrolidone, tetramethylurea and hexamethylphosphoramide, and halogenated hydrocarbons such as methylene chloride and chloroform can be used. At this time, an inorganic salt such as lithium chloride or calcium chloride may be added to the polymerization solvent. Further, the aromatic copolyamide used in the present invention may be either a random, regular or programmed copolyamide.

本発明に使用するポリマーは固有粘度0.8以上、好ま
しくは1之以上を有する重合度のものが用いられる。
The polymer used in the present invention has an intrinsic viscosity of 0.8 or more, preferably 1 or more.

固有粘度が0.8未満では得られるフィルムは機械的性
能の劣つたものとなる。ここで固有粘度とは25℃の9
6%硫酸中0.5y/100m1のポリマー濃度で測定
した値から求めたものである。本発明の方法によつてフ
ィルムを製造するに適したドープはジメチルアセトアミ
ド、N−メチルピロリドン、N−メチルカプロラクタム
、テトラメチル尿素、ヘキサメチルホスホルアミドのよ
う.なアミド系溶媒の単独あるいは混合溶剤に前記のポ
リマーを溶解して得ることができる。この場合カルシウ
ム、リチウム、ストロンチウム、マグネシウムなどの塩
化物あるいは臭化物などの無機塩は、本発明において使
用するポリマーの溶解性な.らびにドープの安定性が良
好であるのであえて添加する必要はないが、ポリマーに
対し0.鍾量%以下、好ましくは0.1重量%以下なら
添加をゆるされる。無機塩を0.3重量%をこえる量添
加した場合は得られるフィルムの電気絶縁性ならびに機
・械的性能は劣つたものとなる。さらには前記のごとく
これらの塩とアミド系溶媒とは鎖体を形成することが知
られており、ドープから形成された薄膜からアミド系溶
媒を加熱除去する場合、蒸発能率が悪く長時間を要して
も完全に溶媒を除去することがむつかしくなる。加えて
、水洗時間も長時間を要し、フィルムの生産性は劣つた
ものとなる。また、上記したことより考えて当然のこと
ながら溶媒回収においてもデメリツトはまぬがれない。
アミド系溶媒に上記無機塩等を添加して重合を行つた場
合には、塩の添加量が得られるポリマーに対し0.鍾量
%以下であれば重合ドープをそのlままあるいは濃縮ま
たは希釈等の処理を行つた後、フィルム成形用ドープと
して適用することができる。
If the intrinsic viscosity is less than 0.8, the resulting film will have poor mechanical properties. Here, the intrinsic viscosity is 9 at 25℃.
It was determined from the value measured at a polymer concentration of 0.5y/100ml in 6% sulfuric acid. Dopes suitable for producing films by the method of the invention include dimethylacetamide, N-methylpyrrolidone, N-methylcaprolactam, tetramethylurea, hexamethylphosphoramide. It can be obtained by dissolving the above polymer in an amide solvent alone or in a mixed solvent. In this case, inorganic salts such as chlorides or bromides of calcium, lithium, strontium, magnesium, etc., may affect the solubility of the polymer used in the present invention. Since the stability of the dope and dope is good, there is no need to add it intentionally, but it is necessary to add 0.0% to the polymer. Addition is allowed if the amount is not more than 1% by weight, preferably not more than 0.1% by weight. If the inorganic salt is added in an amount exceeding 0.3% by weight, the resulting film will have poor electrical insulation properties and mechanical properties. Furthermore, as mentioned above, it is known that these salts and amide solvents form chains, and when amide solvents are removed by heating from a thin film formed from dope, the evaporation efficiency is poor and it takes a long time. However, it is difficult to completely remove the solvent. In addition, water washing takes a long time, resulting in poor film productivity. Furthermore, considering the above, it is obvious that there are disadvantages in solvent recovery as well.
When polymerization is carried out by adding the above-mentioned inorganic salt etc. to an amide solvent, the amount of salt added is 0.00% relative to the resulting polymer. If the amount is less than %, the polymerized dope can be used as it is or after being subjected to treatments such as concentration or dilution, as a dope for film forming.

