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JPS6156844B2 - - Google Patents
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JPS6156844B2 - - Google Patents

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Publication number
JPS6156844B2
JPS6156844B2 JP55144594A JP14459480A JPS6156844B2 JP S6156844 B2 JPS6156844 B2 JP S6156844B2 JP 55144594 A JP55144594 A JP 55144594A JP 14459480 A JP14459480 A JP 14459480A JP S6156844 B2 JPS6156844 B2 JP S6156844B2
Authority
JP
Japan
Prior art keywords
resistor
firing
zno
evaporation
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55144594A
Other languages
Japanese (ja)
Other versions
JPS5768002A (en
Inventor
Nobuyuki Yoshioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Meidensha Electric Manufacturing Co Ltd
Original Assignee
Meidensha Electric Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Meidensha Electric Manufacturing Co Ltd filed Critical Meidensha Electric Manufacturing Co Ltd
Priority to JP55144594A priority Critical patent/JPS5768002A/en
Publication of JPS5768002A publication Critical patent/JPS5768002A/en
Publication of JPS6156844B2 publication Critical patent/JPS6156844B2/ja
Granted legal-status Critical Current

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  • Compositions Of Oxide Ceramics (AREA)
  • Thermistors And Varistors (AREA)

Description

【発明の詳細な説明】 本発明はZnOを主成分とする電圧非直線抵抗体
の製造方法、特にその側面絶縁方法に関するもの
である。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a voltage non-linear resistor containing ZnO as a main component, and particularly to a method for insulating its side surfaces.

従来、ZnOを主成分とする電圧非直線抵抗体
(以下抵抗体と略する。)の側面絶縁方法は、焼成
後抵抗体側面にエポキシ系有機物を塗布して絶縁
するか、あるいは抵抗体の焼成前に種々の無機化
合物を抵抗体側面に塗布後焼成し、ガラス質又は
結晶質の絶縁被膜を形成させて絶縁していた。
Conventionally, the side insulation methods for voltage nonlinear resistors (hereinafter abbreviated as resistors) whose main component is ZnO are to coat the sides of the resistor with an epoxy-based organic material after firing, or to insulate the resistor by baking it. Previously, various inorganic compounds were applied to the side surfaces of the resistor and then fired to form a glassy or crystalline insulating film for insulation.

しかし、前者の方法においては、塗布するエポ
キシ系有機物と抵抗体との密着性が悪いため抵抗
体に水分が吸着され、特性劣化が大きく短波尾耐
量も弱くなる欠点がある。又、抵抗体とエポキシ
系有機物との間に熱膨張の差があるため熱衝撃で
エポキシ系有機物にクラツクが入り劣化の原因と
なる欠点がある。又、後者の方法においては、焼
成時に抵抗体と側面絶縁剤との収縮率を一致させ
る必要があり、このため1次焼成してある程度抵
抗体を収縮させた後に側面絶縁剤を塗布して本焼
成し、側面絶縁被膜を形成させている。従つてこ
の場合には、焼成を2回に分けて行うこととな
り、燃料(電力を含む。)費が上昇するとともに
焼成装置を2回使用するので製造コストが上昇す
る欠点がある。又、両者の方法とも側面絶縁被膜
を必要厚に均一にするためには相当の技術と装置
を要する欠点がある。
However, the former method has the disadvantage that moisture is adsorbed to the resistor due to poor adhesion between the applied epoxy-based organic substance and the resistor, resulting in significant deterioration of characteristics and weakening of short-wave tail resistance. Furthermore, since there is a difference in thermal expansion between the resistor and the epoxy organic material, there is a drawback that the epoxy organic material cracks due to thermal shock, causing deterioration. In addition, in the latter method, it is necessary to match the shrinkage rates of the resistor and the side insulating material during firing, so after the resistor is first fired to shrink to some extent, the side insulating material is applied and the main It is fired to form an insulating coating on the sides. Therefore, in this case, the firing has to be carried out twice, which increases fuel (including electric power) costs, and the firing apparatus is used twice, which increases manufacturing costs. Furthermore, both methods have the disadvantage that considerable skill and equipment are required to make the side insulating coating uniform to the required thickness.

