JPS634343B2 - - Google Patents
Info
- Publication number
- JPS634343B2 JPS634343B2 JP54110422A JP11042279A JPS634343B2 JP S634343 B2 JPS634343 B2 JP S634343B2 JP 54110422 A JP54110422 A JP 54110422A JP 11042279 A JP11042279 A JP 11042279A JP S634343 B2 JPS634343 B2 JP S634343B2
- Authority
- JP
- Japan
- Prior art keywords
- boat
- core tube
- reactor core
- heat treatment
- semiconductor thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0431—Apparatus for thermal treatment
- H10P72/0436—Apparatus for thermal treatment mainly by radiation
Description
【発明の詳細な説明】
本発明は半導体薄板の熱処理効率の向上及び装
置の小型化を図つた熱処理方法及び装置に関する
ものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a heat treatment method and apparatus for improving the efficiency of heat treatment of semiconductor thin plates and reducing the size of the apparatus.
半導体製造装置において、半導体薄板(ウエー
ハ)に拡散や酸化等の熱処理を行なう場合、従来
では第1図に例示するような熱処理装置を用いて
いる。この装置は、大別してボート搬送部1、ガ
ス排気部2、炉体3及びガス供給部4とから構成
されている。前記炉体3には多段に炉心管(プロ
セスチユーブ)5を配設しており、各炉心管5は
図外のヒータ等によつて所望の温度に加熱される
ようになつている。また、前記ガス排気部2にお
いて各炉心管5の延長部は開口しており、後述す
るボートが炉心管内に往復出入できるようになつ
ている。 2. Description of the Related Art Conventionally, in a semiconductor manufacturing apparatus, when a semiconductor thin plate (wafer) is subjected to heat treatment such as diffusion or oxidation, a heat treatment apparatus as illustrated in FIG. 1 is used. This device is roughly composed of a boat transport section 1, a gas exhaust section 2, a furnace body 3, and a gas supply section 4. Furnace core tubes (process tubes) 5 are arranged in multiple stages in the furnace body 3, and each furnace core tube 5 is heated to a desired temperature by a heater or the like (not shown). Further, in the gas exhaust section 2, the extension portion of each core tube 5 is open, so that a boat, which will be described later, can reciprocate into and out of the core tube.
一方、各炉心管5の延長線上に対応するボート
搬送部1には夫々ボートローダ6が配設してい
る。図では最上のボートローダをのみ図示してい
るが、ボートローダ6はカバー1a内に配設した
図示しない駆動機構から溝7を通してその一部を
カバー1a外に突出し、炉心管の軸線方向に往復
移動するボート駆動部8と、前記炉心管の軸延長
線に沿つて配置し、その基端をボート駆動部8に
取付けてボート駆動部8の移動に伴なつて炉心管
内に出入するボート9とで構成している。熱処理
される半導体薄板10は、このボート9の先端に
保持されるようになつている。 On the other hand, a boat loader 6 is disposed in the boat transport section 1 corresponding to the extension line of each furnace tube 5. Although only the topmost boat loader is shown in the figure, the boat loader 6 has a drive mechanism (not shown) disposed inside the cover 1a, a part of which protrudes outside the cover 1a through a groove 7, and reciprocates in the axial direction of the reactor core tube. a boat drive unit 8 that moves; a boat 9 that is disposed along the axial extension line of the core tube and whose base end is attached to the boat drive unit 8 and that moves in and out of the core tube as the boat drive unit 8 moves; It consists of The semiconductor thin plate 10 to be heat treated is held at the tip of this boat 9.
