deposition of goldとは 意味・読み方・使い方

To provide an electroless conversion gold-plating method which can form a uniformly gold-plated film at a constant deposition rate for a long term and greatly prolong the renewal time of a gold-plating solution.例文帳に追加

長期間に亘って安定な析出速度で均一な金めっき皮膜を形成でき、金めっき液の更新期間を大きく延長することが可能な置換型無電解金めっき方法を提供する。 - 特許庁

To provide a highly reliable wiring board by preventing abnormal deposition of gold plating and the oxidation and reaction of nickel plating.例文帳に追加

金めっきの異常析出や、ニッケルめっきの酸化や反応を防止し、信頼性の高い配線基板を提供する。 - 特許庁

After the gold thin film 21 of about 0.2 μm in film thickness is formed by vacuum deposition on a grating surface of a master diffraction grating 12, a first aluminum thin film 22 of about 0.01 μm in film thickness is formed by vacuum deposition on the gold thin film 21.例文帳に追加

マスター回折格子１２の格子面に、膜厚が０．２μｍ程度の金薄膜２１を真空蒸着によって形成した後、金薄膜２１の上に真空蒸着によって膜厚が０．０１μｍ程度の第１アルミニウム薄膜２２を形成する。 - 特許庁

To reduce the occurrence of problems such as a glitch of abnormal deposition of gold in between wiring patterns of a LTCC substrate, poor adhesion between a gold film and a nickel plating film, a phenomenon of repelling solder, and a strength deterioration of a soldered joint.例文帳に追加

ＬＴＣＣ基板の配線パターン間の金異常析出不具合、金とニッケルめっき皮膜間の密着不良、はんだはじき現象、およびはんだ継ぎ手の強度劣化などの問題の発生を低減する。 - 特許庁

In this case, the timing for depositing the base layer and the gold layer are adjusted so that the last one of the base layer in an active state is deposited simultaneously with deposition of the gold layer.例文帳に追加

その際には、まだ活性状態にある基層原子の最後のものと同時に金層原子の最初のものが堆積されるように基層及び金層の堆積のタイミングが調整される。 - 特許庁

The gold or gold-alloy material for thin film deposition is composed of gold of ≥4N purity and the proportion of gold exceeds 50% by mole ratio, and further, the content of volatile metallic impurities is made to ≤1 wt.ppm and the content of hydrogen and nitrogen is made to ≤1 wt.ppm, respectively, and also oxygen content is made to ≤5 wt.ppm.例文帳に追加

４Ｎ以上の純度を有する金からなり、金の比率がモル比で５０％を超えており、揮発性金属不純物の含有量が１重量ｐｐｍ以下、水素、窒素の含有量が１重量ｐｐｍ以下、及び酸素の含有量が５重量ｐｐｍ以下である薄膜形成用金又は金合金材料。 - 特許庁

In the initial stage of film deposition, the film deposition rate is set to a first rate, and after the gold thin film reaches a predetermined film thickness, the film deposition rate is set to a second rate being at least twice as the first rate.例文帳に追加

ここで、成膜初期においては、成膜速度を第１速度に設定し、金薄膜の膜厚が一定の膜厚以上になると、成膜速度を第１速度の少なくとも倍の第２速度に設定する。 - 特許庁

Gold is deposited onto the rear surface of the p-conductive silicon substrate 70 by the EB deposition method, and a second electrode 76 is formed.例文帳に追加

また、ｐ伝導型シリコン基板７０の裏面に金をＥＢ蒸着法により堆積し、第２電極７６を形成した。 - 特許庁