しかし、塩の添加量が0.3重量%を越える場合には一
旦ポリマーを単離し、新たにドープを調製するか、他の
方法たとえば他の塩を添加し上記無機塩を系に不溶性の
ものとして淵別等により除去する必要がある。また、重
合ドープを中和した場合に生成する無機塩の含量が0.
3重量%を越える場合にも同様の処理が必要である。本
発明において使用するドープ中のポリマー濃度は、ポリ
マーの重合度、組成および溶媒の種類により異なるが、
通常10〜4鍾量%、好ましくは15〜2唾量%で用い
られる。
However, if the amount of salt added exceeds 0.3% by weight, either isolate the polymer and prepare a new dope, or use other methods such as adding another salt to make the inorganic salt insoluble in the system. Therefore, it is necessary to remove it by Fuchibetsu etc. Furthermore, the content of inorganic salts generated when the polymerization dope is neutralized is 0.
Similar treatment is required when the amount exceeds 3% by weight. The concentration of the polymer in the dope used in the present invention varies depending on the degree of polymerization, composition, and type of solvent;
It is usually used at a concentration of 10 to 4%, preferably 15 to 2%.

このポリマー濃度範囲外ては成形性が悪かつたり、得ら
れる成形体の物性が低かつたり、ドープ粘度が高くなり
すぎたり、あるいは低くなりすぎて成形しにくくなるこ
とが多いので好ましくない。このようにして調製された
ドープからフィルムを製造するには、まずドープをガス
ス等の平滑な板あるいはベルト状の移動板上などに塗付
する方法や、スリットより下向きに窒素等の加熱雰囲気
中に押出す方法等により薄膜を形扶したのち、該薄膜を
加熱して膜中の残存溶媒量を2師量%以下とする。
If the polymer concentration is outside this range, moldability may be poor, the physical properties of the resulting molded product may be poor, and the dope viscosity may become too high or too low, making it difficult to mold, which is undesirable. To produce a film from the dope prepared in this way, first the dope is applied onto a smooth plate such as gas or a belt-like moving plate, or the dope is applied downward from the slit in a heated atmosphere such as nitrogen. After forming a thin film by an extrusion method or the like, the thin film is heated to reduce the amount of residual solvent in the film to 2 mass% or less.

この除溶媒の種類、濃度等により溶媒の蒸発に要する時
間は当然異なるが、加熱温度としては80℃以上が必要
てある。しかし溶媒の沸点以上では、溶媒の蒸発速度が
速くなりすぎて膜にポイドを生じやすいので好ましくな
い。薄膜中の残存溶媒量が2唾量%を越える場合には、
ついで行う熱処理効果に乏しい。
Although the time required for evaporation of the solvent naturally varies depending on the type and concentration of the solvent removed, the heating temperature is required to be 80° C. or higher. However, if the temperature is above the boiling point of the solvent, the evaporation rate of the solvent becomes too fast, which tends to cause voids in the membrane, which is not preferable. If the amount of residual solvent in the thin film exceeds 2%,
The effect of subsequent heat treatment is poor.

また、残存溶媒量が2唾量%を越える薄膜を水洗した場
合には、得られるフィルムにはポイドの発生や白化現象
が見られ、電気絶縁性ならびに機械的性能は劣つたもの
となる。したがつて、ドープから形成した薄膜は熱処理
あるいは水洗処理を行うまでに、加熱によつてその残存
溶媒量を2唾量%以下になしておく必要がある。熱処理
前の薄膜の残存溶媒量が2鍾量%以下においても、残存
溶媒量の減少とともに得られたフィルムの機械的性能は
若干よくなるが、蒸発に要する時間が長くかかり生産性
は劣つたものとなる。したがつて、特にすぐれた機械的
性能を要求する場合以外は残存溶媒量を20重量%以下
にさえすれば充分である。また、残存溶媒量が2鍾量%
以下となつた任意の時点で加熱による溶媒の蒸発除去か
ら、溶媒の抽出速度の大きい水洗除去に切り換えること
も生産性を向上さすために有効である。残存溶媒量が2
唾量%以下となつた薄膜に、ついで熱処理を行うか、あ
るいは水洗を行つたのち熱処理を行うことにより強靭な
フィルムを得ることができる。
Furthermore, when a thin film with a residual solvent amount exceeding 2% by volume is washed with water, the resulting film exhibits the generation of voids and whitening phenomenon, and its electrical insulation properties and mechanical performance are poor. Therefore, before the thin film formed from the dope is subjected to heat treatment or water washing treatment, it is necessary to reduce the residual solvent amount to 2% or less by heating. Even when the amount of residual solvent in the thin film before heat treatment is less than 2% by weight, the mechanical performance of the obtained film improves slightly as the amount of residual solvent decreases, but the time required for evaporation is longer and the productivity is inferior. Become. Therefore, unless particularly excellent mechanical performance is required, it is sufficient to keep the amount of residual solvent at 20% by weight or less. In addition, the amount of residual solvent is 2%
It is also effective to improve productivity by switching from evaporation removal of the solvent by heating to removal by washing with water, which has a high extraction rate of the solvent, at any point when the following occurs. The amount of residual solvent is 2
A strong film can be obtained by heat-treating the thin film whose saliva content is below %, or by heat-treating it after washing with water.