そして、このような熱処理装置における処理は
次のような手順にて行なう。即ち、第2図に示す
ように、ボート9の先端に半導体薄板の載置用治
具11を乗せて半導体薄板10を保持した上でボ
ート駆動部18を作動してボート9を炉心管5内
に侵入させる。所定の位置まで侵入させたところ
でボート9の全体或は先端を僅かに下降すれば、
載置用治具11は炉心管内底面上に置かれる。し
かる後、ボート9を後退させて炉心管5内から引
出せば、載置用治具11及び半導体薄板10のみ
炉心管内に残されるので、炉心管の開口に蓋をし
て所謂熱処理を行なうのである。熱処理が完了し
た半導体薄板は、再びボート9を炉心管内に侵入
させてその先端に治具11と共に乗せ、ボートを
引出すことによつて炉心管から取出すことにな
る。 Processing in such a heat treatment apparatus is performed in the following procedure. That is, as shown in FIG. 2, the semiconductor thin plate mounting jig 11 is placed on the tip of the boat 9 to hold the semiconductor thin plate 10, and then the boat drive unit 18 is operated to move the boat 9 into the reactor core tube 5. to invade. Once the boat has entered the designated position, if the entire boat 9 or its tip is lowered slightly,
The mounting jig 11 is placed on the inner bottom surface of the furnace tube. After that, when the boat 9 is retreated and pulled out from the inside of the core tube 5, only the mounting jig 11 and the semiconductor thin plate 10 are left inside the core tube, so the so-called heat treatment is performed by covering the opening of the core tube. . After the heat treatment has been completed, the semiconductor thin plate is taken out from the reactor core tube by inserting the boat 9 into the reactor core tube again, placing the boat 9 together with the jig 11 on the tip thereof, and pulling out the boat.
したがつて、この熱処理に際しては、一回の熱
処理を行なうためにボート9を炉心管5内に二往
復させねばならず、しかも炉心管内に半導体薄板
をセツトした後には炉心管の開口に蓋をするとい
う作業が必要とされるため、熱処理の全工程時間
が長くなると共に、これらの作業の自動化が困難
になるという問題がある。 Therefore, during this heat treatment, it is necessary to move the boat 9 back and forth into the core tube 5 twice in order to perform one heat treatment, and after setting the semiconductor thin plate in the core tube, a lid must be placed on the opening of the core tube. As a result, there is a problem in that the entire heat treatment process takes a long time and it is difficult to automate these operations.
また、前述したような炉心管5内に搬入した半
導体薄板10を載置用治具11と共に炉心管内に
残す処理方法では、第8図にボート9及び治具1
1の断面構造を示すように、ボート9が若干下降
したときに炉心管内底面に衝接する支持脚12を
治具11に設けねばならず、しかもこの支持脚1
2の下端がボート9の底面より下方に突出するよ
うに形成しなければならない。このため、半導体
薄板の搬出入時に前記支持脚12の下端が炉心管
内面と干渉し易く、支持脚12や炉心管内面を傷
つけるおそればある。特に炉心管内面を傷つける
と、切り粉が炉心管内のガスと混ざり、正常な熱
処理が行なわれなくなる。このため、従来では炉
心管5の内径を充分大きなものに設計せざるを得
ず、前述のように炉心管を多段配置する装置で
は、その小型化の障害になつている。 Furthermore, in the processing method in which the semiconductor thin plate 10 carried into the reactor core tube 5 is left in the reactor core tube together with the mounting jig 11 as described above, the boat 9 and the jig 1 are shown in FIG.
As shown in the cross-sectional structure of No. 1, the jig 11 must be provided with a support leg 12 that collides with the inner bottom surface of the reactor core tube when the boat 9 is slightly lowered.
2 must be formed so that the lower end thereof protrudes below the bottom surface of the boat 9. For this reason, the lower end of the support leg 12 tends to interfere with the inner surface of the furnace tube when carrying in and out of the semiconductor thin plate, and there is a risk of damaging the support leg 12 and the inner surface of the furnace tube. In particular, if the inner surface of the furnace tube is damaged, the chips will mix with the gas inside the furnace tube, making it impossible to perform normal heat treatment. For this reason, conventionally, the inner diameter of the core tube 5 has to be designed to be sufficiently large, which is an obstacle to downsizing the apparatus in which the core tubes are arranged in multiple stages as described above.
したがつて、本発明の目的は、熱処理作業の工
数の低減や自動化を図つて熱処理効率を向上する
と共に熱処理装置の小型化を図つた熱処理方法及
び熱処理装置を提供することにある。 Accordingly, an object of the present invention is to provide a heat treatment method and a heat treatment apparatus that reduce the number of man-hours and automate heat treatment operations, improve heat treatment efficiency, and downsize the heat treatment apparatus.
以下、実施例により本発明を説明する。 The present invention will be explained below with reference to Examples.
