JPH0251876B2 - - Google Patents
Info
- Publication number
- JPH0251876B2 JPH0251876B2 JP7399184A JP7399184A JPH0251876B2 JP H0251876 B2 JPH0251876 B2 JP H0251876B2 JP 7399184 A JP7399184 A JP 7399184A JP 7399184 A JP7399184 A JP 7399184A JP H0251876 B2 JPH0251876 B2 JP H0251876B2
- Authority
- JP
- Japan
- Prior art keywords
- optical system
- melting zone
- zone
- filter
- section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000003287 optical effect Effects 0.000 claims description 21
- 239000013078 crystal Substances 0.000 claims description 19
- 230000008018 melting Effects 0.000 claims description 11
- 238000002844 melting Methods 0.000 claims description 11
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000002994 raw material Substances 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000010437 gem Substances 0.000 description 1
- 229910001751 gemstone Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
- C30B13/22—Heating of the molten zone by irradiation or electric discharge
- C30B13/24—Heating of the molten zone by irradiation or electric discharge using electromagnetic waves
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Description
【発明の詳細な説明】
〔技術分野〕
本発明は、FZ装置(赤外線集中加熱単結晶製
造装置)に関し、特に結晶育成を自動的に行なう
FZ装置に関する。[Detailed Description of the Invention] [Technical Field] The present invention relates to an FZ device (intensive infrared heating single crystal manufacturing device), and in particular, a device for automatically growing crystals.
Regarding FZ equipment.
従来、FZ装置での結晶合成に自動制御は行な
われておらず、回転楕円面鏡の一箇所に設けられ
た孔からの、画像をスクリーン上で観察するのみ
であつた。
Conventionally, crystal synthesis in the FZ apparatus was not automatically controlled, and the only way to do so was to observe the image on a screen through a hole provided in one location of the spheroidal mirror.
従つて、結晶育成を行なうためには、常時画像
を監視し、ランプパワーあるいはギヤツプ調整を
手動で行なわなければならなかつた。 Therefore, in order to grow crystals, it was necessary to constantly monitor images and manually adjust the lamp power or gap.
本発明は以上の問題点を解決するもので、その
目的とするところは、長時間(10時間以上)安定
して、結晶育成を行なうFZ装置を提供すること
にある。
The present invention solves the above problems, and its purpose is to provide an FZ apparatus that can stably grow crystals for a long time (10 hours or more).
本発明のFZ装置は、レンズ、プリズム、ハー
フミラー、反射鏡等の光学系の中間に、フイルタ
ー及び絞りを設け、回転楕円面鏡の一部に設けた
孔から、溶融帯の像を該光学系を経て、光学セン
サ上に結像させ、該光学センサからの信号を処理
して結晶の自動育成を行なうもので、光学センサ
における信号のSN比が高く、制御精度の高いこ
とを特徴とする。
The FZ device of the present invention is provided with a filter and an aperture in the middle of an optical system such as a lens, prism, half mirror, and reflecting mirror, and an image of the molten zone is transmitted through a hole provided in a part of the spheroidal mirror to the optical system. The crystal is automatically grown by forming an image on an optical sensor through a system and processing the signal from the optical sensor, and is characterized by a high signal-to-noise ratio of the signal in the optical sensor and high control accuracy. .
第1図に従前のFZ装置の概要を示す。 Figure 1 shows an overview of the previous FZ device.
ここで、1は回転楕円面鏡、2はハロゲンラン
プ、3は石英管、4はガス導入口、5はガス排出
口、6は原料棒、7は種結晶、8は溶融、9は上
部シヤフト、10は下部シヤフト、11はレンズ
(含プリズム)、12はスクリーンである。 Here, 1 is a spheroidal mirror, 2 is a halogen lamp, 3 is a quartz tube, 4 is a gas inlet, 5 is a gas outlet, 6 is a raw material rod, 7 is a seed crystal, 8 is a melt, 9 is an upper shaft , 10 is a lower shaft, 11 is a lens (including a prism), and 12 is a screen.
上部シヤフト9に原料棒6をセツトし、下部シ
ヤフト10に種結晶7をセツトする。 A raw material rod 6 is set on the upper shaft 9, and a seed crystal 7 is set on the lower shaft 10.
ハロゲンランプ2のパワーを投入し、回転楕円
面鏡1により該ハロゲンランプの光を石英管3の
中央部に集光する。 The power of the halogen lamp 2 is turned on, and the spheroidal mirror 1 focuses the light from the halogen lamp onto the center of the quartz tube 3.
この時、ガス導入口4から雰囲気ガスを導入
し、ガス排出口5から雰囲気ガスを排出する。 At this time, atmospheric gas is introduced through the gas inlet 4 and exhausted through the gas exhaust port 5.
