JPS6144948B2 - - Google Patents
Info
- Publication number
- JPS6144948B2 JPS6144948B2 JP9581178A JP9581178A JPS6144948B2 JP S6144948 B2 JPS6144948 B2 JP S6144948B2 JP 9581178 A JP9581178 A JP 9581178A JP 9581178 A JP9581178 A JP 9581178A JP S6144948 B2 JPS6144948 B2 JP S6144948B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- titanium oxide
- coating
- alkyl titanate
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 27
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 27
- -1 alkyl titanate Chemical compound 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 16
- 239000002253 acid Substances 0.000 claims description 13
- 238000010438 heat treatment Methods 0.000 claims description 8
- 239000002904 solvent Substances 0.000 claims description 8
- 150000007524 organic acids Chemical class 0.000 claims description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 150000007522 mineralic acids Chemical class 0.000 claims description 3
- UEZVMMHDMIWARA-UHFFFAOYSA-N Metaphosphoric acid Chemical compound OP(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-N 0.000 claims description 2
- 238000004132 cross linking Methods 0.000 claims description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hcl hcl Chemical compound Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 2
- 229920000137 polyphosphoric acid Polymers 0.000 claims description 2
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 claims description 2
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 claims 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims 1
- 239000004327 boric acid Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 description 25
- 239000011248 coating agent Substances 0.000 description 19
- 239000010409 thin film Substances 0.000 description 18
- 239000010408 film Substances 0.000 description 10
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 8
- 239000010410 layer Substances 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- 229910052719 titanium Inorganic materials 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 5
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 238000010306 acid treatment Methods 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- 235000005985 organic acids Nutrition 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- 150000003609 titanium compounds Chemical class 0.000 description 2
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium ethoxide Chemical compound [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 2
- ZDPHROOEEOARMN-UHFFFAOYSA-N undecanoic acid Chemical compound CCCCCCCCCCC(O)=O ZDPHROOEEOARMN-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- FPIQZBQZKBKLEI-UHFFFAOYSA-N ethyl 1-[[2-chloroethyl(nitroso)carbamoyl]amino]cyclohexane-1-carboxylate Chemical compound ClCCN(N=O)C(=O)NC1(C(=O)OCC)CCCCC1 FPIQZBQZKBKLEI-UHFFFAOYSA-N 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- ZYCMDWDFIQDPLP-UHFFFAOYSA-N hbr bromine Chemical compound Br.Br ZYCMDWDFIQDPLP-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 235000011167 hydrochloric acid Nutrition 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- KQJBQMSCFSJABN-UHFFFAOYSA-N octadecan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCCCCCCCCCCCCCCCC[O-].CCCCCCCCCCCCCCCCCC[O-].CCCCCCCCCCCCCCCCCC[O-].CCCCCCCCCCCCCCCCCC[O-] KQJBQMSCFSJABN-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- HKJYVRJHDIPMQB-UHFFFAOYSA-N propan-1-olate;titanium(4+) Chemical compound CCCO[Ti](OCCC)(OCCC)OCCC HKJYVRJHDIPMQB-UHFFFAOYSA-N 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Chemical Treatment Of Metals (AREA)
- Manufacturing Of Electric Cables (AREA)
- Chemically Coating (AREA)
Description
【発明の詳細な説明】
本発明はアルキルチタネートから酸化チタンを
形成せしめる方法に関し、更に詳しくは例えばア
ルキルチタネート溶液を基板上に塗布し、加熱処
理して溶媒除去及び架橋化反応をおこさしめて酸
化チタン膜を形成せしめる方法に関する。
酸化チタン薄膜は高屈折誘電層として透明導電
