JPS6138558B2 - - Google Patents
Info
- Publication number
- JPS6138558B2 JPS6138558B2 JP14618278A JP14618278A JPS6138558B2 JP S6138558 B2 JPS6138558 B2 JP S6138558B2 JP 14618278 A JP14618278 A JP 14618278A JP 14618278 A JP14618278 A JP 14618278A JP S6138558 B2 JPS6138558 B2 JP S6138558B2
- Authority
- JP
- Japan
- Prior art keywords
- write
- current
- rom
- circuit
- writing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 230000015556 catabolic process Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C17/00—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards
- G11C17/14—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM
- G11C17/16—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM using electrically-fusible links
Landscapes
- Read Only Memory (AREA)
Description
【発明の詳細な説明】
本発明はモノリシツク集積回路に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to monolithic integrated circuits.
最近各種のプログラマブルリードオンリーメモ
リ(以下P―ROMと略称する)の方式が開発さ
れている。この中でトランジスタをベース・エミ
ツタ間ジヤンクシヨン焼付(短絡)の有無により
各々1,0の記憶素子として使う所謂ジヤンクシ
ヨン式P―ROMは、通常のヒユーズ式における
ニクロム等の形式を要せず通常のバイポーラプロ
セスを適用できる点で注目されている。特に、ベ
ース開放のトランジスタを記憶素子として用いる
方式は、ベース・コレクタ間ダイオードが、その
まま、記憶素子アレイのデカツプル用ダイオード
として使え、且つコレクタは行方向に共通に出来
るので、行方向には絶縁を要しない。 Recently, various types of programmable read-only memory (hereinafter abbreviated as P-ROM) have been developed. Among these, the so-called juncture-type P-ROM, which uses a transistor as a memory element for 1 and 0 depending on whether or not there is a juncture burn-in (short circuit) between the base and emitter, does not require the nichrome or other forms of the usual fuse type, but instead is a normal bipolar type. It is attracting attention because the process can be applied. In particular, in the method of using open-base transistors as storage elements, the base-collector diode can be used as is as a decoupling diode for the storage element array, and the collector can be shared in the row direction, so insulation is required in the row direction. Not needed.
ところで、一般のLSIと同様にP―ROMも大容
量化を進めるにつれ、従来の技術を適用するだけ
では、チツプサイズは大きくなり、且つスピード
も遅くなるばかりであることから、素子当りの単
位面積縮小及び配線幅縮小等の新プロセス導入は
不可欠であり、この導入により、大容量かつ高ス
ピードのP―ROMを提供することができる。 By the way, as P-ROMs, like general LSIs, continue to increase in capacity, the chip size will increase and the speed will only slow down if only conventional technology is applied, so it is necessary to reduce the unit area per element. It is essential to introduce new processes such as reduction of wire width and wiring width, and this introduction makes it possible to provide a large-capacity, high-speed P-ROM.
さて、上述のジヤンクシヨン式P―ROMで
は、書き込みのメカニズムは次のように考えられ
る。すなわち選択的に各素子毎に、エミツタ・コ
レクタ間に正電位を生ずるようベース・エミツタ
間ブレークダウンにより、一定の大電流(例え
ば、200mA)を一定時間流し込み、その発熱に
よる局部的温度上昇によるエミツタ側のコンタク
ト金属(アルミニウム)のスパイク形成によりエ
ミツタ・ジヤンクシヨンを短絡させることにより
行なわれる。 Now, in the above-mentioned juncture type P-ROM, the writing mechanism can be considered as follows. In other words, a certain large current (for example, 200 mA) is selectively applied to each element for a certain period of time by breakdown between the base and the emitter to generate a positive potential between the emitter and the collector, and the emitter rises due to the local temperature rise caused by the heat generated. This is done by shorting the emitter junction by forming a spike in the side contact metal (aluminum).