このため、抵抗体の焼成時に焼成用容器内にア
ンチモン酸化物(Sb2O3等)を配置し、焼成と同
時に気−固相反応により側面絶縁被膜を形成する
方法が提案されており、この方法ではアンチモン
酸化物の蒸気と抵抗体との気−固相反応を利用し
ているため抵抗体と絶縁被膜との密着性が良く、
ピンホールのない緻密で均一な結晶粒を持つ絶縁
被膜が得られ、電流放電耐量、耐コロナ性および
耐アーク性等の電気的諸特性がエポキシ系有機物
を塗布した場合に比べて著しく改善されるととも
に、無機化合物を塗布焼成した場合に比べると収
縮率を考慮する必要が少なく、焼成を1回で完了
することができ、製作容易で安価となる。しかる
に、この場合、Sb2O3の蒸発速度は1000℃で0.07
mg/min、1050℃で0.45mg/minと比較的速い。こ
のため、抵抗体中にガスが残つた状態で側面が反
応し、さらに高温になつた際に残存ガスが抵抗体
から放出され、抵抗体と側面絶縁被膜との界面に
気孔が残存することとなつた。従つて、抵抗体と
側面絶縁被膜との密着性が低下し、電気的諸特性
も低下することとなつた。
For this reason, a method has been proposed in which antimony oxide (Sb 2 O 3, etc.) is placed in the firing container during firing of the resistor, and a side insulating film is formed through a gas-solid phase reaction at the same time as the firing. The method utilizes a gas-solid phase reaction between antimony oxide vapor and the resistor, so it has good adhesion between the resistor and the insulating film.
An insulating film with dense and uniform crystal grains without pinholes can be obtained, and various electrical properties such as current discharge withstand, corona resistance, and arc resistance are significantly improved compared to when epoxy-based organic materials are applied. In addition, compared to the case where an inorganic compound is applied and fired, there is less need to consider the shrinkage rate, the firing can be completed in one time, and manufacturing is easy and inexpensive. However, in this case, the evaporation rate of Sb 2 O 3 is 0.07 at 1000℃
mg/min, relatively fast at 0.45mg/min at 1050℃. For this reason, the side surfaces react with gas remaining in the resistor, and when the temperature rises further, the residual gas is released from the resistor, leaving pores at the interface between the resistor and the side insulation coating. Summer. Therefore, the adhesion between the resistor and the side insulating coating deteriorated, and various electrical characteristics also deteriorated.

本発明は上記の欠点を除去して、電圧非直線抵
抗体の側面絶縁被膜を密着性良く形成することが
できて電気的諸特性を向上することができるとと
もに、側面絶縁被膜を製作容易で安価に形成する
ことができる電圧非直線抵抗体の製造方法を提供
することを目的とする。
The present invention eliminates the above-mentioned drawbacks, makes it possible to form a side insulating coating of a voltage nonlinear resistor with good adhesion, improving various electrical characteristics, and making the side insulating coating easy and inexpensive to manufacture. It is an object of the present invention to provide a method for manufacturing a voltage nonlinear resistor that can be formed as follows.