熱処理条件はポリマーの種類、溶媒とその残存量あるい
は目的とするフィルムの性能によつて決められるべきで
あるが、温度は150℃以上が必要である。また、熱処
理は一段熱処理でよいが、多段熱処理を行つても一向に
さしつかえない。以上述べたように、本発明によればす
ぐれた電気絶縁性と機械的性能を有するフィルムが経済
的に製造可能となる。
The heat treatment conditions should be determined depending on the type of polymer, the solvent and its residual amount, or the desired performance of the film, but the temperature must be 150°C or higher. Further, the heat treatment may be performed in one stage, but there is no problem even if the heat treatment is performed in multiple stages. As described above, according to the present invention, it is possible to economically produce a film having excellent electrical insulation and mechanical performance.

以下、実施例によつて本発明を説明するが、実施例は本
発明の範囲を限定するものではない。
EXAMPLES Hereinafter, the present invention will be explained with reference to Examples, but the Examples are not intended to limit the scope of the present invention.

比較例1あらかじめm−フェニレンジアミンとイソフタ
ル酸クロライドとより界面重合することにより得たm−
フエニレンイソフタラミド(ηInhl.67)1踵量
%と塩化カルシウム3重量%とジメチルアセトアミド7
鍾量%とより均一なドープを調製した。
Comparative Example 1 m-Phenyldiamine obtained by interfacial polymerization with isophthalic acid chloride in advance
Phenylene isophthalamide (ηInhl.67) 1% by weight, calcium chloride 3% by weight, and dimethylacetamide 7%
A dope with a more uniform slag weight was prepared.

この場合塩化カルシウムを添加しなければ均一なドープ
は得られなかつた。上記ドープをアプリケーターで20
0順角の硬質ガラス板に300μの厚さに均一に塗付し
た。
In this case, a uniform dope could not be obtained unless calcium chloride was added. Apply the above dope with an applicator for 20 minutes.
It was applied uniformly to a thickness of 300 μm on a hard glass plate with a normal angle of 0.0 μm.

直ちにガラス板を80μCの電熱オープンに入れ、1峙
間後にガラス板よりフィルムを剥離し、残存溶媒量を測
定したところ18.鍾量%であることがわかつた。つい
でフィルムをH時間流水洗浄することによりフィルムの
残存溶媒量は0.1重量%、残存塩化カルシウム量は0
.05重量%となつた。流水洗浄後のフィルムを乾燥後
、窒素置換した235℃のオープン中で、2分間同時二
軸延伸機でタテ、ヨコ方向同時に1.4倍延伸熱処理し
た。得られたフィルムは、絶縁破壊電圧183kv/T
Oft(AST■刀49−?法)、引張強度17.1k
9/Tdl伸度40%を有していた。
Immediately, the glass plate was placed in an electric heating oven at 80 μC, and after one hour, the film was peeled off from the glass plate, and the amount of remaining solvent was measured. It was found that the weight was %. Then, the film was washed with running water for H hours, so that the amount of residual solvent in the film was 0.1% by weight, and the amount of residual calcium chloride was 0.
.. The amount was 0.05% by weight. After drying the film after washing with running water, it was subjected to heat treatment for stretching 1.4 times simultaneously in the vertical and horizontal directions using a simultaneous biaxial stretching machine for 2 minutes in an open air atmosphere at 235° C. under nitrogen atmosphere. The obtained film had a dielectric breakdown voltage of 183 kv/T.
Of (AST ■ sword 49-? method), tensile strength 17.1k
9/Tdl elongation of 40%.