性被膜あるいは選択光透過性被膜の重要な成分で
ある。従来、これらの酸化チタン薄膜層を形成す
る方法として、例えば、真空蒸着法、カソードス
パツタリング法等が用いられてきた。しかし、こ
れらの方法は均一厚さの薄膜を形成することが困
難な点、更には、生産性が低い等の欠点があつ
た。これらの欠点を改良すべくアルキルチタネー
トを溶解した溶液を塗工し、加熱処理等により酸
化チタン薄膜層を得ようとする試みが提案されて
いるが、アルキルチタネートの水に対する安定性
が悪い為にアルキルチタネートの塗布工程におい
て均一透明な塗布層を得ることが困難であり、目
的とする良好な酸化チタン薄膜を形成することが
困難であつた。従つて、水に対する不安定性と操
作性の改善の為にアルキルチタネートを錯塩に変
換して、安定な塗布溶液を得る方法も試みられて
いる。例えば、アルキルチタネートにアセチルア
セトン或いはアセト酢酸エチルを添加する方法等
である。このようにチタン化合物の錯塩を形成す
ると塗布液は安定化されて、塗工自体の操作性は
改善されうるが、塗工後に塗布層を加熱処理する
ことにより形成せしめられた酸化チタン薄膜は目
的の酸化チタン成分に完全に変換せず、錯塩形成
の為に用いた有機化合物および原料アルキルチタ
ネートのアルキルオキシ成分が残存し、充分に満
足できる酸化チタン薄膜層を形成せしめ得ないと
いう欠点がある。
本発明はアルキルチタネートを塗布し、酸化チ
タン薄膜を形成せしめる方法において、アルキル
チタネートの塗工工程においては水分に対して安
定であり、加熱処理工程においては速やかに酸化
チタン薄膜が形成される方法について鋭意研究
し、これらの目的に適う新規な方法を見出した。
即ち、本発明は、アルキルチタネート又はその
溶液を酸で処理した後、これを加熱して、溶媒の
除去及び/又は架橋化反応をおこさしめて透明酸
化チタン膜を形成せしめることを特徴とする透明
酸化チタン膜の製造方法である。
本発明の方法により調製した塗布液は水分に対
し安定であり、ガラス板,フイルム,金属板等の
表面に、空気中、室温において容易に均一層に塗
布することが可能である。更に、塗布された基板
を、例えば熱風乾燥器中で加熱処理することによ
り速やかに目的の酸化チタン薄膜を形成せしめう
るという特徴を持つものである。更に、調製する
塗布液の濃度および塗布液量を調節することによ
り生成する酸化チタン薄膜の厚さを容易に制御で
きる特徴を持つものである。
本発明において使用されるアルキルチタネート
は、一般式TilOnRo(但しRはアルキル基,l,
m,nは正の整数)で表わされる。
上記の一般式で表わされるアルキルチタネート
のうちm=3l+1,n=2l+2,l=1〜40のも
のが塗工の容易さから好ましく用いられる。
lの値は、単一でなく分布を持つていても差支
えないが、特にlの値の分布が25以下に最大値を
有するアルキルチタネートは塗工操作において好
ましい。
上記の一般式において、Rは炭素原子数1〜20
のものが好ましい。特に炭素原子数が2〜15のア
ルキル基を有するものが被膜形成操作の点から望
ましい。
該アルキルチタネートは、酸と反応してチタン
原子の一部あるいは全部がイオン化されたチタン
となり、溶液として成型物の表面に塗布されると
加水分解等の反応と、それに続く縮合反応により
大部分が網目構造を有する酸化チタンになると考
えられる。
本発明に用いられるアルキルチタネートとして
は、例えば、テトラブチルチタネート,テトラエ
チルチタネート,テトラプロピルチタネート,テ
トラステアリルチタネート及びこれらの縮合物等
が挙げられる。
本発明方法の如く酸により変性されたアルキル
チタネート溶液を使用することにより塗布工程に
おける塗布液を安定させ、均一透明な塗膜を形成
させることができるようになつた。また、上記の
成形物表面に塗布した後に加熱処理して、酸化チ
タン薄膜を形成させるが、本発明による酸処理に
よるアルキルチタネートからの酸化チタン薄膜は
充分な網状の酸化チタンを形成し、原料アルキル
チタネートおよび使用する酸成分から起因する有
機物が非常に少い特徴がある。
本発明において使用される酸としては、無機酸
および有機酸が使用される。無機酸としては、水
に溶解させた時にH+を与えるもの、例えば塩化
水素(塩酸),臭化水素(臭化水素酸),硫酸,リ
ン酸,亜リン酸,メタリン酸,ポリリン酸,ホウ
酸,ベンゼンスルホン酸等が挙げられる。
有機酸としては、一般式が下記で表わされるも
のである。
R(CO2H)o
〔但し、式中Rはn価の有機残基を表わし、n
は1以上の正数を表わす。〕
かかる有機酸としては、例えば蟻酸,酢酸,プ
ロピオン酸,酪酸,イソ酪酸,吉草酸,ウンデカ
ン酸,オレイン酸,シクロヘキサンカルボン酸,
モノクロル酢酸,安息香酸,蓚酸,コハク酸,ア
ジピン酸等が挙げられる。これらの中でも特に好
ましくは塩化水素酸,蟻酸,酢酸,プロピオン
酸,酪酸,モノクロル酢酸等である。
本発明における酸の使用量は、有機酸で表わし
た場合使用されるアルキルチタネートのチタン原
子に対しカルボキシル基当量が0.1〜4の範囲が
好ましく、特に0.2〜20の範囲が望ましい。この
範囲の下限以下では酸処理の効果が小さく、この
範囲の上限を越える場合には、塗布溶液が白濁し
たり、形成される酸化チタン膜が充分な架橋(網
目)構造をとらない場合が多い。
本発明の被膜形成において一般的に用いられる
溶剤としては、塗布用のチタン化合物を充分に溶
解し、且つ塗布しようとする成型物の表面に対し
親和性を有し、塗布し易く、しかも塗布後に乾燥
し易い溶剤が好ましい。このような溶剤としては
ヘキサン,ヘプタン,シクロヘキサン,メチルシ
クロヘキサン,ベンゼン,トルエン,キシレン,
メタノール,エタノール,イソプロピルアルコー
ル,プロピルアルコール,ブタノール,シクロヘ
キサノール,テトラヒドロフラン,ジオキサン,
アセトン,酢酸エチル,酢酸ブチル,クロロホル
ム,メチルセロソルブ等が挙げられる。これらの
溶剤は、単独で用いてもよく、又2種以上を混合
して用いることもできる。
本発明における塗布後の調製は、アルキルチタ
ネートを適当な溶媒に溶解させ、所定の割合の酸
を反応させて行なわれる。この際、塗布チタン溶
液の濃度は最終的に形成される酸化チタン薄膜の
厚さ、塗布する方法、塗布する成形物等により変
化させることができる。例えば、数百オングスト
ローム以下の膜厚の酸化チタン薄膜層を均一に設
けるには、特に1〜7.5重量%に濃度を調整する
と良い。この溶液を成型物の表面に塗布する場
合、例えば浸漬法,噴霧法,コーテイングマシン
を用いる方法等が使用される。溶液は塗布すると
同時又は後に、加熱処理することにより目的の酸
化チタン薄膜層を得ることができる。この加熱処
理は50〜220℃の温度で、10秒〜1時間程度であ
る。
本発明の方法による酸化チタン薄膜形成の効果
は次の通りである。
1 塗布チタン溶液が水分に対し安定となり、ポ
ツトライフが長くなつた。
2 塗布液が安定になつた結果、塗工工程での厳
しい管理が必要でなくなつた。
3 形成される酸化チタン薄膜は性能の良い網状
構造を持つた透明度の高いものである。
以下、実施例を挙げて説明する。
実施例 1〜4
下記T4又はT10のアルキルチタネートと、下表
に示す溶媒を用いてアルキルチタネートの3.0重
量%の溶液を作成した。これに下表所定の酸を加
えて反応させ酸処理されたアルキルチタネートの
塗布液を得た。
これを光透過率86%で厚さ75μmのポリエチレ
ンテレフタレートフイルム上に数ミクロンの厚さ
にバーコーターを用いて塗布し、130℃の熱風乾
燥器中で2分間加熱処理し酸化チタン薄膜を形成
させた。得られた結果を同じく下表に示す。な
お、同表中のPrはプロキル基を表わす。
〔但しBuはブチル基を表わす。〕