集光部において、原料棒6の先端と種結晶7の
先端とを溶融接触させて、溶融帯8を形成する。
この時、上部シヤフト9及び下部シヤフト10
は、同方向ないしは逆方向へ回転させ、上下のシ
ヤフトが同時に下方へ移動する。 In the light condensing section, the tip of the raw material rod 6 and the tip of the seed crystal 7 are brought into molten contact to form a molten zone 8.
At this time, the upper shaft 9 and the lower shaft 10
are rotated in the same direction or in opposite directions, and the upper and lower shafts move downward at the same time.
該集光部の状況をレンズ11(含プリズム)及
び反射鏡を経て、スクリーン12上に投映し、常
時、該投映像を監視しつつ、ランプパワーあるい
は原料棒と種結晶の間隔(ギヤツプ)を調節しな
がら、結晶育成を行なう。 The state of the light condensing section is projected onto the screen 12 via the lens 11 (including the prism) and the reflecting mirror, and while constantly monitoring the projected image, the lamp power or the gap between the raw material rod and the seed crystal is adjusted. Crystal growth is performed while making adjustments.
第2図に従前のFZ装置の光学系の概要を示す。
ここでaは平面図、bは側面図である。 Figure 2 shows an overview of the optical system of the previous FZ device.
Here, a is a plan view and b is a side view.
21は溶融帯、22はレンズ(含プリズム)、
23は反射鏡、24はスクリーン、25はフロン
トパネルである。 21 is a melting zone, 22 is a lens (including a prism),
23 is a reflecting mirror, 24 is a screen, and 25 is a front panel.
第3図に本発明のFZ装置で使用する自動制御
システムのブロツク図を示す。 FIG. 3 shows a block diagram of the automatic control system used in the FZ device of the present invention.
ここで31は光学系、32はセンサ部、33は
コントローラ部、34はキー入力部、35はDA
変換器、36はAD変換器、37は表示部、38
はプリンター部、39はランプパワーコントロー
ル部、40はギヤツプ調整部である。 Here, 31 is an optical system, 32 is a sensor section, 33 is a controller section, 34 is a key input section, and 35 is a DA
Converter, 36 is an AD converter, 37 is a display unit, 38
39 is a lamp power control section, and 40 is a gap adjustment section.
溶融帯の像は、光学系31を経て、センサ部3
2に到達し、コントロール部39でランプパワー
を調節し、溶融帯の温度を制御するか、又はギヤ
ツプ調整部40で融液の高さを調節する。 The image of the melted zone passes through the optical system 31 and is sent to the sensor section 3.
2, the control section 39 adjusts the lamp power to control the temperature of the melting zone, or the gap adjustment section 40 adjusts the height of the melt.
ランプパワー、あるいはギヤツプは、AD変換
器36を経て、コントローラ部33に再度フイー
ドバツクされる。 The lamp power or gap is fed back to the controller section 33 via the AD converter 36.
一方キー入力部34では、初期の各種定数をイ
ンプツトし、表示部37は、その時のランプパワ
ー等を表示する。更にプリンター部38では、所
定の時間毎に、ランプパワー、溶融帯径、溶融帯
の高さ等をプリントアウトする。 On the other hand, the key input section 34 inputs various initial constants, and the display section 37 displays the lamp power and the like at that time. Further, the printer section 38 prints out the lamp power, melting zone diameter, melting zone height, etc. at predetermined intervals.
自動制御を行なう場合に、光学センサにおける
信号のSN比は、その後の演算処理に極めて大き
な影響を与え、SN比の高いことが必須条件とな
る。 When performing automatic control, the signal-to-noise ratio of the signal in the optical sensor has a very large effect on subsequent calculation processing, and a high signal-to-noise ratio is an essential condition.
以下、本発明について、実施例に基づき詳細に
説明する。
Hereinafter, the present invention will be described in detail based on examples.
第4図及び第5図に本発明装置の光学系の平面
図を示す。 FIGS. 4 and 5 show plan views of the optical system of the apparatus of the present invention.
ここで41及び51は溶融帯、42及び52は
フイルター、43及び53はレンズ(含プリズ
ム)、44及び45は絞り、45及び55は光学
センサ、46及び56はフロントパネル、57は
ハーフミラー、58は反射鏡、59はスクリーン
である。 Here, 41 and 51 are melting zones, 42 and 52 are filters, 43 and 53 are lenses (including prisms), 44 and 45 are apertures, 45 and 55 are optical sensors, 46 and 56 are front panels, 57 is a half mirror, 58 is a reflecting mirror, and 59 is a screen.
第6図に光学センサとしてラインセンサを使用
し、演算処理を行なつた時のオシロスコープによ
る信号波形を示す。 FIG. 6 shows a signal waveform obtained by an oscilloscope when a line sensor is used as an optical sensor and arithmetic processing is performed.
ここで61はセンサの光量レベルの直接値であ
り、62はこれを二値化した値である。 Here, 61 is a direct value of the light amount level of the sensor, and 62 is a value obtained by converting this into a binary value.
(a)は絞りを絞りすぎた場合、(b)は適正値、(c)は
絞りを開けすぎた場合である。 (a) is when the aperture is closed down too much, (b) is the appropriate value, and (c) is when the aperture is opened too much.