そこで記憶素子に対しても上述のような素子面
積の小さい新プロセスを導入した場合、書き込み
に必要な電流を従来より減らすことが出来る
(例:100mA)という事実がある。のみならずか
かる小さい面積の記憶素子を従来と同じ大電流
(例:200mA)で書き込むことはコレクタ・ジヤ
ンクシヨンが従来よりもエミツタ・ジヤンクシヨ
ンの極く近傍にあるためその耐圧を害しやすい。
又、書き込み電流を減らすならば、この電流を扱
う行、列のドライバ回路の素子面積を減らせるの
で一層好都合である。しかしながら書き込み電流
を変更する(小さくする)ためにP―ROM書き
込み装置自身の仕様までを変更することは従来の
特性の部品との互換性が失われるので好ましくな
いことである。 Therefore, if a new process with a small element area as described above is introduced for the memory element, the current required for writing can be reduced compared to the conventional one (for example, 100 mA). Furthermore, writing to such a small-area memory element with the same large current (eg 200 mA) as in the past tends to impair its breakdown voltage because the collector junction is located much closer to the emitter junction than in the past.
Further, if the write current is reduced, it is even more convenient because the element area of the row and column driver circuits that handle this current can be reduced. However, it is undesirable to change the specifications of the P-ROM writing device itself in order to change (reduce) the write current because compatibility with components with conventional characteristics will be lost.
本発明の目的は書き込み電流に互換性を付与し
た集積回路を提供することにある。 SUMMARY OF THE INVENTION An object of the present invention is to provide an integrated circuit with write current compatibility.
本発明による集積回路は書き込み電流の一部を
バイパスする為のバイパス回路をモノリシツク集
積回路内部に設けることにより、書き込み電流が
従来仕様の書き込み装置をそのまま使つて記憶素
子には所望の小さい書き込み電流を流すようにし
たことを特徴とする。 The integrated circuit according to the present invention has a bypass circuit inside the monolithic integrated circuit for bypassing a part of the write current, so that the write current can be reduced by using a conventional writing device as is and supplying a desired small write current to the memory element. It is characterized by being made to flow.
以下、図面を参照して本発明について説明す
る。まず、書き込み専用の端子を持つP―ROM
の書き込み回路の一例を示す。 The present invention will be described below with reference to the drawings. First, P-ROM has a write-only terminal.
An example of a write circuit is shown below.
第1図を参照すると、Z1,…Zmは書き込み用
列駆動回路、ベース開放のトランジスタQx1y1…
Qx1ym…Qxny1…Qxnymは(mxn)個のメモリ
セル、X1…Xnは行線、Y1…Ymは列線をそれぞれ
示している。ここで、例えば、トランジスタ
Qx1y1が選択されたとすると、書き込み専用端子
1より、従来の書き込み装置の仕様の大電流を流
すと、書き込み用駆動回路Zを導通させ、トラン
ジスタQx1y1に大電流が流れ込み書き込みが行な
われるがこの際上述したようにコレクタジヤンク
シヨンの破壊もしくは耐圧の低下がもたされる。 Referring to FIG. 1, Z 1 ,...Zm are column drive circuits for writing, and open-base transistors Qx 1 y 1 ...
Qx 1 ym...Qxny 1 ...Qxnym indicate (mxn) memory cells, X1 ...Xn indicate row lines, and Y1 ...Ym indicate column lines. Here, for example, the transistor
Assuming that Qx 1 y 1 is selected, when a large current according to the specifications of a conventional writing device is passed through the write-only terminal 1, the write drive circuit Z is made conductive, and a large current flows into the transistor Qx 1 y 1 , and writing is performed. However, as mentioned above, the collector juncture is destroyed or the withstand voltage is lowered.
つぎに、本発明の一実施例を第2図を参照して
示す。書き込み回路Z1〜Zmは第1図と同じであ
り本発明で新規に内部にバイパス回路2つまり定
電流源2を設けている。書き込み専用端子1より
大電流を流し込むと最初大電流の一部が定電流源
2に流れ込み、大電流から定電流源に流れ込む大
電流を差し引いた電流つまり小電流が、第1図の
例を取ると、書き込み用駆動回路Z1を導通させ、
選択されたメモリセルQx1y1に流れ込み、小電流
でその書き込みが行なわれる。従つて定電流源を
バイパス回路として内部に設けることにより、新
プロセスの導入により、単位面積当りの小さくな
つたメモリセルを書き込む際、P―ROM書き込
み装置の仕様のままの大電流で書き込むと、コレ
クタ・ジヤンクシヨンが極く近傍にあるため、そ
の耐圧を害しやすいという問題はなくなり、書き
込み専用端子を持つP―ROMにおいて、単位当
りの小さくなつたメモリセルの書き込むに必要な
小電流をメモリセルに流し込むことが出来る。 Next, one embodiment of the present invention will be described with reference to FIG. The write circuits Z 1 to Zm are the same as those shown in FIG. 1, and in the present invention, a bypass circuit 2, that is, a constant current source 2 is newly provided inside. When a large current flows into the write-only terminal 1, a portion of the large current initially flows into the constant current source 2, and the current obtained by subtracting the large current flowing into the constant current source from the large current, that is, the small current, is obtained using the example shown in Figure 1. , the write drive circuit Z 1 is made conductive,
The current flows into the selected memory cell Qx 1 y 1 , and writing is performed using a small current. Therefore, by providing a constant current source internally as a bypass circuit, when writing to a memory cell whose unit area has become smaller due to the introduction of a new process, it is possible to write with a large current as specified by the P-ROM writing device. Since the collector junction is very close to each other, the problem of easily damaging its withstand voltage is eliminated, and in P-ROMs with write-only terminals, the small current required to write to the memory cell, which has become smaller per unit, can be applied to the memory cell. It can be poured.