【表】DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for forming titanium oxide from an alkyl titanate. More specifically, the present invention relates to a method for forming titanium oxide from an alkyl titanate. The present invention relates to a method for forming a film. Titanium oxide thin films are important components of transparent conductive coatings or selective light transmission coatings as high refractive dielectric layers. Conventionally, as a method for forming these titanium oxide thin film layers, for example, a vacuum evaporation method, a cathode sputtering method, etc. have been used. However, these methods have drawbacks such as difficulty in forming a thin film of uniform thickness and low productivity. In order to improve these drawbacks, attempts have been made to coat a solution containing an alkyl titanate and obtain a thin titanium oxide layer by heat treatment, etc. However, due to the poor stability of the alkyl titanate to water, It is difficult to obtain a uniform and transparent coating layer in the alkyl titanate coating process, and it is difficult to form a desired titanium oxide thin film. Therefore, attempts have been made to convert alkyl titanates into complex salts to obtain stable coating solutions in order to improve their instability with water and ease of handling. For example, there is a method of adding acetylacetone or ethyl acetoacetate to an alkyl titanate. Forming a complex salt of a titanium compound in this way can stabilize the coating solution and improve the operability of the coating itself, but the titanium oxide thin film formed by heat-treating the coating layer after coating is However, the organic compound used to form the complex salt and the alkyloxy component of the raw alkyl titanate remain, making it impossible to form a fully satisfactory titanium oxide thin film layer. The present invention relates to a method of coating an alkyl titanate to form a titanium oxide thin film, which is stable against moisture in the alkyl titanate coating process and quickly forming a titanium oxide thin film in the heat treatment process. After extensive research, we discovered a new method that meets these objectives. That is, the present invention provides a transparent titanium oxide film, which is characterized by treating an alkyl titanate or a solution thereof with an acid and then heating the same to cause solvent removal and/or crosslinking reaction to form a transparent titanium oxide film. This is a method for manufacturing a titanium film. The coating solution prepared by the method of the present invention is stable against moisture and can be easily coated in a uniform layer on the surfaces of glass plates, films, metal plates, etc. in air at room temperature. Furthermore, it has the characteristic that the desired titanium oxide thin film can be quickly formed by heating the coated substrate in, for example, a hot air dryer. Furthermore, by adjusting the concentration and amount of the coating liquid to be prepared, the thickness of the titanium oxide thin film produced can be easily controlled. The alkyl titanate used in the present invention has the general formula Ti l O n R o (where R is an alkyl group, l,
m and n are positive integers). Among the alkyl titanates represented by the above general formula, those where m=3l+1, n=2l+2, and l=1 to 40 are preferably used from the viewpoint of ease of coating. The value of l may not be uniform but may have a distribution, but alkyl titanates having a distribution of l values with a maximum value of 25 or less are particularly preferred in coating operations. In the above general formula, R has 1 to 20 carbon atoms.