以下、本発明の第1の実施例を図面とともに説
明する。まず、焼成装置の構成を第1図によつて
説明する。図において、1はアルミナ質の鞘(焼
成用容器)、2は鞘1の底に載置された耐熱性セ
ラミツク材から成る台座で、台座2の材質はアル
ミナ質又は酸化亜鉛系焼結板等が良く、特に酸化
亜鉛系焼結板は抵抗体の主成分と同質であるので
抵抗体の特性を損ねる恐れがない。3は圧縮成形
されたZnOを主成分とする電圧非直線抵抗体で、
抵抗体3は敷粉4を介して台座2上に載置され
る。敷粉4は台座2と抵抗体3との溶積を防ぐた
めのもので、抵抗体3の成分に類似又は同質のも
のが要求され、アルミナ質や抵抗体3の造粉末分
又は抵抗体3を仮焼して砕いた粉等が用いられ
る。台座2を抵抗体3と同質系とした場合には敷
粉4はなくても良い。5は鞘1の内側面に塗布さ
れた抵抗体3に側面絶縁被膜を形成するための塗
布剤、6は鞘1の上部をほぼ密閉状におおう蓋
で、蓋6は鞘1と同質性の部材により形成する。
塗布剤5は鞘1の内面の一部又は全部あるいは蓋
6の内面に塗布しても良く、要は焼成用の容器内
に設けられていれば良い。尚、実際には抵抗体3
の上面には絶縁被膜が形成されるのを防ぐための
しやへい部材が設けられる。
A first embodiment of the present invention will be described below with reference to the drawings. First, the configuration of the firing apparatus will be explained with reference to FIG. In the figure, 1 is an alumina sheath (firing container), 2 is a pedestal made of heat-resistant ceramic material placed on the bottom of the sheath 1, and the material of the pedestal 2 is alumina or zinc oxide sintered plate, etc. In particular, since the zinc oxide-based sintered plate is the same as the main component of the resistor, there is no risk of impairing the characteristics of the resistor. 3 is a voltage nonlinear resistor whose main component is compression molded ZnO.
The resistor 3 is placed on the pedestal 2 with a bedding material 4 interposed therebetween. The bedding powder 4 is for preventing molten deposits between the pedestal 2 and the resistor 3, and is required to be similar or the same as the components of the resistor 3. Powder etc. that are calcined and crushed are used. If the pedestal 2 is made of the same material as the resistor 3, the bedding powder 4 may be omitted. 5 is a coating agent applied to the inner surface of the sheath 1 to form a side insulating coating on the resistor 3; 6 is a lid that covers the upper part of the sheath 1 in a substantially hermetically sealed manner; Formed by members.
The coating agent 5 may be applied to a part or all of the inner surface of the sheath 1 or to the inner surface of the lid 6, and it is sufficient if it is provided inside the firing container. In addition, in reality, resistor 3
A shielding member is provided on the upper surface of the housing to prevent the formation of an insulating film.

次に上記の焼成装置を用いた製造方法について
述べると、まず、抵抗体3はZnO(91mol%)に
Sb2O3、Bi2O3、Cc2O3、Mno2、Cr2O3、SiO2など
を合計9mol%加え、充分混合した後適当な形状
に圧縮成形する。例えば直径40mmφ、厚さ30mmの
円柱形の成形体とする。又、塗布剤5は、出発原
料としてSb2O3、Bi2O3(Sb2O3に対して75mol%
以下)、ZnO(Sb2O3に対して60mol%以下)を用
い、これらに水を加えて充分に混合して得られた
スラリーを鞘1の内壁に塗布し乾燥させる。そし
て、鞘1内に第1図のように抵抗体3を配置し、
蓋6で鞘1をほぼ密閉する。この状態で1000℃〜
1400℃(1100℃〜1300℃が好ましい。)の温度範
囲で焼成すると、塗布した化合物のうちSb2O3
Bi2O3が蒸発し、鞘1内はこれらの雰囲気で満た
され、抵抗体3内のZnO、Bi2O3等と気−固相反
応し、抵抗体3の表面に高抵抗の絶縁被膜が形成
される。この絶縁被膜をX線回折により調べると
第2図に示すようになり、スピネル
(Zn2.33Sb0.67O4)が主成分で形成されていること
が判明した。このことはX線マイクロアナライザ
ーにより調べても同様であつた。
Next, we will discuss the manufacturing method using the above firing equipment. First, resistor 3 is made of ZnO (91 mol%).
A total of 9 mol % of Sb 2 O 3 , Bi 2 O 3 , Cc 2 O 3 , Mno 2 , Cr 2 O 3 , SiO 2 and the like are added, thoroughly mixed, and then compression molded into a suitable shape. For example, it is a cylindrical molded body with a diameter of 40 mmφ and a thickness of 30 mm. Furthermore, coating agent 5 contains Sb 2 O 3 and Bi 2 O 3 (75 mol% relative to Sb 2 O 3 ) as starting materials.
(below) and ZnO (60 mol % or less based on Sb 2 O 3 ), water is added to these, and the resulting slurry is thoroughly mixed and applied to the inner wall of the sheath 1 and dried. Then, the resistor 3 is placed inside the sheath 1 as shown in FIG.
The sheath 1 is almost sealed with the lid 6. 1000℃~ in this state
When fired at a temperature range of 1400°C (preferably 1100°C to 1300°C), Sb 2 O 3 and
Bi 2 O 3 evaporates, and the inside of the sheath 1 is filled with these atmospheres, and it reacts with ZnO, Bi 2 O 3 , etc. inside the resistor 3 in a gas-solid phase, and a high-resistance insulating film is formed on the surface of the resistor 3. is formed. When this insulating coating was examined by X-ray diffraction, as shown in FIG. 2, it was found that spinel (Zn 2 . 33 Sb 0 . 67 O 4 ) was the main component. This was also confirmed when examined using an X-ray microanalyzer.

上記の気−固相反応においては、塗布剤5の
Sb2O3、Bi2O3、ZnOは1000℃までの加熱過程で 7ZnO+Sb2O3+O2→Zn7Sb2O12 4ZnO+3Bi2O3+3Sb2O3+O2 →Zn2Sb3Bi3O14 などの反応によりSb2O3の蒸発を制限する。
Sb2O3は上記の反応生成に必要な量以上塗布され
ているため1000℃付近で蒸発する。しかし、この
蒸発は上記の反応とともに起るためSb2O3単一塗
布の場合より蒸発速度がゆるやかになる。第3図
は塗布剤5がSb2O3単一の場合と60Sb2O3
20Bi2O3−20ZnOの場合とにおける温度とSb2O3
蒸発量との関係を示したもので、60Sb2O3
20Bi2O3−20ZnOの場合はSb2O3単一の場合より
蒸発速度が遅いことが判る。一方、抵抗体3は
800℃付近より収縮を開始し、1000℃付近でZnO
の他にZn2SiO4、Zn2Bi3Sb3O14、Zn2.33Sb0.67O4
14Bi2O3−Cr2O3等が形成される。抵抗体3の側
面ではSb2O3の蒸気と抵抗体3のZnOとが反応
し、Zn2.33Sb0.67O4を主成分とする高抵抗の絶縁
被膜が形成される。
In the above gas-solid phase reaction, the coating agent 5 is
Sb 2 O 3 , Bi 2 O 3 , and ZnO become 7ZnO + Sb 2 O 3 +O 2 →Zn 7 Sb 2 O 12 4ZnO + 3Bi 2 O 3 +3Sb 2 O 3 +O 2 →Zn 2 Sb 3 Bi 3 O during the heating process up to 1000℃. Limit the evaporation of Sb 2 O 3 by reactions such as 14 .
Sb 2 O 3 evaporates at around 1000°C because the amount of Sb 2 O 3 applied is greater than that required for the above reaction production. However, since this evaporation occurs together with the above reaction, the evaporation rate becomes slower than in the case of a single application of Sb 2 O 3 . Figure 3 shows the case where the coating agent 5 is Sb 2 O 3 alone and 60Sb 2 O 3
Temperature and Sb 2 O 3 in the case of 20Bi 2 O 3 −20ZnO
This shows the relationship with the amount of evaporation, 60Sb 2 O 3
It can be seen that in the case of 20Bi 2 O 3 −20ZnO, the evaporation rate is slower than in the case of Sb 2 O 3 alone. On the other hand, resistor 3
ZnO starts shrinking around 800℃, and ZnO starts shrinking around 1000℃.
In addition to Zn 2 SiO 4 , Zn 2 Bi 3 Sb 3 O 14 , Zn 2 . 33 Sb 0 . 67 O 4 ,
14Bi 2 O 3 −Cr 2 O 3 etc. are formed. On the side surface of the resistor 3, the vapor of Sb 2 O 3 and the ZnO of the resistor 3 react to form a high-resistance insulating film containing Zn 2 . 33 Sb 0 . 67 O 4 as a main component.

上記実施例においては、塗布5中のSb2O3
Bi2O3やZnOとも反応するためSb2O3の蒸発開始
温度が高く蒸発速度もゆるやかである。このた
め、抵抗体3が充分に収縮し充分にガスを放出し
てから気−固相反応が生じ、残存ガスが生じない
ので抵抗体3と側面絶縁被膜との密着性が良好と
なる。従つて、電流放電耐量、耐コロナ性および
耐アーク性などの電気的諸特性が良好となる。因
みに抵抗体3の短波尾放電耐量を測定した結果、
例えば塗布剤5を60Sb2O3−20Bi2O3−20ZnOと
した場合、4×10μSのインパルスを2回印加し
て75KAの放電耐量を示した。又、抵抗体3の側
面に直接塗布剤5を塗布する方法ではないので焼
成中における抵抗体3と塗布剤5との収縮率の相
違を考慮する必要がなく、1回の焼成で簡単かつ
安価に高抵抗な側面絶縁被膜を形成することがで
きる。さらに、Bi2O3の蒸気は抵抗体3の電圧非
直線性を支配するBi2O3の抵抗体3からの蒸発を
抑制するので電圧非直線性が向上する。尚、
Bi2O3の蒸気は抵抗体3とSb2O3の蒸気との反応
を促進する働きもする。
In the above example, Sb 2 O 3 in coating 5 was
Since it also reacts with Bi 2 O 3 and ZnO, the evaporation start temperature of Sb 2 O 3 is high and the evaporation rate is slow. Therefore, a gas-solid phase reaction occurs after the resistor 3 has sufficiently shrunk and released gas, and no residual gas is generated, resulting in good adhesion between the resistor 3 and the side insulating coating. Therefore, electrical properties such as current discharge withstand capacity, corona resistance, and arc resistance are improved. Incidentally, as a result of measuring the short wave tail discharge capacity of resistor 3,
For example, when the coating material 5 was 60Sb 2 O 3 -20Bi 2 O 3 -20ZnO, a discharge withstand capacity of 75 KA was obtained by applying an impulse of 4×10 μS twice. In addition, since the method does not apply the coating material 5 directly to the side surface of the resistor 3, there is no need to consider the difference in shrinkage rate between the resistor 3 and the coating material 5 during firing, and the method is simple and inexpensive with one firing. A high-resistance side insulating film can be formed on the surface. Furthermore, the Bi 2 O 3 vapor suppresses the evaporation of Bi 2 O 3 from the resistor 3, which dominates the voltage nonlinearity of the resistor 3, so that the voltage nonlinearity is improved. still,
The Bi 2 O 3 vapor also serves to promote the reaction between the resistor 3 and the Sb 2 O 3 vapor.

次に本発明の第2の実施例について説明する。
焼成装置は第1の実施例に用いたものと同様とす
る。又、抵抗体3も第1の実施例と同様に形成す
る。塗布剤5は、出発原料としてSb2O3とZnOを
Sb2O3/ZnO>1/7となるように秤量後水を加え
て充分に混合してスラリーを得、このスラリーを
鞘1の内壁に塗布し乾燥させる。そして、鞘1内
に第1図のように抵抗体3を配置し、蓋6で鞘1
をほぼ密閉する。この状態で1000℃〜1400℃
(1100℃〜1300℃が望ましい。)の温度範囲で焼成
すると、塗布剤5のうちのSb2O3が蒸発し、鞘1
内はSb2O3の雰囲気で満たされ、抵抗体3内の
ZnOやBi2O3等と気−固相反応し、抵抗体3の表
面に高抵抗の絶縁被膜が形成される。この絶縁被
膜をX線回折により調べるとやはり第2図に示す
ようになり、スピネル(Zn2.33Sb0.67O4)が主成分
で形成されていることが判明した。このことはX
線マイクロアナライザーによつても確認された。
Next, a second embodiment of the present invention will be described.
The firing apparatus is the same as that used in the first example. Further, the resistor 3 is also formed in the same manner as in the first embodiment. Coating agent 5 uses Sb 2 O 3 and ZnO as starting materials.
After weighing so that Sb 2 O 3 /ZnO > 1/7, water is added and thoroughly mixed to obtain a slurry, which is applied to the inner wall of the sheath 1 and dried. Then, place the resistor 3 inside the sheath 1 as shown in FIG.
almost completely sealed. 1000℃~1400℃ in this state
(preferably from 1100°C to 1300°C), Sb 2 O 3 in the coating agent 5 evaporates and the sheath 1
The interior is filled with an atmosphere of Sb 2 O 3 , and the inside of the resistor 3
A gas-solid phase reaction occurs with ZnO, Bi2O3 , etc., and a high-resistance insulating film is formed on the surface of the resistor 3. When this insulating film was examined by X-ray diffraction, as shown in FIG. 2, it was found that spinel (Zn 2 . 33 Sb 0 . 67 O 4 ) was the main component. This is X
It was also confirmed by a line microanalyzer.