先ず本発明の熱処理装置を説明し、次にこの熱
処理装置に基ずいて本発明方法を説明する。 First, the heat treatment apparatus of the present invention will be explained, and then the method of the present invention will be explained based on this heat treatment apparatus.
第4図は本発明装置における要部の構成、即ち
ボートローダの構成を示しており、炉心管を有す
る炉体や、ガス排気部、ガス供給部は従来と同一
の構成であるため説明は省略する。図に示すよう
に、ボートローダ6Aのボート駆動部8Aは、基
台18に炉心管の軸線方向に設けた2本のガイド
13上を往復移動できる移動板14を有し、この
移動板14に螺合する送りねじ15をモータ16
にて軸転することにより移動板14を往復移動す
ることができる。また、この移動板14の一部は
カバー1aに形成した溝8を通してカバー外に突
出し、ボート固定板17を形成している(第1図
参照)。 Fig. 4 shows the configuration of the main parts of the device of the present invention, that is, the configuration of the boat loader.The furnace body with the furnace tube, the gas exhaust section, and the gas supply section are the same as the conventional ones, so explanations are omitted. do. As shown in the figure, the boat drive unit 8A of the boat loader 6A has a movable plate 14 that can reciprocate on two guides 13 provided on the base 18 in the axial direction of the reactor core tube. The feed screw 15 to be screwed is connected to the motor 16.
The movable plate 14 can be moved back and forth by pivoting at . Further, a part of the movable plate 14 protrudes outside the cover through a groove 8 formed in the cover 1a to form a boat fixing plate 17 (see FIG. 1).
そして、略円筒状に形成したボート9Aは、そ
の基部を2本のベルト18にてこの固定板17に
固定する一方、炉心管側に設けたローラ19にて
ボート9Aの先端側を支持させ、固定板17の移
動に伴なつてボート9Aが炉心管内に出入できる
ようにしている。このボート9Aは、石英等の耐
熱性部材にて形成されており、第5図に側面形状
を示すように、先端部位において円筒の略上半分
を削成し、かつこれを底板20及び端板21,2
2にて封止することにより乗置台23を形成して
いる。この乗置台23は、両端にバツフル24を
設ける一方、各バツフル24間には半導体薄板1
0を載置する載置用治具11Aを乗置できるよう
に構成している。尚、治具11Aは第6図に示す
ように、各平行ステム11bに形成した切欠き内
に半導体薄板10を嵌合支持して前記乗置台23
上に置かれているもので、第3図に示した従来の
ような支持脚は設けられていない。 The boat 9A, which is formed into a substantially cylindrical shape, has its base fixed to the fixing plate 17 with two belts 18, while the tip side of the boat 9A is supported by rollers 19 provided on the core tube side. As the fixed plate 17 moves, the boat 9A can move in and out of the reactor core tube. This boat 9A is made of a heat-resistant material such as quartz, and as shown in the side profile in FIG. 21,2
By sealing with 2, a mounting table 23 is formed. This mounting table 23 is provided with buttfuls 24 at both ends, and a semiconductor thin plate 1 is provided between each buttful 24.
It is configured such that a mounting jig 11A for placing 0 can be placed thereon. As shown in FIG. 6, the jig 11A fits and supports the semiconductor thin plate 10 in the notch formed in each parallel stem 11b, and supports the mounting table 23.
It is placed on top and is not provided with supporting legs like the conventional one shown in FIG.
一方、ボート9Aの略中央部、正確に言えばボ
ート9Aが第5図に仮想線で示す炉心管5内に侵
入されたときに炉心管5の開口部に相対する部位
には、第7図に合せて示すように、内部ににガラ
ス繊維等の断熱材25を充填した筒状の内部蓋体
26をボート内空間に内挿する一方、同様に内部
に断熱材27を充填した略鞍状の外部蓋体28を
ボート9A外周部上に嵌合しているのである。そ
して、これら内、外部蓋体26,28は、ボート
9Aが炉心管内に侵入したときに協働して炉心管
開口を塞ぐように(多少のガス抜き用の隙間は生
じるが)形成しているのである。また、これら両
蓋体26,28はボート9A内や上側に単に置く
だけでもよく或いは半固定状態に設けてもよい。
図中、29は加熱膨張した空気の抜き孔である。 On the other hand, approximately the central part of the boat 9A, to be more precise, the part facing the opening of the core tube 5 when the boat 9A enters the core tube 5 shown by the imaginary line in FIG. As shown in FIG. 2, a cylindrical internal lid 26 filled with a heat insulating material 25 such as glass fiber is inserted into the interior space of the boat, while a substantially saddle-shaped inner lid body 26 filled with a heat insulating material 27 inside is inserted into the interior of the boat. The external lid body 28 is fitted onto the outer circumference of the boat 9A. The outer lid bodies 26 and 28 are formed so as to work together to close the opening of the core tube when the boat 9A enters the core tube (although some gaps are left for gas venting). It is. Further, both lids 26 and 28 may be simply placed inside or above the boat 9A, or may be provided in a semi-fixed state.
