JPH0326527B2 - - Google Patents
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- Publication number
- JPH0326527B2 JPH0326527B2 JP59253370A JP25337084A JPH0326527B2 JP H0326527 B2 JPH0326527 B2 JP H0326527B2 JP 59253370 A JP59253370 A JP 59253370A JP 25337084 A JP25337084 A JP 25337084A JP H0326527 B2 JPH0326527 B2 JP H0326527B2
- Authority
- JP
- Japan
- Prior art keywords
- resistance value
- resistor
- pulse
- voltage
- high voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Apparatuses And Processes For Manufacturing Resistors (AREA)
Description
【発明の詳細な説明】
(a) 技術分野
この発明は、厚膜型のサーマル・ヘツドにおけ
る抵抗体の抵抗値を調整するためのサーマル・ヘ
ツドにおけるパルストリミング法に関する。DETAILED DESCRIPTION OF THE INVENTION (a) Technical Field The present invention relates to a pulse trimming method in a thermal head for adjusting the resistance value of a resistor in a thick film type thermal head.
(b) 従来技術
厚膜抵抗体のトリミング法としては、抵抗体を
焼成後、サンドブラストやレーザビームによつて
この抵抗体の一部を削り取る方法がある。ところ
が、これらの方法は、サーマル・ヘツドの発熱抵
抗体アレイのように、配線パターンによつて分割
された各抵抗体が極めて小さいものには実施が困
難であり、また、短時間に非常に多くの発熱と放
熱の熱サイクルを繰り返すような素子に実施する
ことは処理の信頼性の点で問題があつた。従つ
て、従来の厚膜型のサーマル・ヘツドは、セラミ
ツク基板上に抵抗体を印刷し焼成する形成段階で
できるだけ精度を高めることにより抵抗値が均一
になるようにするしか方法がなく、このため、抵
抗値のバラツキによつて生じる記録品質の低下を
防止するにも限度があつた。(b) Prior Art As a method for trimming a thick film resistor, there is a method in which the resistor is fired and then a part of the resistor is scraped off using sandblasting or a laser beam. However, these methods are difficult to implement when each resistor divided by a wiring pattern is extremely small, such as a heating resistor array in a thermal head, and a large number of resistors are connected in a short period of time. There was a problem with the reliability of the process when it was applied to an element that undergoes repeated thermal cycles of heat generation and heat dissipation. Therefore, with conventional thick-film thermal heads, the only way to make the resistance value uniform is to increase the accuracy as much as possible during the formation stage, in which the resistor is printed on the ceramic substrate and fired. However, there is a limit to the ability to prevent deterioration in recording quality caused by variations in resistance values.
(c) 発明の目的
この発明は、このような事情に鑑みなされたも
のであつて、発熱抵抗体アレイの各抵抗体にパル
ス状の高電圧を印加することにより、厚膜型のサ
ーマル・ヘツドにおける各抵抗体の抵抗値のバラ
ツキを修正することができるサーマル・ヘツドに
おけるパルストリミング法を提供することを目的
とする。(c) Purpose of the Invention The present invention has been made in view of the above circumstances, and provides a method for producing a thick film thermal head by applying a pulsed high voltage to each resistor of a heating resistor array. It is an object of the present invention to provide a pulse trimming method in a thermal head that can correct variations in the resistance value of each resistor in a thermal head.
(d) 発明の構成および効果
この発明のサーマル・ヘツドにおけるパルスト
リミング法は、厚膜型のサーマル・ヘツドにおい
て、配線パターンによつて分割された発熱抵抗体
アレイの被調整抵抗体に、パルス状高電圧を印加
するパルス電圧印加処理と、このパルス電圧印加
処理に続いて直流低電圧を数秒間前記被調整抵抗
体に印加するエージング処理と、前記各抵抗体の
抵抗値を測定する抵抗値測定処理を含み、前記抵
抗値が処理値付近の一定範囲内となるまでパルス
電圧印加処理毎に前記パルス状高電圧の電圧値を
増大するとともに、前記パルス電圧印加処理と、
前記抵抗値測定処理を繰り返すことを特徴とす
る。(d) Structure and Effects of the Invention The pulse trimming method for a thermal head according to the present invention applies a pulse trimming method to a resistor to be adjusted in a heat generating resistor array divided by a wiring pattern in a thick film type thermal head. A pulse voltage application process in which a high voltage is applied, an aging process in which a DC low voltage is applied to the resistor to be adjusted for several seconds following the pulse voltage application process, and a resistance value measurement in which the resistance value of each of the resistors is measured. increasing the voltage value of the pulsed high voltage for each pulse voltage application process until the resistance value falls within a certain range around the process value, and the pulse voltage application process;
The method is characterized in that the resistance value measurement process is repeated.