つぎに、書き込み専用端子を出力端子と共用し
使用するP―ROMにおいて、本発明の具体例を
示す。 Next, a specific example of the present invention will be shown in a P-ROM in which a write-only terminal is shared with an output terminal.
第3図を参照すると、トランジスタQ9とQ10で
構成する書き込み用列駆動回路つまりPNPN路の
ゲインは、トランジスタQ5とQ6、トランジスタ
Q7とQ8で構成するPNPN回路のゲインより大きく
し、出力端子共用の書き込み端子3より、P―
ROM書き込み装置の仕様のままの大電流を流し
込むと、バイパス回路2のトランジスタQ9とQ10
で構成するPNPN回路のゲインが、トランジスタ
Q5とQ6及びQ7とQ8で構成するPNPN回路のゲイ
ンより大きい為、最切、大電流の一部は、トラン
ジスタQ0とQ10で構成するPNPN路を導通させ、
パワートランジスタQ11に流れ込む。例えば、ゲ
ート4,6,7を高(High)レベル、ゲート
5,8,9を底(Low)レベルとし、メモリセル
Q1を選択した場合を考えると、大電流からバイ
パス回路2のトランジスタQ11に流れ込む電流を
差し引いた電流つまり小電流が、トランジスタ
Q5とQ6で構成するPNPN回路を導通させ、選択さ
れたメモリセルQx1y1に流れ込み、導通している
トランジスタQ12に流れ込むことになる。従つ
て、新プロセスの導入により単位当りの面積の小
さくなつたメモリセルを書き込む際、従来のP―
ROM書き込み装置の仕様のままの大電流で書き
込むと、コレクタ・ジヤンクシヨンが極く近傍に
あるため、その耐圧を害しやすいという問題もな
くなり、書き込み端子を出力端子と共用するP―
ROMにおいて、単位当りの面積の小さくなつた
メモリセルを書き込むに必要な小電流をメモリセ
ルに流し込むことが出来る。 Referring to FIG. 3, the gain of the write column drive circuit or PNPN path consisting of transistors Q 9 and Q 10 is determined by the gain of transistors Q 5 and Q 6 and transistors
The gain is greater than the gain of the PNPN circuit composed of Q 7 and Q 8 , and the P-
When a large current is applied according to the specifications of the ROM writing device, transistors Q 9 and Q 10 of bypass circuit 2
The gain of the PNPN circuit consisting of the transistor
Since the gain is larger than the gain of the PNPN circuit composed of Q 5 and Q 6 and Q 7 and Q 8 , a part of the highest current conducts the PNPN path composed of transistors Q 0 and Q 10 ,
Flows into the power transistor Q 11 . For example, if gates 4, 6, and 7 are set to high level and gates 5, 8, and 9 are set to bottom level, the memory cell
Considering the case where Q 1 is selected, the current obtained by subtracting the current flowing into transistor Q 11 of bypass circuit 2 from the large current, that is, the small current, flows through the transistor
The PNPN circuit composed of Q 5 and Q 6 is made conductive, and the flow flows into the selected memory cell Qx 1 y 1 , and then into the conductive transistor Q 12 . Therefore, when writing to memory cells whose area per unit has become smaller due to the introduction of a new process, conventional P-
If you write with a large current according to the specifications of the ROM writing device, the collector junction is very close to each other, so there is no problem of easily damaging its withstand voltage.
In ROM, it is possible to flow the small current required to write into a memory cell whose area per unit has become smaller.
以上説明した様に、本発明は、新プロセス化の
導入によりトランジスタ1個当りの面積縮小及び
配線縮小をなされたP―ROMにおいて書き込み
端子より流し込む大電流の一部をバイパスする為
のバイパス回路を設け、メモリセルの書き込み電
流を小電流で行なうことが出来、且つP―ROM
書き込み装置の仕様を変更することなく大容量、
高スピードのP―ROMを提供することが出来、
本発明の効果は甚大である。なお、ヒユーズ式P
―ROMにおいても同様に本発明のバイパス回路
を内部に設けることにより、書き込み電流の一部
をバイパスし、メモリセルの書き込みを小電流で
行なえることが出来ヒユーズ式及びジヤンクシヨ
ン式P―ROMにも本発明は適用でき効果は甚大
である。 As explained above, the present invention provides a bypass circuit for bypassing a portion of the large current flowing from the write terminal in a P-ROM in which the area per transistor and wiring have been reduced due to the introduction of a new process. The write current of the memory cell can be performed with a small current, and the P-ROM
Large capacity without changing the specifications of the writing device.
We can provide high-speed P-ROM,
The effects of the present invention are enormous. In addition, fuse type P
- Similarly, by providing the bypass circuit of the present invention inside the ROM, a part of the write current can be bypassed, and writing to the memory cell can be performed with a small current. The present invention can be applied and the effects are enormous.
第1図は、書き込み端子を専用に持つた従来の
P―ROMを示す回路図、第2図は、本発明の一
実施例によるP―ROMを示す回路図、第3図
は、上記実施例の一具体例を示す回路図である。
Z1〜Zm…書き込み回路、1,11…書き込み
端子、2…バイパス回路、Q5〜Q12…トランジス
タ、Qx1y1〜Qxnym…メモリセル、D1〜D4…ダ
イオド。
Fig. 1 is a circuit diagram showing a conventional P-ROM having a dedicated write terminal, Fig. 2 is a circuit diagram showing a P-ROM according to an embodiment of the present invention, and Fig. 3 is a circuit diagram showing the above-mentioned embodiment. FIG. 2 is a circuit diagram showing a specific example. Z1 to Zm...Write circuit, 1, 11...Write terminal, 2...Bypass circuit, Q5 to Q12 ...Transistor, Qx1y1 to Qxnym ...Memory cell, D1 to D4 ...Diode.
Claims (1)
プログラム回路を含む集積回路に於て、該固定記
憶素子へ流し込みむ書き込み電流の一部のみをバ
イパスして該固定素子に流れる電流量を減少させ
るバイパス回路を設けたことを特徴とするプログ
ラマブル・モノリシツク集積回路。 2 上記固定記憶素子はベース開放のバイポーラ
トランジスタによつて構成されていることを特徴
とする特許請求の範囲第1項に記載の集積回路。[Claims] 1. In an integrated circuit including an electrically writable fixed memory element and its programming circuit, only a part of the write current flowing into the fixed memory element is bypassed and flows to the fixed element. A programmable monolithic integrated circuit characterized by having a bypass circuit that reduces the amount of current. 2. The integrated circuit according to claim 1, wherein the fixed memory element is constituted by a bipolar transistor with an open base.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14618278A JPS5573991A (en) | 1978-11-27 | 1978-11-27 | Integrated circuit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14618278A JPS5573991A (en) | 1978-11-27 | 1978-11-27 | Integrated circuit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5573991A JPS5573991A (en) | 1980-06-04 |
| JPS6138558B2 true JPS6138558B2 (en) | 1986-08-29 |
Family
ID=15401982
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14618278A Granted JPS5573991A (en) | 1978-11-27 | 1978-11-27 | Integrated circuit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5573991A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5647994A (en) * | 1979-09-25 | 1981-04-30 | Nec Corp | Programmable monolithic integrated circuit |
| JPS6070597A (en) * | 1983-09-28 | 1985-04-22 | Toshiba Corp | Non-volatile semiconductor storage device |
| JPH01146198A (en) * | 1987-12-02 | 1989-06-08 | Fujitsu Ltd | Programable read only memory device |
-
1978
- 1978-11-27 JP JP14618278A patent/JPS5573991A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5573991A (en) | 1980-06-04 |
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