実施例1 m−フェニレンジアミン40モル%、p−フェニレンジ
アミン10モル%とイソフタル酸クロライド50モル%
とよりηIrlFlが1.84のポリーm−フェニレン
/p−フエニレンイソフタラミドランダムコポリマー(
ポリーm−フエニレンイソフタラミド単位80モル%、
ポリーp−フエニレンイソフタラミド単位20モル%よ
りなる。
Example 1 40 mol% m-phenylenediamine, 10 mol% p-phenylenediamine and 50 mol% isophthaloyl chloride
Poly m-phenylene/p-phenylene isophthalamide random copolymer with ηIrlFl of 1.84 (
80 mol% of poly m-phenylene isophthalamide units,
It consists of 20 mol% of poly p-phenylene isophthalamide units.

)を得た。上記コポリアミド1踵量%、ジメチルアセト
アミド81重量%より均一なドープを得、比較例1と同
様にしてガラス板に300μの厚みで均一に塗付した。
) was obtained. A uniform dope was obtained from 1% by weight of the above copolyamide and 81% by weight of dimethylacetamide, and was applied uniformly to a thickness of 300 μm on a glass plate in the same manner as in Comparative Example 1.

直ちにガラス板を80℃のオープンに入れ、8時間後に
ガラス板よりフィルムを剥離し、残存溶媒量を測定した
ところ17.5重量%であつた。ついでこのまま窒素置
換された235℃のオープン中で2分間同時二軸延伸機
でタテ、ヨコ方向同時に1.3倍延伸熱処理した。得ら
れたフィルムは無色透明で絶縁破壊電圧215kV/W
!Ftl引張強度18.8k9/Rdl伸度38%を示
した。
Immediately, the glass plate was placed in an oven at 80°C, and after 8 hours, the film was peeled off from the glass plate, and the amount of residual solvent was measured and found to be 17.5% by weight. Then, the film was subjected to a heat treatment for stretching 1.3 times in the vertical and horizontal directions at the same time for 2 minutes in a simultaneous biaxial stretching machine in an open air atmosphere at 235° C. under nitrogen atmosphere. The obtained film was colorless and transparent and had a dielectric breakdown voltage of 215 kV/W.
! It showed Ftl tensile strength of 18.8k9/Rdl elongation of 38%.

実施例2 m−フェニレンジアミン50モル%、イソフタル酸クロ
ライド40モル%、テレフタル酸クロライド10モル%
を用い、N−メチルピロリドンを溶媒として低温溶液重
合を行つた。
Example 2 m-phenylenediamine 50 mol%, isophthalic acid chloride 40 mol%, terephthalic acid chloride 10 mol%
Low temperature solution polymerization was carried out using N-methylpyrrolidone as a solvent.

得られた重合ドープにアンモニアガスを吹き込み中和を
行つた後、副生した塩化アンモニウムをp別した。得ら
れた均一なドープ中にはポリーm−フエニレンイソフタ
ラミド/テレフタラミドポリマー(ポリーm−フエニレ
ンイソフタラミド単位80モル%、ポリーmーフエニレ
ンイソフタラミド単位20モル%よりなる。)を1踵量
%、塩化アンモニウム0.05重量%〔ポリマーに対し
て0.29%)含んでいた。またポリマーのηInhは
1.94であつた。上記ドープを450μの厚さにガラ
ス板に塗付”し、直ちにガラス板を95℃のオープン中
に入れ、1C@間後フィルムを剥離したところ、残存溶
媒率は17.鍾量%であつた。
After neutralizing the obtained polymerized dope by blowing ammonia gas into it, ammonium chloride produced as a by-product was separated. The resulting uniform dope contained a poly m-phenylene isophthalamide/terephthalamide polymer (consisting of 80 mol% poly m-phenylene isophthalamide units and 20 mol% poly m-phenylene isophthalamide units). ) and 0.05% by weight of ammonium chloride (0.29% based on the polymer). Further, the ηInh of the polymer was 1.94. The above dope was applied to a glass plate to a thickness of 450μ, and the glass plate was immediately placed in an open chamber at 95°C, and the film was peeled off after 1C, and the residual solvent rate was 17%. .

これを80℃の熱水中に20分間浸漬してのち乾燥し、
ついで2500Cにおいて同時二軸延伸機でタテ、ヨコ
方向同時に1.3倍延伸熱処理し、絶縁破壊電圧198
kv/Twtl引張強度18.3k9/d1伸度35%
の無色透明なフィルムを得た。比較例2 実施例2と同様にして得られたドープを450μの厚さ
にガラス板に塗付し、直ちにガラス板を95℃のオープ
ン中に入れ、6時間後フィルムを剥離した。
This was immersed in hot water at 80°C for 20 minutes and then dried.
Then, heat treatment was performed at 2500C for simultaneous 1.3x stretching in the vertical and horizontal directions using a simultaneous biaxial stretching machine, resulting in a dielectric breakdown voltage of 198.
kv/Twtl tensile strength 18.3k9/d1 elongation 35%
A colorless and transparent film was obtained. Comparative Example 2 A dope obtained in the same manner as in Example 2 was applied to a glass plate to a thickness of 450 μm, and the glass plate was immediately placed in an open chamber at 95° C., and the film was peeled off after 6 hours.

フィルムの残存溶媒量は26.3%であつた。このフィ
ルムを250℃の温度で同時二軸延伸機でタテ、ヨコ方
向同時に1.3倍延伸熱処理した。熱処理後のフィルム
性能は絶縁破壊電圧138kv/顛、引張強度12.5
k9/Wltl伸度42%と低いものであつた。実施例
3 m−フェニレンジアミン45モル%、4,4″ージアミ
ノジフェニールメタン5モル%、イソフタル酸クロライ
ド50ル%より、ヘキサメチルホスホルアミド中で低温
溶液重合を行いηIrlFll.32のコポリアミドを
得た。
The amount of residual solvent in the film was 26.3%. This film was heat-treated to be simultaneously stretched 1.3 times in the vertical and horizontal directions using a simultaneous biaxial stretching machine at a temperature of 250°C. Film performance after heat treatment is dielectric breakdown voltage 138kv/film, tensile strength 12.5
The k9/Wltl elongation was as low as 42%. Example 3 A copolyamide of ηIrlFll.32 was obtained by low-temperature solution polymerization in hexamethylphosphoramide from 45 mol% of m-phenylenediamine, 5 mol% of 4,4''-diaminodiphenylmethane, and 50 mol% of isophthalic acid chloride. I got it.

上記コポリアミドを一旦単離してからテトラメチル尿素
にポリマー濃度が2鍾量%となるように溶解して均一な
ドープを調製した。
The above copolyamide was once isolated and then dissolved in tetramethylurea to a polymer concentration of 2% by weight to prepare a uniform dope.

このドープを350μの厚みでガラス板に塗付し、直ち
にガラス板を130℃のオープン中に入れ5時間加熱後
、240℃のオープン中で2分間二軸延伸機でタテ、ヨ
コ方向同時に1.3倍延伸熱処理したところ、絶縁破壊
電圧205kV/朗、引張強度18.1k9/i1伸度
羽%の無色透明なフィルムが得られた。比較例3 実施例3と同様にして調製したドープを350μの厚さ
にガラス板に塗布し、直ちにガラス板を130℃のオー
プン中に入れ5時間加熱後120℃のオープン中で同時
二軸延伸を試みたがタテ、ヨコ両方向共延伸することが
でき、そのままで3分間熱処理した。
This dope was applied to a glass plate to a thickness of 350 μm, and the glass plate was immediately placed in an open room at 130°C and heated for 5 hours, and then 1. When the film was subjected to 3-fold stretching heat treatment, a colorless and transparent film having a dielectric breakdown voltage of 205 kV/R and a tensile strength of 18.1 K9/i1 and elongation % was obtained. Comparative Example 3 A dope prepared in the same manner as in Example 3 was applied to a glass plate to a thickness of 350 μm, and the glass plate was immediately placed in an open chamber at 130°C and heated for 5 hours, followed by simultaneous biaxial stretching at 120°C in an open chamber. However, it was possible to stretch the film in both the vertical and horizontal directions, and the film was then heat-treated for 3 minutes.