上記の気−固相反応においては、塗布剤5の
Sb2O3とZnOは1000℃までの加熱過程で ZnO+Sb2O3+O2→ZnSb2O6 …………(1) の反応によりZnSb2O6が600℃〜700℃で形成され
はじめ、900℃までその生成量は増加しその後減
少する。又、 7ZnO+Sb2O3+O2→Zn7Sb2O12 …………(2) の反応によりZn7Sb2O12が800℃付近から形成さ
れはじめその後増加する。そして、これらの塗布
剤5中の化合物の相互反応によりSb2O3の蒸発は
遅くなる。しかし、第4図に示した7ZnO−
Sb2O3系の加熱過程の結晶構造変化から判るよう
に、900℃以上になるとZnSb2O6もZn7Sb2O12に変
化するため、Sb2O3の蒸発は結果的には(2)式の反
応により抑制されたこととなる。従つて、Sb2O3
を蒸発させるためには(2)式の反応に必要な量以上
を要求されるので、塗布剤5中のSb2O3とZnOの
割合はSb2O3/ZnO>1/7となつている。このよ
うにSb2O3は上記の反応に必要な量以上存在する
ため上記反応残余のSb2O3が1000℃前後で蒸発す
る。しかし、この蒸発は上記反応の結果Sb2O3
一塗布の場合より遅くなる。第5図は塗布剤5が
Sb2O3単一の場合と80Sb2O3−20ZnOの場合とに
おける温度とSb2O3蒸発量との関係を示したもの
で、後者の場合は前者の場合より蒸発が遅いこと
が判る。一方、抵抗体3は800℃付近より収縮を
開始し、1000℃付近でZnOの他にZn2SiO4
Zn2Bi2Sb3O14、Zn2.33Sb0.67O4、14Bi2O3−Cr2O3
が形成される。抵抗体3の側面ではSb2O3の蒸気
と抵抗体3のZnOとが反応し、Zn2.33Sb0.67O4
主成分とする高抵抗の絶縁被膜が形成される。
In the above gas-solid phase reaction, the coating agent 5 is
During the heating process of Sb 2 O 3 and ZnO up to 1000°C, ZnSb 2 O 6 begins to be formed at 600°C to 700°C due to the reaction of ZnO + Sb 2 O 3 + O 2 →ZnSb 2 O 6 …………(1). The amount produced increases up to 900℃ and then decreases. Further, due to the reaction 7ZnO+Sb 2 O 3 +O 2 →Zn 7 Sb 2 O 12 (2), Zn 7 Sb 2 O 12 begins to be formed from around 800°C and increases thereafter. The mutual reaction of these compounds in the coating agent 5 slows down the evaporation of Sb 2 O 3 . However, as shown in Figure 4, 7ZnO−
As can be seen from the change in the crystal structure of the Sb 2 O 3 system during the heating process, ZnSb 2 O 6 also changes to Zn 7 Sb 2 O 12 at temperatures above 900°C, so the evaporation of Sb 2 O 3 results in ( This means that it was suppressed by the reaction of equation 2). Therefore, Sb 2 O 3
In order to evaporate ZnO, an amount exceeding that required for the reaction of equation (2) is required, so the ratio of Sb 2 O 3 and ZnO in coating agent 5 is Sb 2 O 3 /ZnO > 1/7. There is. In this way, since Sb 2 O 3 is present in an amount greater than that required for the above reaction, the Sb 2 O 3 remaining from the above reaction evaporates at around 1000°C. However, this evaporation is slower than in the case of a single application of Sb 2 O 3 as a result of the above reaction. Figure 5 shows the coating agent 5.
This shows the relationship between temperature and Sb 2 O 3 evaporation amount in the case of single Sb 2 O 3 and in the case of 80Sb 2 O 3 −20ZnO, and it can be seen that evaporation is slower in the latter case than in the former case. . On the other hand, resistor 3 starts shrinking at around 800°C, and at around 1000°C, Zn 2 SiO 4 , Zn 2 SiO 4 , etc.
Zn 2 Bi 2 Sb 3 O 14 , Zn 2 . 33 Sb 0 . 67 O 4 , 14Bi 2 O 3 −Cr 2 O 3
is formed. On the side surface of the resistor 3, the vapor of Sb 2 O 3 and the ZnO of the resistor 3 react to form a high-resistance insulating film containing Zn 2 . 33 Sb 0 . 67 O 4 as a main component.

上記の第2の実施例においても、塗布剤5中の
Sb2O3がZnOと反応するためSb2O3の蒸発が遅く
なる。このため、抵抗体3が充分に収縮し充分に
ガスを放出してから気−固相反応が生じ、残存ガ
スが生じないので抵抗体3と側面絶縁被膜との密
着性が良好となり、電気的諸特性が良好となる。
例えば塗布剤5を80Sb2O3−20ZnOとした場合の
抵抗体3の短波尾放電耐量は4×10μSのインパ
ルスを2回印加して78KAを示した。又、第1の
実施例と同様に1回の焼成で高抵抗な側面絶縁被
膜を簡単かつ安価に形成できる。
Also in the second embodiment described above, in the coating agent 5,
Evaporation of Sb 2 O 3 is slowed down because Sb 2 O 3 reacts with ZnO. Therefore, after the resistor 3 sufficiently contracts and releases sufficient gas, a gas-solid phase reaction occurs, and no residual gas is generated, resulting in good adhesion between the resistor 3 and the side insulating coating, resulting in electrical Various properties become better.
For example, when the coating material 5 was 80Sb 2 O 3 -20ZnO, the short wave tail discharge capacity of the resistor 3 was 78KA when a 4×10 μS impulse was applied twice. Further, as in the first embodiment, a high-resistance side insulating coating can be easily and inexpensively formed by one firing.

尚、上記各実施例において、鞘1内に収納する
抵抗体3は圧縮成形した後に仮焼成してある程度
収縮させたものでも良い。又、塗布剤5とせずに
スラリーを乾燥して粉状にし鞘1内に敷くように
しても良い。さらに、塗布剤5はSb2O3、Bi2O3
およびZnOにより形成したが、要は焼成用容器内
にアンチモン酸化物とアンチモン酸化物と反応し
てアンチモン酸化物の蒸発を遅らせる化合物とを
配置すれば良い。
In each of the above embodiments, the resistor 3 housed in the sheath 1 may be compressed and then pre-fired to shrink to some extent. Alternatively, instead of forming the coating agent 5, the slurry may be dried into powder and spread within the sheath 1. Furthermore, the coating agent 5 contains Sb 2 O 3 and Bi 2 O 3
The antimony oxide and a compound that reacts with the antimony oxide to delay the evaporation of the antimony oxide may be placed in the firing container.

