JPH0239111B2 - TASOHAISENBANNOSEIZOHOHO - Google Patents
TASOHAISENBANNOSEIZOHOHOInfo
- Publication number
- JPH0239111B2 JPH0239111B2 JP2341986A JP2341986A JPH0239111B2 JP H0239111 B2 JPH0239111 B2 JP H0239111B2 JP 2341986 A JP2341986 A JP 2341986A JP 2341986 A JP2341986 A JP 2341986A JP H0239111 B2 JPH0239111 B2 JP H0239111B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- inner layer
- smear
- cro
- holes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010410 layer Substances 0.000 claims description 33
- 238000007747 plating Methods 0.000 claims description 19
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 18
- 229910052802 copper Inorganic materials 0.000 claims description 10
- 239000010949 copper Substances 0.000 claims description 10
- 239000000853 adhesive Substances 0.000 claims description 7
- 230000001070 adhesive effect Effects 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 238000007772 electroless plating Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000012790 adhesive layer Substances 0.000 claims description 2
- 238000010030 laminating Methods 0.000 claims 1
- 239000000243 solution Substances 0.000 description 10
- 239000011889 copper foil Substances 0.000 description 8
- 239000003054 catalyst Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
Description
【発明の詳細な説明】
産業上の利用分野
本発明は印刷配線板に関し、特には多層印刷配
線板の改良に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to printed wiring boards, and more particularly to improvements in multilayer printed wiring boards.
従来の技術
従来の多層印刷配線板は、両面に配線パターン
を有する内層基板と銅貼り積層板とをプリプレグ
を間に入れて重ね合わせた積層プレスを行い、積
層後穴明け加工を行い、全面に化学銅めつきと電
気銅めつきを施し、その後エツチングレジストを
塗布し、不用の銅箔をエツチングして製造してい
る。Conventional technology Conventional multilayer printed wiring boards are made by stacking an inner layer board with wiring patterns on both sides and a copper-clad laminate board with prepreg interposed between them, then drilling holes after the stacking process is completed. It is manufactured by applying chemical copper plating and electrolytic copper plating, then applying etching resist, and etching the unnecessary copper foil.
発明が解決しようとする問題点
従来の多層印刷配線板は、電気銅めつきで銅層
を形成し、ついでエツチング処理して回路を形成
するために銅が無駄に使用している。このため外
層回路を形成する以外の箇所に、めつきレジスト
を塗布し、スルーホールと外層回路とを同時に無
電解めつきで形成する方法を試みた。Problems to be Solved by the Invention In conventional multilayer printed wiring boards, copper is wasted because a copper layer is formed by electroplating and then etched to form a circuit. For this reason, we tried a method in which a plating resist was applied to areas other than those where the outer layer circuit was to be formed, and the through holes and the outer layer circuit were simultaneously formed by electroless plating.
多層配線板を製造する上で最も重要なことはス
ルーホールの信頼性である。その中でもスルーホ
ール内の内層銅箔とスルーホールめつき銅との導
通信頼性である。 The most important thing in manufacturing multilayer wiring boards is the reliability of through holes. Among these, the reliability of conduction between the inner layer copper foil in the through hole and the through hole plated copper is important.
スルーホールの信頼性に影響を与える要因とし
て、スミヤ除去処理の問題がある。配線板にスル
ーホール用の穴明けはドリルを用いて行うが、こ
の穴明け7時の発熱で絶縁樹脂が溶融し、内層銅
箔4の切断面に樹脂が付着8(スミヤという)
し、このスミヤ8が残留すると内層銅箔4とスル
ーホール銅との導電性を損ね、冷熱サイクルが加
わると断線事故が発生し易い。このためスミヤ8
の除去処理を行つている。 One of the factors that affects the reliability of through-holes is the problem of smear removal processing. Holes for through-holes are drilled in the wiring board using a drill, but the heat generated at the time of drilling 7 melts the insulating resin and the resin adheres to the cut surface of the inner layer copper foil 8 (called smearing).
However, if this smear 8 remains, it impairs the conductivity between the inner layer copper foil 4 and the through-hole copper, and when a heating/cooling cycle is applied, a disconnection accident is likely to occur. For this reason, Sumiya 8
The removal process is in progress.