Claims (1)

【特許請求の範囲】 1 全アミド構成単位の90〜20モル%がポリ−m−
フエニレンイソフタラミドからなり、残りの10〜80
モル%が実質的に等モルの下記のジカルボン酸およびジ
アミン単位で構成される固有粘度0.8以上(96%硫
酸溶媒中で濃度0.5g/100ml、25℃で測定)
のポリアミドとアミド系溶媒とからなり、かつ無機塩含
有量(対ポリマー)が0.3重量%以下であるドープか
ら薄膜を形成し、該薄膜を加熱して該薄膜中の残存溶媒
量(対薄膜)を20重量%以下となし、ついで150℃
以上の温度で熱処理するか、あるいは水洗を行つたのち
150℃以上の温度で熱処理することを特徴とする芳香
族コポリアミドフイルムの製造法。 (ジカルボン酸単位) ▲数式、化学式、表等があります▼ ただし、〔x:ハロゲン、メチル基 n:0,1または2〕 ▲数式、化学式、表等があります▼ ただし、〔Y:−CH_2−,−C(CH_3)_2−
−CO−,−SO_2−,−SO−m:0または1〕 ジアミン単位) ▲数式、化学式、表等があります▼ ただし、〔z:ハロゲン、メチル基、 1:0,1または2〕 ▲数式、化学式、表等があります▼ ただし、〔w:CH_2−,−C(CH_3)_2−,
−CO−,−SO_2−,−SO− k:0または1〕
[Claims] 1. 90 to 20 mol% of all amide structural units are poly-m-
consisting of phenylene isophthalamide, the remaining 10 to 80
Intrinsic viscosity of 0.8 or more (concentration 0.5 g/100 ml in 96% sulfuric acid solvent, measured at 25°C) composed of substantially equimolar mole % of the following dicarboxylic acid and diamine units
A thin film is formed from a dope consisting of a polyamide and an amide solvent with an inorganic salt content (based on the polymer) of 0.3% by weight or less, and the thin film is heated to determine the amount of residual solvent in the thin film (based on the polymer). (thin film) to 20% by weight or less, and then heated to 150°C.
1. A method for producing an aromatic copolyamide film, which comprises heat-treating at a temperature of 150° C. or higher, or washing with water and then heat-treating at a temperature of 150° C. or higher. (Dicarboxylic acid unit) ▲There are mathematical formulas, chemical formulas, tables, etc.▼ However, [x: halogen, methyl group n: 0, 1 or 2] ▲There are mathematical formulas, chemical formulas, tables, etc.▼ However, [Y: -CH_2- , -C(CH_3)_2-
-CO-, -SO_2-, -SO-m: 0 or 1] diamine unit) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ However, [z: halogen, methyl group, 1: 0, 1 or 2] ▲ Numerical formula , chemical formulas, tables, etc. ▼ However, [w: CH_2-, -C(CH_3)_2-,
-CO-, -SO_2-, -SO- k: 0 or 1]
JP4709475A 1975-04-17 1975-04-17 Method for producing aromatic copolyamide film Expired JPS6054339B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4709475A JPS6054339B2 (en) 1975-04-17 1975-04-17 Method for producing aromatic copolyamide film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4709475A JPS6054339B2 (en) 1975-04-17 1975-04-17 Method for producing aromatic copolyamide film

Publications (2)

Publication Number Publication Date
JPS51122159A JPS51122159A (en) 1976-10-26
JPS6054339B2 true JPS6054339B2 (en) 1985-11-29

Family

ID=12765587

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4709475A Expired JPS6054339B2 (en) 1975-04-17 1975-04-17 Method for producing aromatic copolyamide film

Country Status (1)

Country Link
JP (1) JPS6054339B2 (en)

Also Published As

Publication number Publication date
JPS51122159A (en) 1976-10-26

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