Preferably. In particular, those having an alkyl group having 2 to 15 carbon atoms are desirable from the viewpoint of film forming operations. When the alkyl titanate reacts with an acid, some or all of the titanium atoms become ionized titanium, and when applied to the surface of a molded object as a solution, most of the titanium is ionized through reactions such as hydrolysis and subsequent condensation reactions. It is thought that titanium oxide has a network structure. Examples of the alkyl titanate used in the present invention include tetrabutyl titanate, tetraethyl titanate, tetrapropyl titanate, tetrastearyl titanate, and condensates thereof. By using an acid-modified alkyl titanate solution as in the method of the present invention, it has become possible to stabilize the coating solution in the coating process and form a uniform and transparent coating film. In addition, a titanium oxide thin film is formed by applying heat treatment to the surface of the molded product described above, but the titanium oxide thin film from alkyl titanate treated with acid according to the present invention forms a sufficient network of titanium oxide, and It is characterized by very little organic matter originating from the titanate and the acid components used. The acids used in the present invention include inorganic acids and organic acids. Examples of inorganic acids include those that give H + when dissolved in water, such as hydrogen chloride (hydrochloric acid), hydrogen bromide (hydrobromic acid), sulfuric acid, phosphoric acid, phosphorous acid, metaphosphoric acid, polyphosphoric acid, and boron. acid, benzenesulfonic acid, etc. The organic acid has the general formula shown below. R(CO 2 H) o [However, in the formula, R represents an n-valent organic residue, and n
represents a positive number of 1 or more. ] Examples of such organic acids include formic acid, acetic acid, propionic acid, butyric acid, isobutyric acid, valeric acid, undecanoic acid, oleic acid, cyclohexanecarboxylic acid,
Examples include monochloroacetic acid, benzoic acid, oxalic acid, succinic acid, and adipic acid. Among these, particularly preferred are hydrochloric acid, formic acid, acetic acid, propionic acid, butyric acid, monochloroacetic acid and the like. The amount of acid used in the present invention is preferably such that the carboxyl group equivalent, expressed as an organic acid, is in the range of 0.1 to 4, particularly preferably in the range of 0.2 to 20, relative to the titanium atom of the alkyl titanate used. If the acid treatment is below the lower limit of this range, the effect of acid treatment is small, and if it exceeds the upper limit of this range, the coating solution often becomes cloudy or the titanium oxide film formed does not have a sufficient crosslinked (network) structure. . The solvent generally used in forming the film of the present invention is one that sufficiently dissolves the titanium compound for coating, has an affinity for the surface of the molded object to be coated, is easy to coat, and is suitable for use after coating. A solvent that dries easily is preferred. Such solvents include hexane, heptane, cyclohexane, methylcyclohexane, benzene, toluene, xylene,
Methanol, ethanol, isopropyl alcohol, propyl alcohol, butanol, cyclohexanol, tetrahydrofuran, dioxane,
Examples include acetone, ethyl acetate, butyl acetate, chloroform, methyl cellosolve, and the like. These solvents may be used alone or in combination of two or more. The preparation after coating in the present invention is carried out by dissolving the alkyl titanate in a suitable solvent and reacting it with a predetermined proportion of acid. At this time, the concentration of the applied titanium solution can be changed depending on the thickness of the finally formed titanium oxide thin film, the application method, the molded object to be applied, etc. For example, in order to uniformly provide a titanium oxide thin film layer with a thickness of several hundred angstroms or less, the concentration is particularly preferably adjusted to 1 to 7.5% by weight. When applying this solution to the surface of a molded article, for example, a dipping method, a spraying method, a method using a coating machine, etc. are used. The desired titanium oxide thin film layer can be obtained by heat-treating the solution at the same time or after coating. This heat treatment is performed at a temperature of 50 to 220°C for about 10 seconds to 1 hour. The effects of forming a titanium oxide thin film by the method of the present invention are as follows. 