具体的には、まず、各抵抗体の抵抗値の測定を
行い、所定の抵抗値に合致しない場合には、この
抵抗体の両端の配線と接続する電極にパルス状の
高電圧を印加することにより抵抗値を修正する。
続いて抵抗体の両端に直流低電圧を数秒間印加す
ることによつてエージングを行う。そして、この
作業を全ての抵抗体について行うことにより、各
抵抗体の抵抗値をできるだけ所定の抵抗値に近づ
けバラツキを小さくする。各抵抗体に印加するパ
ルス状の高電圧の電圧値、パルス幅および繰り返
し回数は、実験データ等に基づいて抵抗体の抵抗
値が所定値とどの程度異なるかによつて定める。 Specifically, first, the resistance value of each resistor is measured, and if it does not match the predetermined resistance value, a pulsed high voltage is applied to the electrodes connected to the wiring at both ends of this resistor. Correct the resistance value by
Subsequently, aging is performed by applying a low DC voltage across the resistor for several seconds. By performing this operation on all the resistors, the resistance value of each resistor is brought closer to a predetermined resistance value as much as possible, and variations are reduced. The voltage value, pulse width, and number of repetitions of the pulsed high voltage applied to each resistor are determined based on experimental data and the like, depending on how much the resistance value of the resistor differs from a predetermined value.
この発明のサーマル・ヘツドにおけるパルスト
リミング法を上記のように構成すると、各抵抗体
の抵抗値を焼成後に個別に修正することができる
ので、発熱抵抗体アレイにおける各抵抗体の抵抗
値がほぼ一定となる。このため、同一信号入力に
対する各抵抗体の発熱量も均一となるので、記録
濃度のムラがなくなり記録品質を向上させること
ができる。また、従来抵抗体の抵抗値が所定値と
大幅に異なるような場合には、一律に不良品とし
て処分せざるを得なかつたものが、焼成後の修正
が可能となつたので、歩留りの向上を期待するこ
とができる。特にパルス電圧印加処理に続いてエ
ージング処理を行うことにより、製造されたサー
マル・ヘツドの実際の使用時における各抵抗体の
抵抗値変化を低く抑えることができ、信頼性の高
いサーマル・ヘツドを得ることができる。 When the pulse trimming method in the thermal head of this invention is configured as described above, the resistance value of each resistor can be individually modified after firing, so that the resistance value of each resistor in the heating resistor array is almost constant. becomes. Therefore, the amount of heat generated by each resistor in response to the same signal input becomes uniform, so that unevenness in recording density is eliminated, and recording quality can be improved. In addition, in the past, if the resistance value of a resistor was significantly different from a predetermined value, it had to be disposed of as a defective product, but now it is possible to make corrections after firing, improving yield. can be expected. In particular, by performing the aging treatment following the pulse voltage application treatment, it is possible to suppress changes in the resistance value of each resistor during actual use of the manufactured thermal head, resulting in a highly reliable thermal head. be able to.
(e) 実施例
図は、この発明のサーマル・ヘツドにおけるパ
ルストリミング法を或る厚膜型のサーマル・ヘツ
ドに実施した場合の、印加するパルス状の高電圧
の電圧値に対する抵抗体の抵抗値の変化の割合を
示すグラフであり、この特性は実験的に求められ
る。(e) Example The figure shows the resistance value of the resistor with respect to the voltage value of the pulsed high voltage applied when the pulse trimming method for the thermal head of the present invention is applied to a certain thick film type thermal head. This is a graph showing the rate of change in , and this characteristic is obtained experimentally.
厚膜型のサーマル・ヘツドは、セラミツク基板
上にグレーズ層、抵抗層および配線層を焼成する
ことにより、配線パターンによつて分割された多
数の抵抗体からなる発熱抵抗体アレイを形成した
ものである。尚、この実施例では、パルス状の高
電圧を印加すると抵抗体の抵抗値は低下するの
で、発熱抵抗体アレイを形成する際に、予め抵抗
体の抵抗値が誤差によつて低くなつたときにも所
定の抵抗値より低くならないように、抵抗値を大
き目に設定しておく。 Thick-film thermal heads are made by firing a glaze layer, resistance layer, and wiring layer on a ceramic substrate to form a heating resistor array consisting of a large number of resistors divided by wiring patterns. be. In this example, the resistance value of the resistor decreases when a pulsed high voltage is applied, so when forming the heating resistor array, if the resistance value of the resistor decreases in advance due to an error, The resistance value is set large so that it does not become lower than a predetermined resistance value.
この実施例のサーマル・ヘツドにおけるパルス
トリミング法は、まず、発熱抵抗体アレイの各抵
抗体の抵抗値の測定を行い、所定の抵抗値に合致
しない場合に、この抵抗体の両端の配線と接続す
る電極にパルス状の高電圧を印加する。このパル
ス状の高電圧の印加は、数百Ｖの電圧で充電した
250pFのコンデンサを電極に接続し抵抗体に放電
させることにより行う。尚、コンデンサの容量を
変えると抵抗値変化の特性も変化する。パルス状
の高電圧の電圧値は、例えば、所定の抵抗値が
260Ωであり、測定値が400Ωであつた場合、400Ω
を260Ωに変化させるときの抵抗値変化率は、
（260−400）÷400＝−0.35となるので、図のグラ
フから抵抗値変化率が−35％となる印加電圧
335Vを求めることにより定める。パルス状の高
電圧を１回印加し再び抵抗値を測定して、所定値
付近の或る範囲内になつた場合には、そこでパル
ストリミングを終了する。再び抵抗値を測定し
て、所定値に達しない場合には、印加電圧をさら
に10Vずつ増加して範囲内となるまでパルス状の
高電圧の印加を繰り返す。また、パルス状の高電
圧を印加後、抵抗体の抵抗値を安定化するため
に、低圧の直流電圧を数秒間印加することにより
エージングを行つてもよい。エージングを行う場
合には、エージングによる抵抗値の変化分を予定
に入れてパルス状の高電圧の電圧値を定める。以
下、同様の操作を各抵抗体ごとに繰り返して、抵
抗値のバラツキをできるだけ小さくする。 The pulse trimming method in the thermal head of this example first measures the resistance value of each resistor in the heating resistor array, and if it does not match the predetermined resistance value, connects the wiring at both ends of this resistor. A pulsed high voltage is applied to the electrode. This pulsed high voltage application was performed by charging at a voltage of several hundred V.
This is done by connecting a 250pF capacitor to the electrode and discharging it into the resistor. Note that when the capacitance of the capacitor is changed, the resistance value change characteristics also change. The voltage value of the pulsed high voltage is, for example, when the predetermined resistance value is
260Ω and the measured value is 400Ω, then 400Ω
The rate of change in resistance value when changing Ω to 260Ω is
(260-400) ÷ 400 = -0.35, so from the graph in the figure, the applied voltage at which the resistance change rate is -35%
Determined by finding 335V. A pulsed high voltage is applied once and the resistance value is measured again. If the resistance value falls within a certain range around the predetermined value, pulse trimming is terminated at that point. The resistance value is measured again, and if it does not reach the predetermined value, the applied voltage is further increased in increments of 10 V, and the pulsed high voltage application is repeated until it falls within the range. Further, after applying a pulsed high voltage, aging may be performed by applying a low DC voltage for several seconds in order to stabilize the resistance value of the resistor. When aging is performed, the voltage value of the pulsed high voltage is determined by taking into account the change in resistance value due to aging. Thereafter, similar operations are repeated for each resistor to minimize variations in resistance values.
この実施例のサーマル・ヘツドにおけるパルス
トリミング法をこのように実施すると、パルスト
リミングを行わない場合には、±40％程あつた抵
抗値のバラツキを±３％程度まで均一にすること
ができる。このため、同一の信号入力に対する各
抵抗体の発熱量も均一となるので、記録濃度のム
ラがなくなり記録品質を向上させることができ
る。また、従来抵抗体の抵抗値が所定値と大幅に
異なるような場合には、一律に不良品として処分
せざるを得なかつたものが、焼成後の修正が可能
となつたので、歩留りの向上を期待することがで
きる。さらに、このパルストリミングは、他の方
法のように抵抗体を傷付けたりしないので、外観
の品位を損なう心配がない。 When the pulse trimming method in the thermal head of this embodiment is carried out in this manner, the variation in resistance value, which would be about ±40% when pulse trimming is not performed, can be made uniform to about ±3%. Therefore, the amount of heat generated by each resistor in response to the same signal input becomes uniform, so that unevenness in recording density is eliminated, and recording quality can be improved. In addition, in the past, if the resistance value of a resistor was significantly different from a predetermined value, it had to be disposed of as a defective product, but now it is possible to make corrections after firing, which improves yield. can be expected. Furthermore, unlike other methods, this pulse trimming does not damage the resistor, so there is no need to worry about damaging the appearance.
尚、実施例では、パルス状の高電圧を印加する
ことにより、抵抗体の抵抗値が低下する場合を示
したが、パルス状の高電圧の電圧値やパルス幅等
によつては抵抗値が上昇する場合もあるので、そ
れぞれの場合にあわせて最適な条件を選択する。 In addition, in the example, a case was shown in which the resistance value of the resistor is reduced by applying a pulsed high voltage, but the resistance value may vary depending on the voltage value and pulse width of the pulsed high voltage. In some cases, the temperature may increase, so choose the optimal conditions for each case.
図は、この発明のサーマル・ヘツドにおけるパ
ルストリミング法を或る厚膜型のサーマル・ヘツ
ドに実施した場合の、印加するパルス状の高電圧
の電圧値に対する抵抗体の抵抗値の変化の割合を
示すグラフである。
The figure shows the ratio of change in the resistance value of the resistor to the voltage value of the applied pulsed high voltage when the pulse trimming method for the thermal head of the present invention is applied to a certain thick film type thermal head. This is a graph showing.
Claims (1)
ターンによつて分割された発熱抵抗体アレイの被
調整抵抗体に、パルス状高電圧を印加するパルス
電圧印加処理と、このパルス電圧印加処理に続い
て直流低電圧を数秒間前記被調整抵抗体に印加す
るエージング処理と、前記各抵抗体の抵抗値を測
定する抵抗値測定処理を含み、前記抵抗値が所定
値付近の一定範囲内となるまでパルス電圧印加処
理毎に前記パルス状高電圧の電圧値を増大すると
ともに、前記パルス電圧印加処理と、前記抵抗値
測定処理を繰り返すことを特徴とするサーマル・
ヘツドにおけるパルストリミング法。1 In a thick-film thermal head, a pulse voltage application process of applying a pulsed high voltage to the resistors to be adjusted in a heating resistor array divided by a wiring pattern, and following this pulse voltage application process. It includes an aging process in which a low DC voltage is applied to the resistor to be adjusted for several seconds, and a resistance value measurement process in which the resistance value of each resistor is measured, and the pulse is applied until the resistance value is within a certain range near a predetermined value. Thermal method is characterized in that the voltage value of the pulsed high voltage is increased for each voltage application process, and the pulse voltage application process and the resistance value measurement process are repeated.
Pulse trimming method in the head.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59253370A JPS61131404A (en) | 1984-11-29 | 1984-11-29 | Pulse trimming for thermal head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59253370A JPS61131404A (en) | 1984-11-29 | 1984-11-29 | Pulse trimming for thermal head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61131404A JPS61131404A (en) | 1986-06-19 |
| JPH0326527B2 true JPH0326527B2 (en) | 1991-04-11 |
Family
ID=17250405
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59253370A Granted JPS61131404A (en) | 1984-11-29 | 1984-11-29 | Pulse trimming for thermal head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61131404A (en) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6292414A (en) * | 1985-10-18 | 1987-04-27 | 富士ゼロックス株式会社 | Manufacture of thick film thermal head |
| JPS6292411A (en) * | 1985-10-18 | 1987-04-27 | 富士ゼロックス株式会社 | Manufacture of thick film thermal head |
| JPH06417B2 (en) * | 1986-08-29 | 1994-01-05 | 三菱電機株式会社 | Thermal head resistance adjustment device |
| JPH068056B2 (en) * | 1986-08-29 | 1994-02-02 | 三菱電機株式会社 | Method of manufacturing thermal head |
| JPH06414B2 (en) * | 1986-08-29 | 1994-01-05 | 三菱電機株式会社 | Thermal head resistance adjustment device |
| JPH06413B2 (en) * | 1986-08-29 | 1994-01-05 | 三菱電機株式会社 | Thermal head resistance adjustment device |
| JPH068054B2 (en) * | 1986-08-29 | 1994-02-02 | 三菱電機株式会社 | Method of manufacturing thermal head |
| JPS63252759A (en) * | 1987-04-09 | 1988-10-19 | Matsushita Electric Ind Co Ltd | Thermal head heating resistor trimming device |
| JPS63252758A (en) * | 1987-04-09 | 1988-10-19 | Matsushita Electric Ind Co Ltd | How to trim heating resistor of thermal head |
| JPS63252760A (en) * | 1987-04-09 | 1988-10-19 | Matsushita Electric Ind Co Ltd | How to trim heating resistor of thermal head |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS528500A (en) * | 1975-06-27 | 1977-01-22 | Dainichi Nippon Cables Ltd | Electric insulation use gas composition |
| JPS6059375B2 (en) * | 1978-07-31 | 1985-12-25 | 松下電工株式会社 | Simple flush toilet handle structure |
| JPS5780708A (en) * | 1980-11-07 | 1982-05-20 | Nissan Motor | Method of producing thick film resistor |
| JPS5968270A (en) * | 1982-10-12 | 1984-04-18 | Nippon Kogaku Kk <Nikon> | Preparation of heat generating resistance body for thermal head |
| JPS6183050A (en) * | 1984-09-28 | 1986-04-26 | Mitsubishi Electric Corp | Preparation of thermal head |
-
1984
- 1984-11-29 JP JP59253370A patent/JPS61131404A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61131404A (en) | 1986-06-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |