「X-ray diffraction measurement」に関連した英語例文の一覧と使い方 - Weblio英語例文検索

SAMPLE CONTAINER FOR X-RAY DIFFRACTION MEASUREMENT例文帳に追加

Ｘ線回折測定用試料容器 - 特許庁

SILICON SUBSTRATE FOR X-RAY DIFFRACTION MEASUREMENT例文帳に追加

Ｘ線回折測定用シリコン基板 - 特許庁

X-RAY DIFFRACTOMETER AND METHOD FOR X-RAY DIFFRACTION MEASUREMENT例文帳に追加

Ｘ線回折装置及びＸ線回折測定方法 - 特許庁

ANGLE CORRECTION METHOD IN X-RAY DIFFRACTION MEASUREMENT AND X-RAY DIFFRACTION SYSTEM例文帳に追加

Ｘ線回折測定における角度補正方法及びＸ線回折装置 - 特許庁

AIRTIGHT SAMPLE HOLDER FOR X-RAY DIFFRACTION MEASUREMENT例文帳に追加

Ｘ線回折測定用気密試料ホルダー - 特許庁

X-RAY DIFFRACTION AND THERMAL ANALYSIS SIMULTANEOUS MEASUREMENT DEVICE例文帳に追加

Ｘ線回折・熱分析同時測定装置 - 特許庁

X-RAY DIFFRACTION ANALYZER AND METHOD FOR CORRECTING MEASUREMENT POSITION OF X-RAY DIFFRACTION ANALYZER例文帳に追加

Ｘ線回折分析器およびこのＸ線回折分析器の測定位置補正方法 - 特許庁

A measuring device 2 performs X-ray diffraction measurement.例文帳に追加

測定装置２はＸ線回折測定を行う。 - 特許庁

CALIBRATION METHOD FOR TEMPERATURE IN X-RAY DIFFRACTION MEASUREMENT APPARATUS例文帳に追加

Ｘ線回折測定装置の温度較正方法 - 特許庁

To provide an X-ray diffraction measuring method facilitating X-ray diffraction measurement in a transmission method.例文帳に追加

透過法のＸ線回折測定を容易としうるＸ線回折測定方法の提供。 - 特許庁

MEASUREMENT OF CRITICAL DIMENSIONS USING X-RAY DIFFRACTION IN REFLECTION MODE例文帳に追加

反射モードのＸ線回折を用いた限界寸法の測定 - 特許庁

The sample for X-ray diffraction measurement is analyzed by an X-ray diffraction device, to thereby measure the asbestos content.例文帳に追加

このＸ線回折測定用試料をＸ線回折装置で分析しアスベスト含有量を測定する。 - 特許庁

The instrument with function of both the X-ray diffraction (XRD) and the X-ray fluorescence (XRF) measurement deploys an X-ray source 10 generating the incident X-ray beam aiming at samples on a sample stand.例文帳に追加

X線回折XRDおよびX線蛍光測定XRFの両方の機能をもつ機器が、試料台上の試料に向けられる入射X線ビームを生成するX線源１０を配置している。 - 特許庁

SAMPLE HOLDER FOR X-RAY DIFFRACTION MEASUREMENT AND SAMPLE FIXING METHOD例文帳に追加

Ｘ線回折測定用試料ホルダーおよび試料固定方法 - 特許庁

METHOD AND IMPLEMENT FOR FIXING SAMPLE IN X-RAY DIFFRACTION MEASUREMENT例文帳に追加

Ｘ線回折測定における試料固定方法および試料固定具 - 特許庁

To provide an X-ray diffraction apparatus having an improved measurement accuracy.例文帳に追加

測定精度の向上が図られるＸ線回折装置、を提供する。 - 特許庁

To accurately analyze a crystal structure by using X-ray diffraction measurement.例文帳に追加

Ｘ線回折測定を用いて結晶の構造を正確に解析する。 - 特許庁

To judge the presence of a twist distribution by subjecting a GaN type sample to X-ray diffraction measurement.例文帳に追加

ＧａＮ系試料をＸ線回折測定して、twist 分布の存否を判定する。 - 特許庁

To enhance measurement precision for various X-ray diffractometers for usual X-ray diffraction, X-ray abnormal scattering diffraction and the like, by setting an X-ray size within a range assigned by the present invention.例文帳に追加

Ｘ線のサイズを、本発明で指定した範囲内に設定することにより、各種の、通常のＸ線回折用、及び、Ｘ線異常散乱回折用等の、Ｘ線回折装置の測定精度を高めること。 - 特許庁

The X-ray diffraction measurement of the measuring objective sample is performed with a transmission method.例文帳に追加

この測定対象試料に対して透過法によるＸ線回折測定を行う。 - 特許庁

The total axial orientation of the substrate 1 by the X-ray diffraction measurement is ≥50%.例文帳に追加

基板１のＸ線回折測定による全軸配向度が５０％以上である。 - 特許庁

To irradiate a sample with an incident X-ray of optional wave-length to easily conduct various kinds of X-ray diffraction measurement, by using continuous X-rays generated from an X-ray tube.例文帳に追加

Ｘ線管から発生する連続Ｘ線を利用することにより、任意波長の入射Ｘ線を試料に照射して各種のＸ線回折測定を容易に実施可能とする。 - 特許庁

To provide an X-ray diffraction device which miniaturizes a heater and enlarges the burning region for heating a sample without adversely affecting the measurement result of X-ray diffraction, and to simultaneously apply X-ray diffraction measurement to a plurality of samples.例文帳に追加

Ｘ線回折の測定結果に悪影響を及ぼすことなく、ヒータの小型化が図れながら試料を加熱する均熱領域を広くできるＸ線回折装置を提供し、複数の試料に対して同時にＸ線回折測定が良好に行えるようにする。 - 特許庁

The skin 1 is irradiated with X rays through a beam passing hole 47 to perform measurement by an X-ray diffraction device.例文帳に追加

Ｘ線回折装置によってビーム通過孔４７を通して皮膚１にＸ線を照射して計測が行われる。 - 特許庁

The X-ray diffraction measurement method for a water-containing crystal includes a process of encapsulating a crystal in a water-soluble polymer.例文帳に追加

結晶を水溶性ポリマーで包み込む工程を含む含水結晶のＸ線回折測定方法。 - 特許庁

To obtain an X-ray diffraction apparatus capable of performing X-ray diffraction and measurement with respect to both of a sample large in crystal grain and a sample small in crystal grain under a proper condition.例文帳に追加

結晶粒の大きい試料及び結晶粒の小さい試料の両方に対して適正な条件でＸ線回折測定を行うことができるＸ線回折装置を提供する。 - 特許庁

To provide an airtight sample holder for x-ray diffraction measurement which is a holder to be used for holding a measurement target sample in a measurement instrument in an airtight state in x-ray diffraction measurement and is capable of easily setting a sample and preventing occurrence of such a problem that diffraction from a portion such as an x-ray transmission window other than the sample may be detected.例文帳に追加

Ｘ線回折測定において測定対象試料を気密状態で測定装置内に保持するために使用されるホルダーであって、試料のセットが容易で、かつＸ線透過窓等の試料以外の部分からの回折を検出する問題も生じさせないＸ線回折測定用気密試料ホルダーを提供する。 - 特許庁

To provide an apparatus capable of easily performing measurement of small angle scattering, X-ray diffraction, or reflectance by use of one apparatus.例文帳に追加

一台の装置で、小角散乱、Ｘ線回折、反射率測定等を容易に行える装置を提供する。 - 特許庁

The obtained silicon oxide becomes noncrystalline SiO_x (x<1) which does not show a diffraction peak derived from metal silicon and silicon dioxide in X-ray diffraction measurement.例文帳に追加

得られた珪素酸化物は、Ｘ線回折測定において金属珪素および二酸化珪素に由来する回折ピークを示さない、非結晶質のＳｉＯ_x（ｘ＜１）となる。 - 特許庁

An X-ray diffraction and thermal analysis simultaneous measurement device includes functions for executing X-ray diffraction measurement by irradiating a sample for measurement with X-rays and simultaneously executing thermal analysis measurement by heating the sample for measurement and the standard sample, and includes a furnace heating which heats the sample for measurement and the standard sample.例文帳に追加

被測定試料に対しＸ線を照射してＸ線回折測定を実施するとともに、当該被測定試料および標準試料を加熱して熱分析測定を同時に実施する機能を備えたＸ線回折・熱分析同時測定装置であり、被測定試料および標準試料を加熱する加熱炉を備えている。 - 特許庁

A series of processes ranging over crystallization in a capillary, cryoprotectant processing and diffraction data collection by X-ray diffraction measurement is carried out using the capillary having a contraction area for preventing a crystal of a size suitable for the X-ray diffraction measurement from flowing out.例文帳に追加

Ｘ線回折測定に適した大きさの結晶の流出を防止する絞り領域を有するキャピラリーを用いて、その内部で結晶化、クライオプロテクタント処理およびＸ線回折測定による回折データ収集までの一連の工程を行う。 - 特許庁

To perform simultaneously X-ray diffraction measurement by a plurality of kinds of characteristic X-rays by irradiating a sample simultaneously with the plurality of kinds of characteristic X-rays.例文帳に追加

複数種類の特性Ｘ線を同時に試料に照射して，複数種類の特性Ｘ線によるＸ線回折測定を同時に実施できるようにする。 - 特許庁

To surely obtain an X-ray diffraction profile derived from a thin film formed on the surface of a base material having a periodic structure in which a crystal structure or a molecular structure is oriented in a specific direction, by the X-ray diffraction measurement.例文帳に追加

Ｘ線回折測定により、結晶構造または分子構造が特定方向に配向した周期構造を有した基材表面に形成された薄膜由来のＸ線回折プロファイルを確実に得る。 - 特許庁

That is to say, it is preferable if a diffraction peak can be obtained at diffraction angles 2θ within the range of 42° or more and 44° or less when the Si alloy powder is put under a powder X-ray diffraction measurement.例文帳に追加

つまり、このＳｉ合金粉末について粉末Ｘ線回折測定を行うと、回折角度２θが４２°以上４４°以下の範囲内に回折ピークが得られることが好ましい。 - 特許庁

The GaN type sample is subjected to X-ray diffraction measurement to calculate an hkl profile for each of a plurality of selected different reflection indexes hkl.例文帳に追加

ＧａＮ系試料をＸ線回折測定して、選択した複数の異なる反射指数hklごとのhklプロファイルを求める。 - 特許庁

To provide a measuring substrate usable in X-ray diffraction measurement, even in a trace amount of sample.例文帳に追加

微少量の試料であってもＸ線回折測定に用いることが可能な測定用基板を提供することを目的とする。 - 特許庁

(2) When a half-value width of a diffraction peak b in which a diffraction angle 2θ in powder X-ray diffraction measurement using CuKα_1 rays exists around 43.5° is FWHMb, an X-ray half-width value ratio XFab value stipulated in a formula (1) below is to be 1 or less.例文帳に追加

（ロ）ＣｕＫα_１線を使用した粉末Ｘ線回折測定における回折角２θが４３．５°付近に存在する回折ピークｂの半価幅をＦＷＨＭｂとした時に、下記式（１）で規定されるＸ線半価幅比ＸＦａｂ値が１以下である。 - 特許庁

The formula (1): orientation α=(180-Δβ)/180, provided that Δβ expresses a half width when the X-ray diffraction intensity distribution from 0 to 360° azimuth angle direction is measured by fixing a peak scattering angle in the X-ray diffraction measurement.例文帳に追加

配向度α＝（１８０−Δβ）／１８０…（１）（但し、Δβは、Ｘ線回折測定によるピーク散乱角を固定して方位角方向の０〜３６０度までのＸ線回折強度分布を測定したときの半値幅を表す。） - 特許庁

To attain highly accurate thermal analysis measurement by making ambient environment of a sample for measurement and a standard sample the same on the premise of configuration for performing X-ray diffraction measurement by a transmission method.例文帳に追加

透過法によるＸ線回折測定ができる構造を前提として、被測定試料と標準試料の周囲環境を同じにして高精度な熱分析測定を実現する。 - 特許庁

The reciprocal lattice map measurement of X-ray diffraction requires setting of the measuring range of 2θ/ω and setting of the measuring range of ω.例文帳に追加

Ｘ線回折の逆格子マップを測定するには，２θ／ωの測定範囲とωの測定範囲を設定する必要がある。 - 特許庁

When the X-ray diffraction measurement is performed on the anode side electrode 14, a pattern showing that the particles 28 are amorphous is obtained.例文帳に追加

このアノード側電極１４についてＸ線回折測定を行うと、粒子２８が非晶質であることを示すパターンが得られる。 - 特許庁

To provide an X-ray diffraction device with which pole figure measurement is exactly performed even when a two-dimensional detector is used.例文帳に追加

２次元検出器を用いた場合であっても極点図測定を正確に行うことが可能なＸ線回折装置を提供する。 - 特許庁

By selecting the solar slit 12 and the collimator and selecting the function of the X-ray detector 21, X-ray diffraction and measurement can be performed under a proper condition regardless of the size of a crystal grain.例文帳に追加

ソーラスリット１２とコリメータとを選択し、Ｘ線検出装置２１の機能を選択することにより、結晶粒の大小に拘わらず適正な条件でＸ線回折測定を行うことができる。 - 特許庁

To provide a method of measuring a crystallite diameter of a thin film material for easily measuring the crystallite diameter of the thin film material by X-ray diffraction measurement with high precision, a measuring objective sample for performing the X-ray diffraction measurement of the thin film, and a method of manufacturing the measuring objective sample.例文帳に追加

Ｘ線回折測定により薄膜材料の結晶子径を簡易且つ高精度に測定する薄膜材料の結晶子径測定方法、薄膜に対するＸ線回折測定を行うための測定対象試料、及びこの測定対象試料の製造方法を提供する。 - 特許庁

To improve the measurement accuracy of the amount of adhesion of a metallic phase by improving X-ray diffraction intensity from the metallic phase contained in a plated layer in a method for measuring the amount of adhesion of the metallic phase contained in the plated layer using the X-ray diffraction method.例文帳に追加

Ｘ線回折法を用いた、めっき層に含まれる金属相の付着量を測定する方法において、めっき層に含まれる金属相からの回折Ｘ線強度を高め、金属相の付着量の測定精度を向上させる。 - 特許庁