In the figure, 29 is a vent hole for heated and expanded air.
次に、前述の装置を使用した本発明方法を説明
する。 Next, the method of the present invention using the above-mentioned apparatus will be explained.
ボート9A先端の乗置台23上に載置用治具1
1Aを乗せ、更にこの上に半導体薄板10を載置
した後、モータ16を駆動すれば、送りねじ15
によつて移動板14及び固定板17はガイド13
に沿つて炉心管5方向へ移動し、ボート9Aを先
端側から炉心管内に侵入させる。ボート9Aはロ
ーラ19に支持されながら、炉心管5内の幾分下
側に沿つて侵入される。そして、半導体薄板10
が所定の位置にまで挿入されたところでボート9
Aを停止させると、丁度炉心管の開口位置に移動
してきた内部、外部の両蓋体26,28が協働し
て炉心管の開口を閉塞する。これにより、この状
態のまま炉心管を加熱し、更に場合によつてはガ
スを通流しながら熱処理を行なつても、炉心管内
は熱的には封止状態となるため極めて良好な熱処
理を行なうことができる。熱処理の完了後は、ボ
ート9Aを炉心管から引出して治具11Aと共に
半導体薄板10をボートから降ろし、代りに次に
処理する半導体薄板を治具と共に乗置すれば、前
述と同様にして熱処理を行なうことができる。 Mounting jig 1 is placed on the mounting platform 23 at the tip of the boat 9A.
1A and the semiconductor thin plate 10 on top of this, if the motor 16 is driven, the feed screw 15
The movable plate 14 and the fixed plate 17 are connected to the guide 13 by
The boat 9A is moved in the direction of the reactor core tube 5 along the direction of the reactor core tube 5, and the boat 9A is inserted into the reactor core tube from the tip side. The boat 9A is inserted into the furnace core tube 5 along a somewhat lower side while being supported by the rollers 19. And semiconductor thin plate 10
When the is inserted into the specified position, the boat 9
When A is stopped, both the internal and external lids 26 and 28, which have just moved to the opening position of the reactor core tube, work together to close the opening of the reactor core tube. As a result, even if the reactor core tube is heated in this state, and in some cases heat treatment is performed while passing gas through it, the inside of the reactor core tube remains thermally sealed, resulting in extremely good heat treatment. be able to. After the heat treatment is completed, the boat 9A is pulled out from the furnace core tube, the semiconductor thin plate 10 is unloaded from the boat together with the jig 11A, and the semiconductor thin plate to be treated next is placed in its place along with the jig, and the heat treatment is carried out in the same manner as described above. can be done.
従つて、この方法では一回の熱処理に際してボ
ートを一往復するだけでよいから処理工数が低減
できると共に、炉心管内に半導体薄板を置くため
の治具に支持脚を形成する必要もないから支持脚
と炉心管内面との干渉も生じ難く、それだけ炉心
管径を低減して装置を小型にできる。また、前述
した装置ではボートを炉心管内に侵入させればボ
ートに設けた蓋体により自動的に炉心管の開口を
閉塞するので、装置の自動化も可能となる。 Therefore, with this method, the number of processing steps can be reduced because the boat only needs to be moved back and forth once for one heat treatment, and there is no need to form support legs on the jig for placing the semiconductor thin plate in the reactor core tube. Interference between the inner surface of the reactor core tube and the inner surface of the reactor core tube is less likely to occur, and the diameter of the reactor core tube can be reduced accordingly, allowing the apparatus to be made smaller. Further, in the above-mentioned apparatus, when the boat is inserted into the core tube, the opening of the core tube is automatically closed by the lid provided on the boat, so that the apparatus can be automated.
尚、本発明装置におけるボートローダは前記実
施例の外に種々の変形例が考えられることは言う
までもない。 It goes without saying that the boat loader in the apparatus of the present invention may be modified in various ways in addition to the above-mentioned embodiments.
以上のように本発明は、半導体薄板を乗置した
ボートを炉心管内に侵入させたままの状態で熱処
理を行なうので、ボートの必要往復動数を低減し
て熱処理工数を低減し、処理効率の向上を図るこ
とができると共に、半導体薄板やその載置用治具
をボートから降す必要がないので炉心管を減径で
き、装置の小型化を図ることができる。また、本
発明はボートの一部に蓋体を設けているので、手
作業による炉心管開口の閉塞作業が不要となり、
処理効率の向上と共に装置の自動化を図ることも
できるのである。 As described above, the present invention performs heat treatment while the boat carrying the semiconductor thin plate remains inside the reactor core tube, thereby reducing the required number of reciprocating movements of the boat, reducing the number of heat treatment steps, and improving processing efficiency. In addition, since there is no need to unload the semiconductor thin plate and its mounting jig from the boat, the diameter of the reactor core tube can be reduced, and the device can be made more compact. In addition, since the present invention provides a lid on a part of the boat, there is no need to manually close the core tube opening.
In addition to improving processing efficiency, it is also possible to automate the device.
第1図は従来の熱処理装置の外観斜視図、第2
図は従来の作業を説明する側面図、第3図は第2
図の−線に相当する断面図、第4図は本発明
の熱処理装置のボートロードの斜視図、第5図は
ボートの側面図、第6図及び第7図は夫々第5図
の−,−線に相当する断面図である。
1……ボート搬送部、3……炉体、5……炉心
管、6,6A……ボートローダ、9,9A……ボ
ート、10……半導体薄板、11,11A……載
置用治具、15……送りねじ、16……モータ、
23……乗置台、26……内部蓋体、28……外
部蓋体。
Figure 1 is an external perspective view of a conventional heat treatment equipment;
The figure is a side view explaining the conventional work, and Figure 3 is the second
4 is a perspective view of the boat load of the heat treatment apparatus of the present invention, FIG. 5 is a side view of the boat, and FIGS. It is a sectional view corresponding to the - line. 1...Boat transport section, 3...Furnace body, 5...Furnace core tube, 6, 6A...Boat loader, 9,9A...Boat, 10...Semiconductor thin plate, 11, 11A...Jig for mounting , 15...Feed screw, 16...Motor,
23... Placement stand, 26... Internal lid body, 28... External lid body.
Claims (1)
この炉心管内に半導体薄板を搬出入して熱処理を
行なうようにした熱処理方法において、前記炉心
管内に前記ボートを前記炉心管内面に接触しない
状態で前記半導体薄板を搬入し、その後、前記ボ
ートをそのまま前記炉心管内に留めた状態で熱処
理を行なうようにしたことを特徴とする半導体薄
板の熱処理方法。 2 一端を開口した炉心管と、この炉心管の延長
線上において前記炉心管の前記開口に向かつて往
復移動する駆動部と、この駆動部に固定されかつ
先端部には半導体薄板を載置でき、前記駆動部の
作動により前記炉心管内に前記炉心管内面に接触
することなく往復出入するボートとを備え、この
ボートの一部には、前記ボートが前記炉心管内に
侵入したときに前記炉心管開口を閉塞する断熱性
の蓋体を設けたことを特徴とする半導体薄板の熱
処理装置。 3 蓋体はボート内に挿入した内部蓋体と、ボー
ト外周に嵌合した外部蓋体とからなる特許請求の
範囲第2項記載の半導体薄板の熱処理装置。[Scope of Claims] 1. A heat treatment method in which a thin semiconductor plate is carried in and out of a reactor core tube for heat treatment using a boat that can reciprocate in and out of the reactor core tube, wherein the boat is placed inside the reactor core tube so that the boat is placed inside the reactor core tube. 1. A method for heat-treating a semiconductor thin plate, characterized in that the semiconductor thin plate is carried in without contacting the boat, and then the heat treatment is performed while the boat remains in the reactor core tube. 2. A reactor core tube with one end open, a drive part that reciprocates toward the opening of the reactor core tube on an extension line of the reactor core tube, and a thin semiconductor plate fixed to the drive part and capable of mounting a semiconductor thin plate on the tip part, a boat that reciprocates in and out of the reactor core tube without contacting the inner surface of the reactor core tube by the operation of the drive unit; 1. A heat treatment apparatus for semiconductor thin plates, characterized by being provided with an insulating lid body for closing off the semiconductor thin plate. 3. The heat treatment apparatus for semiconductor thin plates according to claim 2, wherein the lid comprises an inner lid inserted into the boat and an outer lid fitted around the outer periphery of the boat.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11042279A JPS5636129A (en) | 1979-08-31 | 1979-08-31 | Method and device for heat treatment of semiconductor thin plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11042279A JPS5636129A (en) | 1979-08-31 | 1979-08-31 | Method and device for heat treatment of semiconductor thin plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5636129A JPS5636129A (en) | 1981-04-09 |
| JPS634343B2 true JPS634343B2 (en) | 1988-01-28 |
Family
ID=14535352
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11042279A Granted JPS5636129A (en) | 1979-08-31 | 1979-08-31 | Method and device for heat treatment of semiconductor thin plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5636129A (en) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59105335A (en) * | 1982-12-09 | 1984-06-18 | Toshiba Corp | Supporter for wafer |
| JPS59200432A (en) * | 1983-04-28 | 1984-11-13 | Toshiba Ceramics Co Ltd | Tool for carrying wafer boat |
| JPS59208824A (en) * | 1983-05-12 | 1984-11-27 | ノ−トン・カンパニ− | Heater of semiconductor member or the like |
| US4459104A (en) * | 1983-06-01 | 1984-07-10 | Quartz Engineering & Materials, Inc. | Cantilever diffusion tube apparatus and method |
| JPS6079714A (en) * | 1983-10-06 | 1985-05-07 | Rohm Co Ltd | diffusion furnace |
| JPS60119715A (en) * | 1983-12-01 | 1985-06-27 | Toshiba Ceramics Co Ltd | Conveying implement for semiconductor wafer boat manufactured of quartz glass |
| US4620832A (en) * | 1984-03-07 | 1986-11-04 | Motion Manufacturing, Inc. | Furnace loading system |
| JPH0612760B2 (en) * | 1984-07-09 | 1994-02-16 | 東芝セラミックス株式会社 | Quartz glass wafer boat transfer jig |
| JPS6144832U (en) * | 1984-08-24 | 1986-03-25 | 日立電子エンジニアリング株式会社 | Quartz fork support mechanism for wafer insertion |
| JPS62281321A (en) * | 1986-05-30 | 1987-12-07 | Fukui Shinetsu Sekiei:Kk | Wafer treating unit |
| JP2601355B2 (en) * | 1989-10-26 | 1997-04-16 | 東芝セラミックス株式会社 | Transfer jig for wafer boat |
| JP2640691B2 (en) * | 1989-12-25 | 1997-08-13 | 東芝セラミックス株式会社 | Jig for semiconductor wafer transfer |
| JPH0498827A (en) * | 1990-08-17 | 1992-03-31 | Toshiba Ceramics Co Ltd | Processing fork for semiconductor wafer |
| JP5165279B2 (en) * | 2007-05-22 | 2013-03-21 | アイシン高丘株式会社 | Multistage heating device |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3744650A (en) * | 1971-10-26 | 1973-07-10 | Semiconductor Elect Memories | Boat mover for semiconductor fusion process |
| JPS597913B2 (en) * | 1976-01-09 | 1984-02-21 | 株式会社日立製作所 | heat treatment furnace |
| JPS53123081A (en) * | 1977-04-01 | 1978-10-27 | Nec Corp | Semiconductor wafer heat treatment apparatus |
| JPS53129964A (en) * | 1977-04-20 | 1978-11-13 | Hitachi Ltd | Method and device for inserting and taking out of heat treatment jig |
| JPS55158626A (en) * | 1979-05-30 | 1980-12-10 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Heat treating apparatus |
-
1979
- 1979-08-31 JP JP11042279A patent/JPS5636129A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5636129A (en) | 1981-04-09 |
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