スミヤ8処理は、スミヤ処理液に浸漬して行う
が、このとき、内層銅箔4も溶解してエツチング
が行われ、穴7の表面から内部に後退するエツチ
ドバツク9現象が生じ、スルーホールめつきを形
成する際の障害になる。従つてエツチドバツク9
の量が少なくかつスミヤ8が完全に除去しうる条
件が求められている。 The smear 8 process is performed by immersing the hole in a smear treatment solution, but at this time, the inner layer copper foil 4 is also dissolved and etched, causing an etched back 9 phenomenon in which the hole 7 retreats from the surface to the inside, resulting in through-hole plating. It becomes an obstacle when forming. Therefore, etched back 9
There is a need for conditions in which the amount of smear 8 is small and the smear 8 can be completely removed.
問題点を解決するための手段
本発明は、接着剤を塗布した絶縁板にめつきレ
ジストを塗布し、無電解めつきを行つて内層回路
を形成し内層回路板を製造する。この内層回路板
の表面に絶縁層と接着剤層を順次積層する。この
後スルーホール用の穴明けを行い、この穴明け後
にCrO3水溶液のスミヤ処理液を用いてスミヤ処
理を行い、穴内にシーダーを付着し、外層パター
ン用めつきレジストを塗布し、CrO3、H2SO4及
びNaFとからなるスミヤ処理液でスミヤ除去処
理と接着剤粗化を同時に行い、無電解銅めつきを
行うことによりスルーホールと外層回路を形成し
て多層配線板を製造するものである。Means for Solving the Problems According to the present invention, a plating resist is applied to an insulating board coated with an adhesive, and electroless plating is performed to form an inner layer circuit to manufacture an inner layer circuit board. An insulating layer and an adhesive layer are sequentially laminated on the surface of this inner layer circuit board. After this, holes for through holes are drilled, and after this hole is drilled, a smear treatment is performed using a smear treatment solution of CrO 3 aqueous solution, a seeder is attached to the inside of the hole, a plating resist for the outer layer pattern is applied, and CrO 3 , Smear removal treatment and adhesive roughening are performed simultaneously using a smear treatment liquid consisting of H 2 SO 4 and NaF, and through-holes and outer layer circuits are formed by electroless copper plating to produce multilayer wiring boards. It is.
実施例
めつき触媒入り絶縁基体1にめつき触媒入り接
着剤2を塗布した1.1mm厚のガラス基板エポキシ
樹脂板の所定箇所にめつきレジストインクをスク
リーン印刷して30μm厚のめつきレジスト層3を
形成し、その後無電解めつき液に浸漬し30μm厚
の内層両面銅箔4を形成した内層基板10を製造
する。Example A 30 μm thick plating resist layer 3 is formed by screen printing a plating resist ink on a predetermined location of a 1.1 mm thick glass substrate epoxy resin plate in which an insulating substrate 1 containing a plating catalyst is coated with an adhesive 2 containing a plating catalyst. The inner layer substrate 10 is then immersed in an electroless plating solution to form an inner layer double-sided copper foil 4 having a thickness of 30 μm.
この内層基板10の表面にめつき触媒入りエポ
キシ樹脂系インクをスクリーン印刷法で150μm厚
の絶縁層6を形成し、160℃、70分間乾燥硬化し、
さらにめつき触媒入り接着剤12をカーテンコー
タ法で30μm厚塗布し、160℃、90分間加熱硬化す
る。 An insulating layer 6 with a thickness of 150 μm was formed on the surface of this inner layer substrate 10 using a plating catalyst-containing epoxy resin ink using a screen printing method, and dried and cured at 160° C. for 70 minutes.
Further, a plating catalyst-containing adhesive 12 is applied to a thickness of 30 μm using a curtain coater method, and cured by heating at 160° C. for 90 minutes.
この後ドリルでスルーホールの穴明け7加工を
行い、CrO3900g/からなる水溶液で40℃15分
間のスミヤ除去処理を行う。 After this, through-holes are drilled 7 using a drill, and smear removal treatment is performed at 40°C for 15 minutes with an aqueous solution containing 900 g of CrO 3 .
次に外層回路を形成するためのめつきレジスト
層13を形成し、ついでCrO340g/、
H2SO4350ml/及びNaF28g/を混合したス
ミヤ処理液で再度スミヤ除去処理(40℃、20分)
を行い、洗浄後無電解めつき液に浸漬して30μm
厚のスルーホールめつき及び外層銅箔回路14を
形成し4層の多層配線板20を製造する。 Next, a plating resist layer 13 for forming an outer layer circuit is formed, and then 40 g of CrO 3 /,
Smear removal treatment again using a smear treatment solution containing 350 ml of H 2 SO 4 and 28 g of NaF (40°C, 20 minutes)
After cleaning, immerse it in electroless plating solution to 30 μm.
A four-layer multilayer wiring board 20 is manufactured by plating thick through holes and forming an outer layer copper foil circuit 14.
この追加スミヤ処理液の濃度はCrO3が30〜
60g/、H2SO4が250〜450ml及びNaFが20〜
40g/の範囲がのぞましい。 The concentration of this additional smear treatment solution is CrO 3 ~ 30
60g/, 250-450ml of H 2 SO 4 and 20-450ml of NaF
A range of 40g/ is desirable.
当初のスミヤ処理液として用いるCrO3溶液で
は濃度が800〜1100g/の範囲が、スミヤの除
去、エツチドバツクの形状、銅箔の接着力、はん
だ耐熱性等の特性上適している。この濃度範囲を
外れると上記特性のいずれかに不都合を生じる。 For the CrO 3 solution used as the initial smear treatment solution, a concentration range of 800 to 1100 g/g is suitable for characteristics such as smear removal, etched back shape, copper foil adhesive strength, and soldering heat resistance. If the concentration is outside this range, any of the above characteristics will be unfavorable.
この多層配印刷線板20を用いホツトオイルテ
スト(260℃、10秒)を行つた結果、スルーホー
ル抵抗が10%を超えるサイクル数が55であつた。
かつ、内層銅とスルーホールめつき銅との接続性
は良好であつた。 A hot oil test (260° C., 10 seconds) was conducted using this multilayer printed wiring board 20, and as a result, the number of cycles in which the through-hole resistance exceeded 10% was 55.
Moreover, the connectivity between the inner layer copper and the through-hole plated copper was good.
発明の効果
本発明は以上に述べた如く、スミヤ処理液とし
てCrO3処理液で処理し、次いでCrO3、H2SO4及
びNaFの混合液を用いてスミヤ除去処理を行つ
た結果、内層銅箔とスルーホールめつきとの接続
信頼性が向上した。Effects of the Invention As described above, the present invention is characterized by treating with a CrO 3 treatment solution as a smear treatment solution, and then performing a smear removal treatment using a mixed solution of CrO 3 , H 2 SO 4 and NaF. Improved connection reliability between foil and through-hole plating.
第1図は本発明の断面図、第2図は内層回路板
の断面図、第3図はスミヤが残留している断面
図、第4図はスミヤ除去した断面図。
図面において、1:絶縁板、2:接着剤、4:
内層回路、8:スミヤ、10:内層回路板、2
0:多層配線板。
FIG. 1 is a sectional view of the present invention, FIG. 2 is a sectional view of an inner layer circuit board, FIG. 3 is a sectional view with smear remaining, and FIG. 4 is a sectional view with smear removed. In the drawings, 1: insulating plate, 2: adhesive, 4:
Inner layer circuit, 8: Smear, 10: Inner layer circuit board, 2
0: Multilayer wiring board.
Claims (1)
パターン形成し、無電解銅めつきを行つて内層回
路を形成して内層回路板となし、この内層回路板
の上に絶縁層、接着剤層を順次積層した後回路板
を貫通する穴明け加工を行い、スミヤ処理液とし
てCrO3の処理液を用い、外層回路用めつきレジ
ストを塗布し、ついでCrO3,H2SO4及びNaF溶
液でスミヤ処理を行い、無電解めつきを行つてス
ルーホールと外層回路を形成することを特徴とす
る多層配線板の製造方法。1 A pattern is formed using a plating resist on an insulating board coated with an adhesive, and an inner layer circuit is formed by electroless copper plating to form an inner layer circuit board.On top of this inner layer circuit board, an insulating layer and an adhesive layer are formed. After sequentially laminating the circuit boards, a hole is drilled through the circuit board, a plating resist for the outer layer circuit is applied using a CrO 3 processing solution as a smearing solution, and then a CrO 3 , H 2 SO 4 and NaF solution is applied. A method for manufacturing a multilayer wiring board, characterized by performing smearing and electroless plating to form through holes and outer layer circuits.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2341986A JPH0239111B2 (en) | 1986-02-05 | 1986-02-05 | TASOHAISENBANNOSEIZOHOHO |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2341986A JPH0239111B2 (en) | 1986-02-05 | 1986-02-05 | TASOHAISENBANNOSEIZOHOHO |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62181495A JPS62181495A (en) | 1987-08-08 |
| JPH0239111B2 true JPH0239111B2 (en) | 1990-09-04 |
Family
ID=12109979
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2341986A Expired - Lifetime JPH0239111B2 (en) | 1986-02-05 | 1986-02-05 | TASOHAISENBANNOSEIZOHOHO |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0239111B2 (en) |
-
1986
- 1986-02-05 JP JP2341986A patent/JPH0239111B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62181495A (en) | 1987-08-08 |
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