以上のように本発明においては、酸化亜鉛を主
成分とする電圧非直線抵抗体の焼成の際に、焼成
用容器内にアンチモン酸化物とこれと反応してア
ンチモン酸化物の蒸発を遅らせる化合物とを配置
し、焼成と同時にアンチモン酸化物と電圧非直線
抵抗体の気−固相反応により電圧非直線抵抗体の
側面絶縁被膜を形成している。従つて、アンチモ
ン酸化物と化合物との反応によりアンチモン酸化
物の蒸発がアンチモン酸化物のみを配置した場合
より遅くなり、電圧非直線抵抗体が充分に収縮し
充分にガスを放出してから気−固相反応により絶
縁被膜が形成されるようになる。このため、抵抗
体と側面絶縁被膜との間に残存ガスが生じず、両
者間の密着性が良好となり、電流放電耐量、耐コ
ロナ性および耐アーク性などの電気的諸特性が良
好となる。又、アンチモン酸化物や化合物を抵抗
体の側面に直接塗布する方法ではないので、焼成
中におけるこれらの酸化物と抵抗体との間の収縮
率の相違を考慮する必要がなく、1回の焼成で簡
単かつ安価に高抵抗の側面絶縁被膜を形成するこ
とができる。
As described above, in the present invention, when firing a voltage nonlinear resistor whose main component is zinc oxide, antimony oxide and a compound that reacts with the antimony oxide and delays the evaporation of the antimony oxide are placed in the firing container. is placed, and at the same time as firing, a side insulating coating of the voltage nonlinear resistor is formed by a gas-solid phase reaction between the antimony oxide and the voltage nonlinear resistor. Therefore, due to the reaction between the antimony oxide and the compound, the evaporation of the antimony oxide becomes slower than when only the antimony oxide is placed, and the voltage nonlinear resistor sufficiently contracts and releases sufficient gas before the gas is released. An insulating film is formed by solid phase reaction. Therefore, no residual gas is generated between the resistor and the side insulating coating, resulting in good adhesion between the two, resulting in good electrical properties such as current discharge withstand capacity, corona resistance, and arc resistance. In addition, since this method does not directly apply antimony oxides or compounds to the sides of the resistor, there is no need to consider the difference in shrinkage rate between these oxides and the resistor during firing, and the process can be completed in one firing. It is possible to easily and inexpensively form a high-resistance side insulation coating.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の各実施例に係る焼成装置の縦
断正面図、第2図は本発明の各実施例に係る側面
絶縁被膜のX線回折図、第3図は本発明の第1の
実施例に係る温度とSb2O3蒸発量との関係図、第
4図は本発明の第2の実施例に係る7ZnO−
Sb2O3系の加熱過程の結晶構造変化図、第5図は
本発明の第2の実施例に係る温度とSb2O3蒸発量
との関係図。 1……鞘(焼成用容器)、3……電圧非直線抵
抗体、5……塗布剤、6……蓋。
FIG. 1 is a longitudinal sectional front view of a firing apparatus according to each embodiment of the present invention, FIG. 2 is an X-ray diffraction diagram of a side insulating coating according to each embodiment of the present invention, and FIG. FIG. 4 is a diagram showing the relationship between temperature and Sb 2 O 3 evaporation amount according to the embodiment, and FIG.
FIG. 5 is a diagram showing changes in the crystal structure of the Sb 2 O 3 system during the heating process, and FIG. 5 is a diagram showing the relationship between temperature and Sb 2 O 3 evaporation amount according to the second embodiment of the present invention. 1... Sheath (container for firing), 3... Voltage nonlinear resistor, 5... Coating agent, 6... Lid.

Claims (1)

【特許請求の範囲】[Claims] 1 酸化亜鉛を主成分とする電圧非直線抵抗体を
焼成用容器内に入れて焼成する際に、焼成用容器
内にアンチモン酸化物とアンチモン酸化物と反応
してアンチモン酸化物の蒸発を遅らせる化合物と
して二酸化ビスマスと酸化亜鉛、または酸化亜鉛
を配置し、前記焼成と同時に気−固相反応により
電圧非直線抵抗体の側面絶縁被膜を形成すること
を特徴とする電圧非直線抵抗体の製造方法。
1. When a voltage non-linear resistor whose main component is zinc oxide is placed in a firing container and fired, a compound is added to the firing container that reacts with antimony oxide and antimony oxide to delay the evaporation of antimony oxide. A method for manufacturing a voltage nonlinear resistor, characterized in that bismuth dioxide and zinc oxide, or zinc oxide are disposed as a material, and a side insulating coating of the voltage nonlinear resistor is formed by a gas-solid phase reaction at the same time as the firing.
JP55144594A 1980-10-16 1980-10-16 Method of producing voltage nonlinear resistor Granted JPS5768002A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55144594A JPS5768002A (en) 1980-10-16 1980-10-16 Method of producing voltage nonlinear resistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55144594A JPS5768002A (en) 1980-10-16 1980-10-16 Method of producing voltage nonlinear resistor

Publications (2)

Publication Number Publication Date
JPS5768002A JPS5768002A (en) 1982-04-26
JPS6156844B2 true JPS6156844B2 (en) 1986-12-04

Family

ID=15365690

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55144594A Granted JPS5768002A (en) 1980-10-16 1980-10-16 Method of producing voltage nonlinear resistor

Country Status (1)

Country Link
JP (1) JPS5768002A (en)

Also Published As

Publication number Publication date
JPS5768002A (en) 1982-04-26

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