1. The coated titanium solution became stable against moisture and had a longer pot life. 2. As a result of the coating liquid becoming more stable, strict control during the coating process is no longer necessary. 3. The titanium oxide thin film formed has a highly transparent network structure with good performance. Examples will be described below. Examples 1 to 4 A 3.0% by weight solution of the alkyl titanate was prepared using the following T 4 or T 10 alkyl titanate and the solvent shown in the table below. A specified acid shown in the table below was added to this and reacted to obtain an acid-treated alkyl titanate coating solution. This was coated on a polyethylene terephthalate film with a light transmittance of 86% and a thickness of 75 μm using a bar coater to a thickness of several microns, and then heated for 2 minutes in a hot air dryer at 130°C to form a titanium oxide thin film. Ta. The results obtained are also shown in the table below. In addition, Pr in the same table represents a prokyl group. [However, Bu represents a butyl group. 〕 【table】
Claims (1)
処理によつて溶媒除去及び/又は架橋反応をおこ
さしめて透明な酸化チタン膜を形成せしめる方法
において、アルキルチタネート又はその溶液が加
熱処理前に酸で処理されることを特徴とする透明
酸化チタン膜の製造方法。 2 該酸が炭素原子数20個以下の有機酸である特
許請求の範囲第1項記載の製造方法。 3 該酸が、塩化水素(塩酸),臭化水素酸,硫
酸,亜リン酸,メタリン酸,ポリリン酸,ホウ酸
から選ばれる少くとも1種の無機酸である特許請
求の範囲第1項記載の製造方法。[Claims] 1. A method for forming a transparent titanium oxide film by removing the solvent and/or causing a crosslinking reaction from an alkyl titanate or a solution thereof by heat treatment, wherein the alkyl titanate or a solution thereof is heated before the heat treatment. A method for producing a transparent titanium oxide film, characterized in that it is treated with an acid. 2. The manufacturing method according to claim 1, wherein the acid is an organic acid having 20 or less carbon atoms. 3. Claim 1, wherein the acid is at least one inorganic acid selected from hydrogen chloride (hydrochloric acid), hydrobromic acid, sulfuric acid, phosphorous acid, metaphosphoric acid, polyphosphoric acid, and boric acid. manufacturing method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9581178A JPS5524923A (en) | 1978-08-08 | 1978-08-08 | Manufacture of transparent titanium oxide film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9581178A JPS5524923A (en) | 1978-08-08 | 1978-08-08 | Manufacture of transparent titanium oxide film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5524923A JPS5524923A (en) | 1980-02-22 |
| JPS6144948B2 true JPS6144948B2 (en) | 1986-10-06 |
Family
ID=14147801
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9581178A Granted JPS5524923A (en) | 1978-08-08 | 1978-08-08 | Manufacture of transparent titanium oxide film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5524923A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62182279A (en) * | 1986-02-05 | 1987-08-10 | Futaki Itsuo | Formation of inorganic film and solution therefor |
| WO1996000198A1 (en) * | 1994-06-23 | 1996-01-04 | Bernd Penth | Production of ceramic layers and their use |
| WO1997015959A1 (en) * | 1995-10-24 | 1997-05-01 | Isa Ag Arch | Method for making an electrochemical cell, and resulting electrochemical cell |
| US6312831B1 (en) | 1999-04-30 | 2001-11-06 | Visteon Global Technologies, Inc. | Highly reflective, durable titanium/tin oxide films |
| WO2009104695A1 (en) * | 2008-02-22 | 2009-08-27 | 住友化学株式会社 | Method for producing transparent conductive substrate |
-
1978
- 1978-08-08 JP JP9581178A patent/JPS5524923A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5524923A (en) | 1980-02-22 |
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