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JPS6251128B2 - - Google Patents
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JPS6251128B2 - - Google Patents

Info

Publication number
JPS6251128B2
JPS6251128B2 JP57194328A JP19432882A JPS6251128B2 JP S6251128 B2 JPS6251128 B2 JP S6251128B2 JP 57194328 A JP57194328 A JP 57194328A JP 19432882 A JP19432882 A JP 19432882A JP S6251128 B2 JPS6251128 B2 JP S6251128B2
Authority
JP
Japan
Prior art keywords
main body
rotating disk
exhaust gas
chemical
medicine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57194328A
Other languages
Japanese (ja)
Other versions
JPS5982926A (en
Inventor
Hiroshi Kono
Miki Yamagishi
Tsuneharu Myaji
Yoshitsugu Yahiro
Hisao Nara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Engineering Corp
Original Assignee
Nippon Kokan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kokan Ltd filed Critical Nippon Kokan Ltd
Priority to JP57194328A priority Critical patent/JPS5982926A/en
Publication of JPS5982926A publication Critical patent/JPS5982926A/en
Publication of JPS6251128B2 publication Critical patent/JPS6251128B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Treating Waste Gases (AREA)
  • Gas Separation By Absorption (AREA)

Description

【発明の詳細な説明】 この発明は排ガス中の塩化水素等の有害ガスを
除去する薬剤例えば消石灰等のスラリー又は水溶
液を排ガスの中に噴霧する装置に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for spraying a slurry or aqueous solution of a chemical such as slaked lime into exhaust gas to remove harmful gases such as hydrogen chloride from the exhaust gas.

ごみ焼却炉等から発生する排ガス中の有害ガス
(主として塩化水素、SOx)の除去方法として、
排ガス中にスラリー又は水溶液の有害ガス除去用
薬剤を噴霧する半乾式法によるものが知られてい
る。この半乾式法は除去用薬剤をスラリー又は水
溶液となし、反応塔内で排ガス中に噴霧する方法
で、噴霧薬剤は排ガス中の有害ガスと反応し、排
ガスの保有熱で乾燥された反応生成物として排ガ
ス中から除去される。
As a method for removing harmful gases (mainly hydrogen chloride and SOx) from exhaust gas generated from garbage incinerators,
A semi-dry method is known in which a slurry or aqueous solution of a harmful gas removal agent is sprayed into exhaust gas. In this semi-dry method, the removal agent is made into a slurry or aqueous solution and is sprayed into the exhaust gas in a reaction tower.The spray agent reacts with harmful gases in the exhaust gas, and the reaction product is dried by the heat retained in the exhaust gas. It is removed from the exhaust gas as

第1図は前述した反応塔内に装備される従来の
薬剤噴霧装置を示すものであつて、これは反応塔
内の排ガス中への薬剤噴霧位置(例えば反応塔の
上部内側)に固定される装置本体1と、この装置
本体1の下側に例えば10mm程度の隙間Gをあけて
配置され前記本体1を貫通する中心回転軸2によ
つて高速回転される回転円盤3とを備え、前記装
置本体1には有害ガス除去用薬剤例えば消石灰ス
ラリーが導入パイプ4を介して垂れ流し程度の少
流量で供給される薬剤供給部5(上部が蓋体6に
よつて閉塞され下部が流出孔7によつて開口した
室として形成されている)が設けられており、ま
た前記回転円盤3には前記薬剤供給部5から流下
する除去用薬剤の流入開口部8と、流入薬剤の受
入室9が設けられていると共に、この室内に入つ
た薬剤を回転遠心力によつて円盤外周部から排ガ
ス中に噴出させる複数個の噴霧ノズル10が設け
られている。
FIG. 1 shows a conventional chemical spraying device installed in the reaction tower mentioned above, which is fixed at a position (for example, inside the upper part of the reaction tower) where the chemical is sprayed into the exhaust gas in the reaction tower. The device includes a device main body 1, and a rotating disk 3 that is arranged under the device main body 1 with a gap G of, for example, about 10 mm and rotated at high speed by a central rotating shaft 2 passing through the main body 1. The main body 1 has a chemical supply section 5 (the upper part is closed by a lid 6 and the lower part is closed by an outflow hole 7), into which a harmful gas removal agent, such as slaked lime slurry, is supplied at a small flow rate such as dripping through an introduction pipe 4. The rotary disk 3 is provided with an inlet opening 8 for the removal agent flowing down from the agent supply section 5 and a receiving chamber 9 for the inflow agent. At the same time, a plurality of spray nozzles 10 are provided that spray the medicine that has entered the chamber from the outer circumference of the disk into the exhaust gas by rotational centrifugal force.

而して、この薬剤噴霧装置は消石灰スラリー等
の除去用薬剤が本体供給部5から回転円盤3内に
少量ずつ連続的に供給され、該円盤の高速回転に
よる遠心力を原動力として噴霧ノズル10から噴
出されるものであるから、前記円盤3の高速回転
時に該円盤内が負圧となり、このため周囲の排ガ
スが装置本体1と回転円盤3との隙間Gから回転
円盤3内にまき込まれ、除去用薬剤と一緒になつ
て前記ノズル10から噴出されるようになる。然
るに排ガスには炭酸ガスが含有されているため、
前記薬剤が消石灰スラリーの場合にはこの消石灰
と排ガス中の炭酸ガスが化学反応して炭酸カルシ
ウムとなり、その生成直後の炭酸カルシウムが前
記ノズル10の内面に付着して該ノズルを閉塞す
るという問題が発生していた。
In this chemical spraying device, a removal agent such as slaked lime slurry is continuously supplied in small quantities into the rotating disk 3 from the main body supply section 5, and is sprayed from the spray nozzle 10 using the centrifugal force generated by the high-speed rotation of the disk as the driving force. Since it is spouted out, when the disk 3 rotates at high speed, the inside of the disk becomes negative pressure, and therefore the surrounding exhaust gas is sucked into the rotating disk 3 through the gap G between the device main body 1 and the rotating disk 3, The liquid is ejected from the nozzle 10 together with the removal agent. However, since exhaust gas contains carbon dioxide,
When the chemical is slaked lime slurry, this slaked lime and carbon dioxide gas in the exhaust gas chemically react to form calcium carbonate, and the calcium carbonate immediately after its formation adheres to the inner surface of the nozzle 10 and blocks the nozzle. It was occurring.

この発明は前記のような欠点を解消する目的で
なされたもので、回転円盤の高速回転時に周囲の
排ガスが回転円盤内にまき込まれないように、該
円盤内の高速回転時における内圧を装置本体が設
置される反応塔の内圧より高い圧力、好ましくは
0〜+10mmAq程度高い圧力に維持させることを
特徴とするものである。
This invention was made with the aim of eliminating the above-mentioned drawbacks, and is designed to control the internal pressure inside the rotating disk during high-speed rotation so that the surrounding exhaust gas is not drawn into the rotating disk when the disk rotates at high speed. It is characterized by maintaining a pressure higher than the internal pressure of the reaction tower in which the main body is installed, preferably a pressure higher by about 0 to +10 mmAq.

以下、この発明装置の一実施例を第2図の図面
に従い説明すると、この実施例は第1図に示すも
のと同様な薬剤噴霧装置(同一部分に同符号を付
して具体的説明は省略する)において、装置本体
1の薬剤供給部5または装置本体1と回転円盤3
との隙間部G(実施例は前者の場合を示してい
る)に反応塔の外部から空気を導入する空気吹込
管11を接続して、ここから吹込まれる空気圧に
よつて回転円盤3内の高速回転時における内圧を
装置本体1が設置される反応塔の内圧より高い圧
力(好ましくは0〜+10mmAq程度高い圧力)に
維持させることを特徴とするもので、前記円盤内
圧のコントロールは回転円盤3の薬剤流入開口部
8の上方位置に配置した空気圧力検出器12によ
つて、回転円盤3内に供給される空気圧を検出
し、この検出信号で空気管路13の調整バルブ1
4を制御することで行なうようにしている。な
お、前記のような円盤内圧の維持方法には圧力検
出器12を用いないで簡単に行なう方法もある。
即ち、前記回転円盤3は定速で回転するので、こ
の内部には略一定の負圧力が生じる。従つてこの
一定の負圧力に見合う空気を定圧定流量で供給す
れば回転円盤3の内圧を反応塔内圧より0〜+10
mmAq程度高い圧力に維持することができる。な
お、回転円盤3内の高速回転時における内圧を反
応塔内圧より0〜+10mmAq程度高い圧力にする
理由は回転円盤3の内圧があまり高くなり過ぎる
と、回転円盤3内の供給薬剤が回転遠心力で良好
に噴霧されない等の不具合が生じるからである。
Hereinafter, one embodiment of the device of this invention will be described with reference to the drawing in FIG. 2. This embodiment is a drug spraying device similar to that shown in FIG. ), the drug supply section 5 of the device main body 1 or the device main body 1 and the rotating disk 3
An air blowing pipe 11 for introducing air from outside the reaction tower is connected to the gap G (the example shows the former case), and the air inside the rotating disk 3 is caused by air pressure blown from here. It is characterized by maintaining the internal pressure during high-speed rotation at a pressure higher than the internal pressure of the reaction tower in which the apparatus main body 1 is installed (preferably a pressure higher by about 0 to +10 mmAq), and the control of the disc internal pressure is performed by the rotating disc 3. The air pressure detector 12 disposed above the drug inflow opening 8 detects the air pressure supplied into the rotary disk 3, and this detection signal is used to control the adjustment valve 1 of the air pipe line 13.
This is done by controlling 4. It should be noted that there is also a method of maintaining the disk internal pressure as described above that can be easily carried out without using the pressure detector 12.
That is, since the rotating disk 3 rotates at a constant speed, a substantially constant negative pressure is generated inside the rotating disk 3. Therefore, if air corresponding to this constant negative pressure is supplied at a constant pressure and constant flow rate, the internal pressure of the rotating disk 3 will be 0 to +10 higher than the reaction tower internal pressure.
Can be maintained at pressures as high as mmAq. The reason why the internal pressure in the rotating disk 3 during high-speed rotation is set to be about 0 to +10 mmAq higher than the reaction tower internal pressure is that if the internal pressure of the rotating disk 3 becomes too high, the chemical supplied in the rotating disk 3 will be affected by rotational centrifugal force. This is because problems such as poor spraying may occur.

この発明の排ガス中の有害ガス除去用薬剤噴霧
装置は以上述べたようなものであるから、回転円
盤の高速回転時に、周囲の排ガスが前記円盤内に
まき込まれる問題が防止され、排ガスが入ること
によつて生じる従来のようなノズル閉塞問題を簡
単に解消することができた。即ち、本発明の装置
を実際に運転して実験してみたところ、3ケ月経
過後においてもノズルの閉塞は発生しなかつた
(従来装置では2週間程度でノズルの閉塞が発生
した例がある)。
Since the chemical spraying device for removing harmful gases from exhaust gas according to the present invention is as described above, the problem of surrounding exhaust gas being drawn into the disk during high-speed rotation of the rotating disk is prevented, and the exhaust gas is prevented from entering. The conventional nozzle clogging problem caused by this can be easily solved. In other words, when we actually operated and tested the device of the present invention, no nozzle blockage occurred even after three months had passed (there have been cases where nozzle blockages occurred in about two weeks with conventional devices). .

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の排ガス中の有害ガス除去用薬剤
噴霧装置を示す要部断面図、第2図はこの発明の
一実施例による排ガス中の有害ガス除去用薬剤噴
霧装置を示す要部断面図である。 1……装置本体、2……中心回転軸、3……回
転円盤、G……隙間、4……薬剤導入パイプ、5
……薬剤供給部、8……薬剤流入開口部、9……
流入薬剤の受入室、10……噴霧ノズル、11…
…空気吹込管、12……空気圧力検出器。
FIG. 1 is a sectional view of a main part showing a conventional chemical spraying device for removing harmful gases from exhaust gas, and FIG. 2 is a sectional view of main parts showing a chemical spraying device for removing harmful gases from exhaust gas according to an embodiment of the present invention. It is. 1... Apparatus body, 2... Central rotating shaft, 3... Rotating disk, G... Gap, 4... Drug introduction pipe, 5
...Drug supply section, 8...Drug inflow opening, 9...
Receiving chamber for inflow drug, 10... Spray nozzle, 11...
...Air blowing pipe, 12...Air pressure detector.

Claims (1)

【特許請求の範囲】[Claims] 1 薬剤供給部を有し反応塔内の薬剤噴霧位置に
設置される装置本体と、この装置本体の下側に隙
間をあけて配置され前記本体を貫通する中心回転
軸によつて高速回転される回転円盤とからなり、
この回転円盤は薬剤供給部から流下する薬剤の流
入開口部及び流入薬剤の受入室を有し且つこの室
内に流入した薬剤を回転遠心力により外周部から
噴出させる複数個の噴霧ノズルを備えた構成とさ
れている排ガス中の有害ガス除去用薬剤の噴霧装
置において、前記装置本体の薬剤供給部または装
置本体と回転円盤との隙間部に空気吹込管を接続
し、ここから吹込まれる空気圧によつて回転円盤
内の高速回転時における内圧を装置本体が設置さ
れている反応塔の内圧より高い圧力、好ましくは
0〜+10mmAq程度高い圧力に維持することを特
徴とする排ガス中の有害ガス除去用薬剤噴霧装
置。
1. A device main body that has a drug supply section and is installed at a drug spraying position in the reaction tower, and is rotated at high speed by a central rotating shaft that is arranged with a gap below the device main body and passes through the main body. Consists of a rotating disk,
This rotating disk has an inflow opening for the medicine flowing down from the medicine supply section and a receiving chamber for the inflowing medicine, and is equipped with a plurality of spray nozzles that spray the medicine that has flowed into this chamber from the outer circumferential part by rotational centrifugal force. In a spraying device for a chemical to remove harmful gases from exhaust gas, an air blowing pipe is connected to the chemical supply section of the device main body or to the gap between the device main body and the rotating disk, and the air pressure blown from there is used to spray the chemical. An agent for removing harmful gases from exhaust gas, which maintains the internal pressure within the rotating disk at high speed rotation at a pressure higher than the internal pressure of the reaction tower in which the main body of the device is installed, preferably at a pressure higher than about 0 to +10 mmAq. Spraying device.
JP57194328A 1982-11-05 1982-11-05 Chemical sprayer for removing harmful gas in waste gas Granted JPS5982926A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57194328A JPS5982926A (en) 1982-11-05 1982-11-05 Chemical sprayer for removing harmful gas in waste gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57194328A JPS5982926A (en) 1982-11-05 1982-11-05 Chemical sprayer for removing harmful gas in waste gas

Publications (2)

Publication Number Publication Date
JPS5982926A JPS5982926A (en) 1984-05-14
JPS6251128B2 true JPS6251128B2 (en) 1987-10-28

Family

ID=16322756

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57194328A Granted JPS5982926A (en) 1982-11-05 1982-11-05 Chemical sprayer for removing harmful gas in waste gas

Country Status (1)

Country Link
JP (1) JPS5982926A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH062732Y2 (en) * 1986-06-26 1994-01-26 日本鋼管株式会社 Chemical spray device for removing harmful gas in exhaust gas

Also Published As

Publication number Publication date
JPS5982926A (en) 1984-05-14

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