(a)の絞りを絞りすぎた場合、二値化信号がXの
如く途中で切れる為、誤つた径の判定をしてしま
い、逆に(c)の絞りを開けすぎた場合、光量の直径
値がYの如く端で上昇する為、径の両端の判定が
不正確になつてしまう。 If the aperture in (a) is closed down too much, the binary signal will be cut off in the middle as shown in Since the value increases at the ends like Y, the determination at both ends of the diameter becomes inaccurate.
結晶の材質によつて、所要パワーが異なる為、
溶融帯の輝度が変化するが、本発明では、フイル
ターの交換と、絞りの開閉状況により、これに対
応できる。 The required power varies depending on the material of the crystal, so
Although the brightness of the melting zone changes, the present invention can cope with this by changing the filter and changing the opening/closing status of the aperture.
以上述べたように、本発明によれば、レンズの
熔融帯側にフイルターを、及びレンズの熔融帯の
反対側に絞りを設けたことにより、
フイルターの交換又は終りの開閉を容易に行な
うことができ、この結果光学系にSN比の高い信
号を与えることができるので、結晶の育成に用い
る材質が変化しても、その材質に合致した操作が
できるので、適性な信号レベルが得られ、長時間
無人稼動をしても、安定した結晶を育成すること
が可能である。従つて、ルビー、サフアイア、ア
レキサンドライト等の宝石単結晶は勿論、YIG、
YAG、GGG等の工業用単結晶にも使用可能であ
り、色ムラ、気泡、欠陥等の無い、高品質な単結
晶を育成できる。
As described above, according to the present invention, by providing the filter on the melting zone side of the lens and the diaphragm on the opposite side of the lens to the melting zone, it is possible to easily replace the filter or open and close the filter at the end. As a result, a signal with a high signal-to-noise ratio can be given to the optical system, so even if the material used for growing the crystal changes, operations that match the material can be performed, so an appropriate signal level can be obtained and long-term operation can be performed. It is possible to grow stable crystals even if the system is operated unattended for hours. Therefore, not only gemstone single crystals such as ruby, sapphire, and alexandrite, but also YIG,
It can also be used for industrial single crystals such as YAG and GGG, and can grow high-quality single crystals without uneven color, bubbles, defects, etc.
第1図は従前のFZ装置の概要を示す。第2図
は従前のFZ装置の光学系の概要を示す。第3図
は本発明のFZ装置で使用する自動制御システム
のブロツク図を示す。第4図は本発明のFZ装置
の光学系の概要を示す。第5図は本発明のFZ装
置の他の光学系の概要を示す。第6図は本発明の
FZ装置においてラインセンサを使用したときの、
信号波形を示す。
Figure 1 shows an overview of the conventional FZ device. Figure 2 shows an overview of the optical system of the conventional FZ device. FIG. 3 shows a block diagram of the automatic control system used in the FZ device of the present invention. FIG. 4 shows an outline of the optical system of the FZ device of the present invention. FIG. 5 shows an outline of another optical system of the FZ device of the present invention. Figure 6 shows the present invention.
When using a line sensor in FZ equipment,
Shows the signal waveform.
Claims (1)
ズ、プリズム、ハーフミラー、反射鏡等の光学系
を経て、光学センサに溶融帯の像を結像し、溶融
帯の直径、又は外形形状を測定して、ランプパワ
ーあるいは、溶融帯の高さを自動制御を行なう赤
外線集光加熱単結晶製造装置において、前記光学
系の前記溶融帯側にフイルター及び前記光学系の
前記溶融帯の反対側に絞りを設けたことを特徴と
する赤外線集光加熱単結晶製造装置。1 An image of the molten zone is formed on an optical sensor through an optical system such as a lens, prism, half mirror, or reflector through a hole provided in a part of the spheroidal mirror, and the diameter or external shape of the molten zone is determined. In an infrared condensed heating single crystal manufacturing apparatus that automatically controls the lamp power or the height of the melting zone by measuring the temperature, the optical system includes a filter on the melting zone side of the optical system and a filter on the opposite side of the optical system to the melting zone. An infrared condensed heating single crystal production device characterized by having an aperture.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7399184A JPS60221386A (en) | 1984-04-13 | 1984-04-13 | Infrared condensed heating single crystal production equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7399184A JPS60221386A (en) | 1984-04-13 | 1984-04-13 | Infrared condensed heating single crystal production equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60221386A JPS60221386A (en) | 1985-11-06 |
| JPH0251876B2 true JPH0251876B2 (en) | 1990-11-08 |
Family
ID=13534087
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7399184A Granted JPS60221386A (en) | 1984-04-13 | 1984-04-13 | Infrared condensed heating single crystal production equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60221386A (en) |
-
1984
- 1984-04-13 JP JP7399184A patent/JPS60221386A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60221386A (en) | 1985-11-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |