JPH0776809B2 - PLZT display device manufacturing method - Google Patents

Description

Description: TECHNICAL FIELD The present invention relates to a PLZT display device using a groove-type electrode that utilizes the birefringence of PLZT (transparent ceramic), and more specifically enables complicated pattern wiring. The present invention relates to a method for manufacturing a PLZT display device.

[Conventional example] In recent years, PLZT (Pb
O, LaO, ZrO ₂ , TiO) are about to be used in light valves and displays. When this PLZT is used as a light valve array or a flat display, for example, the surface electrode shown in FIG. 3 or the groove type electrode shown in FIG. 4 is adopted. In FIG. 3, the drive electrode 2 and the common electrode (GND electrode) 3 are formed on the PLZT substrate 1 by a method such as vapor deposition. Further, in FIG. 4, the PLZT substrate 1
The drive electrode 4 and the common electrode (GND) 5 are formed by embedding the electrode in a groove formed by machining or etching such as a dicing cutter. This groove-type electrode structure has an advantage that the driving voltage can be lowered because the electric field distribution of the PLZT substrate 1 becomes better than that of the surface electrode structure.

[Problems to be Solved by the Invention] The groove is formed by machining such as a dicing cutter or by chemical etching. The deeper the groove, the better the efficiency as a light valve. However, it is effective to carry out a machining process capable of obtaining a narrow groove (for example, depth 100 μm, width 10 μm).

However, the mechanical processing such as dicing is suitable for linear processing, but is not suitable for fine processing (for example, forming a short groove) or curved processing. Therefore, as shown in FIG. 5, when the minute light valve 6 is formed on the PLZT substrate 1, for example, the groove 7 extends beyond the region of the light valve 6. Then, when the drive electrode 4 and the common electrode 5 formed in the groove 7 are drawn out to the outside, the wiring pattern 8 by the thin film technique or the like is formed across the groove 7.
The wiring pattern 8 will be cut at the portion indicated by the two-dot chain line circle in the figure (the edge portion of the groove 7). That is, thin film technology and the like enable complicated wiring patterns, but if the surface has irregularities, pattern breakage may occur.

The present invention has been made in view of the above problems, and an object thereof is a method for manufacturing a PLZT display device using a groove-type electrode, which makes it possible to obtain a fine light valve array or a panel display without cutting a wiring pattern. To provide.

[Means for Solving the Problems] In order to achieve the above object, the present invention leaves a light valve region on a PLZT substrate and forms a first groove for a wiring pattern having a substantially flat bottom by chemical etching at predetermined intervals. At the same time as forming the first groove for the wiring pattern, the second groove for the electrode is formed with the same depth as the first groove at a predetermined interval in the right angle direction by machining such as a dicing cutter. A groove type drive electrode and a groove type common electrode are alternately formed in the second groove for the electrode by a sputtering method, and the groove type drive electrode is formed in the first groove for the wiring pattern by a photolithography method. It is characterized in that an electrode and an external lead wiring of the groove type common electrode are formed.

[Operation] With the above-described configuration, the light valve region is left by chemical etching on the PLZT substrate to form wide wiring pattern grooves at predetermined intervals, and the wiring pattern groove has a flat bottom. To be done. Further, since the groove for the electrode is formed over the entire area of the light valve in a direction perpendicular to the groove for the wiring pattern by machining such as a dicing cutter, a fine light valve is formed in the light valve area. It is formed.

A drive electrode and a common electrode are formed in the groove for the electrode by a sputtering method, and a wiring pattern for drawing out the drive electrode and the common electrode to the outside is formed in the groove for the wiring pattern by a thin film technique or the like. It When forming this wiring pattern, since the groove for the wiring pattern and the groove for the electrode are formed to have substantially the same depth and the bottom of the groove for the wiring pattern is flat, the wiring pattern is cut. It does not occur.

[Examples] Examples of the present invention will be described below with reference to FIGS. 1 and 2. In the figure, the same parts and corresponding parts as in FIG.

In FIG. 1 and FIG. 2, a plurality of rows of wiring pattern grooves (first grooves) 9 having a predetermined width are formed on the PLZT substrate 1 by leaving a region A to be the light valve 6 by chemical etching. A plurality of electrode grooves (second grooves) 10 are formed in a region perpendicular to the grooves 9 in a region to be the light valve 6.
In this case, since the wiring pattern groove 9 is formed to have a wide width and a flat bottom by chemical etching, a plurality of wirings can be passed therethrough. In addition, since the electrode groove 10 is formed linearly in the entire region of the light valve 6, it is deep and machined by a dicing cutter, and
It can be formed narrow (for example, depth 100 μm, width 10 μm). The wiring pattern groove 9 and the electrode groove 10 are formed to have substantially the same depth.

In the regions A and B in the figure, a metal film is formed in the electrode groove 10 by a sputtering method, the groove-shaped drive electrode 4 and the common electrode (GND) 5 are alternately formed, and the wiring is formed. In the pattern groove 10, a wiring pattern 8 for drawing the groove-shaped drive electrode 4 and the common electrode 5 to the outside is formed by a thin film technique (photolithography method). At this time, since the depths of the groove 9 and the groove 10 are substantially the same, the wiring pattern 8
There is no step (concavo-convex) in the portion and the wiring pattern 8 is not cut. As shown in FIG. 2, when forming the wiring pattern 8, the PLZT substrate 1
The extraction electrode 11 can be formed on the substrate by thin film technology.

Further, in the wiring pattern groove 9, not only the wiring pattern for leading out electrodes but also a plurality of electrodes (adjacent drive electrodes 4 and common Electrodes 5)
, And a wiring pattern for forming a comb-shaped drive electrode and a common electrode can be formed.

Thus, the groove 9 for the wiring pattern is formed, and the groove 9
While forming the groove 10 for the electrode in a direction perpendicular to,
Since the depths of the grooves 9 and 10 are substantially the same, a short, deep and narrow groove is formed by using mechanical processing such as a dicing cutter, and the groove type electrode can be obtained by this groove. When the wiring pattern is formed by the thin film technique, the wiring pattern 8 is not cut. Therefore, a minute light valve 6 can be obtained, and a complicated wiring pattern 8 can be obtained, and the PLZT display device using the PLZT substrate 1 can be used as a fine light valve array or a flat display. ..

[Effects of the Invention] As described above, according to the PLZT display device using the groove type electrode of the present invention, the groove for the wiring pattern is formed in the PLZT substrate while leaving the light valve region, and the groove is perpendicular to the groove. Forming a groove for an electrode of the same depth in the same direction, forming a metal film on the groove for the electrode, and extracting the formed part (driving electrode and common electrode) to the outside Since it was formed in the groove for the
Since it is possible to form a minute light valve and to form a complicated wiring pattern without cutting, it is possible to use the groove type electrode PLZT display device for a fine light valve array or a flat display. The effect is that it will be possible.

[Brief description of drawings]

1 and 2 are schematic perspective views and front views of a PLZT display device using grooved electrodes showing an embodiment of the present invention, and FIGS. 3 to 5 show conventional surface electrodes and grooved electrodes.
FIG. 3 is a schematic cross-sectional view and a front view for explaining a PLZT display device. In the figure, 1 is a PLZT substrate, 4 is a drive electrode (groove type), 5 is a common electrode (GND; groove type), 6 is a light valve, 8 is a wiring pattern,
9 is a groove (for wiring pattern), 10 is a groove (for electrode), 11
Is an extraction electrode.

Claims (1)

[Claims] 1. A first groove for a wiring pattern having a substantially flat bottom is formed at a predetermined interval by chemical etching while leaving a light valve region on a PLZT substrate, and the first groove for the wiring pattern is formed. The second grooves for the electrodes are formed at a predetermined interval in the perpendicular direction at the same depth as the first grooves by machining such as a dicing cutter, and are alternately formed in the second grooves for the electrodes by the sputtering method. Forming a groove-type drive electrode and a groove-type common electrode, and forming an external lead wiring of the groove-type drive electrode and the groove-type common electrode in the first groove for the wiring pattern by a photolithography method. A method for manufacturing a PLZT display device, characterized by: